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    • 2. 发明公开
    • 파쇄체 및 이를 구비하는 연습용 탄
    • 分散组装和目标实施项目
    • KR1020130085661A
    • 2013-07-30
    • KR1020120006585
    • 2012-01-20
    • (주)화이트스톤주식회사 풍산
    • 노동수김태정이용수최시남박창규진희식양성진박동준김정립
    • F42B8/14F42B8/16
    • F42B8/14F42B30/08
    • PURPOSE: A fragmentation assembly and a target-practice projectile with the same are provided to fragment a filler to be fragmented to small pieces and to scatter the fragments only within short distances because the internal pressure and impact energy of the filler to be fragmented are maximized over the fragmentation threshold of the filler to be fragmented. CONSTITUTION: A fragmentation assembly (10) comprises a filler (12) to be fragmented and a plastic pressure-resistant case (14). The filler to be fragmented is applied to a projectile body flying by the explosive force of a propellant charge and is fragmented by impact energy generated when the projectile body collides with a target. The plastic pressure-resistant case increases the internal pressure of the filler to be fragmented while concentrating the impact energy, generated when the projectile body collides with the target, on the inside of the filler to be fragmented. Accordingly, the filler is fragmented to smaller pieces.
    • 目的:提供一种分裂组件和具有相同功能的目标实践弹丸,以将填料碎裂成小块,并将碎片仅在短距离内散射,因为要分段的填料的内部压力和冲击能量最大化 超过要分段的填料的碎裂阈值。 构成:破碎组件(10)包括待碎裂的填料(12)和塑料耐压外壳(14)。 要分散的填料被应用于由推进剂装药的爆炸力飞行的射弹体,并且当射弹体与目标物碰撞时产生的冲击能量被分段。 塑料耐压外壳会增加填料的内部压力,同时将发射体碰撞时产生的冲击能量集中在要分段的填料内部。 因此,填料被分段成小块。
    • 3. 发明公开
    • 강화 유리 기판 가공용 마스크 패턴 및 강화 유리 기판 가공 방법
    • 用于处理温和玻璃基板的掩模图案和加工温和玻璃基板的方法
    • KR1020120092748A
    • 2012-08-22
    • KR1020110000440
    • 2011-01-04
    • (주)화이트스톤
    • 정윤교윤인수이용수김태정노동수
    • C03C17/34C03C15/00C03C19/00H01L23/15
    • C03C17/23C03C15/00C09K13/08
    • PURPOSE: A mask pattern for processing tempered glass substrate and a processing method of tempered glass substrates are provided to stably process the tempered glass substrate without damaging the glass. CONSTITUTION: A mask pattern for processing tempered glass substrate(100) comprises a first patter(110) and a second pattern(120). The first pattern is partly included in the surface of the tempered glass substrate and prevents the tempered glass substrate from being etched by an etching solution. The second pattern is arranged on the first pattern and prevents the tempered glass substrate from being damaged from impact of an abrasive. A mask pattern for processing tempered glass substrate processing method comprises the following steps: forming a mask pattern on the surface of the tempered glass substrate; cutting the exposed part by the mask pattern using a sand blast processing; forming a pre-cut substrate; forming a cut substrate by etching the cut region of the pre-cut substrate; and removing the mask pattern from the cut board.
    • 目的:提供用于加工钢化玻璃基板的掩模图案和强化玻璃基板的加工方法,以在不损坏玻璃的情况下稳定地处理钢化玻璃基板。 构成:用于加工钢化玻璃基板(100)的掩模图案包括第一图案(110)和第二图案(120)。 第一图案部分地包括在钢化玻璃基板的表面中,并且防止钢化玻璃基板被蚀刻溶液蚀刻。 第二图案布置在第一图案上,并且防止钢化玻璃基板被磨料的冲击损坏。 用于加工钢化玻璃基板处理方法的掩模图案包括以下步骤:在钢化玻璃基板的表面上形成掩模图案; 使用喷砂处理通过掩模图案切割曝光部分; 形成预切基板; 通过蚀刻预切割基板的切割区域来形成切割基板; 并从切割板移除掩模图案。
    • 9. 发明公开
    • 파편 발생용 발사체
    • PROJECTILE生成的碎片
    • KR1020140040959A
    • 2014-04-04
    • KR1020120107678
    • 2012-09-27
    • (주)화이트스톤
    • 노동수이용수최시남홍찬호
    • F42B12/22F42B12/32
    • F42B12/22F42B12/74
    • A projectile includes a shape deformation unit, a fragment generation unit, and a reaction unit. The shape deformation unit includes first density so that the shape is transformed due to pressure. The fragment generation unit accommodates the shape deformation unit inside and is scattered as a plurality of fragments due to expansion pressure generated by the deformation of the shape deformation unit while including second density which is higher than the first density. The reaction unit is located to the inside of the fragment generation unit to support the shape deformation unit while including third density which is higher than the second density in order to react the pressure generated when colliding to a target towards the shape deformation unit again.
    • 射弹包括形状变形单元,片段生成单元和反应单元。 形状变形单元包括第一密度,使得形状由于压力而变形。 片段生成单元将形状变形单元容纳在内部,并且由于形状变形单元的变形而产生的膨胀压力而散布为多个碎片,同时包括高于第一密度的第二密度。 反应单元位于碎片生成单元的内部,以支撑形状变形单元,同时包括高于第二密度的第三密度,以便将与冲击目标时产生的压力再次反映到形状变形单元。