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    • 7. 发明公开
    • 균일한 온도 분포를 가지는 진공 디가스 챔버 및 카세트
    • 真空室和均匀温度分布的CASSETTE
    • KR1020140081232A
    • 2014-07-01
    • KR1020120150778
    • 2012-12-21
    • 삼성전기주식회사
    • 김윤수한성김진구권영도
    • H01L21/673
    • H01L21/673H01L21/67017
    • Disclosed are a vacuum degas chamber and a cassette having uniform temperature distribution. The cassette includes a top frame and a bottom frame which are separately arranged in a vertical direction; guide frames which are arranged to face each other between both end parts of the top frame and the bottom frame and in which multiple guide slots guiding the outer circumference of a substrate are separately arranged corresponding to each other; and a docking pipe installed on the bottom center of the bottom frame to be docked on a cassette holder and receiving heat from the cassette holder. Therefore, the cassette has an effect of improving the uniformity of the inner temperature of the cassette by conducting the heat to the cassette itself as a heat block is installed on the cassette holder.
    • 公开了一种真空脱气室和具有均匀温度分布的盒。 盒子包括在垂直方向上分开设置的顶部框架和底部框架; 在顶框架的两端部和底框架的两端部彼此相对配置的引导框架,其中引导基板的外周的多个引导槽彼此分开布置; 以及安装在底架的底部中心上以对接在盒座上并从盒座承受热量的对接管。 因此,盒式磁带具有通过在盒式磁带架上安装加热块而将热传导到磁带盒本身来提高磁带盒内部温度的均匀性的效果。
    • 8. 发明公开
    • 인쇄회로기판의 제조에 있어서의 시드층의 제거방법 및 그를 이용하여 제조된 인쇄회로기판
    • 印刷电路板制造工艺中剥离层的方法和使用该方法制造的印刷电路板
    • KR1020140038126A
    • 2014-03-28
    • KR1020120104449
    • 2012-09-20
    • 삼성전기주식회사
    • 한성김윤수하경무오경섭심경숙정두성
    • H05K3/10H05K3/06H05K3/00
    • H05K3/06H05K1/02H05K3/027H05K3/108H05K2203/087H05K2203/107Y10T29/49156H05K3/0023H05K3/0026H05K3/064
    • The present invention relates to a method of removing a seed layer in a printed circuit board manufacturing process. The method of removing a seed layer in a printed circuit board manufacturing process according to the present invention includes the steps of: forming a photoresist layer on a printed circuit board in which a seed layer is formed on a surface thereof; removing the photoresist layer in a predetermined shape; forming a plating layer for a circuit in the predetermined pattern in which the photoresist layer is formed; forming corrosion layers on surfaces of the seed layer and the plating layer by bringing the board from which the seed layer is exposed in a reactor filled with a gas into a chemical reaction; and removing the seed layer by projecting a laser beam to the corrosion layers to remove the corrosion layers. According to the present invention, laser ablation as a dry etching method instead of a conventional wet etching method is employed when a copper seed layer is removed, a precise wire pattern can be obtained even with low energy by causing a chemical reaction by gas to produce a chloride corrosion layer on a seed layer and performing laser ablation, and damage to a copper plating layer can be prevented. [Reference numerals] (AA) Start; (BB) End; (S101) Form a photoresist on a printed circuit board in which a seed layer is formed on a surface thereof; (S102) Remove the photoresist layer in a predetermined pattern; (S103) Form a circuit plating layer in the predetermined pattern from which the photoresist layer is removed; (S104) Expose the seed layer by removing the photoresist layer around the plating layer; (S105) Form Chloride corrosion layers on surfaces of the seed layer and the plating layer by bringing the board from which the seed layer is exposed into a chemical reaction in a reactor filled with a chloride (Cl2) gas; (S106) Remove the seed layer by projecting a laser beam to the chloride corrosion layer and removing the chloride corrosion layer
    • 本发明涉及一种在印刷电路板制造工艺中去除种子层的方法。 在根据本发明的印刷电路板制造方法中去除种子层的方法包括以下步骤:在其表面上形成种子层的印刷电路板上形成光致抗蚀剂层; 以预定形状去除光致抗蚀剂层; 在其中形成光致抗蚀剂层的预定图案中形成用于电路的镀层; 通过使填充有气体的反应器中暴露于种子层的基板进入化学反应,在种子层和镀层的表面上形成腐蚀层; 并通过将激光束投射到腐蚀层去除腐蚀层来去除种子层。 根据本发明,当去除铜籽晶层时,采用干法蚀刻法代替传统的湿式蚀刻方法的激光烧蚀法,即使通过气体产生化学反应也能以低能量获得精确的线图 可以防止种子层上的氯化物腐蚀层进行激光烧蚀,并且可以防止铜镀层的损伤。 (附图标记)(AA)开始; (BB)结束; (S101)在其表面上形成种子层的印刷电路板上形成光致抗蚀剂; (S102)以预定图案去除光致抗蚀剂层; (S103)形成除去光致抗蚀剂层的预定图案的电路镀层; (S104)通过除去镀层周围的光致抗蚀剂层来曝光种子层; (S105)通过将填充有氯化物(Cl2)气体的反应器中的种子层暴露于化学反应的基板,使晶种层和镀层的表面上的氯化物腐蚀层成形; (S106)通过将激光束投射到氯化物腐蚀层并除去氯化物腐蚀层来去除种子层