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    • 6. 发明公开
    • 강화 유리 기판 가공용 마스크 패턴 및 강화 유리 기판 가공 방법
    • 用于处理温和玻璃基板的掩模图案和加工温和玻璃基板的方法
    • KR1020120092748A
    • 2012-08-22
    • KR1020110000440
    • 2011-01-04
    • (주)화이트스톤
    • 정윤교윤인수이용수김태정노동수
    • C03C17/34C03C15/00C03C19/00H01L23/15
    • C03C17/23C03C15/00C09K13/08
    • PURPOSE: A mask pattern for processing tempered glass substrate and a processing method of tempered glass substrates are provided to stably process the tempered glass substrate without damaging the glass. CONSTITUTION: A mask pattern for processing tempered glass substrate(100) comprises a first patter(110) and a second pattern(120). The first pattern is partly included in the surface of the tempered glass substrate and prevents the tempered glass substrate from being etched by an etching solution. The second pattern is arranged on the first pattern and prevents the tempered glass substrate from being damaged from impact of an abrasive. A mask pattern for processing tempered glass substrate processing method comprises the following steps: forming a mask pattern on the surface of the tempered glass substrate; cutting the exposed part by the mask pattern using a sand blast processing; forming a pre-cut substrate; forming a cut substrate by etching the cut region of the pre-cut substrate; and removing the mask pattern from the cut board.
    • 目的:提供用于加工钢化玻璃基板的掩模图案和强化玻璃基板的加工方法,以在不损坏玻璃的情况下稳定地处理钢化玻璃基板。 构成:用于加工钢化玻璃基板(100)的掩模图案包括第一图案(110)和第二图案(120)。 第一图案部分地包括在钢化玻璃基板的表面中,并且防止钢化玻璃基板被蚀刻溶液蚀刻。 第二图案布置在第一图案上,并且防止钢化玻璃基板被磨料的冲击损坏。 用于加工钢化玻璃基板处理方法的掩模图案包括以下步骤:在钢化玻璃基板的表面上形成掩模图案; 使用喷砂处理通过掩模图案切割曝光部分; 形成预切基板; 通过蚀刻预切割基板的切割区域来形成切割基板; 并从切割板移除掩模图案。
    • 8. 发明公开
    • 강화 유리 식각 마스크 및 이를 이용한 터치스크린용 강화 유리 기판의 가공방법
    • 用于温度玻璃的蚀刻掩模和使用它的处理用于触摸屏的温度玻璃基板的方法
    • KR1020130092804A
    • 2013-08-21
    • KR1020120014334
    • 2012-02-13
    • (주)화이트스톤
    • 정윤교윤인수김태정이용수노동수
    • C03C15/00C03C19/00H01L21/30G06F3/041
    • C03C15/00C03C19/00G06F3/041G06F3/044H01L21/30
    • PURPOSE: An etching mask for tempered glass is provided to discharge static electricity generated in a sand blast processing due to the collision of abrasive particles to outside by including a conductive mask pattern and a ground wire. CONSTITUTION: An etching mask for tempered glass (100) comprises a conductive mask pattern (110) and a ground wiring (120). The conductive mask pattern is formed on a tempered glass disk (10) and selectively exposes the etching region of the tempered glass disk. Conductive constructs forming a touch screen are arranged in the tempered glass disk. The ground wiring is connected electrically with the conductive mask pattern. The ground wiring discharges static electricity generated in a sand blast processing to outside by spraying abrasive particles with superhigh speed. A processing method of a reinforced glass substrate for a touch screen comprises following steps. A tempered glass disk is prepared (S110). An etching mask for tempered glass is arranged on the tempered glass disk (S120). Static electricity generated in a sand blast processing due to the collision of abrasive particles is discharged to outside while the tempered glass disk is etched through the sand blast processing (S130).
    • 目的:提供一种用于钢化玻璃的蚀刻掩模,用于通过包括导电掩模图案和接地线来排除由于研磨颗粒与外部的碰撞而在喷砂处理中产生的静电。 构成:钢化玻璃(100)的蚀刻掩模包括导电掩模图案(110)和接地布线(120)。 导电掩模图案形成在钢化玻璃盘(10)上并选择性地暴露钢化玻璃盘的蚀刻区域。 形成触摸屏的导电结构布置在钢化玻璃盘中。 接地布线与导电掩模图案电连接。 地面布线通过以超高速度喷涂磨料颗粒将喷沙处理中产生的静电放电到外部。 一种用于触摸屏的强化玻璃基板的处理方法包括以下步骤。 制备钢化玻璃盘(S110)。 在钢化玻璃盘上配置用于钢化玻璃的蚀刻掩模(S120)。 在通过砂喷处理对钢化玻璃盘进行蚀刻时,由于磨粒的碰撞而在喷砂加工中产生的静电被排出到外部(S130)。
    • 9. 发明公开
    • 터치스크린용 강화 유리 기판의 가공방법
    • 处理温和玻璃基板的触摸屏的方法
    • KR1020130092713A
    • 2013-08-21
    • KR1020120014156
    • 2012-02-13
    • (주)화이트스톤
    • 정윤교윤인수김태정이용수노동수
    • C03C15/00C03B33/02C03C17/06G06F3/041
    • Y02P40/57C03C15/00C03B33/0222C03C17/06G06F3/0412
    • PURPOSE: A method of processing a tempered glass substrate for a touch screen is provided to improve the side strength and flexural strength of a tempered glass substrate for a touch screen by removing micro-cracks and protrusions formed in a cross section of the tempered glass substrate through a chemical etching process. CONSTITUTION: A method of processing a tempered glass substrate for a touch screen comprises following steps. A tempered glass substrate which is sectionalized into unit cell areas is prepared (S110). Multiple tempered glass substrates for a touch screen are formed by cutting the sectionalized tempered glass substrate into unit cell areas through a physical cutting process (S130). Micro-cracks formed in a cross section of the tempered glass substrates are removed through a chemical etching process (S140). In the sectionalized tempered glass substrate, Conductive constructs composing a touch screen are formed in each unit cell area. The chemical etching process includes a following step. The cross section in which micro-cracks exist is etched to a depth of 100-700 μm by using a tempered glass etchant. [Reference numerals] (AA) Start; (BB) End; (S110) Tempered glass substrate which is sectionalized into unit cell areas is prepared; (S120) Mask patterns are formed on a tempered glass substrate; (S130) Multiple tempered glass substrates are cut into unit cell areas; (S140) Cut surfaces of the tempered glass substrates are chemically etched; (S150) Tempered glass substrate for a touch screen is formed by removing mask patterns
    • 目的:提供一种处理用于触摸屏的钢化玻璃基板的方法,以通过去除在钢化玻璃基板的横截面中形成的微裂纹和突起来改善用于触摸屏的强化玻璃基板的侧面强度和弯曲强度 通过化学蚀刻工艺。 构成:处理用于触摸屏的钢化玻璃基板的方法包括以下步骤。 制备分为单元区域的钢化玻璃基板(S110)。 通过物理切割工艺将分层钢化玻璃基板切割成单元格区域,形成用于触摸屏的多个钢化玻璃基板(S130)。 在钢化玻璃基板的横截面上形成的微裂纹通过化学蚀刻工艺去除(S140)。 在分段强化玻璃基板中,构成触摸屏的导电结构形成在每个单元电池区域中。 化学蚀刻工艺包括以下步骤。 通过使用强化玻璃蚀刻剂将存在微裂纹的横截面蚀刻到100-700μm的深度。 (附图标记)(AA)开始; (BB)结束; (S110)制备分段成单位区域的钢化玻璃基板; (S120)在钢化玻璃基板上形成掩模图案; (S130)将多个钢化玻璃基板切割成单元电池区域; (S140)钢化玻璃基板的切割表面进行化学蚀刻; (S150)通过去除掩模图案形成用于触摸屏的钢化玻璃基板