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111. 发明授权

US5729562A Pulse power generating circuit with energy recovery 失效
标题翻译：具有能量回收的脉冲发电电路
公开(公告)号：US5729562A
公开(公告)日：1998-03-17
申请号：US739873
申请日：1996-10-31
申请人： Daniel L. Birx , Palash P. Das , Igor V. Fomenkov , William N. Partlo , Tom A. Watson
发明人： Daniel L. Birx , Palash P. Das , Igor V. Fomenkov , William N. Partlo , Tom A. Watson
IPC分类号： H01S3/00 , H01S3/097 , H01S3/225 , H02M9/04 , H03K3/57 , H03K17/00 , H03K17/80 , H05H1/06
CPC分类号： H05H1/06 , H01S3/097 , H03K17/80 , H03K3/57 , H01S3/225 , H03K2217/0036
摘要： A high voltage pulse power generating circuit capable of providing energy recovery is disclosed. The energy efficient pulse generating circuit source comprises a high voltage charge storing element which is periodically discharged into a compressor circuit. An energy recovery circuit coupled to the compressor circuit reverses the polarity of energy dissipated by the pulse power generating circuit and transfers the waste energy back to the power source. In a preferred embodiment, the pulse power generating circuit of the present invention utilizes an SCR switch for periodically discharging the charge storing element. This embodiment of the present invention provides pulses consistently and will not provide even a single missed pulse.
摘要翻译：公开了一种能够提供能量回收的高压脉冲发生电路。能量效率脉冲发生电路源包括周期性地排放到压缩机电路中的高电压电荷存储元件。耦合到压缩机电路的能量恢复电路反转由脉冲发电电路消耗的能量的极性，并将废能转移回电源。在优选实施例中，本发明的脉冲发生电路利用SCR开关来周期性地对电荷存储元件进行放电。本发明的该实施例一致地提供脉冲，并且甚至不会提供单个错过的脉冲。

112. 发明授权

US08575575B2 System, method and apparatus for laser produced plasma extreme ultraviolet chamber with hot walls and cold collector mirror 有权
标题翻译：激光产生的等离子体极紫外线室，热壁和冷收集镜的系统，方法和装置
公开(公告)号：US08575575B2
公开(公告)日：2013-11-05
申请号：US12725167
申请日：2010-03-16
申请人： William N. Partlo , Igor V. Fomenkov
发明人： William N. Partlo , Igor V. Fomenkov
IPC分类号： H01G2/00 , H05G2/00 , G03F7/20
CPC分类号： H05G2/005 , G03F7/70033 , G21K5/00 , H05G2/003 , H05G2/006
摘要： A system and method for an extreme ultraviolet light chamber comprising a collector mirror, a cooling system coupled to a backside of the collector mirror operative to cool a reflective surface of the collector mirror and a buffer gas source coupled to the extreme ultraviolet light chamber.
摘要翻译：一种用于极紫外光室的系统和方法，包括收集器反射镜，耦合到收集器反射镜的后侧的冷却系统，其用于冷却收集反射镜的反射表面和耦合到极紫外光室的缓冲气体源。

113. 发明授权

US08263953B2 Systems and methods for target material delivery protection in a laser produced plasma EUV light source 有权
标题翻译：用于激光产生等离子体EUV光源的靶材料输送保护的系统和方法
公开(公告)号：US08263953B2
公开(公告)日：2012-09-11
申请号：US13075500
申请日：2011-03-30
申请人： Igor V. Fomenkov , William N. Partlo
发明人： Igor V. Fomenkov , William N. Partlo
IPC分类号： H01J35/00 , G21G5/00 , G01J3/10
CPC分类号： H05G2/008 , H05G2/005 , H05G2/006
摘要： A device is disclosed herein which may comprise a chamber, a source providing a stream of target material droplets delivering target material to an irradiation region in the chamber along a path between a target material release point and the irradiation region, a gas flow in the chamber, at least a portion of the gas flowing in a direction toward the droplet stream, a system producing a laser beam irradiating droplets at the irradiation region to generate a plasma producing EUV radiation, and a shroud positioned along a portion of said stream, said shroud having a first shroud portion shielding droplets from said flow and an opposed open portion.
摘要翻译：本文公开了一种装置，其可以包括室，源提供目标材料液滴流，其沿着目标材料释放点和照射区域之间的路径将靶材料输送到腔室中的照射区域，腔室中的气流，所述气体的至少一部分沿着朝向所述液滴流的方向流动，产生在所述照射区域处照射液滴的激光束以产生等离子体产生EUV辐射的系统，以及沿着所述流的一部分定位的护罩，所述护罩具有屏蔽来自所述流动的液滴的第一护罩部分和相对的开口部分。

114. 发明授权

US08000212B2 Metrology for extreme ultraviolet light source 有权
标题翻译：极紫外光源测量
公开(公告)号：US08000212B2
公开(公告)日：2011-08-16
申请号：US12637961
申请日：2009-12-15
申请人： Vahan Senekerimyan , Nam-Hyong Kim , Robert A. Bergstedt , Igor V. Fomenkov , William N. Partlo
发明人： Vahan Senekerimyan , Nam-Hyong Kim , Robert A. Bergstedt , Igor V. Fomenkov , William N. Partlo
IPC分类号： G11B7/00
CPC分类号： G01J1/429 , H05G2/008
摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location. The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions.
摘要翻译：极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 射束传送系统，被配置为接收从驱动激光系统发射的放大光束并将放大的光束引向目标位置; 和计量系统。光束传送系统包括被配置和布置成将被放大的光束聚焦在目标位置处的会聚透镜。测量系统包括：光收集系统，被配置为收集从会聚透镜反射的放大光束的一部分和从会聚透镜反射的一部分引导激光束。光采集系统包括配置为光学地分离这些部分的二向色光学装置。

115. 发明授权

US07291853B2 Discharge produced plasma EUV light source 失效
标题翻译：放电产生等离子体EUV光源
公开(公告)号：US07291853B2
公开(公告)日：2007-11-06
申请号：US11493945
申请日：2006-07-26
申请人： Igor V. Fomenkov , William N. Partlo , Gerry M. Blumenstock , Nortbert Bowering , I. Roger Oliver , Xiaojiang Pan , Rodney D. Simmons
发明人： Igor V. Fomenkov , William N. Partlo , Gerry M. Blumenstock , Nortbert Bowering , I. Roger Oliver , Xiaojiang Pan , Rodney D. Simmons
IPC分类号： H01J65/04
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70825 , G03F7/70891 , G03F7/70908 , G03F7/70916 , G21K1/06 , G21K2201/064 , G21K2201/067 , H01S3/005 , H01S3/225 , H05G2/005 , H05H1/06
摘要： An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis or rotation and an ellipse in another. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members.
摘要翻译：公开了一种DPP EUV源，其可以包括使用从离开等离子体的碎片产生金属卤化物的金属卤素气体的碎片减缓装置。 EUV源可以具有碎片屏蔽，其可以包括多个曲线屏蔽构件，其具有通过与焦点对准的光通道连接的内表面和外表面，该屏蔽构件可以与它们之间的开放空间交替，并且可以具有形成圆在一个轴或旋转，另一个椭圆。源可以具有可操作地连接到收集器的温度控制机构，并且可操作地调节相应壳体部件的温度，以保持温度相关几何形状优化来自相应外壳部件的入射反射的扫掠角，或机械定位器壳成员。

116. 发明授权

US06972421B2 Extreme ultraviolet light source 失效
标题翻译：极紫外光源
公开(公告)号：US06972421B2
公开(公告)日：2005-12-06
申请号：US10409254
申请日：2003-04-08
申请人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号： G21K5/00 , G01J1/00 , G03F7/20 , G21K5/02 , H01L21/027 , H01S3/00 , H05G2/00 , H05H1/06 , H05H1/24 , H01J35/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译：本发明提供了一种可靠，高重复率的生产线兼容高能光子源。在真空室中产生含有活性物质的非常热的等离子体。活性物质是具有期望的极紫外（EUV）范围内的发射线的原子元素。包括充电电容器和包括脉冲变压器的磁压缩电路的脉冲电源提供电脉冲，其具有足够的能量和电势，足以以超过5瓦的速率在中间焦点处产生EUV光。在由申请人带内设计的优选实施例中，中间焦点处的EUV光能量可以45瓦可扩展到105.8瓦特。

117. 发明授权

US06317447B1 Electric discharge laser with acoustic chirp correction 有权
标题翻译：具有声啁啾校正的放电激光器
公开(公告)号：US06317447B1
公开(公告)日：2001-11-13
申请号：US09490835
申请日：2000-01-25
申请人： William N. Partlo , Igor V. Fomenkov , Jean-Marc Hueber , Zsolt Bor , Eckehard D. Onkels , Michael C. Cates , Richard C. Ujazdowski , Vladimir B. Fleurov , Dmitri V. Gaidarenko
发明人： William N. Partlo , Igor V. Fomenkov , Jean-Marc Hueber , Zsolt Bor , Eckehard D. Onkels , Michael C. Cates , Richard C. Ujazdowski , Vladimir B. Fleurov , Dmitri V. Gaidarenko
IPC分类号： H01S322
CPC分类号： G03F7/70025 , G03F7/70575 , G03F7/708 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0382
摘要： Methods and structural changes in gas discharge lasers for minimizing wavelength chirp at high pulse rates. Applicants have identified the major cause of wavelength chirp in high pulse rate gas discharge lithography lasers as pressure waves from a discharge reflecting back to the discharge region coincident with a subsequent discharge. The timing of the arrival of the pressure wave is determined by the temperature of the laser gas through which the wave is traveling. During burst mode operation, the laser gas temperature in prior art lasers changes by several degrees over periods of a few milliseconds. These changing temperatures change the location of the coincident pressure waves from pulse to pulse within the discharge region causing a variation in the pressure of the laser gas which in turn affects the index of refraction of the discharge region causing the laser beam exiting the rear of the laser to slightly change direction. This change in beam direction causes the grating in the LNP to reflect back to the discharge region light at a slightly different wavelength causing the wavelength chirp. Solution to the problem is to include in the laser chamber structural elements to moderate or disperse the pressure waves and to maintain the laser gas temperature as close as feasible to constant values.
摘要翻译：气体放电激光器的方法和结构变化，以最大限度地减少高脉冲波长啁啾。申请人已经确定了在高脉冲气体放电光刻激光器中的波长啁啾的主要原因，因为从反射回到放电区域的放电的压力波与随后的放电一致。压力波的到达时间由波浪行进的激光气体的温度决定。在突发模式操作期间，现有技术的激光器中的激光气体温度在几毫秒的时间内改变了几度。这些变化的温度改变了放电区域内重合压力波从脉冲到脉冲的位置，导致激光气体的压力变化，这反过来影响放电区域的折射率，导致激光束离开激光稍微改变方向。光束方向的这种变化导致LNP中的光栅以稍微不同的波长反射回到放电区域，导致波长啁啾。解决问题的方法是在激光室结构元件中包括中压或分散压力波，并将激光气体温度保持在尽可能接近的恒定值。

118. 发明授权

US5748656A Laser having improved beam quality and reduced operating cost 失效
标题翻译：激光器具有改善的光束质量和降低的操作成本
公开(公告)号：US5748656A
公开(公告)日：1998-05-05
申请号：US583302
申请日：1996-01-05
申请人： Tom A. Watson , William N. Partlo , Donald G. Larson , Igor V. Fomenkov , Anthony J. de Ruyter , Palash P. Das
发明人： Tom A. Watson , William N. Partlo , Donald G. Larson , Igor V. Fomenkov , Anthony J. de Ruyter , Palash P. Das
IPC分类号： H01S3/03 , H01S3/036 , H01S3/04 , H01S3/041 , H01S3/225 , H01S3/045
CPC分类号： H01S3/036 , H01S3/04 , H01S3/041 , F28D2021/0077 , H01S3/225
摘要： Disclosed is a laser useful in, e.g., photolithography or medical surgery. In one embodiment, the laser comprises a discharge chamber and heat-generating electronics that are enclosed in a baffled enclosure that requires less cooling air to reliably cool the components in the enclosure than previous unbaffled enclosures. A method of reducing the amount of conditioned air is also provided. In a further embodiment, the laser has a heat-exchange system that acts quickly in response to changes in laser gas temperature by adjusting a flow-proportioning valve regulating water flow through a heat exchanger, thereby providing a continuously variable rate of heat exchange through the heat exchanger to maintain the lasing gas temperature constant. Methods of providing a laser beam and of improving the uniformity of a laser beam are disclosed, as are photolithography methods utilizing a laser and method of this invention.
摘要翻译：公开了一种可用于例如光刻或医疗手术中的激光。在一个实施例中，激光器包括放电室和发热电子器件，其封闭在挡板外壳中，其需要较少的冷却空气以可靠地冷却外壳中的部件比先前的未封闭的外壳。还提供了减少调节空气量的方法。在另一个实施例中，激光器具有热交换系统，其响应于激光气体温度的变化而快速作用，通过调节调节通过热交换器的水流的流量比例阀，由此通过所述热交换系统提供连续可变的热交换速率热交换器保持激光温度恒定。公开了提供激光束并提高激光束的均匀性的方法，以及利用激光的光刻方法和本发明的方法。

119. 发明授权

US07109503B1 Systems for protecting internal components of an EUV light source from plasma-generated debris 有权
标题翻译：用于保护EUV光源的内部部件免受等离子体产生的碎片的系统
公开(公告)号：US07109503B1
公开(公告)日：2006-09-19
申请号：US11067099
申请日：2005-02-25
申请人： Norbert R. Bowering , Bjorn A. M. Hansson , Alexander N. Bykanov , Oleh Khodykin , Alexander I. Ershov , William N. Partlo
发明人： Norbert R. Bowering , Bjorn A. M. Hansson , Alexander N. Bykanov , Oleh Khodykin , Alexander I. Ershov , William N. Partlo
IPC分类号： G01J1/00
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.
摘要翻译：公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

120. 发明授权

US09066412B2 Systems and methods for cooling an optic 有权
标题翻译：用于冷却光学元件的系统和方法
公开(公告)号：US09066412B2
公开(公告)日：2015-06-23
申请号：US12900762
申请日：2010-10-08
申请人： Alexander I. Ershov , Robert L. Morse , William N. Partlo , Christopher P. Pate
发明人： Alexander I. Ershov , Robert L. Morse , William N. Partlo , Christopher P. Pate
IPC分类号： G02B7/02 , G02B3/12 , G02B1/06 , H05G2/00 , G02B7/00 , G03F7/20
CPC分类号： H05G2/008 , G02B7/008 , G03F7/70033 , G03F7/70891 , Y10T137/0318 , Y10T137/8593
摘要： Devices are described herein which may comprise an optic having a non-planar surface, the non-planar surface having an optically active portion; and a flow guide directing gas upon the non-planar surface to produce turbulent flow on at least a portion of the optically active portion of the non-planar surface to cool the optic.
摘要翻译：本文描述的装置可以包括具有非平面表面的光学元件，非平面表面具有光学活性部分; 以及引导气体在非平面表面上的流动引导件，以在非平面表面的光学活性部分的至少一部分上产生湍流，以冷却光学元件。

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