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    • 11. 发明授权
    • Scatterometry metrology using inelastic scattering
    • 散射测量使用非弹性散射
    • US07688454B1
    • 2010-03-30
    • US12200325
    • 2008-08-28
    • Gary R. Janik
    • Gary R. Janik
    • G01B11/30G01B11/14G01J3/44G01J3/427G01J3/28
    • G01B11/0616G01N21/65G01N2021/653
    • A system for characterizing material properties in miniature semiconductor structures performs a scatterometry analysis on inelastically scattered light. The system can include a narrowband probe beam generator and a detector. A single wavelength probe beam from the narrowband probe beam generator produces scattered light from a measurement pattern on a test sample. The scattered light is measured by the detector, and the measurement data (e.g., Raman spectrum) is used in a scatterometry analysis to determine material properties for the measurement pattern. The detector can measure either incoherent inelastically scattered light (e.g., using a spectrometer) or coherent inelastically scattered light (e.g., using an array detector). If the measurement pattern dimensions are substantially similar to actual device dimensions, the material property distributions determined for the measurement pattern can be applied to the actual devices on the test sample.
    • 用于表征微型半导体结构中的材料性质的系统对非弹性散射光进行散射分析。 该系统可以包括窄带探测光束发生器和检测器。 来自窄带探测光束发生器的单个波长探测光束从测试样品上的测量图形产生散射光。 通过检测器测量散射光,并且在散射分析中使用测量数据(例如,拉曼光谱)来确定测量图案的材料特性。 检测器可以测量非相干非弹性散射光(例如,使用光谱仪)或相干非弹性散射光(例如,使用阵列检测器)。 如果测量图形尺寸基本上类似于实际的装置尺寸,则可以将测量图案确定的材料特性分布应用于测试样品上的实际装置。
    • 12. 发明授权
    • Large collection angle x-ray monochromators for electron probe microanalysis
    • 用于电子探针微量分析的大型收集角x射线单色仪
    • US07427757B1
    • 2008-09-23
    • US11295258
    • 2005-12-05
    • Gary R. JanikJeffrey A. Moore
    • Gary R. JanikJeffrey A. Moore
    • G01N23/00G21K7/00
    • G21K1/06H01J37/244H01J37/252H01J2237/24425H01J2237/2561
    • X-ray monochromators and electron probe micro-analysis (EPMA) systems using such monochromators are disclosed. A turretless x-ray monochromator may have a cassette of reflectors instead of a turret. The cassette stores a plurality of reflectors that can be inserted into a conventional Rowland circle monochromator geometry. A transfer mechanism selectively moves reflectors from the cassette to a reflector positioner. The use of the cassette allows each reflector to be placed closer to a source of x-rays, thereby allowing a larger solid angle for x-ray collection. An alternative x-ray monochromator uses a non-focusing reflector that can be fixed, scanned axially or scanned radially to provide large solid angle detection of x-rays at various energies with a single reflector.
    • 公开了使用这种单色仪的X射线单色仪和电子探针微分析(EPMA)系统。 无转塔X射线单色仪可以具有一个反射镜盒而不是一个转盘。 磁带盒存储可以插入常规罗兰圆单色仪几何形状的多个反射器。 传送机构选择性地将反射器从盒子移动到反射器定位器。 使用盒式磁带允许每个反射器被放置得更靠近X射线源,从而允许用于x射线收集的更大的立体角。 另一种x射线单色仪使用非聚焦反射器,其可以被固定,轴向扫描或径向扫描,以提供具有单个反射器的各种能量的X射线的大的立体角检测。
    • 14. 发明授权
    • Angle resolved x-ray detection
    • 角度分辨X线检测
    • US07075073B1
    • 2006-07-11
    • US10851437
    • 2004-05-21
    • Gary R. JanikJeffrey A. MooreEdward M. James
    • Gary R. JanikJeffrey A. MooreEdward M. James
    • G21K1/02
    • G01N23/20G21K1/06
    • An apparatus for detecting properties of a sample. An electron beam generator produces an electron beam and directs the electron beam at a desired point on the sample. The sample thereby emits characteristic x-rays at takeoff angles. A collimator receives and parallelizes the x-rays and converts the takeoff angles of the x-rays to positional differences between the parallelized x-rays. A diffractor receives and deflects the x-rays. A position sensitive detector receives the deflected x-rays and detects the positional differences between the x-rays, and generates signals that are characteristic of the received x-rays. An analyzer receives the signals from the detector and determines the properties of the sample based at least in part on the positional differences between the x-rays.
    • 一种用于检测样品特性的装置。 电子束发生器产生电子束并将电子束引导到样品上的所需点。 因此,样品从而以起飞角发射特征性X射线。 准直器接收并平行X射线,并将x射线的射出角度转换为平行X射线之间的位置差异。 衍射器接收和偏转x射线。 位置敏感检测器接收偏转的x射线并检测x射线之间的位置差异,并产生作为接收到的x射线的特征的信号。 分析仪接收来自检测器的信号,并且至少部分地基于X射线之间的位置差异来确定样品的性质。
    • 15. 发明授权
    • Method and apparatus for reducing band broadening in chromatographic
detectors
    • 用于降低色谱检测器中带宽变宽的方法和装置
    • US5676830A
    • 1997-10-14
    • US632035
    • 1996-04-12
    • Gary R. JanikDouglas W. Shepard
    • Gary R. JanikDouglas W. Shepard
    • G01N30/74B01D15/08
    • G01N30/74
    • A capillary tube used to transfer a liquid sample into a detection cell following separation by a chromatographic system is modified by plugging or otherwise severely restricting its flow. Near its plugged end, said tube is drilled to provide a plurality of holes or ports perpendicular thereto and penetrating into the central flowing core of said tube so as to direct outflow from the tube perpendicularly therefrom. The outer diameter of this so-modified capillary tube is selected to be of a size comparable to, though smaller than, the detection cell diameter into which it transfers the flowing sample. In this manner, fluid transferred into a detection cell by said modified capillary tube will be split into a plurality of smaller streams flowing outwardly therefrom and striking the adjacent detector cell walls almost immediately. Because of the close proximity of the emerging split streams to the walls of the detection cell, the eddies produced thereby will be very small and the contents of the detection cell will be homogenized rapidly.
    • 用于在通过色谱系统分离后将液体样品转移到检测单元中的毛细管通过堵塞或以其他方式严格限制其流动来改变。 在其堵塞端附近,所述管被钻孔以提供与其垂直的多个孔或孔,并且穿透到所述管的中心流动的芯中,以便从管垂直地引导从管垂直流出。 该经修改的毛细管的外径被选择为与其传送流动样品的检测池直径相当的尺寸。 以这种方式,通过所述改进的毛细管转移到检测单元中的流体将被分成多个从其向外流动的较小流,并几乎立即撞击相邻的检测器单元壁。 由于新出现的分流与检测单元的壁的紧密接近,因此产生的涡流将非常小,并且检测单元的内容物将迅速均匀化。
    • 17. 发明授权
    • Dynamic measurement control
    • 动态测量控制
    • US07606677B1
    • 2009-10-20
    • US10986269
    • 2004-11-10
    • Gary R. JanikEric BoucheJohn Fielden
    • Gary R. JanikEric BoucheJohn Fielden
    • G06F3/01
    • H01L22/20H01L22/12
    • A metrology recipe includes dynamic instructions that allow a metrology tool to perform a secondary metrology operation on a test wafer when previous measurement data indicates a process issue with that test wafer. The metrology recipe can instruct the metrology tool to perform an efficient default metrology operation on all test wafers, and perform a more in-depth secondary metrology operation on only those wafers that warrant additional scrutiny. In this manner, critical metrology data can be captured with a minimum of effect on metrology throughput. The metrology data used to determine whether or not the secondary metrology operation is to be performed can be generated from default metrology operations within the same tool, or can be generated by measurements taken by a completely different tool. Such “external” metrology data can be received via a communications network, either directly or from a server on the network for processing the metrology data.
    • 计量配方包括动态指令,允许计量工具在测试晶片上执行次级测量操作,以前的测量数据表明该测试晶片的过程问题。 计量配方可以指示计量工具在所有测试晶圆上执行有效的默认计量操作,并对仅需要额外检查的晶圆进行更深入的次级测量操作。 以这种方式,可以以最小的测量吞吐量影响来捕获关键测量数据。 用于确定是否要执行二次测量操作的计量数据可以由同一工具内的默认计量操作生成,也可以通过完全不同的工具进行测量来生成。 这样的“外部”计量学数据可以经由通信网络直接地或从网络上的服务器接收以处理度量数据。
    • 18. 发明授权
    • Patterned substrate surface mapping
    • 图案衬底表面映射
    • US07196801B1
    • 2007-03-27
    • US10771020
    • 2004-02-03
    • Gary R. JanikLiang-Guo WangChristopher M. Pohlhammer
    • Gary R. JanikLiang-Guo WangChristopher M. Pohlhammer
    • G01B11/30
    • G01B11/306
    • A method for measuring a characteristic of a substrate, including directing an incident beam at an inspection grid of points on the substrate, receiving the reflected beam with a position sensitive detector, measuring the displacement of the reflected beam from its expected location, compiling a database of the displacement measurements, examining the database for effects of a pattern induced anomaly in the displacement measurements, producing an adjusted database, and deriving the characteristic of the substrate from the adjusted database. Thus, pattern induced errors from the displacement measurements are corrected. In this manner, problems with interpreting the reflection angles of a beam in substrate stress analysis equipment are overcome where distortions in the reflection angles are caused by deposition patterns on the substrates.
    • 一种用于测量衬底的特性的方法,包括将入射光束定向在衬底上的点的检查栅格处,用位置敏感检测器接收反射光束,测量反射光束从其预期位置的位移,编译数据库 的位移测量,检查数据库中位移测量中模式引起的异常的影响,产生调整后的数据库,以及从调整后的数据库导出底物的特征。 因此,校正来自位移测量的图案诱导误差。 以这种方式,克服了在基板应力分析设备中解释光束的反射角度的问题,其中反射角的失真是由基板上的沉积图案引起的。