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1. 发明申请

US20100126555A1 CONCENTRATING PHOTOVOLTAIC PHOTO-CURRENT BALANCING SYSTEM 审中-公开
标题翻译：浓缩光电照相平衡系统
公开(公告)号：US20100126555A1
公开(公告)日：2010-05-27
申请号：US12622331
申请日：2009-11-19
申请人： Patrick M. MAXTON
发明人： Patrick M. MAXTON
IPC分类号： H01L31/042
CPC分类号： H01L31/052 , H01L31/035281 , H01L31/0547 , Y02E10/52
摘要： A solar cell concentrating apparatus includes a parabolic reflector focusing a beam of light on an array of photovoltaic cells to generate electric current. The photocell array includes a number of triangular shaped segments arranged in a polygon. Surrounding the triangular shaped segments is another set of solar cells, each having a trapezoidal shape. The trapezoidal cells each have a larger surface area than that of the adjacent triangular shaped cell. The electric current produced by each trapezoidal cell is approximately the same as that of the smaller triangular shaped cells, which are subject to more intense incident light due to the beam's Gaussian spot profile.
摘要翻译：太阳能电池集中装置包括将光束聚焦在光伏电池阵列上以产生电流的抛物面反射器。光电管阵列包括布置在多边形中的多个三角形段。围绕三角形段是另一组太阳能电池，每个太阳能电池具有梯形形状。梯形电池各自具有比相邻的三角形电池的表面积更大的表面积。每个梯形电池产生的电流与较小的三角形电池的电流大致相同，由于光束的高斯光斑轮廓，它们受到更强烈的入射光的影响。

2. 发明授权

US07202951B1 Laser-based cleaning device for film analysis tool 有权
标题翻译：基于激光的电影分析工具清洗装置
公开(公告)号：US07202951B1
公开(公告)日：2007-04-10
申请号：US10976438
申请日：2004-10-28
申请人： Gary R. Janik , Patrick M. Maxton
发明人： Gary R. Janik , Patrick M. Maxton
IPC分类号： G01J4/00 , G01N21/55 , G01N23/00 , G01N21/86 , G01N23/223 , G01N23/20 , G01B11/30 , G01B11/24 , G01B11/28 , G01B15/02 , G02F1/01 , H01J40/14 , G21K7/00 , G01V8/00 , G01R31/26 , G01R27/26 , G01R31/305 , G01R31/302 , H01L21/66 , G01T1/36 , B08B3/12 , B08B6/00 , B08B7/00 , B08B7/02 , C25F1/00 , C25F3/30 , C25F5/00
CPC分类号： G01N21/211
摘要： A system for analyzing a thin film uses an energy beam, such as a laser beam, to remove a portion of a contaminant layer formed on the thin film surface. This cleaning operation removes only enough of the contaminant layer to allow analysis of the underlying thin film, thereby enhancing analysis throughput while minimizing the chances of recontamination and/or damage to the thin film. An energy beam source can be readily incorporated into a conventional thin film analysis tool, thereby minimizing total analysis system footprint. Throughput can be maximized by focusing the probe beam (or probe structure) for the analysis operation at the same location as the energy beam so that repositioning is not required after the cleaning operation. Alternatively, the probe beam (structure) and the energy beam can be directed at different locations to reduce the chances of contamination of the analysis optics.
摘要翻译：用于分析薄膜的系统使用诸如激光束的能量束来去除形成在薄膜表面上的污染物层的一部分。这种清洁操作仅去除了足够的污染物层，以便分析下面的薄膜，从而增强分析产量，同时最小化再沉淀和/或损坏薄膜的机会。能量束源可以容易地结合到传统的薄膜分析工具中，从而最小化总分析系统占用空间。通过将探测光束（或探针结构）聚焦在与能量束相同的位置处，可以最大化吞吐量，从而在清洁操作之后不需要重新定位。或者，探针光束（结构）和能量束可以被引导到不同的位置，以减少分析光学器件的污染机会。

3. 发明授权

US06804003B1 System for analyzing surface characteristics with self-calibrating capability 有权
标题翻译：用于分析具有自校准能力的表面特性的系统
公开(公告)号：US06804003B1
公开(公告)日：2004-10-12
申请号：US09405716
申请日：1999-09-24
申请人： Haiming Wang , Patrick M. Maxton , Kenneth C. Johnson , Mehrdad Nikoonahad
发明人： Haiming Wang , Patrick M. Maxton , Kenneth C. Johnson , Mehrdad Nikoonahad
IPC分类号： G01J400
CPC分类号： G01J3/447 , G01B11/0641 , G01J4/02 , G01N21/21 , G01N21/211
摘要： Two phase modulators or polarizing elements are employed to modulate the polarization of an interrogating radiation beam before and after the beam has been modified by a sample to be measured. Radiation so modulated and modified by the sample is detected and up to 25 harmonics may be derived from the detected signal. The up to 25 harmonics may be used to derive ellipsometric and system parameters, such as parameters related to the angles of fixed polarizing elements, circular deattenuation, depolarization of the polarizing elements and retardances of phase modulators. A portion of the radiation may be diverted for detecting sample tilt or a change in sample height. A cylindrical objective may be used for focusing the beam onto the sample to illuminate a circular spot on the sample. The above-described self-calibrating ellipsometer may be combined with another optical measurement instrument such as a polarimeter, a spectroreflectometer or another ellipsometer to improve the accuracy of measurement and/or to provide calibration standards for the optical measurement instrument. The self-calibrating ellipsometer as well as the combined system may be used for measuring sample characteristics such as film thickness and depolarization of radiation caused by the sample.
摘要翻译：采用两相调制器或偏振元件来调制光束已被待测样品修改之前和之后的询问辐射束的极化。检测由样本调制和修改的辐射，并且可以从检测到的信号导出多达25个谐波。可以使用多达25个谐波来导出椭偏和系统参数，例如与固定偏振元件的角度相关的参数，圆形去衰减，偏振元件的去极化和相位调制器的延迟。可以转移一部分辐射以检测样品倾斜或样品高度的变化。可以使用圆柱形物镜将光束聚焦到样品上以照亮样品上的圆形斑点。上述自校准椭偏仪可以与另一种光学测量仪器如偏振计，分光光度计或其他椭偏仪组合，以提高测量精度和/或为光学测量仪器提供校准标准。自校准椭偏仪以及组合系统可用于测量样品特性，如样品的膜厚度和辐射的去极化。

4. 发明授权

US07190441B1 Methods and systems for preparing a sample for thin film analysis 有权
标题翻译：制备薄膜分析样品的方法和系统
公开(公告)号：US07190441B1
公开(公告)日：2007-03-13
申请号：US11021555
申请日：2004-12-22
申请人： James T. McWhirter , Liang-Guo Wang , Hidong Kwak , Haixing Zou , Dan Georgesco , Bernard Lautee , Jennming James Chen , Gary R. Janik , Patrick M. Maxton
发明人： James T. McWhirter , Liang-Guo Wang , Hidong Kwak , Haixing Zou , Dan Georgesco , Bernard Lautee , Jennming James Chen , Gary R. Janik , Patrick M. Maxton
IPC分类号： G01N1/00
CPC分类号： G01N1/32 , G01N1/2813 , H01L21/67028
摘要： Methods and systems for preparing a sample for thin film analysis are provided. One system includes an energy beam source configured to generate an energy beam. The system also includes an energy beam delivery subsystem configured to direct the energy beam to a sample and to modify the energy beam such that the energy beam has a substantially flat-top profile on the sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample. One method includes generating an energy beam and modifying the energy beam such that the energy beam has a substantially flat-top profile. The method also includes directing the energy beam to a sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample.
摘要翻译：提供了制备用于薄膜分析的样品的方法和系统。一个系统包括被配置为产生能量束的能量束源。该系统还包括能量束传送子系统，其配置成将能量束引导到样品并修改能量束，使得能量束在样品上具有基本上平顶的轮廓。能量束去除样品上的污染物层的一部分以暴露样品上薄膜的分析区域。一种方法包括产生能量束并修改能量束，使得能量束具有基本平坦的轮廓。该方法还包括将能量束引导到样品。能量束去除样品上的污染物层的一部分以暴露样品上薄膜的分析区域。

5. 发明授权

US06734968B1 System for analyzing surface characteristics with self-calibrating capability 有权
公开(公告)号：US06734968B1
公开(公告)日：2004-05-11
申请号：US09298007
申请日：1999-04-22
申请人： Haiming Wang , Patrick M. Maxton , Kenneth C. Johnson , Mehrdad Nikoonahad
发明人： Haiming Wang , Patrick M. Maxton , Kenneth C. Johnson , Mehrdad Nikoonahad
IPC分类号： G01N2121
CPC分类号： G01J4/02 , G01J3/447 , G01N21/21
摘要： Two phase modulators or polarizing elements are employed to modulate the polarization of an interrogating radiation beam before and after the beam has been modified by a sample to be measured. Radiation so modulated and modified by the sample is detected and up to 25 harmonics may be derived from the detected signal. The up to 25 harmonics may be used to derive ellipsometric and system parameters, such as parameters related to the angles of fixed polarizing elements, circular deattenuation, depolarization of the polarizing elements and retardances of phase modulators. A portion of the radiation may be diverted for detecting sample tilt or a change in sample height. A cylindrical objective may be used for focusing the beam onto the sample to illuminate a circular spot on the sample. The above-described self-calibrating ellipsometer may be combined with another optical measurement instrument such as a polarimeter, a spectroreflectometer or another ellipsometer to improve the accuracy of measurement and/or to provide calibration standards for the optical measurement instrument. The self-calibrating ellipsometer as well as the combined system may be used for measuring sample characteristics such as film thickness and depolarization of radiation caused by the sample.

6. 发明授权

US07253901B2 Laser-based cleaning device for film analysis tool 有权
公开(公告)号：US07253901B2
公开(公告)日：2007-08-07
申请号：US10056271
申请日：2002-01-23
申请人： Gary R. Janik , Patrick M. Maxton
发明人： Gary R. Janik , Patrick M. Maxton
IPC分类号： G01J4/00 , G01N21/55 , G01N23/00 , G01N21/86 , G01N23/223 , G01B11/30 , G01B11/24 , G01B11/28 , G01B15/02 , G02F1/01 , H01J40/14 , G21K7/00 , G01V8/00 , G01R31/26 , G01R27/26 , G01R31/305 , G01R31/302 , H01L21/66 , G01T1/36 , B08B3/12 , B08B6/00 , B08B7/00 , B08B7/02 , C25F1/00 , C25F3/30 , C25F5/00
CPC分类号： G01N21/211
摘要： A system for analyzing a thin film uses an energy beam, such as a laser beam, to remove a portion of a contaminant layer formed on the thin film surface. This cleaning operation removes only enough of the contaminant layer to allow analysis of the underlying thin film, thereby enhancing analysis throughput while minimizing the chances of recontamination and/or damage to the thin film. An energy beam source can be readily incorporated into a conventional thin film analysis tool, thereby minimizing total analysis system footprint. Throughput can be maximized by focusing the probe beam (or probe structure) for the analysis operation at the same location as the energy beam so that repositioning is not required after the cleaning operation. Alternatively, the probe beam (structure) and the energy beam can be directed at different locations to reduce the chances of contamination of the analysis optics.

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