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    • 2. 发明公开
    • 방사선 검출기
    • 辐射探测器
    • KR1020130018918A
    • 2013-02-25
    • KR1020127032134
    • 2011-04-22
    • 가부시키가이샤 시마쓰세사쿠쇼
    • 오히준이치사토마사노부후루타마사후미
    • G01T1/20G01T1/161G01T1/17
    • G01T1/1647
    • 형광의 잔광의 영향을 받지 않고 γ 선의 입사 위치를 정확히 특정하도록 보정할 수 있는 방사선 검출기를 제공한다. 본 발명에 따르면, 경시적으로 일정한 샘플링 간격 (Sa) 마다 광검출기 (3) 가 출력하는 형광의 강도를 나타내는 강도 데이터 (S) 를 취득하는 강도 데이터 취득부 (11) 와, 형광의 잔광에 기인하는 강도 데이터 (S) 의 변동 보정에 사용하는 보정값 (A) 을 취득하는 보정값 취득부 (14) 를 구비하고, 적산부 (15) 는 보정값 (A) 을 사용하여 강도 데이터 (S) 의 보정을 실시하도록 하고 있다. 이와 같이 하면 형광의 잔광 성분에 영향을 받지 않고 형광의 위치를 정확히 특정할 수 있다.
    • 提供一种能够校正以精确确定λ射线入射位置而不受荧光余辉影响的放射线检测器。 根据本发明,提供了一个强度数据获取部分(11),用于以恒定采样间隔(Sa)获取指示从光电检测器(3)输出的荧光强度的强度数据(S) 以及校正值获取部分14,其获取用于要进行强度数据S的校正的强度数据S的偏差校正的校正值A.积分部分15使用校正值A乘以强度数据S, 进行修正。 以这种方式,荧光的位置可以精确地指定而不受荧光的余辉成分的影响。
    • 3. 发明公开
    • 고체촬상소자 및 그 구동방법
    • 固态成像元件及其驱动方法
    • KR1020100039884A
    • 2010-04-16
    • KR1020107003061
    • 2008-09-04
    • 고쿠리츠다이가쿠호진 도호쿠다이가쿠가부시키가이샤 시마쓰세사쿠쇼
    • 스가와시게토시곤도야스시도미나가히데키
    • H04N5/343
    • H04N5/35572H04N5/3559H04N5/3575H04N5/3742H04N5/37452H04N5/378
    • An independent pixel output line (14) is arranged for each of pixels (10) arranged two-dimensionally in a pixel region (2a) and a plurality of storage units are connected to the respective pixel output lines (14). In a continuous read-out mode, all the pixels simultaneously execute photo charge accumulation and the storage units simultaneously capture signals in the storage units from the respective pixels (10) via the pixel output lines (14), after which the signals held in the respective storage units are successively read out and outputted. On the other hand, in a burst read-out mode, the process that all the pixels (10) simultaneously execute photo charge accumulation and the storage units simultaneously capture signals from the respective pixels (10) via the pixel output lines (14) is successively executed on the storage units so as to hold signals of a plurality of frames. Upon reception of an imaging stop instruction, capturing of a new signal is stopped and the image signals of the frames held in the storage units at the moment are successively read out. Thus, it is possible to perform a high-speed imaging although the number of frames is limited or a reduced-speed imaging without limiting the number of frames.
    • 为像素区域(2a)中二维布置的每个像素(10)布置独立的像素输出线(14),并且多个存储单元连接到各个像素输出线(14)。 在连续读出模式中,所有像素同时执行光电荷累积,并且存储单元经由像素输出线(14)同时从各个像素(10)捕获存储单元中的信号,之后保持在 相应地读出并输出各个存储单元。 另一方面,在突发读出模式中,所有像素(10)同时执行光电荷累积和存储单元同时从像素(10)经由像素输出线(14)捕获信号的处理是 在存储单元上依次执行以保持多个帧的信号。 在接收到成像停止指令时,停止新信号的捕获,并且连续地读出保持在该时刻的存储单元中的帧的图像信号。 因此,尽管帧的数量被限制,但是可以在不限制帧数的情况下执行低速成像。
    • 4. 发明公开
    • 고체촬상소자 및 촬영장치
    • 固态成像元件和成像装置
    • KR1020100038445A
    • 2010-04-14
    • KR1020107003062
    • 2008-09-04
    • 고쿠리츠다이가쿠호진 도호쿠다이가쿠가부시키가이샤 시마쓰세사쿠쇼
    • 스가와시게토시곤도야스시도미나가히데키
    • H04N5/351
    • H04N5/378H04N5/3415H04N5/374
    • An independent pixel output line (14) is arranged for each of pixels arrange in a two-dimensional array in a pixel region so that pixel signals can be successively written into storage units (22) via the pixel output lines (14). When pixel signals of a plurality of frames are held in the storage units (22), pixel signals corresponding to two arbitrary frames are read out from the storage units (22) and held in sample hold circuit units (61, 62), respectively. A difference between the pixel signals is obtained. Difference signals corresponding to a predetermined image range are accumulated and compared to a threshold value. When the accumulated value exceeds the threshold value, it is considered that an object has changed and a pulse generation circuit (66) generates a trigger signal. According to the trigger signal, control may be performed to stop the imaging. Thus, it is possible to perform an accurate high-speed imaging before or after occurrence of a target phenomenon.
    • 为像素区域中的二维阵列中的每个像素布置独立的像素输出线(14),使得像素信号可以经由像素输出线(14)被连续地写入存储单元(22)。 当多个帧的像素信号被保持在存储单元(22)中时,分别从存储单元(22)读出对应于两个任意帧的像素信号并保持在采样保持电路单元(61,62)中。 获得像素信号之间的差异。 对应于预定图像范围的差分信号被累加并与阈值进行比较。 当累积值超过阈值时,认为物体已经改变,并且脉冲发生电路(66)产生触发信号。 根据触发信号,可以执行控制以停止成像。 因此,可以在目标现象发生之前或之后执行准确的高速成像。
    • 6. 发明公开
    • 질량분석장치
    • 质谱仪
    • KR1020080070013A
    • 2008-07-29
    • KR1020087011980
    • 2006-06-27
    • 가부시키가이샤 시마쓰세사쿠쇼
    • 우메무라요시카츠
    • H01J49/26G01N27/62
    • H01J49/004H01J49/0031
    • An analyzer previously inputs, from an input part (25), the mass of a fragment removed by the first cleaving, as a precursor ion selection standard in the second cleaving, together with other analysis conditions. Upon the start of an automatic analysis, a control unit (21) successively carries out an MS1 analysis, an MS2 analysis, and an MS3 analysis. During this process, a data processing part (23) determines the valence of each ion species corresponding to peaks in a mass spectrum obtained in the MS1 analysis. After the completion of the MS2 analysis, a search is made for an ion species satisfying the selection standard among the ion species corresponding to peaks in a mass spectrum obtained by the MS2 analysis by taking into consideration the above determined valence. The ion species is selected as a precursor ion in the second cleaving in the MS3 analysis. Thus, an improved analysis efficiency and the provision of highly accurate information about chemical structures can be realized by automatically selecting a precursor ion to be selected and cleaved in each stage of MSn analysis according to the mass of a fragment removed by the cleaving of the preceding stage, regardless of the valence of the object ion.
    • 分析仪先前从输入部分(25)输入通过第一次切割除去的片段的质量作为第二次切割中的前体离子选择标准以及其它分析条件。 在自动分析开始时,控制单元(21)依次执行MS1分析,MS2分析和MS3分析。 在该过程中,数据处理部分(23)确定对应于在MS1分析中获得的质谱中的峰的每个离子种类的价数。 完成MS2分析后,通过考虑上述确定的价态,搜索通过MS2分析获得的质谱中与峰对应的离子种类中满足选择标准的离子种类。 在MS3分析中的第二次裂解中,选择离子种类作为前体离子。 因此,通过在MSn分析的每个阶段中自动选择要选择和切割的前体离子,根据通过前述的切割除去的片段的质量,可以实现提高的分析效率和提供关于化学结构的高度准确的信息 阶段,不管物体离子的价态如何。
    • 7. 发明授权
    • 기판 검사 장치
    • 检测基板的装置
    • KR100813868B1
    • 2008-03-17
    • KR1020070066414
    • 2007-07-03
    • 가부시키가이샤 시마쓰세사쿠쇼
    • 오카모토,히데키타나세,준이치로우쿠로다,신-이치
    • G02F1/13
    • G02F1/1309G01R31/302G02F1/1303G02F2001/136254G09G3/006
    • An apparatus for inspecting a substrate is provided to enable a probe frame stocker to be installed in an area in which a rod lock chamber or a main chamber is installed, thereby preventing an increase in the installation area of the probe frame stocker. An apparatus for inspecting a substrate(1) comprises a main chamber(2), a rod lock chamber(3), and a probe frame stocker(4). The main chamber performs the inspection of the substrate in a vacuum. The rod lock chamber performs the input/output of the substrate between a standby side and the rod lock chamber and between the main chamber and the rod lock chamber. The probe frame stocker contacts electrically the substrate to store a probe frame applying an inspection signal. The probe frame stocker is disposed in the upper part of the rod lock chamber.
    • 提供了一种用于检查基板的装置,以使探针框架储料器能够安装在安装有杆锁定室或主室的区域中,从而防止了探针框架储料器的安装面积的增加。 用于检查基板(1)的装置包括主室(2),杆锁定室(3)和探针框架储料器(4)。 主室在真空中进行基板的检查。 杆锁定室执行待机侧和杆锁定室之间以及主室和杆锁定室之间的衬底的输入/输出。 探针架储存器电接触基板以存储施加检查信号的探针框架。 探针框架储料器设置在杆锁定室的上部。
    • 8. 发明公开
    • 밸브 기구 및 유로 기판
    • 阀门结构和通风基板
    • KR1020070106916A
    • 2007-11-06
    • KR1020060126841
    • 2006-12-13
    • 가부시키가이샤 시마쓰세사쿠쇼
    • 카지,토루
    • F16K31/02B81B3/00
    • F15C5/00F16K99/0001F16K99/0011F16K99/0026F16K99/0046Y10T137/86879
    • A valve structure and a passage substrate are provided to integrate a plurality of fluid passages with the valve structure to perform high integration of the passage substrate. A passage substrate includes a fluid passage(16). The passage substrate is formed by overlapping a PDMS substrate(14) on a glass substrate(12). A spherical valve chamber(18) is formed at the fluid passage. The valve chamber is formed by the PDMS substrate. The PDMS substrate corresponding to the valve chamber has a smaller thickness than other parts thereof. The small thickness part of the PDMS substrate forms one side wall(22) of the valve chamber. The one side wall can be resiliently bent toward the glass substrate. A magnetic body(20) is buried in a portion of the PDMS substrate for constituting the one side wall.
    • 提供阀结构和通道基板以将多个流体通道与阀结构集成,以实现通道基板的高度集成。 通道基底包括流体通道(16)。 通道基板通过在玻璃基板(12)上重叠PDMS基板(14)而形成。 在流体通道处形成球形阀室(18)。 阀室由PDMS基板形成。 对应于阀室的PDMS基板的厚度比其它部分的厚度小。 PDMS基板的小厚度部分形成阀室的一个侧壁(22)。 单侧壁可以朝向玻璃基板弹性弯曲。 磁性体(20)被埋在PDMS衬底的一部分中,用于构成一个侧壁。