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    • 4. 发明公开
    • 제초제 조성물
    • 除草剂组合物
    • KR1020050031920A
    • 2005-04-06
    • KR1020040076390
    • 2004-09-23
    • 스미또모 가가꾸 가부시끼가이샤
    • 다나카야스시가지와라유카리니시야마다카유키
    • A01N43/54A01N43/50
    • A01N43/54A01N25/02A01N25/08A01N37/22A01N43/66A01N47/10A01N47/28A01N47/36A01N2300/00
    • A herbicide composition is provided, which composition sufficiently controls weeds including sufonylurea-based herbicide resistant weeds at one time, has low number of effective ingredients, and has improved stability against paddy rice. The herbicide composition comprises a compound of formula (1) or salts thereof, and one herbicide selected from (a) carbamate-based herbicides; (b) chloroacetoanilide-based herbicides; (c) triazine-based herbicides; (d) acidamide- or urea-based herbicides; and (e) other herbicides, wherein Q is Q1, Q2, Q3 or Q4; R1 is hydrogen, lower alkyl optionally substituted with halogen atom, cyano, nitro or halogen, or lower alkoxy, lower alkylthio, lower alkylsulfinyl, lower alkylsulfonyl, amino, lower alkylamino or di-lower alkylamino which is optionally substituted with halogen; R2 is lower alkyl optionally substituted with hydrogen, halogen atom or halogen; R3 is lower alkyl optionally substituted with halogen atom, cyano, nitro or halogen, or lower cycloalkl optionally substituted with halogen or lower alkyl, lower alkenyl optionally substituted with halogen, lower alkynyl optionally substituted with halogen, lower alkoxy, lower alkylthio, lower alkylsulfinyl, lower alkylsulfonyl, amino, lower alkylamino or di-lower alkylamino which is optionally substituted with halogenl; and X and Y are the same or different, and are independently lower alkyl optionally substituted with halogen, lower alkoxy optionally substituted with halogen, or halogen atom.
    • 提供了一种除草剂组合物,其组合物一次充分地控制包括基于磺酰脲类除草剂的杂草的杂草,具有低有效成分的数量,并且具有改善的对水稻的稳定性。 除草剂组合物包含式(1)化合物或其盐,和一种除草剂,其选自(a)氨基甲酸酯类除草剂; (b)氯乙酰苯胺类除草剂; (c)三嗪类除草剂; (d)酰胺或脲类除草剂; 和(e)其它除草剂,其中Q是Q1,Q2,Q3或Q4; R 1为氢,任选被卤素原子取代的低级烷基,氰基,硝基或卤素,或低级烷氧基,低级烷硫基,低级烷基亚磺酰基,低级烷基磺酰基,氨基,任选被卤素取代的低级烷基氨基或二低级烷基氨基; R2是任选被氢,卤素原子或卤素取代的低级烷基; R3是任选被卤素原子,氰基,硝基或卤素取代的低级烷基,或任选被卤素或低级烷基取代的低级环烷基,任选被卤素取代的低级链烯基,任选被卤素取代的低级炔基,低级烷氧基,低级烷硫基,低级烷基亚磺酰基, 低级烷基磺酰基,氨基,任选被卤素取代的低级烷基氨基或二 - 低级烷基氨基; 且X和Y相同或不同,并且独立地为任选被卤素取代的低级烷基,任选被卤素取代的低级烷氧基或卤素原子。