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1. 发明公开

KR20070119794A METHOD FOR MANUFACTURING DISPLAY SUBSTRATE 审中-公开
标题翻译：制造显示基板的方法
公开(公告)号：KR20070119794A
公开(公告)日：2007-12-21
申请号：KR20060054168
申请日：2006-06-16
申请人： SAMSUNG ELECTRONICS CO LTD
发明人： JUNG YANG HO , KANG HOON , KIM JAE SUNG , LEE HI KUK , WHANGBO SANG WOO
IPC分类号： G02F1/136 , H01L29/786
CPC分类号： G02F1/136227 , H01L21/02076 , H01L27/1248
摘要： A method for fabricating a display substrate is provided to form an organic dielectric layer without forming a passivation layer by forming the organic dielectric layer after performing first washing, second washing and NH3 plasma processing. A TFT is formed on a substrate. NH3 plasma processing is performed on a substrate including the TFT. An organic dielectric layer is formed on the NH3 plasma processed substrate. A pixel electrode electrically contacting the TFT is formed on the organic dielectric layer. The forming of the TFT includes forming a gate electrode(110) on the substrate, forming a gate dielectric layer(120) on the substrate to cover the gate electrode, forming an active layer overlapping the gate electrode on the gate dielectric layer, and forming a source electrode(142) partially contacting the active layer and a drain electrode(144) separated from the source electrode at a predetermined interval and partially contacting the active layer.
摘要翻译：提供了制造显示基板的方法，以便在进行第一次洗涤，第二次洗涤和NH 3等离子体处理之后通过形成有机电介质层而形成有机介电层而不形成钝化层。在基板上形成TFT。在包括TFT的衬底上进行NH 3等离子体处理。在NH 3等离子体处理衬底上形成有机电介质层。在有机电介质层上形成与TFT电接触的像素电极。 TFT的形成包括在基板上形成栅电极（110），在基板上形成覆盖栅电极的栅介电层（120），与栅电介质层上的栅电极重叠的有源层，以及形成部分地接触有源层的源电极（142）和以预定间隔与源电极分离的部分接触有源层的漏电极（144）。

2. 发明公开

KR20070078264A METHOD AND APPARATUS FOR RESIST PATTERN FORIMING ON A SUBSTRATE 审中-公开
标题翻译：用于衬底上的电阻图案的方法和装置
公开(公告)号：KR20070078264A
公开(公告)日：2007-07-31
申请号：KR20060008354
申请日：2006-01-26
申请人： SAMSUNG ELECTRONICS CO LTD
发明人： LEE HI KUK , KIM SHI YUL , KIM KYU YOUNG
IPC分类号： H01L21/027
CPC分类号： G03F7/0002 , H01L21/67098 , H01L21/67225
摘要： A method and an apparatus for processing a surface of a substrate is provided to enhance efficiency of imprinting process by simultaneously performing light irradiation and heat treatment in the imprinting process. A substrate(110) is fixed to an upper surface of a support, and then a resist is applied onto the substrate. A mold(200) having a mold pattern(210) with plural protrusions is positioned adjacent to a surface of the substrate. The mold is pressed against the resist to imprint the mold pattern, while removing gas generated from the resist. Finally, the resist is detached from the mold. The step of imprinting the mold pattern includes irradiating light onto surfaces of the mold and resist, and applying heat to the resist.
摘要翻译：提供了用于处理基板表面的方法和装置，以通过在压印过程中同时执行光照射和热处理来提高压印过程的效率。将基板（110）固定到支撑体的上表面，然后将抗蚀剂施加到基板上。具有多个突起的模具图案（210）的模具（200）定位成与基板的表面相邻。模具被压靠在抗蚀剂上以压印模具图案，同时去除由抗蚀剂产生的气体。最后，抗蚀剂与模具分离。压印模具的步骤包括将光照射到模具的表面上并抗蚀，并向抗蚀剂施加热量。

3. 发明公开

KR20120055782A Exposure head of maskless exposure apparatus 审中-公开
标题翻译：接触头接触头
公开(公告)号：KR20120055782A
公开(公告)日：2012-06-01
申请号：KR20100117046
申请日：2010-11-23
申请人： SAMSUNG ELECTRONICS CO LTD
发明人： KIM TAE HYUN , LEE HI KUK , JANG SANG DON
IPC分类号： G03F7/20
CPC分类号： G03F7/70291 , G03B27/52 , G03F1/26 , G03F7/70191 , G03F7/70275 , G03F7/70383 , G03F7/70716
摘要： PURPOSE: The exposure head of a maskless exposing apparatus is provided to cost effectively manufacture an exposure optical system and to reduce the size of the exposure optical system. CONSTITUTION: The exposure head(200) of a maskless exposing apparatus includes a plurality of light illumination optical system(210A, 210B), a plurality of spatial light modulators(230A, 230B), a plurality of projection optical systems(232A, 232B), and an exposure optical system(240). The spatial light modulators selectively reflect light from the light illumination optical systems according to the shape of patterns on a substrate. The projection optical systems obtain projected images based on the reflected light. The exposure optical system transfers light through the projection optical systems to the substrate. A plurality of spatial light modulators faces each other.
摘要翻译：目的：提供无掩模曝光装置的曝光头以有效地制造曝光光学系统并减小曝光光学系统的尺寸。构成：无掩模曝光装置的曝光头（200）包括多个照明光学系统（210A，210B），多个空间光调制器（230A，230B），多个投影光学系统（232A，232B），以及曝光光学系统（240）。空间光调制器根据基板上的图案的形状选择性地反射来自光照射光学系统的光。投影光学系统基于反射光获得投影图像。曝光光学系统通过投影光学系统将光传输到基板。多个空间光调制器彼此面对。

4. 发明公开

KR20070081578A IMPRINT DEVICE AND IMPRINTING METHODE USING THE SAME 审中-公开
标题翻译：印刷装置和使用其的印刷方法
公开(公告)号：KR20070081578A
公开(公告)日：2007-08-17
申请号：KR20060013596
申请日：2006-02-13
申请人： SAMSUNG ELECTRONICS CO LTD
发明人： LEE HI KUK
IPC分类号： G02F1/13
CPC分类号： G03F7/0002 , B29C43/021 , B29C43/10 , B29C43/36 , B29C2043/3634 , B82Y40/00
摘要： An imprinting device and an imprinting method using the same are provided to economically and efficiently form a high-quality nano structure within a short period of time, by controlling an interval therebetween and pressure and selectively applying pressure according to bending of the substrate, and thus maintaining flatness of a stamp and a substrate. A substrate table(110) faces a stamp(100). A bonding unit(120) moves the stamp. A separation adjusting unit selectively applies pressure to a portion of the stamp or the substrate. The bonding unit is driven by pneumatic pressure. The pneumatic pressure ranges from 0 to 10kgf/Cm^2. The bonding unit further includes a motor(121). The separation adjusting unit includes a screw groove at an upper portion.
摘要翻译：提供一种压印装置和使用其的压印方法，以便在短时间内经济地和有效地形成高质量的纳米结构，通过控制它们之间的间隔和压力，并根据基板的弯曲选择性地施加压力，因此保持印模和基材的平整度。衬底台（110）面向印模（100）。接合单元（120）移动印模。分离调节单元选择性地将压力施加到印模或基底的一部分上。接合单元由气动压力驱动。气压范围为0〜10kgf / Cm ^ 2。接合单元还包括马达（121）。分离调节单元包括在上部的螺纹槽。

5. 发明公开

KR20100069242A Method of fabricating thin film transistor substrate and negative photoresist composition used therein 有权
标题翻译：制造薄膜晶体管基板的方法及其使用的负极光电组合物
公开(公告)号：KR20100069242A
公开(公告)日：2010-06-24
申请号：KR20080127880
申请日：2008-12-16
申请人： SAMSUNG ELECTRONICS CO LTD , DONGJIN SEMICHEM CO LTD
发明人： LEE YEONG BEOM , PARK JUNG IN , LEE HI KUK , KONG HYANG SHIK , KIM BYUNG UK , YOUN HYOC MIN , KOO KI HYUK
IPC分类号： G02F1/136 , H01L29/786
CPC分类号： G02F1/13439 , G02F1/133707 , G02F1/136286 , G03F7/0385
摘要： PURPOSE: A method of manufacturing a thin film transistor display panel and a negative photoresist composition used in the same are provided to improve heat resistance and uniformity. CONSTITUTION: A conductive film(80) is formed on an insulating substrate(10). An etching pattern(200) consisting of the negative photoresist composition is formed on the conductive film. The negative photoresist composition includes a novolak resin of 10-45 weight%, a photo acid generator of 0.1-5 weight%, a cross-linker of 0.1-10 weight%, a phenolic compound of 0.5-10 weight%, and a solvent of the remaining amount.
摘要翻译：目的：提供一种制造薄膜晶体管显示面板及其中使用的负型光致抗蚀剂组合物的方法，以提高耐热性和均匀性。构成：在绝缘基板（10）上形成导电膜（80）。在导电膜上形成由负性光致抗蚀剂组合物构成的蚀刻图案（200）。负性光致抗蚀剂组合物包括10-45重量％的酚醛清漆树脂，0.1-5重量％的光酸产生剂，0.1-10重量％的交联剂，0.5-10重量％的酚类化合物和溶剂的余额。

6. 发明公开

KR20070075163A MOLD FOR FORMATION OF FINE PATTERN AND METHOD FOR FABRICATING THIN FILM TRANSISTOR PLATE USING THE SAME 审中-公开
标题翻译：用于形成细小图案的模具和使用其制造薄膜晶体管板的方法
公开(公告)号：KR20070075163A
公开(公告)日：2007-07-18
申请号：KR20060003610
申请日：2006-01-12
申请人： SAMSUNG ELECTRONICS CO LTD
发明人： KIM KYU YOUNG , LEE HI KUK , PARK JEONG MIN
IPC分类号： H01L29/786 , H01L21/027
CPC分类号： G03F7/0002 , B41K3/00 , B82Y10/00 , B82Y40/00 , H01L29/786 , Y10S977/887
摘要： A mold for forming a fine pattern is provided to control generation of defects and improve process efficiency by eliminating the necessity for a refraction exposure method that generates lots of defects in forming a photoresist pattern of a dual layer structure. A light blocking pattern(120) is formed on a transparent substrate(110). An uneven pattern(130) includes a convex part(131) or a concave part(132,133) in a region not overlapping the light blocking pattern, positioned on the transparent substrate and the light blocking pattern. The light blocking pattern can include black photoresist. The uneven pattern can include at least one of poly-dimethylsiloxane, silicon rubber, polyurethane or polyimide.
摘要翻译：提供用于形成精细图案的模具，以通过消除在形成双层结构的光致抗蚀剂图案时产生大量缺陷的折射曝光方法的必要性来控制缺陷的产生并提高工艺效率。在透明基板（110）上形成遮光图案（120）。不均匀图案（130）包括在不与遮光图案重叠的区域中的位于透明基板和遮光图案上的凸部（131）或凹部（132,133）。遮光图案可以包括黑色光致抗蚀剂。不均匀图案可以包括聚二甲基硅氧烷，硅橡胶，聚氨酯或聚酰亚胺中的至少一种。

7. 发明公开

KR20070083020A LIQUID CRYSTAL DISPLAY DEVICE 审中-公开
标题翻译：液晶显示装置
公开(公告)号：KR20070083020A
公开(公告)日：2007-08-23
申请号：KR20060016204
申请日：2006-02-20
申请人： SAMSUNG ELECTRONICS CO LTD
发明人： KIM JAE SUNG , LEE HI KUK
IPC分类号： G02F1/136
CPC分类号： G02F1/133512 , G02F1/133555 , G02F1/136227 , G02F1/1368
摘要： An LCD(Liquid Crystal Display) is provided to reduce the size of a black matrix corresponding to a storage line, thereby enhancing the aperture ratio. Signal lines and TFTs(Thin Film Transistors) are formed on the first substrate(100). The second substrate(200) is located oppositely to the first substrate. A liquid crystal layer(300) is located between the first and second substrates. The second substrate includes an insulating substrate. A black matrix(221) is formed on the insulating substrate. A common electrode(241) has the first region located on the black matrix. The height of the second region is lower than that of the first region. A color filter(231) is located between the black matrix and the common electrode at the first region. The first substrate also includes a pixel electrode(161) connected with the TFT. The pixel electrode is formed oppositely to the first region. The color filter includes plural partial layers with different colors.
摘要翻译：提供了一种LCD（液晶显示器），用于减小对应于存储线的黑矩阵的尺寸，从而提高了孔径比。在第一基板（100）上形成信号线和TFT（薄膜晶体管）。第二基板（200）与第一基板相对设置。液晶层（300）位于第一和第二基板之间。第二基板包括绝缘基板。在绝缘基板上形成黑矩阵（221）。公共电极（241）具有位于黑色矩阵上的第一区域。第二区域的高度低于第一区域的高度。滤色器（231）位于第一区域的黑矩阵和公共电极之间。第一基板还包括与TFT连接的像素电极（161）。像素电极与第一区域相对地形成。滤色器包括具有不同颜色的多个部分层。

8. 发明公开

KR20070081236A THIN FILM TRANSISTOR SUBSTRATE 审中-公开
标题翻译：薄膜晶体管基板
公开(公告)号：KR20070081236A
公开(公告)日：2007-08-16
申请号：KR20060013032
申请日：2006-02-10
申请人： SAMSUNG ELECTRONICS CO LTD
发明人： KIM JAE SUNG , LEE HI KUK
IPC分类号： H01L29/786
CPC分类号： G09G3/3611 , G02F1/136286
摘要： A TFT substrate is provided to shorten an interval of time for disposing a chip and reduce defective proportion by disposing one integrated driving chip in the peripheral region of a display region wherein the integrated driving chip controls driving of a liquid display panel. A substrate is prepared which has a display region and a driving region. A plurality of first switching devices are disposed as a matrix type in the display region. A plurality of gate lines(GL) are respectively connected in common to control electrodes of widthwise switching devices among the first switching devices. A plurality of data lines(DL) are respectively connected in common to a second current electrode of the lengthwise switching device among the switching devices. A gate driving circuit(140) sequentially scans the gate lines, disposed in the first region of the peripheral region to which one end of the gate lines is extended. A line block select circuit(150) inputs driving signals of a block unit, selects each line block of the data lines, and switches the driving signals of the block unit to data lines of the selected line block, disposed in the second region of the peripheral region to which the data lines are extended. An integrated driving chip(180) inputs external image data and external control signal, outputs driving control signals(GC) to the gate driving circuit, and outputs line block select signals(TG) and driving signals of a block unit to the line block select circuit, disposed in the second region.
摘要翻译：提供一种TFT基板，通过在集成驱动芯片控制液晶显示面板的驱动的显示区域的周边区域设置一个集成驱动芯片，缩短芯片配置的时间间隔，降低不良比例。准备具有显示区域和驱动区域的基板。多个第一开关装置在显示区域中被设置为矩阵型。多个栅极线（GL）共同地分别连接到第一开关装置中的宽度方向开关装置的控制电极。多个数据线（DL）分别连接到开关器件中的纵向开关器件的第二电流电极。栅极驱动电路（140）顺序地扫描设置在所述栅极线的一端延伸的周边区域的第一区域中的栅极线。线路块选择电路（150）输入块单元的驱动信号，选择数据线的每个线路块，并且将块单元的驱动信号切换到布置在所述块单元的第二区域中的所选线路块的数据线数据线延伸到的外围区域。集成驱动芯片（180）输入外部图像数据和外部控制信号，将驱动控制信号（GC）输出到门驱动电路，并将块单元的线路块选择信号（TG）和驱动信号输出到线路块选择电路，设置在第二区域中。

9. 发明公开

KR20070078462A MASK AND METHOD FOR MANUFACTURING DISPLAY SUBSTRATE USING THE MASK 审中-公开
标题翻译：使用掩模制造显示基板的掩模和方法
公开(公告)号：KR20070078462A
公开(公告)日：2007-08-01
申请号：KR20060008690
申请日：2006-01-27
申请人： SAMSUNG ELECTRONICS CO LTD
发明人： JEON WOO SEOK , LEE HI KUK , PARK JUNG IN
IPC分类号： H01L21/32 , H01L21/027
CPC分类号： G03F1/32 , H01L21/0274
摘要： A mask and a method for manufacturing a display substrate using the same are provided to secure stepped portions of a photoresist pattern corresponding to a light shielding pattern and a semi-transmitting region and to extend a planarization region of the photoresist pattern corresponding to the semi-transmitting region by acquiring uniform exposure rates from center and end portions of the semi-transmitting region using an opening pattern of the semi-transmitting region adjacent to the light shielding pattern. A mask includes a transparent substrate(10), a light shielding layer, and a semi-transmitting region. The light shielding layer(20) is formed on the transparent substrate. The light shielding layer includes a light shielding pattern(22) and a first opening pattern(24) with a first width. The semi-transmitting region(30) is formed in the first opening pattern. A second opening pattern(32) is formed on the semi-transmitting region. The second opening pattern has a second width smaller than the first width of the first opening pattern. The second opening pattern is formed at a portion adjacent to the light shielding pattern.
摘要翻译：提供一种用于制造使用其的显示基板的掩模和方法，以确保与遮光图案和半透射区域相对应的光致抗蚀剂图案的阶梯部分，并且延伸对应于半透明区域的光致抗蚀剂图案的平坦化区域，通过使用与遮光图案相邻的半透射区域的开口图案，从半透射区域的中心部和端部获得均匀的曝光率，掩模包括透明基板（10），遮光层和半透射区域。遮光层（20）形成在透明基板上。遮光层包括具有第一宽度的遮光图案（22）和第一开口图案（24）。半透射区域（30）形成为第一开口图案。第二开口图案（32）形成在半透射区域上。第二开口图案具有小于第一开口图案的第一宽度的第二宽度。第二开口图案形成在与遮光图案相邻的部分。

10. 发明公开

KR20100030999A Maskless lithographic apparatus and method of compensating rotational alignment error of exposure head of the same 审中-公开
标题翻译： MASKLESS LITHOGRAPHIC装置及其相容凸起头的旋转对准错误的补偿方法
公开(公告)号：KR20100030999A
公开(公告)日：2010-03-19
申请号：KR20080090013
申请日：2008-09-11
申请人： SAMSUNG ELECTRONICS CO LTD
发明人： KIM JEONG MIN , BAE SANG WOO , LEE HI KUK , JANG SANG DON
IPC分类号： H01L21/027
CPC分类号： G03F7/7085 , G03F7/70291 , G03F7/70508 , G03F7/70558 , G02B26/0833 , G02F2203/12 , G03F7/2057
摘要： PURPOSE: A maskless exposure device and a method for correcting an alignment error using the same are provided to expose a photosensitive film on a substrate with a wanted pattern shape without a mask or reticle. CONSTITUTION: A light source(10) provides an exposure beam. A light modulation device(30) modulates the exposure beam according to an exposure pattern. An exposure optical system(40) transmits the modulated exposure beam to the substrate with a beam spot array type. A controller(15) converts a partial row of the beam spot array to the off state to uniformize the exposure energy distribution of the beam spot array.
摘要翻译：目的：提供无掩模曝光装置和使用其的对准误差的校正方法，以在没有掩模或掩模版的情况下以所需的图案形状在基板上曝光感光膜。构成：光源（10）提供曝光光束。光调制装置（30）根据曝光图案调制曝光光束。曝光光学系统（40）将调制的曝光光束以束斑阵列型发射到衬底。控制器（15）将束斑阵列的部分行转换为关闭状态以使束斑阵列的曝光能量分布均匀化。

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