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1. 发明专利

JP2006144130A Method for producing shadow mask 审中-公开
标题翻译：生产阴影面膜的方法
公开(公告)号：JP2006144130A
公开(公告)日：2006-06-08
申请号：JP2006036250
申请日：2006-02-14
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： FUKAGAWA HIROTAKA , YAMAMOTO TATSUHIKO , AMANO TAKAHISA
IPC分类号： C23F1/00 , H01J9/14
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a shadow mask using a photoetching process by which a shadow mask free from the occurrence of defect in an opening and having high quality can be obtained. SOLUTION: The method for producing a shadow mask using a photoetching process is characterized in that a means is provided for using one surface of a shadow mask metal stock as the upper surface, pasting a long-length beltlike protective film to the other surface, thereafter, applying first etching to the one surface, subsequently, reversing the upper and lower surfaces of the horizontally transported shadow mask metal stock, and with the other surface as the upper surface, the protective film is peeled, and then, the other surface is subjected to second etching. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种使用光刻工艺制造阴影掩模的方法，通过该方法可以获得没有开口中的缺陷发生且具有高质量的荫罩。解决方案：使用光刻工艺制造荫罩的方法的特征在于，提供一种用于使用荫罩金属原料的一个表面作为上表面的装置，将长长的带状保护膜粘贴到另一个表面，然后对一个表面施加第一蚀刻，随后反转水平输送的荫罩金属原料的上表面和下表面，另一个表面作为上表面，剥离保护膜，然后另一个表面进行第二蚀刻。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JPH11200071A SURFACE EXPOSING TREATMENT VESSEL 失效
公开(公告)号：JPH11200071A
公开(公告)日：1999-07-27
申请号：JP472198
申请日：1998-01-13
申请人： TOPPAN PRINTING CO LTD
发明人： YAMAMOTO TATSUHIKO
IPC分类号： G03F7/16 , C23F1/00 , H01J9/14 , H01L23/50
摘要： PROBLEM TO BE SOLVED: To provide a surface exposing treatment vessel capable of executing a desired surface exposing treatment without adversely affecting another production stage even if the specifications of the resist films formed in the respective sections of a metallic sheet or the production conditions, such as transporting speed, of the metallic sheet are changed at the time of producing etching parts in the continuous production stage using a long-sized belt-like metallic sheet as a blank. SOLUTION: The surface exposing treatment vessel 5 which has a surface exposing treatment liquid 7 and executes the surface exposing treatment on the resist films at the time of forming the resist films having the aperture parts exposing the metallic sheet according to prescribed patterns on the long- sized belt-like metallic sheet 1 includes a means 6 for changing the transporting route of the metallic sheet transported like a belt within the surface exposing treatment vessel to vary the contact time of the metallic sheet and the surface exposing treatment liquid while maintaining the transporting speed of the metallic sheet at the prescribed speed.

3. 发明专利

JPS59173161A Device for producing flat mask 失效
标题翻译：用于生产扁平面膜的装置
公开(公告)号：JPS59173161A
公开(公告)日：1984-10-01
申请号：JP4854283
申请日：1983-03-23
申请人： Toppan Printing Co Ltd , Toshiba Corp
发明人： HIRAYAMA KAZUNARI , OKUMURA KADODE , SAIGOU MASAKATSU , YAMAMOTO TATSUHIKO , FUJII YOSHIHIRO
IPC分类号： B05B13/02 , B65G15/12 , H01J9/02 , H01J9/14 , H01J29/07
摘要： PURPOSE: To prevent surely spread of a coating liquid to the bottom surface side of a belt-like body by positioning conveying belts on both sides so as to meet the width of the belt-like body and matching both side edges of the belt-like body and the outside edges of the conveying belts.
CONSTITUTION: Conveying belts 25 for a belt-like body 1 are dividedly formed on both sides, and the belts 25 on both sides are provided freely adjustably in the transverse position. The body 1 is conveyed while both side edges of the body 1 and the outside edges of the belts 25 are matched. Then the spread of a coating liquid to the bottom surface side of the belt-like body is prevented by the belts 25, and the working efficiency of the device is improved.
COPYRIGHT: (C)1984,JPO&Japio
摘要翻译：目的：通过将输送带定位在两侧以防止带状体的宽度和带状体的两侧边缘匹配，以防止将涂布液确实地传播到带状体的底面侧主体和输送带的外边缘。构成：用于带状体1的输送带25分成两侧形成，并且两侧的带25在横向位置可自由调节地设置。主体1被输送，同时主体1的两个侧边缘和皮带25的外边缘相匹配。然后，通过带25防止涂布液向带状体的底面侧的扩散，提高了装置的工作效率。

4. 发明专利

JPH11219665A APERTURE GRILLE TYPE SHADOW MASK 失效
公开(公告)号：JPH11219665A
公开(公告)日：1999-08-10
申请号：JP1981098
申请日：1998-01-30
申请人： TOPPAN PRINTING CO LTD
发明人： KOBAYASHI TETSUYA , YAMAMOTO TATSUHIKO , YAGO KYUICHI
IPC分类号： H01J29/07
摘要： PROBLEM TO BE SOLVED: To improve the display quality of a color picture tube by forming a linear through hole pattern with multiple rectangular through hole patterns connected in the longitudinal direction, and irregularly drifting the center lines in the longitudinal direction of the rectangular through hole patterns from the prescribed pitch centers between the linear through hole patterns by the specific length in the repeating direction of the linear through hole patterns. SOLUTION: A linear through hole is properly split into rectangles cut in the direction perpendicular to the longitudinal direction of the linear through hole, and a nearly linear through hole 2 is formed with connected rectangular through holes. The center lines of rectangular through holes 5 split with the linear through hole portion 4 of the through hole 2 are drifted in parallel from the center line of the original linear through hole in the repeating direction of the linear through hole portion 4, and the center lines of the rectangular through holes 5 are likewise drifted from the center line of the original through hole in other through holes 2. The drift quantity is irregularly set to the range of ±0.1-0.3 μm, thereby the occurrence of a moire pattern can be prevented.

5. 发明专利

JPH08283964A PRODUCTION OF ETCHED PARTS 失效
公开(公告)号：JPH08283964A
公开(公告)日：1996-10-29
申请号：JP8959295
申请日：1995-04-14
申请人： TOPPAN PRINTING CO LTD
发明人： WADA TOMOKI , FUKAGAWA HIROTAKA , YAMAMOTO TATSUHIKO
IPC分类号： C23F1/00 , H01L21/304
摘要： PURPOSE: To minimize the sheared etching of a metallic base material and to improve the dimensional accuracy of an etching pattern by etching the surface of a metallic base material having a resist film on which a fine pattern is formed with a high-temp. and high-sp.gr. liq. etchant and then washing the etched surface with hot water. CONSTITUTION: The exposed part of metal is etched with a high-temp. and high-sp.gr. ferric chloride soln. kept at 75-90 deg.C and having 1.50-1.61 sp.gr., and a resist film is released in this photoetching method. When the etched parts are produced by this method, hot water is used in washing after etching. In this case, when the sp.gr. of the liq. etchant is denoted by (d), the temp. of the used in washing is higher than the temp. obtained from the approximate expression, 103, 7543d=136, 5597 and lower than 60 deg.C. Besides, inexpensive well water passed through a filter can be used as the washing water.

6. 发明专利

JPH08250022A MANUFACTURING OF ETCHED PART 失效
公开(公告)号：JPH08250022A
公开(公告)日：1996-09-27
申请号：JP5404595
申请日：1995-03-14
申请人： TOPPAN PRINTING CO LTD
发明人： YAMAMOTO TATSUHIKO , TERAJIMA TATEO , TAKABAYASHI JUN
IPC分类号： C23F1/00 , H01J9/14
摘要： PURPOSE: To provide a manufacturing method for a etched part, which is free from a faulty etching process, by cutting the right and left end areas of a metallic member so as to be removed after a regist film forming process but prior to an etching process. CONSTITUTION: Two paired circular knives 2 which are rotated in the direction identical to the carrying direction of metallic raw material 1 while being interlocked with a drive motor 4, are positioned at both plate end sections of the metallic raw material 1 respectively, and the plate end sectional areas are thereby cut and removed while the metallic raw material is passed through each paired circular knives 2. And only the area where the thickness of its regist film is as specified, and furthermore the regist film is uniform in thickness, is permitted to be passed through. By this constitution, the area where the regist film is thin in the plate end sections 5 is prevented from being unnecessarily etched, the regist films at the plate end sections which are peeled off are prevented from being adhered again onto the metallic raw material, and thereby faulty etching is prevented, which is caused by adhered matters preventing etching to the metallic raw material.

7. 发明专利

JPH08241671A MANUFACTURE OF SHADOW MASK 失效
公开(公告)号：JPH08241671A
公开(公告)日：1996-09-17
申请号：JP4291295
申请日：1995-03-02
申请人： TOPPAN PRINTING CO LTD
发明人： YAMAMOTO TATSUHIKO , TOMIYASU HIROYUKI
IPC分类号： H01J9/14
摘要： PURPOSE: To prevent poorly performed etching shape of a shadow mask originating from imperfect formation of an etching prevent layer by conducting the rinsing process for a shadow mask material after first etching while the material is conveyed upward. CONSTITUTION: A shadow mask material 1 advances from the left to right, and thereon a solution of ferric chloride is sprayed in the first etching chamber 7 so that first etching is conducted. Then the material 1 after the first etching process is subjected to a rinse with water. Therein the water rinse is made while the material 1 is conveyed upward. That is, the material 1 sent off from the chamber 7 is intruded into a rinsing chamber 8, conveyed in the A-part in the chamber 8 in the horizontal direction, guided to a conveying path upward in the B-part by a conveying roller 11 for changing the heading, and returned in the C-part again to the conveying path in the horizontal direction. Thereby the rinse water having run against the material 1 flows down so that no sump of old rinse water is generated at the overhang of a resist film, and a fresh rinse water will circulate to prevent imperfect formation of an etching prevent layer.

8. 发明专利

JPH0362264B2 失效
公开(公告)号：JPH0362264B2
公开(公告)日：1991-09-25
申请号：JP7218384
申请日：1984-04-11
申请人： TOPPAN PRINTING CO LTD
发明人： NAKAYAMA NAOMI , AWANO HIDEKI , NISHIMURA MASAYOSHI , YAMAMOTO TATSUHIKO
IPC分类号： G03F7/26 , G03F7/30 , G03F7/40

9. 发明专利

JPH03202481A ETCHING LINE CONTROLLING DEVICE 失效
公开(公告)号：JPH03202481A
公开(公告)日：1991-09-04
申请号：JP34008589
申请日：1989-12-29
申请人： TOPPAN PRINTING CO LTD
发明人： MATSUO HIDEAKI , OZAWA TATSURO , YAMAMOTO TATSUHIKO , FUKAGAWA HIROTAKA , AMANO TAKAHISA
IPC分类号： C23F1/00 , H01L21/306
摘要： PURPOSE:To perform high quality etching which has the hole diameter of proper dimension and bridge width by detecting the liquid pressure, liquid temp., specific gravity and line speed and finely regulating the preset value thereof. CONSTITUTION:A shadow mask is produced by passing a stock 35 for the shadow mask through an etching part 21 consisting of the chambers 23-28 and a varnish application part 29, etc., and controlling the etching rate in a controlling part 22. In this etching line controlling device, the data in the front step such as the material of the above-mentioned stock 35, film thickness of a coater and baking deviation, the measured value such as liquid pressure of etching liquid, line speed, liquid temp. and specific gravity due to various sensors 45-48 and the dimensional data after etching are inputted to a controlling device 40 via the respective input means 41-43. The above-mentioned etching part 21 is regulated via a driving means 44 by this controlling device 40 on the basis of these data. The hole diameter and bridge dimension of the shadow mask formed by corrosion are automatically controlled.

10. 发明专利

JPS60214356A Method for developing pattern of water-soluble photosensitive material 失效
标题翻译：用于开发水溶性光敏材料图案的方法
公开(公告)号：JPS60214356A
公开(公告)日：1985-10-26
申请号：JP7218384
申请日：1984-04-11
申请人： Toppan Printing Co Ltd
发明人： NAKAYAMA NAOMI , AWANO HIDEKI , NISHIMURA MASAYOSHI , YAMAMOTO TATSUHIKO
IPC分类号： G03F7/26 , G03F7/30 , G03F7/40
CPC分类号： G03F7/405
摘要： PURPOSE:To prevent bleeding by treating a developed photosensitive material with an aq. soln. of chromic acid anhydride. CONSTITUTION:The water-soluble photosensitive material formed on the material 1 to be etched and imagewise exposed is developed by ejecting water from nozzles 4 arranged on both sides of the material 1 while the material 1 is moved up and down through a roller 3. The material 1 drawn out of this device with a roller 5 is squeezed with a water squeezing roller 6 to squeeze water out of the material 1. Then, the material 1 is sprayed with an aq. sol. of chromic acid anhydride in advance on both sides and immersed into said soln. in a vessel 9. After it is drawn out of the vessel 9 through the roller 12, it is again sprayed with said soln., thus permitting nonuniform treatment of the water-soluble photosensitive material wit said soln., and uneven hardening due to the foam of said soln. to be prevented.
摘要翻译：目的：通过用水洗处理显影的感光材料来防止出血。索恩的铬酸酐。构成：在材料1通过辊3上下移动时，通过从设置在材料1两侧的喷嘴4喷出水来形成形成在待蚀刻和图像曝光的材料1上的水溶性感光材料。用辊5从该装置中拉出的材料1用挤压辊6挤压，将水从材料1中挤出。然后，将材料1喷洒在水中。溶胶的铬酸酐，并浸入所述溶胶中。在容器9中。在通过辊12从容器9中抽出之后，再次用所述溶液喷雾，从而使所述溶剂对水溶性感光材料进行不均匀的处理，并且由于所述溶胶的泡沫。被预防。

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