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    • 6. 发明授权
    • 반도체 패키지 구조 및 이의 제조 방법
    • 半导体封装的制造方法和结构
    • KR101167815B1
    • 2012-07-25
    • KR1020110062442
    • 2011-06-27
    • 삼성전기주식회사
    • 테루야키시모지조성민이동준김치성방정윤김정석전동주
    • H01L23/48H01L21/60
    • H01L24/03H01L24/05H01L2224/0401H01L2224/14H01L2224/1411H01L2924/00012
    • PURPOSE: A semiconductor package structure and a manufacturing method thereof are provided to increase heat resisting reliability while obtaining connection reliability by successively forming an aluminum pad, a bump, a nickel film layer, a palladium thin film layer, and a gold plating layer on the upper surface of a substrate. CONSTITUTION: An aluminum pad(40) is formed on the upper surface of a silicon substrate(20). A plurality of bumps(50) is formed on the aluminum pad. A nickel film layer(60) is formed on the aluminum pad including a part of a bump. A palladium thin film layer(70) is formed on the nickel film layer. The thickness of the palladium thin film layer is maximum 0.3micrimeters. A gold plating layer(80) is formed on the palladium thin film layer. A solder ball is connected to the upper side of the gold plating layer. The thickness of the gold plating layer is maximum 0.5micrimeters.
    • 目的:提供半导体封装结构及其制造方法,以通过在其上连续形成铝焊盘,凸块,镍膜层,钯薄膜层和镀金层来获得连接可靠性,从而提高耐热可靠性 衬底的上表面。 构成:在硅衬底(20)的上表面上形成铝焊盘(40)。 在铝垫上形成多个凸块(50)。 在包括凸块的一部分的铝垫上形成镍膜层(60)。 在镍膜层上形成钯薄膜层(70)。 钯薄膜层的厚度最大为0.3微米。 在钯薄膜层上形成镀金层(80)。 焊锡球连接到镀金层的上侧。 镀金层的厚度最大为0.5微米。
    • 10. 发明公开
    • 범프의 전단 강도 평가 장치
    • 评估剪切强度的设备
    • KR1020110022886A
    • 2011-03-08
    • KR1020090080380
    • 2009-08-28
    • 삼성전기주식회사
    • 이영관민병승황수형방정윤김치성이동준
    • G01N3/24G01N3/02
    • G01N3/24G01N3/02G01N2203/0025G01N2203/0039
    • PURPOSE: A device for evaluating the shear strength of a bump is provided to measure the coupling reliability of a bump constituting C4 of a semiconductor, a CPU, and a chip set. CONSTITUTION: A device for evaluating the shear strength of a bump comprises a plate(101), an elastic member(105), a transmission member(111), and a stopper(110). The plate fixes a substrate(106) and a test member(108) coupled with a bump(107). The plate comprises an insertion groove(109) opened to one side. The elastic member generates the movement of a hammer with external force. The transmission member is placed in the insertion groove to be movable. The transmission member transfers the elastic force to the test member.
    • 目的:提供一种用于评估凸块的剪切强度的装置,以测量构成半导体,CPU和芯片组C4的凸块的耦合可靠性。 构成:用于评估凸块的剪切强度的装置包括板(101),弹性构件(105),传动构件(111)和止挡件(110)。 板固定基板(106)和与凸块(107)连接的测试构件(108)。 板包括向一侧开口的插入槽(109)。 弹性构件产生具有外力的锤的运动。 传动构件放置在插入槽中以便可移动。 传动部件将弹性力传递给测试部件。