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111. 发明授权

US06625191B2 Very narrow band, two chamber, high rep rate gas discharge laser system 有权
公开(公告)号：US06625191B2
公开(公告)日：2003-09-23
申请号：US10012002
申请日：2001-11-30
申请人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scott T. Smith , William G. Hulburd , Jeffrey Oicles
发明人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scott T. Smith , William G. Hulburd , Jeffrey Oicles
IPC分类号： H01S322
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

112. 发明授权

US06621846B1 Electric discharge laser with active wavelength chirp correction 有权
标题翻译：具有有源波长啁啾校正的放电激光器
公开(公告)号：US06621846B1
公开(公告)日：2003-09-16
申请号：US09501160
申请日：2000-02-09
申请人： Richard L. Sandstrom , Palash P. Das , George J. Everage , Frederick G. Erie , William N. Partlo , Igor V. Fomenkov
发明人： Richard L. Sandstrom , Palash P. Das , George J. Everage , Frederick G. Erie , William N. Partlo , Igor V. Fomenkov
IPC分类号： H01S322
CPC分类号： H01S3/104 , G03F7/70025 , G03F7/70333 , G03F7/70575 , G03F7/708 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0382 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/225
摘要： Electric discharge laser with active chirp correction. This application discloses techniques for moderating and dispensing these pressure waves. In some lasers small predictable patterns remain which can be substantially corrected with active wavelength control using relatively slow wavelength control instruments of the prior art. In a preferred embodiment a simple learning algorithm is described to allow advance tuning mirror adjustment in anticipation of the learned chirp pattern. Embodiments include stepper motors having very fine adjustments so that size of tuning steps are substantially reduced for more precise tuning. However, complete elimination of wavelength chirp is normally not feasible with structural changes in the laser chamber and advance tuning; therefore, Applicants have developed equipment and techniques for very fast active chirp correction. Improved techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver. In another preferred embodiment chirp correction is made on a pulse-to-pulse basis where the wavelength of one pulse is measured and the wavelength of the next pulse is corrected based on the measurement. This correction technique is able to function at repetition rates as rapid as 2000 Hz and greater.
摘要翻译：具有主动啁啾校正的放电激光器。本申请公开了用于调节和分配这些压力波的技术。在一些激光器中，可以使用现有技术的相对较慢的波长控制装置的主动波长控制基本上校正了小的可预测的图案。在优选实施例中，描述了一种简单的学习算法，以便在预期学习的啁啾模式中允许预调谐镜调节。实施例包括具有非常精细调节的步进电动机，使得调节步骤的尺寸被显着减小以便更精确的调谐。然而，完全消除波长啁啾通常不可行，在激光室的结构变化和提前调谐; 因此，申请人已经开发了用于非常快的主动啁啾校正的设备和技术。改进的技术包括相对较慢的步进电机和非常快的压电驱动器的组合。在另一个优选实施例中，在脉冲对脉冲基础上进行啁啾校正，其中测量一个脉冲的波长，并且基于测量校正下一个脉冲的波长。该校正技术能够以2000Hz及更高的重复速率工作。

113. 发明授权

US06480275B2 High resolution etalon-grating monochromator 有权
标题翻译：高分辨率标准光栅单色仪
公开(公告)号：US06480275B2
公开(公告)日：2002-11-12
申请号：US09772293
申请日：2001-01-29
申请人： Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith
发明人： Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith
IPC分类号： G01J318
CPC分类号： G01J3/12 , G01J1/4257 , G01J3/22 , G01J3/26 , G01J9/02
摘要： A high resolution etalon-grating monochromator. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the monochromator and scanning the laser wavelength over a range which includes the monochromator slit wavelength.
摘要翻译：高分辨率标准光栅单色仪。优选的实施例在紫外范围内呈现非常狭窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。表示对应于所选择的标准具条纹的波长的调度光的一部分通过第二狭缝并由光检测器监视。当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。激光束的带宽可以通过激光束的引导部分进入单色仪并且在包括单色器狭缝波长的范围内扫描激光波长而被非常精确地测量。

114. 发明授权

US06317447B1 Electric discharge laser with acoustic chirp correction 有权
标题翻译：具有声啁啾校正的放电激光器
公开(公告)号：US06317447B1
公开(公告)日：2001-11-13
申请号：US09490835
申请日：2000-01-25
申请人： William N. Partlo , Igor V. Fomenkov , Jean-Marc Hueber , Zsolt Bor , Eckehard D. Onkels , Michael C. Cates , Richard C. Ujazdowski , Vladimir B. Fleurov , Dmitri V. Gaidarenko
发明人： William N. Partlo , Igor V. Fomenkov , Jean-Marc Hueber , Zsolt Bor , Eckehard D. Onkels , Michael C. Cates , Richard C. Ujazdowski , Vladimir B. Fleurov , Dmitri V. Gaidarenko
IPC分类号： H01S322
CPC分类号： G03F7/70025 , G03F7/70575 , G03F7/708 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0382
摘要： Methods and structural changes in gas discharge lasers for minimizing wavelength chirp at high pulse rates. Applicants have identified the major cause of wavelength chirp in high pulse rate gas discharge lithography lasers as pressure waves from a discharge reflecting back to the discharge region coincident with a subsequent discharge. The timing of the arrival of the pressure wave is determined by the temperature of the laser gas through which the wave is traveling. During burst mode operation, the laser gas temperature in prior art lasers changes by several degrees over periods of a few milliseconds. These changing temperatures change the location of the coincident pressure waves from pulse to pulse within the discharge region causing a variation in the pressure of the laser gas which in turn affects the index of refraction of the discharge region causing the laser beam exiting the rear of the laser to slightly change direction. This change in beam direction causes the grating in the LNP to reflect back to the discharge region light at a slightly different wavelength causing the wavelength chirp. Solution to the problem is to include in the laser chamber structural elements to moderate or disperse the pressure waves and to maintain the laser gas temperature as close as feasible to constant values.
摘要翻译：气体放电激光器的方法和结构变化，以最大限度地减少高脉冲波长啁啾。申请人已经确定了在高脉冲气体放电光刻激光器中的波长啁啾的主要原因，因为从反射回到放电区域的放电的压力波与随后的放电一致。压力波的到达时间由波浪行进的激光气体的温度决定。在突发模式操作期间，现有技术的激光器中的激光气体温度在几毫秒的时间内改变了几度。这些变化的温度改变了放电区域内重合压力波从脉冲到脉冲的位置，导致激光气体的压力变化，这反过来影响放电区域的折射率，导致激光束离开激光稍微改变方向。光束方向的这种变化导致LNP中的光栅以稍微不同的波长反射回到放电区域，导致波长啁啾。解决问题的方法是在激光室结构元件中包括中压或分散压力波，并将激光气体温度保持在尽可能接近的恒定值。

115. 发明授权

US5991324A Reliable. modular, production quality narrow-band KRF excimer laser 失效
标题翻译：可靠。模块化，生产质量好的窄带KRF准分子激光器
公开(公告)号：US5991324A
公开(公告)日：1999-11-23
申请号：US41474
申请日：1998-03-11
申请人： David S. Knowles , James H. Azzola , Herve A. Besaucele , Palash P. Das , Alexander I. Ershov , Igor V. Fomenkov , Tibor Juhasz , Robert G. Ozarski , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Richard C. Ujazdowski , Tom A. Watson , Richard M. Ness
发明人： David S. Knowles , James H. Azzola , Herve A. Besaucele , Palash P. Das , Alexander I. Ershov , Igor V. Fomenkov , Tibor Juhasz , Robert G. Ozarski , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Richard C. Ujazdowski , Tom A. Watson , Richard M. Ness
IPC分类号： H01S3/038 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/139 , H01S3/225 , H01S3/22
CPC分类号： G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/225 , H01S3/1392
摘要： A reliable, modular, production quality narrow-band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwidth of about 0.6 pm or less. The present invention is especially suited to long-term round-the-clock operation in the lithographic production of integrated circuits. Improvements over prior art lasers include a single upstream preionizer tube and acoustic baffles. A preferred embodiment includes reduced fluorine concentration, an anode support bar shaped to reduce aerodynamic reaction forces on blower bearings, a modified pulse power system providing faster pulse rise time, an output coupler with substantially increased reflectivity, a line narrowing module with CaF prism beam expanders, a more accurate wavemeter, a laser computer controller programmed with new and improved pulse energy control algorithm.
摘要翻译：一种可靠，模块化，生产质量好的窄带KrF准分子激光器，能够以1000Hz的频率产生10mJ的激光脉冲，带宽约为0.6μm或更小。本发明特别适用于集成电路的平版印刷生产中的长期全天候操作。现有技术的激光器的改进包括单个上游预分解器管和声学挡板。优选的实施例包括减少的氟浓度，阳极支撑杆形状以减小鼓风机轴承上的空气动力反作用力，改进的脉冲电源系统提供更快的脉冲上升时间，输出耦合器具有显着增加的反射率，具有CaF棱镜扩束器的线窄化模块，更准确的波长计，激光计算机控制器编程，具有新的改进的脉冲能量控制算法。

116. 发明授权

US5748656A Laser having improved beam quality and reduced operating cost 失效
标题翻译：激光器具有改善的光束质量和降低的操作成本
公开(公告)号：US5748656A
公开(公告)日：1998-05-05
申请号：US583302
申请日：1996-01-05
申请人： Tom A. Watson , William N. Partlo , Donald G. Larson , Igor V. Fomenkov , Anthony J. de Ruyter , Palash P. Das
发明人： Tom A. Watson , William N. Partlo , Donald G. Larson , Igor V. Fomenkov , Anthony J. de Ruyter , Palash P. Das
IPC分类号： H01S3/03 , H01S3/036 , H01S3/04 , H01S3/041 , H01S3/225 , H01S3/045
CPC分类号： H01S3/036 , H01S3/04 , H01S3/041 , F28D2021/0077 , H01S3/225
摘要： Disclosed is a laser useful in, e.g., photolithography or medical surgery. In one embodiment, the laser comprises a discharge chamber and heat-generating electronics that are enclosed in a baffled enclosure that requires less cooling air to reliably cool the components in the enclosure than previous unbaffled enclosures. A method of reducing the amount of conditioned air is also provided. In a further embodiment, the laser has a heat-exchange system that acts quickly in response to changes in laser gas temperature by adjusting a flow-proportioning valve regulating water flow through a heat exchanger, thereby providing a continuously variable rate of heat exchange through the heat exchanger to maintain the lasing gas temperature constant. Methods of providing a laser beam and of improving the uniformity of a laser beam are disclosed, as are photolithography methods utilizing a laser and method of this invention.
摘要翻译：公开了一种可用于例如光刻或医疗手术中的激光。在一个实施例中，激光器包括放电室和发热电子器件，其封闭在挡板外壳中，其需要较少的冷却空气以可靠地冷却外壳中的部件比先前的未封闭的外壳。还提供了减少调节空气量的方法。在另一个实施例中，激光器具有热交换系统，其响应于激光气体温度的变化而快速作用，通过调节调节通过热交换器的水流的流量比例阀，由此通过所述热交换系统提供连续可变的热交换速率热交换器保持激光温度恒定。公开了提供激光束并提高激光束的均匀性的方法，以及利用激光的光刻方法和本发明的方法。

117. 发明申请

US20180020532A1 EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS 审中-公开
公开(公告)号：US20180020532A1
公开(公告)日：2018-01-18
申请号：US15208548
申请日：2016-07-12
申请人： William N. Partlo , Richard L. Sandstrom , Daniel J.W. Brown , Igor V. Fomenkov
发明人： William N. Partlo , Richard L. Sandstrom , Daniel J.W. Brown , Igor V. Fomenkov
IPC分类号： H05G2/00
摘要： A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.

118. 发明授权

US08653437B2 EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods 有权
标题翻译：具有子系统的EUV光源，用于在EUV非输出期间维持LPP驱动激光输出
公开(公告)号：US08653437B2
公开(公告)日：2014-02-18
申请号：US13157233
申请日：2011-06-09
申请人： William N. Partlo , Richard L. Sandstrom , Daniel J. W. Brown , Igor V. Fomenkov
发明人： William N. Partlo , Richard L. Sandstrom , Daniel J. W. Brown , Igor V. Fomenkov
IPC分类号： H05G2/00
CPC分类号： G21K5/00 , G03F7/70033 , H01S3/117 , H01S3/2232 , H01S3/2308 , H05G2/008
摘要： A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.
摘要翻译：本文公开的装置可包括产生目标材料的液滴的液滴发生器; 当液滴到达预选位置时提供拦截时间信号的传感器; 与所述传感器耦合的延迟电路，所述延迟电路产生从截取时间信号延迟的触发信号; 响应于触发信号产生激光脉冲的激光源; 以及控制所述延迟电路的系统，以提供从截取时间延迟第一延迟时间的触发信号，以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号，以产生不聚焦在液滴上的光脉冲。

119. 发明申请

US20120313016A1 SYSTEMS AND METHODS FOR BUFFER GAS FLOW STABILIZATION IN A LASER PRODUCED PLASMA LIGHT SOURCE 有权
标题翻译：激光产生的等离子体光源中缓冲气体流动稳定的系统和方法
公开(公告)号：US20120313016A1
公开(公告)日：2012-12-13
申请号：US13156188
申请日：2011-06-08
申请人： Vladimir B. Fleurov , William N. Partlo , Igor V. Fomenkov , Alexander I. Ershov
发明人： Vladimir B. Fleurov , William N. Partlo , Igor V. Fomenkov , Alexander I. Ershov
IPC分类号： G21K5/00
CPC分类号： H05G2/005 , H05G2/008
摘要： An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.
摘要翻译：一种极紫外（EUV）光源，包括光学元件，目标材料和沿着光束路径通过所述光学元件以照射所述目标材料的激光束。 EUV光源还包括沿着所述光束路径产生朝向所述目标材料的气流的系统，所述系统具有包围体积和多条气体管线的锥形构件，每条气体管线将气流输送到所述体积中。

120. 发明授权

US08304752B2 EUV light producing system and method utilizing an alignment laser 有权
标题翻译： EUV光产生系统和利用对准激光的方法
公开(公告)号：US08304752B2
公开(公告)日：2012-11-06
申请号：US12638413
申请日：2009-12-15
申请人： Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
发明人： Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
IPC分类号： G01J1/04 , G01J1/18
CPC分类号： H01S3/2232 , G03F7/70033 , H01S3/0014 , H01S3/0407 , H01S3/041 , H01S3/086 , H01S3/2308 , H05G2/008
摘要： A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.
摘要翻译：用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。

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