专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08657962B2 Particle removing method, particle removing device, atomic force microscope, and charged particle beam apparatus 有权
标题翻译：粒子去除法，粒子去除装置，原子力显微镜和带电粒子束装置
公开(公告)号：US08657962B2
公开(公告)日：2014-02-25
申请号：US12139065
申请日：2008-06-13
申请人： Hiroki Hayashi , Takashi Konno , Kouji Iwasaki , Masatoshi Yasutake , Junichi Tashiro
发明人： Hiroki Hayashi , Takashi Konno , Kouji Iwasaki , Masatoshi Yasutake , Junichi Tashiro
IPC分类号： B08B7/00
CPC分类号： B25J7/00 , G01Q80/00
摘要： Small tweezers having a pair of arms openable and closable is moved closer to a sample and grips a particle attached on a surface of the sample and carries it onto an adhesion member to attach it thereto. The small tweezers are opened to release the particle and brought away from the adhesion member to leave the particle on the adhesion member. A particle removing device includes small tweezers having a pair of arms openable and closable; an opening/closing driving unit that drives the arm or arms to open/close the small tweezers; a stage mounting an adhesion member that attaches thereto a particle to withdraw the particle; and a moving mechanism that moves the small tweezers between the sample and the adhesion member mounted on the stage. Also, an atomic force microscope and a charged ion beam apparatus that include the particle removing device are disclosed.
摘要翻译：具有可打开和关闭的一对臂的小镊子移动得更靠近样品并且夹持附着在样品表面上的颗粒并将其携带到粘附构件上以将其附着在其上。打开小镊子以释放颗粒并从附着构件脱离，使颗粒留在粘合构件上。颗粒除去装置包括具有可打开和关闭的一对臂的小镊子; 打开/关闭驱动单元，驱动臂或臂打开/关闭小镊子; 安装附着于其上以吸收颗粒的粘合构件的载物台; 以及移动机构，其将小镊子移动在样品和安装在台架上的粘合构件之间。另外，还公开了包括粒子除去装置的原子力显微镜和带电离子束装置。

2. 发明授权

US07404339B2 Probe and small sample pick up mechanism 有权
标题翻译：探头和小样品拾取机制
公开(公告)号：US07404339B2
公开(公告)日：2008-07-29
申请号：US11182108
申请日：2005-07-15
申请人： Masanao Munekane , Kouji Iwasaki , Takashi Konno , Hiroki Hayashi
发明人： Masanao Munekane , Kouji Iwasaki , Takashi Konno , Hiroki Hayashi
IPC分类号： G01N1/00
CPC分类号： H01J37/20 , B25J7/00 , B25J15/12 , G01N1/32 , H01J2237/20264
摘要： A probe mechanism and a sample pick up mechanism of the invention are provided at an observing apparatus or an analyzing apparatus and characterized in including a tip member comprising a needle-like member brought into contact with a sample, including a driving electrostatic actuator and means for monitoring a change in an electrostatic capacitance between electrodes of the electrostatic actuator, and capable of sensing that the probe is brought into contact with a sample by the monitor.
摘要翻译：本发明的探针机构和取样机构设置在观察装置或分析装置中，其特征在于，包括：尖端部件，包括与样品接触的针状部件，所述针状部件包括驱动静电致动器和用于监测静电致动器的电极之间的静电电容的变化，并且能够感测到探针通过监视器与样品接触。

3. 发明申请

US20060010968A1 Probe and small sample pick up mechanism 有权
标题翻译：探头和小样品拾取机制
公开(公告)号：US20060010968A1
公开(公告)日：2006-01-19
申请号：US11182108
申请日：2005-07-15
申请人： Masanao Munekane , Kouji Iwasaki , Takashi Konno , Hiroki Hayashi
发明人： Masanao Munekane , Kouji Iwasaki , Takashi Konno , Hiroki Hayashi
IPC分类号： G01N19/02
CPC分类号： H01J37/20 , B25J7/00 , B25J15/12 , G01N1/32 , H01J2237/20264
摘要： A probe mechanism and a sample pick up mechanism of the invention are provided at an observing apparatus or an analyzing apparatus and characterized in including a tip member comprising a needle-like member brought into contact with a sample, including a driving electrostatic actuator and means for monitoring a change in an electrostatic capacitance between electrodes of the electrostatic actuator, and capable of sensing that the probe is brought into contact with a sample by the monitor
摘要翻译：本发明的探针机构和取样机构设置在观察装置或分析装置中，其特征在于，包括：尖端部件，包括与样品接触的针状部件，所述针状部件包括驱动静电致动器和用于监测静电致动器的电极之间的静电电容的变化，并且能够感测到探针通过监视器与样品接触

4. 发明授权

US08581206B2 Focused ion beam system and sample processing method using the same 有权
标题翻译：聚焦离子束系统和样品处理方法使用相同
公开(公告)号：US08581206B2
公开(公告)日：2013-11-12
申请号：US12707024
申请日：2010-02-17
申请人： Xin Man , Kouji Iwasaki , Junichi Tashiro
发明人： Xin Man , Kouji Iwasaki , Junichi Tashiro
IPC分类号： G21K5/10 , G21K5/08 , G21K1/00 , G21K5/04
CPC分类号： H01J37/20 , G01N1/32 , H01J37/3056 , H01J2237/208
摘要： A focused ion beam system includes a sample holder having a fixing plane for fixing a sample, a sample base on which the sample holder is provided, a focused ion beam irradiating mechanism that irradiates a focused ion beam to the sample, microtweezers that hold the sample and have the axial direction at a predetermined angle to a surface of the sample base, an opening/closing mechanism that opens and closes the microtweezers, a rotating mechanism that rotates the microtweezers about the axial direction, and a moving mechanism that moves the position of the microtweezers.
摘要翻译：聚焦离子束系统包括具有用于固定样品的固定平面的样品保持器，其上设置有样品保持器的样品基底，将聚焦离子束照射到样品的聚焦离子束照射机构，保持样品的微量滴定器并且具有与样品台的表面成预定角度的轴向方向，打开和关闭微型加热器的开闭机构，使微型加热器绕轴向旋转的旋转机构，以及移动机构，微动员。

5. 发明申请

US20100213386A1 FOCUSED ION BEAM SYSTEM AND SAMPLE PROCESSING METHOD USING THE SAME 有权
标题翻译：聚焦离子束系统和采用该方法的样品处理方法
公开(公告)号：US20100213386A1
公开(公告)日：2010-08-26
申请号：US12707024
申请日：2010-02-17
申请人： Xin Man , Kouji Iwasaki , Junichi Tashiro
发明人： Xin Man , Kouji Iwasaki , Junichi Tashiro
IPC分类号： G21K5/10 , G21K5/08 , G21K1/00 , G21K5/04
CPC分类号： H01J37/20 , G01N1/32 , H01J37/3056 , H01J2237/208
摘要： A focused ion beam system includes a sample holder having a fixing plane for fixing a sample, a sample base on which the sample holder is provided, a focused ion beam irradiating mechanism that irradiates a focused ion beam to the sample, microtweezers that hold the sample and have the axial direction at a predetermined angle to a surface of the sample base, an opening/closing mechanism that opens and closes the microtweezers, a rotating mechanism that rotates the microtweezers about the axial direction, and a moving mechanism that moves the position of the microtweezers.
摘要翻译：聚焦离子束系统包括具有用于固定样品的固定平面的样品保持器，其上设置有样品保持器的样品基底，将聚焦离子束照射到样品的聚焦离子束照射机构，保持样品的微量滴定器并且具有与样品台的表面成预定角度的轴向方向，打开和关闭微型加热器的开闭机构，使微型加热器绕轴向旋转的旋转机构，以及移动机构，微动员。

6. 发明申请

US20100176296A1 COMPOSITE FOCUSED ION BEAM DEVICE, AND PROCESSING OBSERVATION METHOD AND PROCESSING METHOD USING THE SAME 有权
标题翻译：复合聚焦离子束装置和处理观测方法及其处理方法
公开(公告)号：US20100176296A1
公开(公告)日：2010-07-15
申请号：US12733089
申请日：2008-08-06
申请人： Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
发明人： Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
IPC分类号： H01J37/30 , H01J27/02 , H01J37/08 , H01J37/26
CPC分类号： H01J37/3056 , G01N1/286 , G01N1/32 , G03F1/74 , G03F1/84 , H01J37/08 , H01J37/3005 , H01J2237/0805 , H01J2237/0807 , H01J2237/31745
摘要： A composite focused ion beam device includes a first ion beam irradiation system 10 including a liquid metal ion source for generating a first ion, and a second ion beam irradiation system 20 including a gas field ion source for generating a second ion, and a beam diameter of the second ion beam 20A emitted from the second ion beam irradiation system 20 is less than that of the first ion beam 10A emitted from the first ion beam irradiation system 10.
摘要翻译：复合聚焦离子束装置包括：第一离子束照射系统10，其包括用于产生第一离子的液态金属离子源;以及第二离子束照射系统20，其包括用于产生第二离子的气体场离子源，从第二离子束照射系统20发射的第二离子束20A的距离小于从第一离子束照射系统10发射的第一离子束10A的离子束。

7. 发明授权

US08269194B2 Composite focused ion beam device, and processing observation method and processing method using the same 有权
标题翻译：复合聚焦离子束装置及其加工方法及处理方法
公开(公告)号：US08269194B2
公开(公告)日：2012-09-18
申请号：US12733089
申请日：2008-08-06
申请人： Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
发明人： Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
IPC分类号： H01J49/00
CPC分类号： H01J37/3056 , G01N1/286 , G01N1/32 , G03F1/74 , G03F1/84 , H01J37/08 , H01J37/3005 , H01J2237/0805 , H01J2237/0807 , H01J2237/31745
摘要： A composite focused ion beam device has a sample stage for supporting a sample, a first ion beam irradiation system that irradiates a first ion beam for processing the sample, and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a liquid metal ion source that generates first ions for forming the first ion beam. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. The first ion beam irradiated by the first ion beam irradiation system has a first beam diameter and the second ion beam irradiated by the second ion beam irradiation system has a second beam diameter smaller than the first beam diameter. The first and second ion beam irradiation systems are disposed relative to the sample stage so that axes of the first and second ion beams are orthogonal to a tilt axis of the sample stage.
摘要翻译：复合聚焦离子束装置具有用于支撑样品的样品台，照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束以用于处理或观察样品的第二离子束照射系统样品。第一离子束照射系统具有产生用于形成第一离子束的第一离子的液态金属离子源。第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。由第一离子束照射系统照射的第一离子束具有第一光束直径，并且由第二离子束照射系统照射的第二离子束具有小于第一光束直径的第二光束直径。第一和第二离子束照射系统相对于样品台设置，使得第一和第二离子束的轴线垂直于样品台的倾斜轴。

8. 发明授权

US08304721B2 Micro cross-section processing method 有权
标题翻译：微截面加工方法
公开(公告)号：US08304721B2
公开(公告)日：2012-11-06
申请号：US12708896
申请日：2010-02-19
申请人： Kouji Iwasaki , Tatsuya Adachi
发明人： Kouji Iwasaki , Tatsuya Adachi
IPC分类号： H01L21/302 , H01L21/66 , H01J37/26 , H01J37/30
CPC分类号： G21K5/04 , G01N23/2202 , G21K5/10 , H01J2237/31745 , H01J2237/31749
摘要： A micro cross-section processing method includes the steps of determining a linear cross-section estimated position including an observation object on a surface of the sample, irradiating the focused ion beam to the cross-section estimated position perpendicularly to or at a tilt angle to form a cross-section at a position in front of the cross-section estimated position, irradiating the focused ion beam to both ends of the cross-section to form side cuts extending to a position in rear of the cross-section estimated position, irradiating the focused ion beam to a position on the surface of the cross-section and at a position deeper than the observation object to form a bottom cut extending to a position in rear of the cross-section estimated position, irradiating the focused ion beam along from the side cuts to the cross-section estimated position to form wedges connecting to the bottom cut, and applying impact to a region in front of the cross-section estimated position of the sample to cleave the vicinity of the cross-section estimated position between the wedges and form a plane of cleavage.
摘要翻译：微型横截面处理方法包括以下步骤：确定包括在样品表面上的观察对象的线性横截面估计位置，将聚焦离子束垂直于或以倾斜角照射到横截面估计位置，在横截面估计位置前面的位置处形成横截面，将聚焦离子束照射到横截面的两端，以形成延伸到横截面估计位置后方的位置的侧切口所述聚焦离子束到达所述横截面表面上的位置，并且位于比所述观察对象更深的位置，以形成延伸到所述横截面估计位置的后方的位置的底切口，从而沿着所述聚焦离子束照射侧面切割到横截面估计位置以形成连接到底切口的楔形，并且对样品的横截面估计位置前面的区域施加冲击以切割楔块之间的横截面估计位置附近并形成切割平面。

9. 发明授权

US07345289B2 Sample support prepared by semiconductor silicon process technique 有权
标题翻译：采用半导体硅工艺制备样品
公开(公告)号：US07345289B2
公开(公告)日：2008-03-18
申请号：US11356698
申请日：2006-02-17
申请人： Kouji Iwasaki , Masanso Munekane
发明人： Kouji Iwasaki , Masanso Munekane
IPC分类号： H01L21/00 , H01J37/305 , G01N1/28
CPC分类号： H01J37/20 , G01N1/32
摘要： A sample support of the present invention is prepared such that a silicon substrate is used as a raw material, the thickness structure having a shape and a thickness of 10 μm or less is prepared using a semiconductor silicon process technique. The sample support of the present invention is adhered to a partially-cut mesh in a state that a sample portion is not adhered. Further, a plurality of portions where the samples are mounted is arranged on the same substrate.
摘要翻译：制备本发明的样品载体，使用硅衬底作为原料，使用半导体硅工艺技术制备具有10μm或更小的形状和厚度的厚度结构。本发明的样品支持体在样品部分未被粘附的状态下被粘附到部分切割的网状物上。此外，在同一基板上配置多个安装样品的部分。

10. 发明申请

US20050236587A1 Ion beam device and ion beam processing method, and holder member 有权
标题翻译：离子束装置和离子束处理方法，以及支架构件
公开(公告)号：US20050236587A1
公开(公告)日：2005-10-27
申请号：US10520982
申请日：2003-07-09
申请人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fujii , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
发明人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fujii , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
IPC分类号： G01N1/32 , G01N1/28 , G01N1/34 , G21K5/08 , H01J37/20 , H01J37/30 , H01J37/305 , H01L21/302 , G21K5/10
CPC分类号： H01J37/3056 , G01N1/32 , H01J2237/31745 , H01J2237/31749
摘要： An apparatus has a holder member (21) which holds a sample (3), and a removing beam source (13) which irradiates an inert ion beam onto a cross section (4) of the sample (3) held by a holder member (21) and removes a fracture layer on the cross section (4). Then, the removing beam source (13) is disposed on the holding end side of the sample (3) with respect to the normal L of the cross section (4) so that the irradiating direction of the inert ion beam is tilted at the tilt angle θ to the normal L with respect to the cross section (4).
摘要翻译：一种装置具有保持样品（3）的保持器构件（21）和将惰性离子束照射到由保持器构件保持的样品（3）的横截面（4）上的去除束源（13） 21）并且去除横截面（4）上的断裂层。然后，移除光束源（13）相对于截面（4）的法线L配置在样品（3）的保持端侧，使得惰性离子束的照射方向倾斜相对于横截面（4）的角度θ相对于法线L。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式