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1. 发明授权

KR101439788B1 전기화학적 방법을 이용한 3차원 탄소나노튜브 네트워크 기반의 금속 또는 산화금속 나노구조체 有权
标题翻译：通过电化学方法制备碳纳米管的三维网络面向金属或金属氧化物纳米结构
公开(公告)号：KR101439788B1
公开(公告)日：2014-09-15
申请号：KR1020130099935
申请日：2013-08-22
申请人： 주식회사 포스코 , 포항공과대학교 산학협력단 , 한양대학교 산학협력단
发明人： 박준원 , 이해원 , 조석진 , 이문근 , 조용덕 , 서정은
IPC分类号： B82B3/00 , B82B1/00
CPC分类号： B82B3/0095 , B01J23/881 , B82Y40/00 , C01B32/158 , C23C14/34 , C23C16/45525 , C25D3/02
摘要： The present invention relates to a method for manufacturing a metal or metal oxide nanostructure comprising the steps of: forming a silicon pillar structure on one side of a silicon substrate; impregnating the silicon substrate with the silicon pillar structure in a catalytic solution; providing carbon source gas to the impregnated silicon substrate to form a three-dimensional network of a carbon nanotube between the silicon pillars; coating the three-dimensional network of carbon nanotube; and electrochemically depositing metal or metal oxide after coating. According to the present invention, provided is the metal or metal oxide nanostructure based on the three-dimensional carbon nanotube network with a large cross sectional area and a hierarchical structure by depositing by an electrochemical method.
摘要翻译：本发明涉及一种金属或金属氧化物纳米结构体的制造方法，包括以下步骤：在硅衬底的一侧上形成硅柱结构; 在硅催化溶液中用硅柱结构浸渍硅衬底; 向浸渍的硅衬底提供碳源气体以在硅柱之间形成碳纳米管的三维网络; 涂覆碳纳米管的三维网络; 并在涂覆后电化学沉积金属或金属氧化物。根据本发明，提供了基于具有大横截面积的三维碳纳米管网络的金属或金属氧化物纳米结构和通过电化学方法沉积的分层结构。

2. 发明授权

KR101975412B1 핵산 효소를 이용한 전립선암 바이오마커의 검출용 프라이머 세트, 검출용 조성물 및 이를 이용한 전립선암 바이오마커의 검출 방법 有权
公开(公告)号：KR101975412B1
公开(公告)日：2019-05-07
申请号：KR1020170067859
申请日：2017-05-31
申请人： 한양대학교 산학협력단
发明人： 김영필 , 이하원 , 이해원 , 윤수영 , 문경철
IPC分类号： C12Q1/68

3. 发明公开

KR1020150062144A 수화젤 다중 탐침 구조체, 이의 제조방법 및 이를 이용한 생체분자 다중 패턴 형성방법 有权
标题翻译：水解多元探针结构及其生物分子的制备方法及方法
公开(公告)号：KR1020150062144A
公开(公告)日：2015-06-05
申请号：KR1020140167701
申请日：2014-11-27
申请人： 한양대학교 산학협력단
发明人： 이해원 , 윤성훈 , 이상윤 , 오은결
IPC分类号： G01N35/00 , G01N33/48
CPC分类号： G01N35/00 , C12Q1/68 , G01N33/48
摘要： 본발명은수화젤다중탐침구조체, 이의제조방법및 이를이용한생체분자다중패턴형성방법에관한것이다. 본발명에따른수화젤다중탐침구조체는고가의장비가아니면서도정교한생체분자의다중패턴형성을가능하게하는구조체이다. 또한이러한수화젤다중탐침구조체의제조방법도간편한방법으로상기수화물다중탐침구조체를제작하여생체분자다중패턴형성을가능하게한다. 그리하여이러한수화젤다중탐침구조체를이용한생체분자다중패턴형성방법은간편한방법으로제작된수화젤다중탐침구조체를가지고간단하면서도정교하게생체분자의다중패턴을형성하는것이다.
摘要翻译：本发明涉及一种水凝胶多探针结构体及其制造方法，以及使用其形成双分子多图案的方法。根据本发明，水凝胶多探针结构能够通过使用廉价的设备形成精细的双分子多图案。此外，水凝胶多探针结构的制造方法简单易行，能够通过制备水凝胶多探针结构形成双分子多图案。因此，根据使用水凝胶多探针结构形成双分子多图案的方法，以容易的方式生产的水凝胶多探针结构容易且复杂地形成精细的双分子多图案。

4. 发明公开

KR1020130051767A 3차원 탄소나노튜브 네트워크를 포함하는 태양전지 및 이의 제조방법 有权
标题翻译：包括三维碳纳米管网络的太阳能电池及其制造方法
公开(公告)号：KR1020130051767A
公开(公告)日：2013-05-21
申请号：KR1020110117103
申请日：2011-11-10
申请人： 한양대학교 산학협력단
发明人： 안진호 , 고기영 , 최윤식 , 이길복 , 이해원 , 서정은 , 여해구 , 이병훈 , 강창구
IPC分类号： H01L31/04 , H01L31/18
CPC分类号： Y02E10/50 , Y02P70/521 , H01L31/18 , H01L31/04
摘要： PURPOSE: A solar cell including a 3D carbon nanotube network and a manufacturing method thereof are provided to maximize a photoelectric conversion efficiency by forming a carbon nanotube with a 3D network. CONSTITUTION: A substrate includes a plurality of pillars(100a). A 3D carbon nanotube network(200) is formed with an entwined structure to connect each pillar. An anode(300) and a cathode(400) are formed on both sides of the substrate. A dielectric layer(500) covers the anode and the cathode and completely surrounds the 3D carbon nanotube network. A first electrode(600a) is arranged on one side of the anode while interposing the dielectric layer. A second electrode(600b) is arranged on one side of the cathode while interposing the dielectric layer.
摘要翻译：目的：提供一种包括3D碳纳米管网络的太阳能电池及其制造方法，以通过形成具有3D网络的碳纳米管来最大化光电转换效率。构成：基板包括多个支柱（100a）。 3D碳纳米管网络（200）形成有缠结结构以连接每个支柱。阳极（300）和阴极（400）形成在基板的两侧。电介质层（500）覆盖阳极和阴极并完全围绕3D碳纳米管网络。第一电极（600a）布置在阳极的一侧，同时插入介电层。第二电极（600b）布置在阴极的一侧，同时插入介电层。

5. 发明公开

KR1020100122002A 탄소나노튜브 3차원 네트워크를 포함하는 고분자 복합체, 그 제조방법 및 이를 이용하여 제조된 스트레인 센서 有权
标题翻译：包含碳纳米管三维网络的聚合物复合材料，其制造方法和使用其的应变传感器
公开(公告)号：KR1020100122002A
公开(公告)日：2010-11-19
申请号：KR1020090040973
申请日：2009-05-11
申请人： 한양대학교 산학협력단
发明人： 이해원 , 이태재 , 서정은 , 이승백 , 임채현
IPC分类号： B82B1/00 , B82B3/00 , C01B31/02
CPC分类号： G01L1/2293 , G01B1/00 , B82B1/00 , B82B3/0009 , C01B32/158 , C01B2202/02 , C01B2202/04 , C01B2202/06 , C01B2202/22
摘要： PURPOSE: A polymer composite, a manufacturing method thereof, and a strain sensor manufactured by using thereof are provided to secure the excellent electrical connection of carbon nanotubes by forming into a 3D network. CONSTITUTION: A polymer composite containing a carbon nanotube 3D network comprises the carbon nanotube 3D network formed on the inside or the surface of a polymer to the horizontal or vertical direction in a 3D network form. A manufacturing method of the polymer composite comprises the following steps: adsorbing a catalyst metal to a substrate including with nanorods(b); supplying carbon source gas to the substrate to produce the substrate formed with carbon nanotube 3D network(c); coating the surface of the substrate with a prepolymer solution, and curing to form the polymer composite; and separating the polymer composite from the substrate.
摘要翻译：目的：提供一种聚合物复合材料，其制造方法和通过使用它制造的应变传感器，以通过形成3D网络来确保碳纳米管的优异电连接。构成：含有碳纳米管3D网络的聚合物复合材料包括以3D网络形式在聚合物的内部或表面上以水平或垂直方向形成的碳纳米管3D网络。聚合物复合材料的制造方法包括以下步骤：将催化剂金属吸附到包括纳米棒（b）的基材上; 向基板供应碳源气体以产生由碳纳米管3D网络（c）形成的基板; 用预聚物溶液涂覆基材的表面，并固化以形成聚合物复合材料; 并将聚合物复合物与基底分离。

6. 发明公开

KR1020100081474A 원자 힘 현미경 리소그래피를 이용한 금속 나노 패턴의 제조 방법 有权
标题翻译：使用原子力显微镜光刻制备金属纳米材料的方法
公开(公告)号：KR1020100081474A
公开(公告)日：2010-07-15
申请号：KR1020090000728
申请日：2009-01-06
申请人： 한양대학교 산학협력단
发明人： 이해원 , 이조원 , 권광민 , 유재범
IPC分类号： H01L21/027 , B82Y40/00
CPC分类号： G03F7/70375 , G03F7/165 , G03F7/2051
摘要： PURPOSE: A method for preparing metal nano-patterns using an atomic is provided to effectively form a metal nano pattern on a substrate corresponding to a probe of an atomic microscope by forming a resistor film after forming organic intermediate layer. CONSTITUTION: The surface of a substrate is reformed to a negative ion(S10). An organic compound intermediate layer is formed in the reformed substrate surface(S20). The resist including the organic-metallic compound is spread on the organic compound intermediate layer to form a resist film(S30). A voltage is applied between the probe of an atomic force microscope and the substrate to form a nano-pattern on the surface of the substrate(S40). The resist film is removed from the substrate in which the metal nano pattern is formed(S50).
摘要翻译：目的：提供使用原子制备金属纳米图案的方法，通过在形成有机中间层之后形成电阻膜，在对应于原子显微镜的探针的基板上有效形成金属纳米图案。构成：将基板的表面重新形成负离子（S10）。在重整基板表面中形成有机化合物中间层（S20）。将包含有机金属化合物的抗蚀剂铺展在有机化合物中间层上以形成抗蚀剂膜（S30）。在原子力显微镜的探针和衬底之间施加电压以在衬底的表面上形成纳米图案（S40）。从其中形成金属纳米图案的基板去除抗蚀剂膜（S50）。

7. 发明授权

KR100882555B1 탐침 현미경을 이용한 리소그래피 장치 및 그 방법 失效
标题翻译：使用扫描探针显微镜进行光刻的方法和装置
公开(公告)号：KR100882555B1
公开(公告)日：2009-02-12
申请号：KR1020070104876
申请日：2007-10-18
申请人： 한양대학교 산학협력단
发明人： 이해원 , 정정주 , 한철수 , 권광민
IPC分类号： G01Q80/00 , G03F7/20 , H01J37/26
CPC分类号： G01Q80/00 , G03F7/2035 , H01J37/2955 , H01L21/0334
摘要： A lithography apparatus and a method using a probe microscope are provided to draw the mathematical model by building the lithography result according to the specific condition to database. A voltage applying unit(110) is controlled by center control units(100). The voltage applying unit performs the lithography by authorizing the voltage to the sample. Current detection units(120) measure the micro current generated by the voltage of the voltage applying unit. The current detection units deliver the measured value to the center control units. An environmental control unit(130) controls the temperature and humidity of the lithography computational environment. A surface measuring unit(140) measures the change amount of the surface height of sample.
摘要翻译：提供光刻设备和使用探针显微镜的方法，通过根据具体的数据库建立光刻结果绘制数学模型。电压施加单元（110）由中央控制单元（100）控制。电压施加单元通过授权对样品的电压进行光刻。电流检测单元（120）测量由电压施加单元的电压产生的微电流。当前检测单元将测量值传送给中央控制单元。环境控制单元（130）控制光刻计算环境的温度和湿度。表面测量单元（140）测量样品的表面高度的变化量。

8. 发明授权

KR100876398B1 원자 힘 현미경 나노 리소그래피를 이용한 패턴 제작 방법 有权
标题翻译：使用原子力显微镜纳米尺度的图案的生成
公开(公告)号：KR100876398B1
公开(公告)日：2008-12-29
申请号：KR1020070104745
申请日：2007-10-17
申请人： 한양대학교 산학협력단
发明人： 이해원 , 김성경
IPC分类号： H01L21/027 , G03F7/20 , B82Y40/00
CPC分类号： G03F7/2049 , B82Y40/00
摘要： The method manufacturing the pattern using the atomic force microscope nanolithography is provided to improve the height of the nano oxidation structure over 100 nm in the lithography using the atomic force microscope. The method for manufacturing the pattern using the atomic force microscope comprises as follows. A step is for irradiating the ion beam of proton or the argon on the substrate. A step is for performing the atomic force microscope lithography on the substrate at which the ion beam is irradiated and for forming the oxidation structure(d) by applying the positive voltage in the atomic force microscope tip(e). .
摘要翻译：提供使用原子力显微镜纳米光刻技术制造图案的方法，以使用原子力显微镜在光刻中提高超过100nm的纳米氧化结构的高度。使用原子力显微镜制造图案的方法包括如下。步骤是用于在基板上照射质子或氩的离子束。步骤是在离子束照射的基板上进行原子力显微镜光刻，并通过在原子力显微镜尖端（e）中施加正电压来形成氧化结构（d）。。

9. 发明公开

KR1020080104732A 탐침 현미경의 리소그래피 장치 및 방법 有权
标题翻译：纳米扫描仪和扫描探针显微镜的方法
公开(公告)号：KR1020080104732A
公开(公告)日：2008-12-03
申请号：KR1020070051927
申请日：2007-05-29
申请人： 한양대학교 산학협력단
发明人： 이해원 , 정정주 , 한철수 , 권광민 , 이태규
IPC分类号： H01L21/027 , G03F7/00
CPC分类号： H01L21/0274 , G03F7/2022 , G03F7/70491 , G03F7/70775
摘要： The lithography apparatus and method of the probe microscope are provided to generate the signal for the nanostructures manufacture in the location which a user wants by outputting the respective digital lithography signal or the analog lithography signal. The lithography apparatus of the probe microscope comprises the information input unit(11), and the output control. The information input unit receives the information for manufacturing the nanostructures to the sample. The information input unit receives the digital or the analog location information of sample. The output control outputs digital produces the respective digital lithography control signal or the analog lithography signal according to the set-up lithography algorithm and the output control outputs digital or the analog location information of the sample selected according to the location information input method of the sample.
摘要翻译：提供探针显微镜的光刻设备和方法，以通过输出相应的数字光刻信号或模拟光刻信号，在用户想要的位置产生用于纳米结构制造的信号。探针显微镜的光刻设备包括信息输入单元（11）和输出控制。信息输入单元接收用于制造纳米结构到样品的信息。信息输入单元接收样本的数字或模拟位置信息。输出控制输出数字根据设置光刻算法产生相应的数字光刻控制信号或模拟光刻信号，并且输出控制输出根据样本的位置信息输入方法选择的样本的数字或模拟位置信息。

10. 发明授权

KR100869546B1 원자 힘 현미경 리소그래피 기술을 이용한 박막 패턴 제작방법 失效
标题翻译：使用原子力显微镜光刻的薄膜图案的制造方法
公开(公告)号：KR100869546B1
公开(公告)日：2008-11-19
申请号：KR1020070096658
申请日：2007-09-21
申请人： 한양대학교 산학협력단
发明人： 이해원 , 고경근 , 권광민
IPC分类号： H01L21/027 , H01L21/304 , B82Y40/00
CPC分类号： G03F7/2049 , B82Y10/00 , B82Y40/00 , H01L21/3213
摘要： The step for resist-related processing can be removed and the suitable resolution can be secured by forming a thin film pattern using the atomic force microscope lithography technique. The thin film pattern manufacturing method using the atomic force microscope lithography technique is provided. A step is for forming the first thin film on the substrate(10). A step is for forming the second thin film for the etching mask on the first thin film. A step is for forming the oxide pattern in a part of the second thin film by using the atomic force microscope(13). A step is for forming the etching mask for exposing a part of the first thin film by dry-etching the oxide pattern. A step is for dry etching the exposed part of the first thin film by using the etching mask.
摘要翻译：可以除去抗蚀剂相关处理的步骤，并且可以通过使用原子力显微镜光刻技术形成薄膜图案来确保合适的分辨率。提供了使用原子力显微镜光刻技术的薄膜图案制造方法。步骤是在衬底（10）上形成第一薄膜。步骤是在第一薄膜上形成用于蚀刻掩模的第二薄膜。步骤是通过使用原子力显微镜（13）在第二薄膜的一部分中形成氧化物图案。步骤是通过干蚀刻氧化物图案形成用于暴露第一薄膜的一部分的蚀刻掩模。通过使用蚀刻掩模来干法蚀刻第一薄膜的暴露部分的步骤。

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