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    • 6. 发明公开
    • 건식 표면 클리닝 장치
    • 清洁干燥表面的装置
    • KR1020020001701A
    • 2002-01-09
    • KR1020010077320
    • 2001-12-07
    • 주식회사 아이엠티
    • 이종명조성호
    • H01L21/304
    • H01L21/02046B08B7/0035B08B7/0042B23K26/064B23K26/0648B23K26/0665B23K26/12B23K26/1224B23K26/123B23K2201/40H01J37/32082H01J37/32339H01L21/67028
    • PURPOSE: An apparatus for cleaning a dry surface is provided to remove various pollutants from a surface of working material by generating a plasma shock wave. CONSTITUTION: A laser beam generation portion(1) is used for generating a plasma shock wave. A chamber(11) is used for performing a dry surface cleaning process. A reflection mirror(3) is used for inducing the laser beam irradiated from the laser beam generation portion(1) to the chamber(11). The reflection mirror(3) is moved to a left and a right direction in order to generate the shock wave. A transparent window(12) is installed at one end of the chamber(11) in order to pass the laser beam. A focus lens(4) is used for focusing the laser beam to an inside of the chamber(11). A vacuum pump(25) is used for forming the inside of the chamber(11) to a vacuum state.
    • 目的:提供一种用于清洁干燥表面的设备,通过产生等离子体冲击波来从工作材料表面除去各种污染物。 构成:激光束产生部分(1)用于产生等离子体冲击波。 使用室(11)进行干燥表面清洁处理。 反射镜(3)用于将从激光束产生部分(1)照射到激光束的激光束引导到腔室(11)。 反射镜(3)向左右方向移动,以产生冲击波。 透明窗(12)安装在腔室(11)的一端,以通过激光束。 聚焦透镜(4)用于将激光束聚焦到室(11)的内部。 真空泵(25)用于将室(11)的内部形成为真空状态。