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11. 发明授权

US08182981B2 Pattern forming method 失效
标题翻译：图案形成方法
公开(公告)号：US08182981B2
公开(公告)日：2012-05-22
申请号：US12497734
申请日：2009-07-06
申请人： Hiroko Nakamura
发明人： Hiroko Nakamura
IPC分类号： G03F7/26
CPC分类号： G03F7/40 , G03F7/0035 , H01L21/0273 , H01L21/31144 , H01L21/76802
摘要： A pattern forming method has forming a first resist film on a processed film, patterning the first resist film into a first resist pattern, forming a first film containing a photo acid generator so as to cover the first resist pattern, forming a second resist film so as to cover the first film, irradiating a predetermined region of the second resist film with exposure light, heating the first film and the second resist film, performing a development process, removing the second resist film of the predetermined region and forming a second resist pattern while the first film is left, and etching the processed film with the first resist pattern and the second resist pattern as a mask.
摘要翻译：图案形成方法在加工膜上形成第一抗蚀剂膜，将第一抗蚀剂膜图案化为第一抗蚀剂图案，形成含有光酸产生剂的第一膜以覆盖第一抗蚀剂图案，从而形成第二抗蚀剂膜为了覆盖第一膜，用曝光灯照射第二抗蚀剂膜的预定区域，加热第一膜和第二抗蚀剂膜，进行显影处理，除去预定区域的第二抗蚀剂膜并形成第二抗蚀剂图案同时留下第一膜，并用第一抗蚀剂图案和第二抗蚀剂图案作为掩模蚀刻处理的膜。

12. 发明申请

US20090233955A1 1H-Pyrrolo[2,3-B]Pyridnes 审中-公开
标题翻译： 1H-吡咯并[2,3-B]吡啶酮
公开(公告)号：US20090233955A1
公开(公告)日：2009-09-17
申请号：US11720951
申请日：2005-12-08
申请人： James S. Frazee , Marlys Hammond , Sharada Manns , Scott Kevin Thompson , David G. Washburn , Kazuya Kano , Hiroko Nakamura
发明人： James S. Frazee , Marlys Hammond , Sharada Manns , Scott Kevin Thompson , David G. Washburn , Kazuya Kano , Hiroko Nakamura
IPC分类号： A61K31/437 , C07D471/04 , A61P9/00
CPC分类号： C07D471/04 , A61K31/44 , C09B11/24
摘要： Derivatives of pyrrolo[2,3-b]pyridine which are useful as SGK-1 kinase inhibitors are described herein. The invention described herein also describes pharmaceutical compositions containing derivatives of pyrrolo[2,3-b]pyridine and methods of using pyrrolo[2,3-b]pyridine derivatives and pharmaceutical compositions thereof in the treatment of diseases mediated by SGK-1.
摘要翻译：本文描述了可用作SGK-1激酶抑制剂的吡咯并[2,3-b]吡啶的衍生物。本文描述的本发明还描述了含有吡咯并[2,3-b]吡啶衍生物的药物组合物和使用吡咯并[2,3-b]吡啶衍生物的药物组合物及其药物组合物，用于治疗由SGK-1介导的疾病。

13. 发明申请

US20070269746A1 Pattern forming method used in semiconductor device manufacturing and method of manufacturing semiconductor device 失效
标题翻译：半导体器件制造中使用的图案形成方法和半导体器件的制造方法
公开(公告)号：US20070269746A1
公开(公告)日：2007-11-22
申请号：US11798724
申请日：2007-05-16
申请人： Hiroko Nakamura
发明人： Hiroko Nakamura
IPC分类号： G03F7/26
CPC分类号： G03F7/0035 , G03F7/40 , H01L21/0273 , H01L21/31058 , H01L21/31144 , H01L21/76816
摘要： A method of forming a pattern on a photosensitive resin film in lithography, a method of forming a pattern for a semiconductor device, and a method of manufacturing a semiconductor device using the patterned film are disclosed. In an aspect of the invention, there is provided a method of forming a pattern on a photosensitive resin film, comprising forming a processing-object film above a semiconductor substrate, forming a first patterned photosensitive resin layer on the processing-object film, implanting ions into the first patterned photosensitive resin layer, the sum (Rp+3dRp) of a projected range (Rp) for the ions in the first photosensitive resin layer and three times a standard deviation (dRp) of the projected range being greater than a thickness of the first patterned photosensitive resin layer, and forming a second patterned photosensitive resin layer on the ion-implanted first patterned photosensitive resin layer.
摘要翻译：公开了一种在光刻中在感光性树脂膜上形成图案的方法，形成半导体器件用图案的方法以及使用该图案化膜的半导体器件的制造方法。在本发明的一个方面，提供了一种在感光性树脂膜上形成图案的方法，包括在半导体衬底上形成处理对象膜，在处理对象膜上形成第一图案化感光树脂层，将离子在第一图案感光性树脂层中，第一感光性树脂层中的离子的投影范围（Rp）的和（Rp + 3dRp）和投影范围的标准偏差（dRp）的三倍大于第一图案化感光树脂层，并且在离子注入的第一图案化感光树脂层上形成第二图案化感光树脂层。

14. 发明授权

US07009440B2 Pulse signal generator and display device 有权
标题翻译：脉冲信号发生器和显示装置
公开(公告)号：US07009440B2
公开(公告)日：2006-03-07
申请号：US10863184
申请日：2004-06-07
申请人： Masashi Nogawa , Tetsuo Tateishi , Hiroko Nakamura
发明人： Masashi Nogawa , Tetsuo Tateishi , Hiroko Nakamura
IPC分类号： G06F1/04
CPC分类号： G09G3/2014 , G09G3/2085 , G09G3/2088 , G09G3/32 , G09G3/3216 , G09G3/3283 , G09G2300/06 , G09G2310/0221 , G09G2310/027 , G09G2310/0275 , H03K7/08
摘要： The objective of this invention is to provide a pulse signal generator with a simple constitution that can reduce the number of signals required for setting the pulse width, as well as a display device using said pulse signal generator. Pulse assignment signal DP0 input to the initial stage of pulse signal generating units PG(i,0)–PG(i,39) connected in cascade is sequentially transferred towards the last stage of the cascade connection. After transfer of the pulse assignment signal to the pulse signal generating unit in each stage, the count value of said pulse signal generating unit is initialized. Then, the pulses of pulse strings PS0–PS39 in the various pulse signal generating units are counted. The count value of the pulse string is compared to the pulse assignment signal in the comparison unit of each pulse signal generating unit, and, in accordance with the comparison result, the level of the drive pulse signal of the LED is inverted. The pulse intervals (pulse timing) of pulse strings PS0–PS39 are controlled individually by control unit 1 so that the drive pulse signal output from the pulse signal generating unit has the desired pulse width.
摘要翻译：本发明的目的是提供具有简单结构的脉冲信号发生器，其可以减少设置脉冲宽度所需的信号数量，以及使用所述脉冲信号发生器的显示装置。输入到级联连接的脉冲信号产生单元PG（i，0）-PG（i，39）的初始阶段的脉冲分配信号DP 0被顺序地传送到级联连接的最后阶段。在每个级中将脉冲分配信号传送到脉冲信号产生单元之后，初始化所述脉冲信号产生单元的计数值。然后，对各种脉冲信号发生单元中的脉冲串PS 0 -PS 39的脉冲进行计数。将脉冲串的计数值与每个脉冲信号生成单元的比较单元中的脉冲分配信号进行比较，并且根据比较结果，LED的驱动脉冲信号的电平反转。脉冲串PS 0 -PS 39的脉冲间隔（脉冲定时）由控制单元1单独控制，使得从脉冲信号发生单元输出的驱动脉冲信号具有期望的脉冲宽度。

15. 发明申请

US20050017778A1 Pulse signal generator and display device 有权
标题翻译：脉冲信号发生器和显示装置
公开(公告)号：US20050017778A1
公开(公告)日：2005-01-27
申请号：US10863184
申请日：2004-06-07
申请人： Masashi Nogawa , Tetsuo Tateishi , Hiroko Nakamura
发明人： Masashi Nogawa , Tetsuo Tateishi , Hiroko Nakamura
IPC分类号： G09G3/36 , G06M7/00 , G09G3/20 , G09G3/32 , H03K7/08
CPC分类号： G09G3/2014 , G09G3/2085 , G09G3/2088 , G09G3/32 , G09G3/3216 , G09G3/3283 , G09G2300/06 , G09G2310/0221 , G09G2310/027 , G09G2310/0275 , H03K7/08
摘要： The objective of this invention is to provide a pulse signal generator with a simple constitution that can reduce the number of signals required for setting the pulse width, as well as a display device using said pulse signal generator. Pulse assignment signal DP0 input to the initial stage of pulse signal generating units PG(i,0)-PG(i,39) connected in cascade is sequentially transferred towards the last stage of the cascade connection. After transfer of the pulse assignment signal to the pulse signal generating unit in each stage, the count value of said pulse signal generating unit is initialized. Then, the pulses of pulse strings PS0-PS39 in the various pulse signal generating units are counted. The count value of the pulse string is compared to the pulse assignment signal in the comparison unit of each pulse signal generating unit, and, in accordance with the comparison result, the level of the drive pulse signal of the LED is inverted. The pulse intervals (pulse timing) of pulse strings PS0-PS39 are controlled individually by control unit 1 so that the drive pulse signal output from the pulse signal generating unit has the desired pulse width.
摘要翻译：本发明的目的是提供具有简单结构的脉冲信号发生器，其可以减少设置脉冲宽度所需的信号数量，以及使用所述脉冲信号发生器的显示装置。输入到级联连接的脉冲信号产生单元PG（i，0）-PG（i，39）的初始阶段的脉冲分配信号DP0被顺序地传送到级联连接的最后阶段。在每个级中将脉冲分配信号传送到脉冲信号产生单元之后，初始化所述脉冲信号产生单元的计数值。然后，对各种脉冲信号发生单元中的脉冲串PS0-PS39的脉冲进行计数。将脉冲串的计数值与每个脉冲信号生成单元的比较单元中的脉冲分配信号进行比较，并且根据比较结果，LED的驱动脉冲信号的电平反转。脉冲串PS0-PS39的脉冲间隔（脉冲定时）由控制单元1单独控制，使得从脉冲信号发生单元输出的驱动脉冲信号具有期望的脉冲宽度。

16. 发明授权

US5549995A Photomask and method of manufacturing the same 失效
标题翻译：光掩模及其制造方法
公开(公告)号：US5549995A
公开(公告)日：1996-08-27
申请号：US402656
申请日：1995-03-13
申请人： Satoshi Tanaka , Soichi Inoue , Hiroko Nakamura
发明人： Satoshi Tanaka , Soichi Inoue , Hiroko Nakamura
IPC分类号： G03F1/30 , G03F1/68 , H01L21/027 , G03F9/00
CPC分类号： G03F1/30
摘要： A transmitting photomask includes an optically transparent substrate having a major surface on which a plurality of recesses are selectively formed and transmitting exposure light, a plurality of opaque materials formed on the portions of the major surface of the transparent substrate, other than the recesses and preventing the exposure light from passing therethrough, and a plurality of transmitting portions constituted of the recesses. Each of the recesses has side walls formed perpendicular to the major surface of the transparent substrate so as to substantially coincide with a corresponding end face of each of the opaque materials, and adjacent transmitting portions have different depths. A method of manufacturing a transmitting photomask, includes a step of forming an opaque film preventing exposure light from passing therethrough on an optically transparent substrate transmitting the exposure light, a step of forming a plurality of opening patterns for forming a transmitting portion on the opaque film and thus forming a plurality of opaque materials with remaining portions of the opaque film, and a step of forming a plurality of transmitting portions including recesses having different depths alternately by etching the transparent substrate through the opening patterns by use of anisotropic etching.
摘要翻译：发送光掩模包括具有主表面的光学透明基板，多个凹部被选择性地形成在其上并透射曝光光，多个不透明材料形成在透明基板的主表面的除了凹部之外的部分上，并防止来自其的曝光光，以及由凹部构成的多个透光部。每个凹部具有垂直于透明基板的主表面形成的侧壁，以便与每个不透明材料的相应端面基本上重合，并且相邻的透光部分具有不同的深度。一种发送光掩模的制造方法，其特征在于，包括以下步骤：在透光曝光用光学透明基板上形成防止曝光的透光的不透明膜，在不透明膜上形成多个用于形成透光部的开口图案的工序并且由此形成多个不透明材料，其余部分是不透明膜，以及通过使用各向异性蚀刻通过开口图案蚀刻透明基板而交替地形成包括具有不同深度的凹槽的多个透光部分的步骤。

17. 发明授权

US4968529A Process for producing a corrosion resistant permanent magnet 失效
标题翻译：用于生产耐腐蚀永磁体的方法
公开(公告)号：US4968529A
公开(公告)日：1990-11-06
申请号：US454451
申请日：1989-12-21
申请人： Atsushi Hamamura , Takaki Hamada , Hiroko Nakamura , Tomoyuki Imai , Toshiki Matsui , Nanao Horiishi
发明人： Atsushi Hamamura , Takaki Hamada , Hiroko Nakamura , Tomoyuki Imai , Toshiki Matsui , Nanao Horiishi
IPC分类号： C22C1/04 , C23C26/00 , H01F7/02 , H01F41/02
CPC分类号： C22C1/0441 , C23C26/00 , H01F41/026 , H01F7/021 , Y10S428/928 , Y10T428/12076 , Y10T428/12097 , Y10T428/12465
摘要： To obtain an anticorrosive Fe-B-R type permanent magnet; in particular, to reduce deterioration rate of the initial magnetic properties below 10% after the magnet has been kept at 80.degree. C. in 90% relative humidity for 500 hours, the surface of the sintered permanent magnet is coated with metallic coating film layers of at least one noble metal layer and at least one base metal layer disposed on the noble metal layer. Diffusion heat treatment further improves the adhesiveness of the coating film layers.
摘要翻译：获得防腐Fe-B-R型永磁体; 特别是在将磁体在90％相对湿度保持在80℃500小时后，将初始磁特性的劣化率降低到10％以下，烧结永磁体的表面涂覆有金属涂膜层至少一个贵金属层和设置在所述贵金属层上的至少一个基底金属层。扩散热处理进一步提高涂膜层的粘合性。

18. 发明授权

US09073284B2 Method of forming pattern and laminate 有权
标题翻译：形成图案和层压板的方法
公开(公告)号：US09073284B2
公开(公告)日：2015-07-07
申请号：US13626415
申请日：2012-09-25
申请人： Atsushi Hieno , Shigeki Hattori , Hiroko Nakamura , Satoshi Mikoshiba , Koji Asakawa , Masahiro Kanno , Yuriko Seino , Tsukasa Azuma
发明人： Atsushi Hieno , Shigeki Hattori , Hiroko Nakamura , Satoshi Mikoshiba , Koji Asakawa , Masahiro Kanno , Yuriko Seino , Tsukasa Azuma
IPC分类号： B32B7/04 , B82Y30/00 , G03F7/004 , G03F7/20 , G03F7/075 , G03F7/11 , G03F7/16 , G03F7/40
CPC分类号： G03F7/40 , B32B7/04 , B32B2307/40 , B82Y30/00 , G03F7/0002 , G03F7/004 , G03F7/0751 , G03F7/0752 , G03F7/11 , G03F7/165 , G03F7/20
摘要： According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating, selectively irradiating the photosensitive composition layer with energy rays, forming a block copolymer layer including a block copolymer on the photosensitive composition layer, and forming a microphase-separated structure in the block copolymer layer.
摘要翻译：根据一个实施方案，提供了形成图案的方法，包括在基材上形成包含热交联性分子的热交联性分子层，在热交联性分子层上形成包含感光性组合物的感光性组合物层，化学结合热交联性分子通过加热，用能量射线选择性地照射感光性组合物层，在感光性组合物层上形成包含嵌段共聚物的嵌段共聚物层，在嵌段共聚物层中形成微相分离结构。

19. 发明授权

US07816060B2 Manufacturing method of semiconductor device, reticle correcting method, and reticle pattern data correcting method 失效
标题翻译：半导体器件的制造方法，掩模版校正方法和掩模版图案数据校正方法
公开(公告)号：US07816060B2
公开(公告)日：2010-10-19
申请号：US11717058
申请日：2007-03-13
申请人： Hiroko Nakamura
发明人： Hiroko Nakamura
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： H01L21/31144 , G03F1/36 , G03F7/0035 , H01L21/76816
摘要： A manufacturing method of a semiconductor device including a pattern forming method, a reticle correcting method, and a reticle pattern data correcting method are disclosed. According to one aspect of the present invention, there is provided a manufacturing method of a semiconductor device, comprising forming a pattern composed of photosensitive resin film including forming periodically arranged first contact hole patterns of a first photosensitive resin film on a processing film formed above a semiconductor substrate, and forming a selective opening pattern of a second photosensitive resin film including various opening pattern types on the first photosensitive resin film, whereby selectively forming second contact hole patterns at positions of the first contact hole patterns selected by the selective opening patterns, wherein the first contact hole patterns have corrected dimensions such that dimensions of the second contact hole patterns become equivalent each other independent of the opening pattern types.
摘要翻译：公开了一种包括图案形成方法，掩模版校正方法和掩模版图形数据校正方法的半导体器件的制造方法。根据本发明的一个方面，提供了一种半导体器件的制造方法，包括形成由感光性树脂膜构成的图案，该图案包括在形成在第一感光性树脂膜上的处理膜上的第一感光性树脂膜的周期性排列的第一接触孔图案在第一感光性树脂膜上形成包含各种开口图案的第二感光性树脂膜的选择性开口图案，由此通过选择性开口图案选择的第一接触孔图案的位置选择性地形成第二接触孔图案，其中，第一接触孔图形具有校正的尺寸，使得第二接触孔图案的尺寸变得相当于独立于开口图案类型。

20. 发明申请

US20100021850A1 PATTERN FORMING METHOD 失效
标题翻译：图案形成方法
公开(公告)号：US20100021850A1
公开(公告)日：2010-01-28
申请号：US12497734
申请日：2009-07-06
申请人： Hiroko NAKAMURA
发明人： Hiroko NAKAMURA
IPC分类号： G03F7/20
CPC分类号： G03F7/40 , G03F7/0035 , H01L21/0273 , H01L21/31144 , H01L21/76802
摘要： A pattern forming method has forming a first resist film on a processed film, patterning the first resist film into a first resist pattern, forming a first film containing a photo acid generator so as to cover the first resist pattern, forming a second resist film so as to cover the first film, irradiating a predetermined region of the second resist film with exposure light, heating the first film and the second resist film, performing a development process, removing the second resist film of the predetermined region and forming a second resist pattern while the first film is left, and etching the processed film with the first resist pattern and the second resist pattern as a mask.
摘要翻译：图案形成方法在加工膜上形成第一抗蚀剂膜，将第一抗蚀剂膜图案化为第一抗蚀剂图案，形成含有光酸产生剂的第一膜以覆盖第一抗蚀剂图案，从而形成第二抗蚀剂膜为了覆盖第一膜，用曝光灯照射第二抗蚀剂膜的预定区域，加热第一膜和第二抗蚀剂膜，进行显影处理，除去预定区域的第二抗蚀剂膜并形成第二抗蚀剂图案同时留下第一膜，并用第一抗蚀剂图案和第二抗蚀剂图案作为掩模蚀刻处理的膜。

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