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    • 2. 发明授权
    • 외벽에 챔버의 내부를 촬영하는 카메라가 부착된 트랜스퍼챔버
    • 相机胶粘剂转移室
    • KR101395043B1
    • 2014-05-21
    • KR1020120153282
    • 2012-12-26
    • 주식회사 싸이맥스
    • 박세운황상욱
    • H01L21/677
    • H01L21/67196H01L21/67259H01L21/67739
    • The present invention relates to a transfer chamber to which a camera for photographing the inside of the transfer chamber is attached on the outer wall. The transfer chamber provides a moving space through which a wafer of a semiconductor device is transferred; and comprises a view port having a through-hole at the bottom of the transfer chamber; and a photographing part attached to the bottom of the view port to seal the view port and to photograph the inside of the transfer chamber. Therefore, the present invention provides a transfer chamber to which a camera for photographing the inside of the transfer chamber is attached on the outer wall to enable users to accurately grasp the position of a robot arm inside the transfer chamber and the condition of a wafer by minimizing blind spots for critical points and a visual field using a camera attached to the outer wall of the transfer chamber to photograph the inside of the transfer chamber.
    • 本发明涉及一种传送室,用于拍摄传送室内部的照相机安装在外壁上。 传送室提供移动半导体器件的晶片通过其移动的空间; 并且包括在所述传送室的底部具有通孔的视图端口; 以及附接到视口的底部的拍摄部分,以密封观察端口并拍摄传送室的内部。 因此,本发明提供了一种传送室,用于拍摄传送室内部的照相机附接到外壁上,以使得用户能够准确地将传送室内的机器人臂的位置和晶片的状态 最小化关键点的盲点和使用附接到传送室的外壁的照相机拍摄传送室内部的视场。
    • 3. 发明授权
    • 질소가스 분사장치 일체형 웨이퍼 거치대
    • 氮气注入装置互连式水平仪
    • KR101432136B1
    • 2014-08-20
    • KR1020130015594
    • 2013-02-14
    • 주식회사 싸이맥스
    • 박세운황상욱
    • H01L21/673
    • H01L21/68771H01L21/67034H01L21/6875H01L21/68785
    • The present invention relates to a nitrogen gas injection device integrated with a wafer holder and, more specifically, to a wafer holder of a side storage that has an internal space for drying wafers entering from a wafer transfer device using nitrogen gas. The wafer holder comprises a first pipe which has a first tube which is hollow for nitrogen gas supplied from the outside to pass, and multiple nitrogen gas discharge holes between stackers for nitrogen gas supplied to the first tube to be discharged to the outside; and multiple stackers which are separated at regular intervals so that the wafer can be held on the outer circumference surface of the pipe. The nitrogen gas injection device also includes a flange whose one side is coupled to an end of the wafer holder and whose the other side is coupled to a nitrogen gas supplying nozzle through which nitrogen gas is supplied from the outside.
    • 本发明涉及一种与晶片保持器集成的氮气注入装置,更具体地说,涉及一种具有用于干燥从使用氮气的晶片转移装置进入的晶片的内部空间的侧面存储器的晶片保持器。 晶片保持器包括:第一管,其具有从外部供给的氮气中空的第一管,并且供给到第一管的氮气的堆积器之间的多个氮气排出孔被排出到外部; 以及以规则间隔分开的多个堆垛机,使得晶片能够保持在管的外周表面上。 氮气注入装置还包括一个凸缘,其一侧连接到晶片保持器的端部,另一侧与氮气供应喷嘴相连,氮气从外部供给氮气。