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    • 7. 发明授权
    • Method of fabricating grabbing face of sample grabbing portion
    • 样品抓取部分抓取面的制作方法
    • US07951303B2
    • 2011-05-31
    • US11960304
    • 2007-12-19
    • Masanao Munekane
    • Masanao Munekane
    • C23F1/00
    • H01J37/3056H01J37/20H01J2237/2007H01J2237/204H01J2237/31745
    • By working a grabbing portion by a charged particle beam of FIB or the like, the grabbing portion in parallel with the beam can be formed, and also dust adhered to the grabbing portion is removed. When a small sample represented by a TEM sample is fabricated by being cut out by etching by a charged particle beam and is carried at inside of an apparatus of irradiating a charged particle beam, the sample is etched in a direction of irradiating the charged particle beam, and therefore, a mechanism pinched by a grabbing face of a grabbing portion can be worked in a direction the same as that in working the sample, and therefore, a change in an attitude can be reduced when the sample and the grabbing face are fabricated by parallel faces.
    • 通过利用FIB等的带电粒子束来抓取部分,可以形成与梁平行的抓取部分,并且除去附着在抓取部分上的灰尘。 当由TEM样品表示的小样品通过用带电粒子束蚀刻而切割并在照射带电粒子束的装置的内部被携带时,沿着照射带电粒子束的方向来蚀刻样品 因此,可以在与加工样品相同的方向上加工由抓取部分的抓握面夹持的机构,因此当制造样品和抓取面时可以降低姿态的变化 通过平行面。