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1. 发明授权

US07442942B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US07442942B2
公开(公告)日：2008-10-28
申请号：US11509520
申请日：2006-08-24
申请人： Haruo Takahashi , Toshiaki Fujii , Yutaka Ikku , Kouji Iwasaki , Yo Yamamoto
发明人： Haruo Takahashi , Toshiaki Fujii , Yutaka Ikku , Kouji Iwasaki , Yo Yamamoto
IPC分类号： H01J37/20
CPC分类号： H01J37/304 , G01N1/32 , H01J2237/31745 , H01J2237/31749
摘要： To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.
摘要翻译：为了包括聚焦离子束装置，通过加工试样和观察切片试样来制造切片样品，观察切片试样的扫描电子显微镜，气相离子束照射装置，通过将气体离子束照射到切片试样的表面，切片试样固定并具有至少一个以上的旋转轴的试样台，识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台，以便允许气体离子束相对于正面或反向的入射角切片样品为期望值。

2. 发明申请

US20070045560A1 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US20070045560A1
公开(公告)日：2007-03-01
申请号：US11509520
申请日：2006-08-24
申请人： Haruo Takahashi , Toshiaki Fujii , Yutaka Ikku , Kouji Iwasaki , Yo Yamamoto
发明人： Haruo Takahashi , Toshiaki Fujii , Yutaka Ikku , Kouji Iwasaki , Yo Yamamoto
IPC分类号： H01J37/20 , G01N1/28
CPC分类号： H01J37/304 , G01N1/32 , H01J2237/31745 , H01J2237/31749
摘要： To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.
摘要翻译：为了包括聚焦离子束装置，通过加工试样和观察切片试样来制造切片样品，观察切片试样的扫描电子显微镜，气相离子束照射装置，通过将气体离子束照射到切片试样的表面，切片试样固定并具有至少一个以上的旋转轴的试样台，识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台，以便允许气体离子束相对于正面或反向的入射角切片样品为期望值。

3. 发明授权

US07518125B2 Processing apparatus using focused charged particle beam 有权
标题翻译：使用聚焦带电粒子束的处理装置
公开(公告)号：US07518125B2
公开(公告)日：2009-04-14
申请号：US11501629
申请日：2006-08-09
申请人： Yo Yamamoto , Haruo Takahashi , Toshiaki Fujii
发明人： Yo Yamamoto , Haruo Takahashi , Toshiaki Fujii
IPC分类号： G01N23/00
CPC分类号： G01N1/32
摘要： A processing apparatus uses a focused charged particle beam to process a micro sample that is supported on a micro mount part. The micro mount part is supported on a micro sample stage and locally cooled by a cooling unit. The micro mount part is thermally independent of the micro sample stage and, due to its small size, can be cooled rapidly by the cooling unit.
摘要翻译：处理装置使用聚焦带电粒子束来处理支撑在微安装部件上的微样品。微型安装部分支撑在微量样品台上，并由冷却单元局部冷却。微型安装部件与微型样品台热独立，并且由于其小尺寸，可以通过冷却单元快速冷却。

4. 发明申请

US20070040128A1 Processing apparatus using focused charged particle beam 有权
标题翻译：使用聚焦带电粒子束的处理装置
公开(公告)号：US20070040128A1
公开(公告)日：2007-02-22
申请号：US11501629
申请日：2006-08-09
申请人： Yo Yamamoto , Haruo Takahashi , Toshiaki Fujii
发明人： Yo Yamamoto , Haruo Takahashi , Toshiaki Fujii
IPC分类号： H01J37/20
CPC分类号： G01N1/32
摘要： A sample to be observed or processed with a focused charged particle beam is formed small, and only the micro sample is locally cooled. Alternatively, a sample mount part is used which has the structure that can relax a thermal drift.
摘要翻译：用聚焦带电粒子束观察或加工的样品形成较小，并且只有微样品局部冷却。或者，使用具有可以放松热漂移的结构的样品安装部件。

5. 发明授权

US07718981B2 Composite charged-particle beam system 有权
标题翻译：复合带电粒子束系统
公开(公告)号：US07718981B2
公开(公告)日：2010-05-18
申请号：US12134919
申请日：2008-06-06
申请人： Haruo Takahashi , Yo Yamamoto , Toshiaki Fujii
发明人： Haruo Takahashi , Yo Yamamoto , Toshiaki Fujii
IPC分类号： G01N23/00
CPC分类号： H01J37/20 , H01J37/3056 , H01J2237/20242 , H01J2237/31745 , H01J2237/31749
摘要： There is provided a method of arranging, as a composite charged-particle beam system, a gas ion beam apparatus, an FIB and an SEM in order to efficiently prepare a TEM sample. The composite charged-particle beam system includes an FIB lens-barrel 1, an SEM lens-barrel 2, a gas ion beam lens-barrel 3, and a rotary sample stage 9 having an eucentric tilt mechanism and a rotating shaft 10 orthogonal to an eucentric tilt axis 8. In the composite charged-particle beam system, an arrangement is made such that a focused ion beam 4, an electron beam 5 and a gas ion beam 6 intersect at a single point, an axis of the FIB lens-barrel 1 and an axis of the SEM lens barrel 2 are orthogonal to the eucentric tilt axis 8, respectively, and the axis of the FIB lens-barrel 1, an axis of the gas ion beam lens-barrel 3 and the eucentric tilt axis 8 are in one plane.
摘要翻译：提供了一种作为复合带电粒子束系统布置气体离子束装置，FIB和SEM以便有效地制备TEM样品的方法。复合带电粒子束系统包括FIB透镜镜筒1，SEM透镜镜筒2，气体离子束透镜镜筒3以及具有偏心倾斜机构的旋转样品台9和与其垂直的旋转轴10 在复合带电粒子束系统中，使得聚焦离子束4，电子束5和气体离子束6在单点相交，FIB透镜镜筒的轴线 1并且SEM透镜镜筒2的轴线分别与偏心倾斜轴8正交，并且FIB透镜镜筒1的轴线，气体离子束透镜镜筒3的轴线和偏心倾斜轴线8是在一架飞机上

6. 发明授权

US07531796B2 Focused ion beam apparatus and sample section forming and thin-piece sample preparing methods 有权
标题翻译：聚焦离子束装置和样品截面成型及薄片样品制备方法
公开(公告)号：US07531796B2
公开(公告)日：2009-05-12
申请号：US11840575
申请日：2007-08-17
申请人： Junichi Tashiro , Yutaka Ikku , Toshiaki Fujii
发明人： Junichi Tashiro , Yutaka Ikku , Toshiaki Fujii
IPC分类号： H01J37/305 , H01J37/30 , G01N23/22
CPC分类号： G01N23/2255 , G01N1/32 , G01N2223/104 , G01N2223/32 , G01N2223/611 , H01J37/3005 , H01J37/3045 , H01J37/3056 , H01J2237/30466 , H01J2237/30488 , H01J2237/31745 , H01J2237/31749
摘要： Detected is a secondary electron generated by irradiating a focused ion beam while performing etching a sample section and the around through scan-irradiating the focused ion beam. From a changing amount of the detected secondary electron signal an end-point detecting mechanism detects an end point to thereby terminate the etching, so that a center position of a defect or a contact hole is effectively detected even with an FIB apparatus not having a SEM observation function.
摘要翻译：检测到的是通过照射聚焦离子束而同时进行蚀刻样品部分和周围扫描照射聚焦离子束而产生的二次电子。从检测到的二次电子信号的变化量中，终点检测机构检测终点，从而终止蚀刻，即使不具有SEM的FIB装置也能够有效地检测缺陷或接触孔的中心位置观察功能。

7. 发明申请

US20080042059A1 FOCUSED ION BEAM APPARATUS AND SAMPLE SECTION FORMING AND THIN-PIECE SAMPLE PREPARING METHODS 有权
标题翻译：聚焦离子束装置和样品制备和薄层样品制备方法
公开(公告)号：US20080042059A1
公开(公告)日：2008-02-21
申请号：US11840575
申请日：2007-08-17
申请人： Junichi Tashiro , Yutaka Ikku , Toshiaki Fujii
发明人： Junichi Tashiro , Yutaka Ikku , Toshiaki Fujii
IPC分类号： G01N23/00
CPC分类号： G01N23/2255 , G01N1/32 , G01N2223/104 , G01N2223/32 , G01N2223/611 , H01J37/3005 , H01J37/3045 , H01J37/3056 , H01J2237/30466 , H01J2237/30488 , H01J2237/31745 , H01J2237/31749
摘要： Detected is a secondary electron generated by irradiating a focused ion beam while performing etching a sample section and the around through scan-irradiating the focused ion beam. From a changing amount of the detected secondary electron signal an end-point detecting mechanism detects an end point to thereby terminate the etching, so that a center position of a defect or a contact hole is effectively detected even with an FIB apparatus not having a SEM observation function.
摘要翻译：检测到的是通过照射聚焦离子束而同时进行蚀刻样品部分和周围扫描照射聚焦离子束而产生的二次电子。从检测到的二次电子信号的变化量中，终点检测机构检测终点，从而终止蚀刻，即使不具有SEM的FIB装置也能够有效地检测缺陷或接触孔的中心位置观察功能。

8. 发明申请

US20100176296A1 COMPOSITE FOCUSED ION BEAM DEVICE, AND PROCESSING OBSERVATION METHOD AND PROCESSING METHOD USING THE SAME 有权
标题翻译：复合聚焦离子束装置和处理观测方法及其处理方法
公开(公告)号：US20100176296A1
公开(公告)日：2010-07-15
申请号：US12733089
申请日：2008-08-06
申请人： Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
发明人： Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
IPC分类号： H01J37/30 , H01J27/02 , H01J37/08 , H01J37/26
CPC分类号： H01J37/3056 , G01N1/286 , G01N1/32 , G03F1/74 , G03F1/84 , H01J37/08 , H01J37/3005 , H01J2237/0805 , H01J2237/0807 , H01J2237/31745
摘要： A composite focused ion beam device includes a first ion beam irradiation system 10 including a liquid metal ion source for generating a first ion, and a second ion beam irradiation system 20 including a gas field ion source for generating a second ion, and a beam diameter of the second ion beam 20A emitted from the second ion beam irradiation system 20 is less than that of the first ion beam 10A emitted from the first ion beam irradiation system 10.
摘要翻译：复合聚焦离子束装置包括：第一离子束照射系统10，其包括用于产生第一离子的液态金属离子源;以及第二离子束照射系统20，其包括用于产生第二离子的气体场离子源，从第二离子束照射系统20发射的第二离子束20A的距离小于从第一离子束照射系统10发射的第一离子束10A的离子束。

9. 发明申请

US20060188946A1 Nanobio device of imitative anatomy structure 有权
标题翻译：模拟解剖结构的Nanobio装置
公开(公告)号：US20060188946A1
公开(公告)日：2006-08-24
申请号：US11353603
申请日：2006-02-14
申请人： Masanao Munekane , Hiroyuki Wada , Kouji Iwasaki , Toshiaki Fujii , Takahiro Ochiya , Yusuke Yamamoto , Takumi Teratani
发明人： Masanao Munekane , Hiroyuki Wada , Kouji Iwasaki , Toshiaki Fujii , Takahiro Ochiya , Yusuke Yamamoto , Takumi Teratani
IPC分类号： G01N33/567 , G01N33/53
CPC分类号： G01N33/5088 , Y10T436/11
摘要： objects to be achieved by the invention are to provide a nanobio device in which cultured cells are organized at a high-level in a state near in vivo, and to provide a method of using the nanobio device of imitative anatomy structure. The nanobio device of imitative anatomy structure of the invention is obtained by manufacturing a substrate with a bio-compatible substance and arranging a plurality of types of cells thereon in a desired array. A method of manufacturing a nanobio device in the invention includes a step of manufacturing a substrate for a nanobio device by a micromachine processing technique and a step of arranging a plurality of cultured cells on the substrate in a desired array with laser optical tweezers.
摘要翻译：本发明要实现的目的是提供一种纳米生物装置，其中培养细胞在体内接近的状态下组织成高水平，并且提供使用模拟解剖结构的纳米装置的方法。本发明的模拟解剖结构的纳米装置通过用生物相容性物质制造衬底并以期望的阵列布置多种类型的细胞而获得。在本发明中制造纳米装置的方法包括通过微机械加工技术制造纳米装置用基板的步骤，以及使用激光光学镊子以期望的阵列在基板上排列多个培养细胞的步骤。

10. 发明授权

US06838685B1 Ion beam apparatus, ion beam processing method and sample holder member 失效
标题翻译：离子束装置，离子束处理方法和样品架构件
公开(公告)号：US06838685B1
公开(公告)日：2005-01-04
申请号：US10629217
申请日：2003-07-29
申请人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fujii , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
发明人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fujii , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
IPC分类号： G01N1/28 , G01N1/32 , H01J37/26 , H01J37/305 , H01J37/31 , H01J37/317
CPC分类号： H01J37/3056 , G01N1/32 , H01J2237/2007 , H01J2237/20214 , H01J2237/31745 , H01J2237/31749
摘要： An ion beam processing device has a sample holder for fixing a sample on which a section has been formed by irradiation of a specified focused ion beam from a surface side, and gas ion beam irradiation device for irradiating a gas ion beam to a region of the sample fixing using the holder member that contains the section to remove a damage layer on the section. The gas ion beam from the gas ion beam irradiation device irradiates the section from a rear surface side of the sample at a specified incident angle.

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