专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06516816B1 Spin-rinse-dryer 失效
公开(公告)号：US06516816B1
公开(公告)日：2003-02-11
申请号：US09544660
申请日：2000-04-06
申请人： Anwar Husain , Brian J. Brown , David G. Andeen , Svetlana Sherman , John M. White , Michael Sugarman , Makoto Inagawa , Manoocher Birang
发明人： Anwar Husain , Brian J. Brown , David G. Andeen , Svetlana Sherman , John M. White , Michael Sugarman , Makoto Inagawa , Manoocher Birang
IPC分类号： B08B302
CPC分类号： H01L21/67028 , Y10S134/902
摘要： An inventive vertical spin-dryer is provided. The inventive spin-dryer may have a shield system positioned to receive fluid displaced from a substrate vertically positioned within the spin-dryer. The shield system may have one or more shields positioned to at least partially reflect fluid therefrom as the fluid impacts the shield. The one or more shields are angled to encourage the flow of fluid therealong, and are preferably hydrophilic to prevent droplets from forming. Preferably the shield system has three shields positioned in a horizontally and vertically staggered manner so that fluid is transferred from a substrate facing surface of a first shield to the top or non-substrate-facing surface of an adjacent shield, etc. A pressure gradient may be applied across the interior of the spin-dryer to create an air flow which encourages fluid to travel along the shield system in a desired direction. A sensor adapted to facilitate desired flywheel position, an openable gripper having a remote actuator, a radiused gripper and a source of inert drying gas are also provided in individual embodiments.

2. 发明授权

US07226514B2 Spin-rinse-dryer 失效
标题翻译：旋转干燥机
公开(公告)号：US07226514B2
公开(公告)日：2007-06-05
申请号：US10309832
申请日：2002-12-04
申请人： Anwar Husain , Brian J. Brown , David G. Andeen , Svetlana Sherman , John M. White , Michael Sugarman , Makoto Inagawa , Manoocher Birang
发明人： Anwar Husain , Brian J. Brown , David G. Andeen , Svetlana Sherman , John M. White , Michael Sugarman , Makoto Inagawa , Manoocher Birang
IPC分类号： B08B3/02
CPC分类号： H01L21/67028 , Y10S134/902
摘要： An inventive vertical spin-dryer is provided. The inventive spin-dryer may have a shield system positioned to receive fluid displaced from a substrate vertically positioned within the spin-dryer. The shield system may have one or more shields positioned to at least partially reflect fluid therefrom as the fluid impacts the shield. The one or more shields are angled to encourage the flow of fluid therealong, and are preferably hydrophilic to prevent droplets from forming. Preferably the shield system has three shields positioned in a horizontally and vertically staggered manner so that fluid is transferred from a substrate facing surface of a first shield to the top or non-substrate-facing surface of an adjacent shield, etc. A pressure gradient may be applied across the interior of the spin-dryer to create an air flow which encourages fluid to travel along the shield system in a desired direction. A sensor adapted to facilitate desired flywheel position, an openable gripper having a remote actuator, a radiused gripper and a source of inert drying gas are also provided in individual embodiments.
摘要翻译：提供了一种创造性的垂直旋转干燥器。本发明的旋转干燥器可以具有屏蔽系统，其被定位成接收从垂直定位在旋转干燥器内的衬底移位的流体。屏蔽系统可以具有一个或多个屏蔽件，其定位成当流体冲击屏蔽时至少部分地反射流体。一个或多个屏蔽件成角度以促使其流体流动，并且优选是亲水的以防止液滴形成。优选地，屏蔽系统具有以水平和垂直交错方式定位的三个屏蔽件，使得流体从第一屏蔽件的面向基板的表面转移到相邻屏蔽件的顶部或非基板面向表面等。压力梯度可以施加在旋转干燥器的内部以产生鼓风流体沿着屏蔽系统沿所需方向行进的空气流。在各个实施例中还提供了适于促进期望的飞轮位置的传感器，具有远程致动器的可打开夹具，圆角夹持器和惰性干燥气体源。

3. 发明授权

US06474712B1 Gripper for supporting substrate in a vertical orientation 失效
标题翻译：夹持器用于垂直方向支撑基板
公开(公告)号：US06474712B1
公开(公告)日：2002-11-05
申请号：US09559889
申请日：2000-04-26
申请人： Boris I. Govzman , Manoocher Birang , Michael Sugarman , Anwar Husain
发明人： Boris I. Govzman , Manoocher Birang , Michael Sugarman , Anwar Husain
IPC分类号： B66C100
CPC分类号： H01L21/68707 , Y10S414/141
摘要： A gripper assembly is provided which supports a substrate in a vertical orientation. The gripper assembly's end effectors contact only the edge of the substrate. In a first aspect the end effectors each comprise a first pair of opposed surfaces and an second pair of opposed surfaces, all of which simultaneously contact the substrate, holding the substrate in a clamp-type manner. In a second aspect the end effectors each comprise a lower pair of opposed surfaces which simultaneously contact the substrate, and an upper pair of opposed surfaces, larger than the thickness of the substrate, which limit the substrate from horizontal tilting. In the second aspect the end effectors can close at a first elevation where they do not contact the substrate, and can then elevate to gently contact and support the substrate in a pocket-like manner. In a third aspect one of the end effectors has two pairs of opposed surfaces which simultaneously contact the substrate, and the other end effector has two pairs of opposed surfaces which limit the substrate from horizontal tilting. In any aspect no moving parts are required to limit the substrate's vertical and horizontal movement. In a further aspect, fingers to which the end effectors are coupled, are bent so that the gripper is not positioned above the substrate.
摘要翻译：提供了一种夹持器组件，其以垂直取向支撑衬底。夹持器组件的端部执行器仅接触基板的边缘。在第一方面，端部执行器各自包括第一对相对表面和第二对相对表面，所述第二对相对表面同时接触基板，以夹紧方式保持基板。在第二方面，端部执行器各自包括同时接触基板的下一对相对表面，以及大于基板厚度的上对对相对表面，其将基板限制为水平倾斜。在第二方面，末端效应器可以在它们不接触衬底的第一高度处关闭，然后可以以袋状方式轻轻地接触和支撑衬底。在第三方面中，一个端部执行器具有两对同时接触基板的相对表面，而另一端部执行器具有两对相对的表面，这些对面限制了基板的水平倾斜。在任何方面，无需移动部件来限制基板的垂直和水平运动。在另一方面，端部执行器耦合到的手指被弯曲，使得夹持器不位于衬底上方。

4. 发明授权

US06918864B1 Roller that avoids substrate slippage 失效
标题翻译：避免衬底滑动的滚子
公开(公告)号：US06918864B1
公开(公告)日：2005-07-19
申请号：US09580880
申请日：2000-05-30
申请人： Brian J. Brown , Michael Sugarman , Makoto Inagawa , Daniel D. Ramar , Alexander Lerner
发明人： Brian J. Brown , Michael Sugarman , Makoto Inagawa , Daniel D. Ramar , Alexander Lerner
IPC分类号： H01L21/00 , A01B29/00
CPC分类号： H01L21/67057
摘要： A roller assembly is provided. The roller assembly comprises a groove that the includes two opposing surfaces. The roller assembly comprises either frictional surfaces positioned along the groove, or O-ring(s) coupled to the groove. The frictional surfaces may be a plurality of holes at spaced intervals along the opposing surfaces of the groove, a plurality of holes, each hole sized so as to extend into the two opposing surfaces, at spaced intervals along the opposing surfaces of the groove, or may be a bead-blasted surface or a knurled surface positioned along the opposing surfaces of the groove.
摘要翻译：提供辊组件。辊组件包括一个包括两个相对表面的槽。辊组件包括沿着凹槽定位的摩擦表面或耦合到凹槽的O形环。所述摩擦表面可以是沿所述槽的相对表面间隔开的多个孔，多个孔，每个孔的尺寸设计成沿所述槽的相对表面以间隔开的间隔延伸到所述两个相对的表面中，或者可以是沿着凹槽的相对表面定位的喷砂表面或滚花表面。

5. 发明授权

US06921494B2 Backside etching in a scrubber 失效
标题翻译：洗涤器中的背面蚀刻
公开(公告)号：US06921494B2
公开(公告)日：2005-07-26
申请号：US10456723
申请日：2003-06-06
申请人： Brian J. Brown , Madhavi Chandrachood , Radha Nayak , Fred C. Redeker , Michael Sugarman , John M. White
发明人： Brian J. Brown , Madhavi Chandrachood , Radha Nayak , Fred C. Redeker , Michael Sugarman , John M. White
IPC分类号： B08B1/04 , B08B3/02 , B08B3/08 , B08B7/04 , H01L21/00 , H01L21/304 , H01L21/306 , B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： H01L21/6708 , H01L21/67075 , Y10S134/902
摘要： A scrubber device is provided. The scrubber device may etch a backside of a wafer and may clean a frontside of the wafer simultaneously. The scrubber device may comprise a programmed controller adapted to supply a non-etching fluid to a frontside of the wafer whenever an etching fluid is supplied to the backside of the wafer.
摘要翻译：提供洗涤器装置。洗涤器装置可以蚀刻晶片的背面并且可以同时清洁晶片的前侧。洗涤器装置可以包括编程控制器，其适用于每当将蚀刻流体供应到晶片的背面时，将非蚀刻流体提供给晶片的前侧。

6. 发明申请

US20060189465A1 Roller that avoids substrate slippage 审中-公开
标题翻译：避免衬底滑动的滚子
公开(公告)号：US20060189465A1
公开(公告)日：2006-08-24
申请号：US11413257
申请日：2006-04-28
申请人： Brian Brown , Michael Sugarman , Makoto Inagawa , Daniel Ramar , Alexander Lerner
发明人： Brian Brown , Michael Sugarman , Makoto Inagawa , Daniel Ramar , Alexander Lerner
IPC分类号： F16C13/00 , B25F5/02
CPC分类号： H01L21/67057
摘要： A roller assembly is provided. The roller assembly comprises a groove that includes two opposing surfaces. The roller assembly comprises either frictional surfaces positioned along the groove, or O-ring(s) coupled to the groove. The frictional surfaces may be a plurality of holes at spaced intervals along the opposing surfaces of the groove, a plurality of holes, each hole sized so as to extend into the two opposing surfaces, at spaced intervals along the opposing surfaces of the groove, or may be a bead-blasted surface or a knurled surface positioned along the opposing surfaces of the groove.
摘要翻译：提供辊组件。辊组件包括包括两个相对表面的凹槽。辊组件包括沿着凹槽定位的摩擦表面或联接到凹槽的O形环。所述摩擦表面可以是沿所述槽的相对表面间隔开的多个孔，多个孔，每个孔的尺寸设计成沿所述槽的相对表面以间隔开的间隔延伸到所述两个相对的表面中，或者可以是沿着凹槽的相对表面定位的喷砂表面或滚花表面。

7. 发明授权

US06797074B2 Wafer edge cleaning method and apparatus 失效
标题翻译：晶圆边缘清洗方法及装置
公开(公告)号：US06797074B2
公开(公告)日：2004-09-28
申请号：US10278115
申请日：2002-10-22
申请人： Fred C. Redeker , Brian J. Brown , Michael Sugarman
发明人： Fred C. Redeker , Brian J. Brown , Michael Sugarman
IPC分类号： B08B704
CPC分类号： H01L21/02052 , B08B3/02 , B08B3/12 , H01L21/67051 , H01L21/67086 , Y10S134/902
摘要： A method and apparatus is provided for removing material from the edge of a disk. In one embodiment, the edge of the disk is contacted with etchant via an etchant containing swab or trough (which may contain one or more transducers) and is rotated such that successive portions of the disk edge are scanned through the trough or past the swab. To prevent etchant from contacting the major surface of the substrate, and/or to prevent excessive etching, the edge of the disk is contacted with a rinsing fluid (e.g., a rinsing fluid nozzle or a trough filled with rinsing fluid). In a further embodiment material such as residue or particles may be removed via a trough containing sonically energized rinsing fluid.
摘要翻译：提供了一种从盘的边缘去除材料的方法和装置。在一个实施例中，盘的边缘通过含有拭子或槽（其可以包含一个或多个换能器）的蚀刻剂与蚀刻剂接触，并且被旋转使得盘边缘的连续部分通过槽扫过或通过拭子。为了防止蚀刻剂接触基板的主表面和/或防止过度蚀刻，盘的边缘与冲洗流体（例如，冲洗流体喷嘴或填充有冲洗流体的槽）接触。在另一个实施方案中，可以通过含有声波激发的冲洗流体的槽来去除诸如残余物或颗粒的材料。

8. 发明授权

US06523553B1 Wafer edge cleaning method and apparatus 有权
公开(公告)号：US06523553B1
公开(公告)日：2003-02-25
申请号：US09281618
申请日：1999-03-30
申请人： Fred C. Redeker , Brian J. Brown , Michael Sugarman
发明人： Fred C. Redeker , Brian J. Brown , Michael Sugarman
IPC分类号： B08B304
CPC分类号： H01L21/02052 , B08B3/02 , B08B3/12 , H01L21/67051 , H01L21/67086 , Y10S134/902
摘要： A method and apparatus is provided for removing material from the edge of a disk. In one embodiment, the edge of the disk is contacted with etchant via an etchant containing swab or trough (which may contain one or more transducers) and is rotated such that successive portions of the disk edge are scanned through the trough or past the swab. To prevent etchant from contacting the major surface of the substrate, and/or to prevent excessive etching, the edge of the disk is contacted with a rinsing fluid (e.g., a rinsing fluid nozzle or a trough filled with rinsing fluid). In a further embodiment material such as residue or particles may be removed via a trough containing sonically energized rinsing fluid.

9. 发明授权

US06820298B2 Wafer scrubbing device having brush assembly and mounting assembly forming spherical joint 有权
标题翻译：具有刷组件和安装组件形成球形接头的晶片擦洗装置
公开(公告)号：US06820298B2
公开(公告)日：2004-11-23
申请号：US09838959
申请日：2001-04-19
申请人： John M White , Ying Yu , Michael Sugarman
发明人： John M White , Ying Yu , Michael Sugarman
IPC分类号： B08B104
CPC分类号： H01L21/67046 , B08B1/04 , Y10T403/591 , Y10T403/599
摘要： A brush mounting system for a wafer scrubbing device includes a brush mandrel and a mounting assembly on which the brush mandrel is mounted. The mounting assembly includes a mounting member adapted to be mounted to a wall of the wafer scrubbing device, and a bearing secured to the mounting member. A brush support is rotatably mounted on the bearing and has an outer end that includes a contact surface adapted to contact the brush mandrel. The contact surface has a spherical profile. The brush mandrel includes a corresponding contact surface having a spherical profile, so that the brush mandrel and the mounting assembly form a spherical joint at the point of contact.
摘要翻译：用于晶片洗涤装置的刷子安装系统包括刷心轴和安装组件，其上安装有刷心轴。安装组件包括适于安装到晶片洗涤装置的壁上的安装构件和固定到安装构件的轴承。刷支撑件可旋转地安装在轴承上，并具有外端，该外端包括适于接触刷心的接触表面。接触表面具有球形轮廓。刷心轴包括具有球形轮廓的对应的接触表面，使得刷心轴和安装组件在接触点处形成球形接头。

10. 发明授权

US06728989B2 Labyrinth seal for bearing in brush mounting assembly for semiconductor wafer scrubber 有权
标题翻译：用于半导体晶片洗涤器的刷子安装组件中的轴承用迷宫式密封件
公开(公告)号：US06728989B2
公开(公告)日：2004-05-04
申请号：US09771086
申请日：2001-01-27
申请人： Alexander Lerner , John M. White , Shou-Sang Chang , Michael Sugarman
发明人： Alexander Lerner , John M. White , Shou-Sang Chang , Michael Sugarman
IPC分类号： A46B1304
CPC分类号： H01L21/67046 , B08B1/04 , B08B3/04
摘要： A wafer scrubbing unit includes a mounting assembly for a scrubber brush. The mounting assembly has a rotary flow through tube through which cleaning liquid is delivered to the brush. A stationary tube may be mounted in the bore of the rotary tube. Spinning shields mounted on the rotary tube form labyrinth seals to protect a bearing housing from the cleaning liquid. Bearings for rotatably mounting the rotary tube are mounted within the housing.
摘要翻译：晶片洗涤单元包括用于洗涤刷的安装组件。安装组件具有旋转流通管，清洁液通过管被输送到刷子。固定管可以安装在旋转管的孔中。安装在旋转管上的旋转屏蔽形成迷宫式密封，以保护轴承壳体免受清洁液体的影响。用于可旋转地安装旋转管的轴承安装在壳体内。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式