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1. 发明公开

KR20100069242A Method of fabricating thin film transistor substrate and negative photoresist composition used therein 有权
标题翻译：制造薄膜晶体管基板的方法及其使用的负极光电组合物
公开(公告)号：KR20100069242A
公开(公告)日：2010-06-24
申请号：KR20080127880
申请日：2008-12-16
申请人： SAMSUNG ELECTRONICS CO LTD , DONGJIN SEMICHEM CO LTD
发明人： LEE YEONG BEOM , PARK JUNG IN , LEE HI KUK , KONG HYANG SHIK , KIM BYUNG UK , YOUN HYOC MIN , KOO KI HYUK
IPC分类号： G02F1/136 , H01L29/786
CPC分类号： G02F1/13439 , G02F1/133707 , G02F1/136286 , G03F7/0385
摘要： PURPOSE: A method of manufacturing a thin film transistor display panel and a negative photoresist composition used in the same are provided to improve heat resistance and uniformity. CONSTITUTION: A conductive film(80) is formed on an insulating substrate(10). An etching pattern(200) consisting of the negative photoresist composition is formed on the conductive film. The negative photoresist composition includes a novolak resin of 10-45 weight%, a photo acid generator of 0.1-5 weight%, a cross-linker of 0.1-10 weight%, a phenolic compound of 0.5-10 weight%, and a solvent of the remaining amount.
摘要翻译：目的：提供一种制造薄膜晶体管显示面板及其中使用的负型光致抗蚀剂组合物的方法，以提高耐热性和均匀性。构成：在绝缘基板（10）上形成导电膜（80）。在导电膜上形成由负性光致抗蚀剂组合物构成的蚀刻图案（200）。负性光致抗蚀剂组合物包括10-45重量％的酚醛清漆树脂，0.1-5重量％的光酸产生剂，0.1-10重量％的交联剂，0.5-10重量％的酚类化合物和溶剂的余额。

2. 发明公开

KR20100116844A Negative photosensitive resin composition 审中-公开
标题翻译：负性光敏树脂组合物
公开(公告)号：KR20100116844A
公开(公告)日：2010-11-02
申请号：KR20090035475
申请日：2009-04-23
申请人： DONGJIN SEMICHEM CO LTD , UNIV KOREA RES & BUS FOUND
发明人： LEE HO JIN , KIM WY YONG , LEE DONG HYUK , KIM BYUNG UK , CHOI SUNG MOOK , HONG MOON PYO
IPC分类号： G03F7/027 , G03F7/028
CPC分类号： G03F7/027 , G03F7/004 , G03F7/028
摘要： PURPOSE: A negative photosensitive resin composition is provided to use as an interlayer insulating film of flexible display and organic electroluminescent device and to ensure high insulation, thermal resistance, light penetration, and chemical resistance. CONSTITUTION: A negative photosensitive resin composition of non-solvent type contains: 10-80 weight% of ethylene-based oligomer or polymer resin, 10-60 weight% of cross-linking monomer having two or more ethylene-based double bonds; and 0.1-10 weight% of photopolymerization initiator. The composition additionally contains 0.01-10 weight% of fluorinated surfactant or silicon surfactant. The ethylene oligomer is selected from epoxy acrylate oligomer, urethane acrylate oligomer and polyester acrylate oligomer.
摘要翻译：目的：提供一种负型感光性树脂组合物，用作柔性显示器和有机电致发光器件的层间绝缘膜，并确保高绝缘性，耐热性，光穿透性和耐化学性。构成：非溶剂型的负型感光性树脂组合物含有10-80重量％的乙烯类低聚物或聚合物树脂，10〜60重量％的具有两个以上乙烯基双键的交联单体; 和0.1-10重量％的光聚合引发剂。该组合物另外含有0.01-10重量％的氟化表面活性剂或硅表面活性剂。乙烯低聚物选自环氧丙烯酸酯低聚物，氨基甲酸酯丙烯酸酯低聚物和聚酯丙烯酸酯低聚物。

3. 发明公开

KR20070099310A SYSTEM FOR MANUFACTURING A FLAT PANEL DISPLAY 审中-公开
标题翻译：制造平板显示器的系统
公开(公告)号：KR20070099310A
公开(公告)日：2007-10-09
申请号：KR20060030597
申请日：2006-04-04
申请人： DONGJIN SEMICHEM CO LTD
发明人： PARK HEE JIN , KIM SEONG BAE , YOON SUK IL , JEONG JONG HYUN , HUH SOON BEOM , SHIN SUNG GUN , JUNG SE HWAN , HUH HYUN , KIM BYUNG UK
IPC分类号： G02F1/13
CPC分类号： G02F1/1303 , B01D24/22 , G02F2001/133792
摘要： A system for manufacturing a flat display device is provided to extend a life of a filter by flowing a working fluid to the filter when removing floating matters by a floating matter filtering unit without allowing a working fluid including the floating matters to be directly flowed into the filter, and to reduce cost by shortening the replacement period of the filter. A system for manufacturing a flat display device includes a working chamber(300) which removes a necessary part during working layers formed in a flat display panel by using a working fluid, a floating matter filtering unit(100) which receives the working fluid discharged from the working chamber and filters the floating matters of the working layers included in the working fluid, a filter(500) which receives the working fluid discharged from the floating matter filtering unit and filters the components of the working layers included in the working fluid, and a strip liquid storing unit(700) which stores a strip liquid of which the photo resist components are filtered by the filter.
摘要翻译：提供了一种用于制造平面显示装置的系统，以通过在通过浮动物质过滤单元去除浮动物质时将工作流体流动到过滤器来延长过滤器的寿命，而不允许包括浮动物质的工作流体直接流入过滤器，并通过缩短过滤器的更换周期来降低成本。一种用于制造平面显示装置的系统包括：工作室（300），其通过使用工作流体在平面显示面板中形成的工作层期间去除必要部分;浮动物质过滤单元（100），其接收从所述工作室和所述工作液体中包含的工作层的浮动物质进行过滤，过滤器（500），其接收从所述浮动物质过滤单元排出的所述工作流体，并且对包含在所述工作流体中的所述工作层的部件进行过滤;以及条带液体储存单元（700），其存储其中光致抗蚀剂成分被过滤器过滤的条状液体。

4. 发明公开

KR20120030477A Composition for removing a photoresist 有权
标题翻译：用于去除光电元件的组合物
公开(公告)号：KR20120030477A
公开(公告)日：2012-03-28
申请号：KR20120008383
申请日：2012-01-27
申请人： DONGJIN SEMICHEM CO LTD
发明人： YOON SUK IL , KIM SEONG BAE , KIM WY YONG , JEONG JONG HYUN , HUH SOON BEOM , KIM BYUNG UK
IPC分类号： G03F7/42
CPC分类号： G03F7/425 , G03F7/32 , G03F7/422 , G03F7/426 , H01L21/02071 , H01L21/31133
摘要： PURPOSE: A composition for photoresist stripping liquid is provided to reduce the change of the composition in the process of heating and to improve the stripping performance of photoresist by including chain type amine, a solvent, and a stripping accelerator. CONSTITUTION: A composition for photoresist stripping liquid includes chain type amine, a solvent, and a stripping accelerator. The composition further includes an anti-corrosion agent. The chain amine is one or more selected from a group including monoethanolamine, ethylenediamine, 2-(2-aminoetoxy)ethanol, 2-(2-aminoethylamino)ethanol, 1-amino-2-propanol, diethanolamine, iminobispropylamine, 2-methylaminoethanol, N-methylethanolamine, and triethylamino ethane. The solvent is a protic polar solvent, a non-protic polar solvent, and the mixture of the same. The anti-corrosion agent is selected from a group including triazole-based compounds, mercapto-based compounds, alkyl gallate-based compounds, and the mixture of the same.
摘要翻译：目的：提供用于光致抗蚀剂剥离液的组合物，以减少加热过程中组合物的变化，并通过包括链型胺，溶剂和剥离促进剂改善光致抗蚀剂的剥离性能。构成：用于光致抗蚀剂剥离液的组合物包括链型胺，溶剂和剥离促进剂。该组合物还包括防腐蚀剂。链胺是选自包括单乙醇胺，乙二胺，2-（2-氨氧基）乙醇，2-（2-氨基乙基氨基）乙醇，1-氨基-2-丙醇，二乙醇胺，亚氨基双丙基胺，2-甲基氨基乙醇， N-甲基乙醇胺和三乙基氨基乙烷。溶剂是质子极性溶剂，非质子极性溶剂及其混合物。防腐剂选自三唑类化合物，巯基类化合物，没食子酸镓基化合物及其混合物。

5. 发明公开

KR20120030476A Composition for removing a photoresist 有权
标题翻译：用于去除光电元件的组合物
公开(公告)号：KR20120030476A
公开(公告)日：2012-03-28
申请号：KR20120008382
申请日：2012-01-27
申请人： DONGJIN SEMICHEM CO LTD
发明人： YOON SUK IL , KIM SEONG BAE , KIM WY YONG , JEONG JONG HYUN , HUH SOON BEOM , KIM BYUNG UK
IPC分类号： G03F7/42
CPC分类号： G03F7/425 , G03F7/26 , G03F7/32 , G03F7/422 , G03F7/426 , H01L21/02071
摘要： PURPOSE: A composition for a photoresist stripping solution is provided to secure operational stability by completely stripping and washing photoresist without the undesirable corrosion of metal wires. CONSTITUTION: A composition for a photoresist stripping solution contains cyclic amine, a solvent, a stripping accelerator, and selectively an anticorrosive agent. The cyclic amine is one or more selected from a group including 1-(2-hydroxyethyl)piperazine, 1-(2-aminoethyl)piperazine, 1-(2-hydroxyethyl)methylpiperazine, N-(3-aminopropyl)morpholine, 2-methylpiperazine, 1-methylpiperazine, 1-amino-4-methylpiperazine, 1-benzylpiperazine, and 1-phenylpiperazine. The solvent is a protic polar solvent, a non-protic polar solvent, or the mixture of the same. The anticorrosive agent is selected from a group including triazole-based compounds, mercapto-based compounds, alkyl gallate-based compounds, and the mixture of the same.
摘要翻译：目的：提供一种用于光致抗蚀剂剥离溶液的组合物，以通过完全剥离和洗涤光致抗蚀剂来确保操作稳定性，而不会有金属丝的不期望的腐蚀。构成：用于光致抗蚀剂剥离溶液的组合物包含环胺，溶剂，剥离促进剂，以及选择性地防腐蚀剂。环胺是选自1-（2-羟乙基）哌嗪，1-（2-氨基乙基）哌嗪，1-（2-羟乙基）甲基哌嗪，N-（3-氨基丙基）吗啉，2- 甲基哌嗪，1-甲基哌嗪，1-氨基-4-甲基哌嗪，1-苄基哌嗪和1-苯基哌嗪。溶剂是质子极性溶剂，非质子极性溶剂或其混合物。防腐剂选自三唑类化合物，巯基类化合物，没食子酸镓基化合物及其混合物。

6. 发明公开

KR20070103109A PHOTOSENSITIVE RESIN COMPOSITION 审中-公开
标题翻译：感光树脂组合物
公开(公告)号：KR20070103109A
公开(公告)日：2007-10-23
申请号：KR20060034791
申请日：2006-04-18
申请人： DONGJIN SEMICHEM CO LTD
发明人： YEO TAE HOON , YOUN HYOC MIN , KOO KI HYUK , YUN JOO PYO , SHIN HONG DAE , LEE HO JIN , KIM BYUNG UK , KIM DONG MYUNG , CHOI SANG GAK , LEE DONG HYUK , JEONG UI CHEOL , KIM SUNG TAK , CHOI SU YOUN , CHO DONG HO , JEONG DAE JUNG
IPC分类号： G03F7/027 , G03F7/022
摘要： A photosensitive resin composition, an LCD substrate containing the cured product of the composition, and a method for forming the pattern of the LCD substrate are provided to improve sensitivity, heat resistance and chemical resistance and to form a hydrophobic film. A photosensitive resin composition comprises 100 parts by weight of an acrylic copolymer obtained by copolymerizing an unsaturated carbonic acid, an unsaturated carbonic anhydride or their mixture, an unsaturated compound containing an epoxy group and an olefin-based unsaturated compound and removing the unreacted monomers; 5-50 parts by weight of a 1,2-quinonediazide compound; 3-20 parts by weight of a fluorine-based compound represented by CF3(CF2)nCOOH, CF3(CF2)nCH2OH, CF3C(CF3)2CFCF(CF3)CF2COOH, (CF3)2CF(CF2)3CF(CF3)CF2COOH, or C11HF17O2; and a solvent, wherein n is an integer of 6-10.
摘要翻译：提供感光性树脂组合物，含有该组合物的固化物的LCD基板以及形成LCD基板的图案的方法，以提高灵敏度，耐热性和耐化学性，并形成疏水膜。感光性树脂组合物包含100重量份通过使不饱和碳酸，不饱和碳酸酐或其混合物共聚得到的丙烯酸共聚物，含有环氧基的不饱和化合物和烯烃系不饱和化合物，除去未反应单体; 5-50重量份的1,2-醌二叠氮化合物; 由CF3（CF2）nCOOH，CF3（CF2）nCH2OH，CF3C（CF3）2CFCF（CF3）CF2COOH，（CF3）2CF（CF2）3CF（CF3）CF2COOH等表示的氟系化合物的3-20重量份， C11HF17O2; 和溶剂，其中n为6-10的整数。

7. 发明公开

KR20070074746A COMPOSITION FOR REMOVING A (PHOTO)RESIST 审中-公开
标题翻译：用于去除（照片）电阻的组合物
公开(公告)号：KR20070074746A
公开(公告)日：2007-07-18
申请号：KR20060002683
申请日：2006-01-10
申请人： DONGJIN SEMICHEM CO LTD
发明人： YOON SUK IL , KIM SEONG BAE , JEONG JONG HYUN , HUH SOON BEOM , KIM BYUNG UK
IPC分类号： G03F7/32
摘要： Provided is a composition for removing photoresist for patterning metal interconnection of electronic circuit or display device with excellent resist removing effect, low composition change according to volatilization at high temperature. The composition for removing photoresist includes at least one compound selected from the group consisting of a compound of the formula(1), a compound of the formula(2), a cyclic compound of the formula(3) or (4) and a glycolic compound of the formula(5). In the formulae, R, R', R", R"' are each hydrogen, hydroxy group, a C1-10 alkyl group, a C1-10 alkanol group or a C1-10 alkylacetate group, R3 is hydroxyl group, a C1-10 alkyl group, or a C1-10 alkylacetate group, and n is an integral number of 1 to 12. The composition further comprises a lactone-based compound, amine or organic acid, an oxidizing agent or a mixture thereof. The composition is excellent in removal and decomposition of resists, and washing of a substrate in the process.
摘要翻译：提供一种用于除去用于图案化电子电路或显示装置的金属互连的光致抗蚀剂的组合物，其具有优异的抗除去效果，根据高温下挥发的低组成变化。用于除去光致抗蚀剂的组合物包括选自式（1）的化合物，式（2）的化合物，式（3）或（4）的环状化合物和乙醇酸的化合物中的至少一种化合物式（5）的化合物。式中R，R'，R“，R”'分别为氢，羟基，C 1-10烷基，C 1-10链烷醇基或C 1-10烷基乙酸酯基，R 3为羟基，C 1 -10烷基或C1-10烷基乙酸酯基，n为1至12的整数。该组合物还包含内酯类化合物，胺或有机酸，氧化剂或其混合物。该组合物在该方法中除去和分解抗蚀剂以及洗涤基材是优异的。

8. 发明公开

KR20100037849A Display device driven by electric field 审中-公开
标题翻译：由电场驱动的显示装置
公开(公告)号：KR20100037849A
公开(公告)日：2010-04-12
申请号：KR20080097169
申请日：2008-10-02
申请人： DONGJIN SEMICHEM CO LTD
发明人： JEONG DAE JUNG , KIM BYUNG UK , KIM WY YONG
IPC分类号： G02F1/15 , G02F1/133 , G02F1/1335
CPC分类号： G02F1/15 , G02F1/0102
摘要： PURPOSE: A display device driven by electric field is provided to indicate an image of applying time of final driving voltage by forming fixed partition or a fixed electrode when the driving voltage is not applied. CONSTITUTION: A display device driven by electric field comprises a first substrate(110), a first electrode(121), a drive partition(330), a fixed partition(140), and plurality of driving bodies(370). The first electrode is formed on the first substrate. The drive partition is formed on the first substrate. The drive partition has a plurality of opening and shutting holes(335). The opening and shutting holes comprise a light blocking unit(271) and a light transmitting unit(272). The fixed partition is located in a border line of the light blocking unit and the light transmitting unit. Multiple driving bodies are arranged within each opening and shutting hole one by one.
摘要翻译：目的：提供由电场驱动的显示装置，以在未施加驱动电压时形成固定分隔件或固定电极来施加最终驱动电压施加时间的图像。构成：由电场驱动的显示装置包括第一基板（110），第一电极（121），驱动隔板（330），固定隔板（140）和多个驱动体（370）。第一电极形成在第一基板上。驱动隔板形成在第一基板上。驱动器分隔件具有多个打开和关闭孔（335）。打开和关闭孔包括遮光单元（271）和光发射单元（272）。固定分隔件位于遮光单元和光发送单元的边界线中。多个驱动体一个接一个地布置在每个打开和关闭孔内。

9. 发明公开

KR20070099381A HEAT TREATMENT FURNACE OF PREPARING FLAT DISPLAY PANEL, MANUFACTURING DEVICE AND METHOD OF FLAT DISPLAY PANEL INCLUDING THE SAME, AND FLAT DISPLAY PANEL PREPARED THEREBY 审中-公开
标题翻译：制备平板显示面板的热处理炉，制造装置以及包括其的平板显示面板的方法以及制备的平面显示面板
公开(公告)号：KR20070099381A
公开(公告)日：2007-10-09
申请号：KR20060043891
申请日：2006-05-16
申请人： DONGJIN SEMICHEM CO LTD
发明人： LEE SUNG HYUN , LEE WON YOUNG , YOO JAE WON , SHIN SEUNG HYUP , KIM BYUNG UK
IPC分类号： H01J11/02 , F27B9/02 , F27B9/06 , F27B9/36 , F27D11/12 , G09F9/00 , H05H1/24
摘要： A heat treatment furnace for manufacturing a flat display panel, a flat display panel manufacturing apparatus including the same, a manufacturing method of the same, and a flat panel display device using the same are provided to improve performance of a material layer by lowering resistance of the material layer. A heat treatment furnace includes a magnetron(301), a waveguide(302), and a discharge tube(305). The magnetron is formed to generate microwaves. The waveguide is formed to transmit the microwaves generated from the magnetron. The discharge tube is formed to generate plasma by using the microwaves transmitted through the waveguide and gas supplied through a gas supply unit. The discharge tube is formed to irradiate the plasma onto a structure for manufacturing a flat panel display device.
摘要翻译：提供一种用于制造平板显示面板的热处理炉，包括该平板显示面板的平板显示面板制造装置，其制造方法和使用该热处理炉的平板显示装置，以通过降低材料层的耐性降低材料层的性能材料层。热处理炉包括磁控管（301），波导管（302）和放电管（305）。形成磁控管以产生微波。形成波导以传输由磁控管产生的微波。放电管形成为通过使用通过波导传输的微波和通过气体供应单元供应的气体来产生等离子体。放电管形成为将等离子体照射到用于制造平板显示装置的结构上。

10. 发明公开

KR20090007953A PHOTOSENSITIVE RESIN COMPOSITION WITH ORGANIC~INORGANIC HYBRID AND LIQUID DISPLAY DEVICES USING 无效
标题翻译：有机 - 无机混合物和液体显示装置的感光树脂组合物
公开(公告)号：KR20090007953A
公开(公告)日：2009-01-21
申请号：KR20070071201
申请日：2007-07-16
申请人： KOREA ELECTRO TECH RES INST , DONGJIN SEMICHEM CO LTD
发明人： HAN DONG HEE , KANG DONG PIL , KANG DONG JUN , KIM BYUNG UK , YOUN HYOC MIN , YEO TAE HOON , CHOI SANG GAK , CHOI SU YOUN
IPC分类号： G03F7/028
CPC分类号： G03F7/028 , G03F7/0007 , G03F7/0045 , G03F7/023 , G03F7/0233 , G03F7/027 , G03F7/032 , G03F7/033
摘要： An organic/inorganic hybrid photosensitive resin composition, and an LCD device using the composition are provided to improve hardness, heat resistance, insulation and smoothness when a passivation insulating film is formed. An organic/inorganic hybrid photosensitive resin composition comprises a colloidal inorganic sol; an acrylic copolymer obtained by copolymerizing an unsaturated carbonic acid, an unsaturated carbonic anhydride or their mixture, and at least one acrylic unsaturated compound; a photoinitiator; a multifunctional monomer having an ethylenically unsaturated bond; a silicon-based compound containing an epoxy group or an aminegroup; and a solvent.
摘要翻译：提供有机/无机混合光敏树脂组合物和使用该组合物的LCD装置，以在形成钝化绝缘膜时提高硬度，耐热性，绝缘性和平滑性。有机/无机混合光敏树脂组合物包含胶态无机溶胶; 通过使不饱和碳酸，不饱和碳酸酐或其混合物与至少一种丙烯酸不饱和化合物共聚得到的丙烯酸共聚物; 光引发剂; 具有烯键式不饱和键的多官能单体; 含有环氧基或胺基的硅系化合物; 和溶剂。

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