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81. 发明公开

KR1020030028401A 타깃 장치 无效
标题翻译：真空涂装装置
公开(公告)号：KR1020030028401A
公开(公告)日：2003-04-08
申请号：KR1020020058363
申请日：2002-09-26
申请人： 폰 아르데네 게엠베하
发明人： 에르프캄,볼프강 , 헤흐트,한스-크리스티안 , 호프만,미하엘 , 밀데,팔크
IPC分类号： C23C14/34
CPC分类号： C23C14/564 , C23C14/562 , C23C14/568
摘要： PURPOSE: A vacuum coating apparatus is provided to reduce maintenance cost for cleaning magnetron chamber walls, and to separate a gas in magnetron chambers from a process chamber. CONSTITUTION: The apparatus comprises a process chamber(1); a cooling roller(3) for transporting the band of material within the process chamber, the cooling roller having an axis for rotation and a peripheral surface; at least two magnetron chambers(7) arranged adjacent the peripheral surface within the process chamber, the magnetron chambers each including a magnetron sputter source(4) and surrounding walls(5) having flow resistance seals acting with the peripheral surface and forming a closed magnetron chamber with the peripheral surface; and vacuum vents for drawing a vacuum in each of the magnetron chambers and the process chamber such that a pressure difference between each magnetron chamber and the process chamber is adjustable.
摘要翻译：目的：提供真空镀膜装置，以减少清洗磁控管腔壁的维护成本，并将磁控管腔中的气体与处理室分开。构成：该装置包括处理室（1）; 用于在处理室内传送材料带的冷却辊（3），所述冷却辊具有用于旋转的轴线和周边表面; 至少两个磁控管室（7）邻近处理室内的周边表面设置，每个磁控管腔室均包括磁控溅射源（4）和围绕壁（5），其具有与周边表面作用的流动阻力密封并形成闭合磁控管室与外围表面; 以及用于在每个磁控管室和处理室中抽真空的真空通风口，使得每个磁控管室和处理室之间的压力差是可调节的。

82. 发明公开

KR1020020095081A 유기 전계발광 표시장치를 제조하는 장치 및 방법 无效
标题翻译：成膜装置和成膜方法
公开(公告)号：KR1020020095081A
公开(公告)日：2002-12-20
申请号：KR1020020029287
申请日：2002-05-27
申请人： 소니 주식회사
发明人： 모리다카오 , 야마구찌마사루 , 가미야마이사오
IPC分类号： H05B33/10
CPC分类号： H01L51/56 , C23C14/022 , C23C14/042 , C23C14/12 , C23C14/568 , H01L27/12 , H01L27/3211 , H01L27/3244 , H01L27/3295 , H01L51/0008
摘要： PURPOSE: To provide a film-forming device and a film-forming method with which a tact time of an organic layer forming process for an organic EL display equipment can be shortened and useless consumption of organic materials for formation of an organic layer can be curbed. CONSTITUTION: The device is composed of an alignment room 53 where masks for film-forming with openings corresponding to a specified pattern are aligned with a substrate on which is formed an anode electrode layer and equipped with an alignment mechanism coupling the masks for film-forming with the substrate in free detachment, of vacuum processing rooms 62, 63, 64 where a plurality of organic material layers are sequentially formed on the substrate coupled with the masks for film-forming, and of a conveyance robot 45 which conveys the masks for film-forming and the substrate in a coupled state by the alignment mechanism to one of the vacuum processing rooms 62, 63, 64 and conveys them sequentially among the vacuum processing rooms 62, 63, 64.
摘要翻译：目的：提供可以缩短有机EL显示设备的有机层形成工艺的触控时间并且可以抑制用于形成有机层的有机材料的无用消耗的成膜装置和成膜方法。构成：该装置由对准室53构成，其中用于成膜的用于形成与具体图案对应的开口的掩模与其上形成阳极电极层的基板对齐，并配备有将成膜用掩模其中基板处于自由分离的真空处理室62,63,64中，其中多个有机材料层顺序地形成在与用于成膜的掩模耦合的基板上，以及传送机器人45，其传送用于膜的掩模以及通过对准机构处于耦合状态的基板到真空处理室62,63,64中的一个，并且在真空处理室62,63,64之间依次传送它们。

83. 发明公开

KR1020020084853A 웨이퍼 가공을 위한 클러스터 툴 失效
标题翻译：加工工具加工工具
公开(公告)号：KR1020020084853A
公开(公告)日：2002-11-13
申请号：KR1020010023668
申请日：2001-05-02
申请人： 주성엔지니어링(주) , 배준호 , 코스텍시스템(주)
发明人： 배준호 , 변홍식
IPC分类号： H01L21/00
CPC分类号： H01L21/67196 , C23C14/566 , C23C14/568 , H01L21/67201 , H01L21/67742
摘要： PURPOSE: A cluster tool for processing a wafer is provided to transfer wafers to corresponding modules by reducing an installation area of the cluster tool and simplifying operations of the cluster tool. CONSTITUTION: The first and the second load port(100,102) are used for loading wafers. A front-end system(200) is used for transferring and aligning the loaded wafers and transferring the aligned wafers to the first and the second load lock chamber(300,302). The front-end system(200) has an ATM(ATMosphere) robot(202) for transferring the loaded wafers and an ATM aligner(204) for aligning the transferred wafers. The first and the second load lock chamber(300,302) have the first and the second vacuum transfer device(304,306), respectively. The first and the second vacuum transfer device(304,306) are used for transferring the wafers to the first and the second process module(500,502). The first and the second slot valve(400,402) are located between the first and the second load lock chamber(300,302) and the first and the second process module(500,502).
摘要翻译：目的：提供用于处理晶片的集群工具，通过减少集群工具的安装面积并简化集群工具的操作，将晶片转移到相应的模块。构成：第一个和第二个装载端口（100,102）用于装载晶片。前端系统（200）用于传送和对准加载的晶片并将对准的晶片传送到第一和第二加载锁定室（300,302）。前端系统（200）具有用于传送加载的晶片的ATM（空气环境）机器人（202）和用于对准所转移的晶片的ATM对准器（204）。第一和第二装载锁定室（300,302）分别具有第一和第二真空传送装置（304,306）。第一和第二真空传送装置（304,306）用于将晶片传送到第一和第二处理模块（500,502）。第一和第二狭槽阀（400,402）位于第一和第二负载锁定室（300,302）和第一和第二处理模块（500,502）之间。

84. 发明公开

KR1020020064215A 증착 장치 및 증착 방법 无效
标题翻译：沉积装置和沉积方法
公开(公告)号：KR1020020064215A
公开(公告)日：2002-08-07
申请号：KR1020020005797
申请日：2002-02-01
申请人： 가부시키가이샤 한도오따이 에네루기 켄큐쇼
发明人： 야마자키순페이 , 세오사토시 , 미즈카미마유미
IPC分类号： H05B33/10
CPC分类号： H01L51/5203 , B05D1/60 , C23C14/12 , C23C14/564 , C23C14/568 , H01L33/08 , H01L33/36 , H01L51/001 , H01L51/5008 , H01L51/5012 , H01L51/5036 , H01L51/5068 , H01L2924/0002 , H05B33/02 , H05B33/12 , H01L2924/00
摘要： PURPOSE: A deposition apparatus and a deposition method are provided to achieve improved carrier inject ability between the organic layers, thus enabling formation of the organic luminescent elements capable of reducing drive voltages and offering longer lifetime. CONSTITUTION: A deposition apparatus comprises a plurality of deposition chambers(210), and a plurality of evaporation sources(203a to 203c) in the deposition chambers. Each of the plurality of evaporation sources includes one or more organic compounds(204a to 204c) having a different function, and the organic compounds having the different functions are continuously deposited by a vacuum evaporation from the plurality of evaporation sources.
摘要翻译：目的：提供沉积设备和沉积方法以实现有机层之间改进的载流子注入能力，从而能够形成能够降低驱动电压并提供更长寿命的有机发光元件。构成：沉积设备包括多个沉积室（210）和沉积室中的多个蒸发源（203a至203c）。多个蒸发源中的每一个包括具有不同功能的一种或多种有机化合物（204a至204c），并且具有不同功能的有机化合物通过真空蒸发从多个蒸发源连续沉积。

85. 发明公开

KR1020010051426A 연속 증착 시스템 失效
标题翻译：基板加工系统
公开(公告)号：KR1020010051426A
公开(公告)日：2001-06-25
申请号：KR1020000065134
申请日：2000-11-03
申请人： 어플라이드 머티어리얼스, 인코포레이티드
发明人： 테프만,아비
IPC分类号： H01L21/20
CPC分类号： H01L21/67161 , C23C14/568 , H01L21/67167 , H01L21/67173 , H01L21/67184 , H01L21/67236 , H01L21/67706 , H01L21/6776
摘要： PURPOSE: A substrate processing system is provided to process a substrate, in particular a relatively flat glass substrate. CONSTITUTION: The substrate processing system has a carrier(122) which is mainly arranged generally at least in one processing chamber(96); and at least one of shuttles(118, 120) for conveying substrates(114, 115, 116) between the processing chamber(96) and load lock chambers(92, 94). A plurality of processing chambers, load lock chambers, and other chambers are joined to each other, so that a series modular chamber for processing the substrate can be formed. Preferably, the carrier is only exposed to a processing environment, namely the carrier does not reciprocate within a non-processing chamber. Thus, during a consecutive sequential processing of the substrate, a thermal circulation of the carrier is decreased. The carrier is reversibly moved within the processing chamber along track(123, 125). A plurality of processing states can be generated within the same processing chamber by a plurality of processing areas isolated by a bulkhead.
摘要翻译：目的：提供基板处理系统来处理基板，特别是相对平坦的玻璃基板。构成：基板处理系统具有主要布置在至少一个处理室（96）中的载体（122）; 以及用于在处理室（96）和加载锁定室（92,94）之间输送基板（114,115,116）的至少一个梭（118,120）。多个处理室，负载锁定室和其他室彼此接合，从而可以形成用于处理基板的串联模块室。优选地，载体仅暴露于处理环境，即载体不在非处理室内往复运动。因此，在衬底的连续顺序处理期间，载体的热循环减少。载体沿着轨道（123,125）在处理室内可逆地移动。可以通过由隔板隔离的多个处理区域在同一处理室内产生多个处理状态。

86. 发明授权

KR100247597B1 진공처리장치 失效
标题翻译：真空处理设备
公开(公告)号：KR100247597B1
公开(公告)日：2000-03-15
申请号：KR1019920009321
申请日：1992-05-29
申请人： 오씨 외를리콘 발처스 악티엔게젤샤프트
发明人： 로만셰르틀러
IPC分类号： B01J3/04
CPC分类号： C23C14/568 , C23C14/50 , H01L21/67745 , H01L21/67751 , Y10T29/49998 , Y10T29/5124 , Y10T29/5196
摘要： 본 발명은 각각 목적물을 공급하고 방출하는 개구가 제공되어 있는 2개의 스테이션에서 처리되는 목적물용의 진공처리장치에 관한 것이다. 운반장치가 회전할 수 있게 장착되어 있고, 스테이션의 개구에서 순차적으로 이동하는 지지장치가 제공되어 있다.
진공처리장치는 본 발명에 의하여, 개구의 표면에 의하여 범위가 한정되는 표면법선과 운반장치의 회전축에 의하여 범위가 한정되는 공간측이 서로 평행으로 있지 아니하고, 예를 들면 90°또는 45°의 각도를 가지도록 형성되어 있다.
이와 같은 배열에 의하여 다수의 단일스테이션이 달린 매우 조밀한 소형의 진공처리장치를 만들 수 있고, 짧은 운반로를 달성할 수 있으며, 공기조절대상용적을 최소화시킬 수 있다.

87. 发明公开

KR1020000000499A 롤 플레이트 롤 및 롤 투 플레이트 진공증착 시스템 失效
标题翻译：辊板辊和辊板真空沉积系统
公开(公告)号：KR1020000000499A
公开(公告)日：2000-01-15
申请号：KR1019990047609
申请日：1999-10-29
申请人： 주식회사 컴텍스 , 오형석 , 이만호 , 주식회사 계림통상
发明人： 오형석 , 이만호
IPC分类号： C23C14/56
CPC分类号： C23C14/568 , C23C14/021 , C23C14/24
摘要： PURPOSE: A vacuum deposition system is provided to make easy to control the process pressure by separating an unnecessary film roll part from a deposition part, reduce the loss of gas, and apply to various processors easily. CONSTITUTION: The system comprises a roll drum chamber(1) for supplying the whole base material such as film and fiber by winding, a tension control unit(8) for smoothing the winding and loosening of base material, a vacuum surface treatment chamber(9) for removing foreign material formed on the surface of base material and increasing adhesion by enhancing the activation energy of base material surface, and a vacuum deposition chamber(7). In the system Ar, O2, N2, CF4, H2, CO2, C2H5OH and other gas are leaded in the vacuum surface treatment chamber(9) to remove foreign material. The vacuum deposition chamber is composed of each unit such as a vacuum pump(4), a gas lead-in solenoid valve(10), and a deposition source(3) and designed to be able to addition and deletion.
摘要翻译：目的：提供真空沉积系统，通过将不必要的膜卷部分与沉积部分分离，减少气体损失，容易地应用于各种处理器，从而容易控制工艺压力。构成：该系统包括用于通过卷绕提供诸如薄膜和纤维的整个基材的卷筒室（1），用于平滑基材的卷绕和松动的张力控制单元（8），真空表面处理室（9 ），用于去除形成在基材表面上的异物，并通过提高基材表面的活化能增加粘合力，以及真空沉积室（7）。在系统中，在真空表面处理室（9）中引入了Ar，O 2，N 2，CF 4，H 2，CO 2，C 2 H 5 OH和其它气体以除去异物。真空沉积室由诸如真空泵（4），气体引入电磁阀（10）和沉积源（3）的每个单元组成，并被设计成能够添加和删除。

88. 发明授权

KR100227489B1 반도체 장치의 제조방법 失效
公开(公告)号：KR100227489B1
公开(公告)日：1999-11-01
申请号：KR1019960007045
申请日：1996-03-15
申请人： 야마하 가부시키가이샤
发明人： 구리하라순스케
IPC分类号： H01L21/203
CPC分类号： H01L22/34 , C23C14/042 , C23C14/50 , C23C14/568
摘要： 본 발명에 따른 반도체 장치의 제조방법에 있어서는, 멀티 챔버식 스퍼터링 시스템의 챔버들을 이용하여, 상이한 형상을 지닌 웨이퍼 클램퍼들을 사용하여 반도체 웨이퍼 상에 다층막을 형성한다. 상기 웨이퍼 클램퍼들은 각각 웨이퍼의 오리엔테이션 플랫 주변에 차폐부에 구비하고 차폐부의 서로 상이한 위치에 개구부를 갖는다. 순차적인 막형성 공정중 각 공정에서는 다층막의 단층 영역이 반도체 웨이퍼상의 상기 개구부에 대응하는 영역에 형성된다. 각 층의 막 품질은 단층 영역에서 측정할 수 있다. 본 발명은 다층막의 각 층의 품질을 간단하면서도 정확하게 측정할 수 있는 반도체 장치의 제조방법을 제공한다.

89. 发明授权

KR1019950003597B1 진공 처리장치 失效
标题翻译：真空加工设备
公开(公告)号：KR1019950003597B1
公开(公告)日：1995-04-14
申请号：KR1019860000614
申请日：1986-01-30
申请人： 더 비오씨 그룹 인코포레이티드
发明人： 올바니디이그럽 , 알렉스부우제니 , 월터지이오우버래커
IPC分类号： B65G5/00
CPC分类号： H01L21/67748 , C23C14/568
摘要： 내용 없음.

90. 发明授权

KR101869525B1 가요성 기판용 챔버 입구 또는 챔버 출구를 밀봉하기 위한 장치, 기판 처리 기구 및 이러한 장치를 조립하기 위한 방법 有权
公开(公告)号：KR101869525B1
公开(公告)日：2018-06-22
申请号：KR1020127029226
申请日：2011-03-22
申请人： 어플라이드 머티어리얼스, 인코포레이티드
发明人： 벤크,칼-하인리히 , 하커,폴커
IPC分类号： F16K7/10 , C23C14/56 , B29C37/00
CPC分类号： C23C14/568 , B29C37/0089 , F16K7/10 , H01J2237/166 , Y10T29/49826
摘要： 본개시내용은가요성기판(16)용챔버입구(18) 또는챔버출구를밀봉하기위한장치(100)에관한것이며, 상기장치는밀봉면(108)을갖는본체(104)와, 본체내에형성되어가요성기판에의해횡단되도록구성된기판개구(106)와, 적어도부분적으로밀봉면을대면하는탄성튜브(116)를포함하고, 탄성튜브는, 가스공급부(136)에연결하기위한연결부를갖고, 동작동안팽창및 수축에적합하다. 또한, 본개시내용은가요성기판(16)용챔버입구또는챔버출구를밀봉하기위한장치를조립하는방법에관한것이며, 상기방법은, 밀봉면(108)을갖는본체(104)를제공하고, 기판개구(106)가상기본체에형성되어상기가요성기판에의해횡단되도록구성되는단계와; 탄성튜브(116)가적어도부분적으로상기밀봉면(108)을대면하도록상기탄성튜브(116)를상기본체내로삽입하고, 탄성튜브는연결부를갖고동작동안팽창및 수축에적합한단계와; 그리고상기탄성튜브의연결부를가스공급부(136)에연결하는단계를포함한다.

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