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1. 发明专利

JPS5929679B2 JPS5929679B2 - 失效
公开(公告)号：JPS5929679B2
公开(公告)日：1984-07-21
申请号：JP13263276
申请日：1976-11-04
申请人： Toppan Printing Co Ltd
发明人： AWANO HIDEKI
IPC分类号： C25D13/00 , C23C26/00 , C23F1/02

2. 发明专利

JPH0460293B2 失效
公开(公告)号：JPH0460293B2
公开(公告)日：1992-09-25
申请号：JP1748284
申请日：1984-02-02
申请人： TOPPAN PRINTING CO LTD
发明人： SEN TAKURO , SHIRAKAWA KAZUO , NAKAYAMA NAOMI , WAKI KATSUJIRO , AWANO HIDEKI , MATSUYOSHI MASAHIKO
IPC分类号： G03F1/00 , H01J9/14

3. 发明专利

JPS6319861B2 失效
公开(公告)号：JPS6319861B2
公开(公告)日：1988-04-25
申请号：JP3284184
申请日：1984-02-23
申请人： TOPPAN PRINTING CO LTD
发明人： SEN TAKURO , SHIRAKAWA KAZUO , NAKAYAMA NAOMI , WAKI KATSUJIRO , AWANO HIDEKI , MATSUYOSHI MASAHIKO
IPC分类号： H01J9/14 , G03C5/00 , G03F1/00 , G03F7/26

4. 发明专利

JPS60176040A PRODUCTION OF PATTERN PLATE FOR SHADOW MASK 失效
公开(公告)号：JPS60176040A
公开(公告)日：1985-09-10
申请号：JP3284084
申请日：1984-02-23
申请人： TOPPAN PRINTING CO LTD
发明人： SEN TAKUROU , SHIRAKAWA KAZUO , NAKAYAMA NAOMI , WAKI KATSUJIROU , AWANO HIDEKI , MATSUYOSHI MASAHIKO
IPC分类号： H01J9/14 , G03F1/00
摘要： PURPOSE:To obtain a pattern plate for a shadow mask with high accuracy and high efficiency by superposing a mask plate of an outside shape part on the 1st glass dryplate in such a way that the positioning marks of both plates coincide with each other and subjecting the plates to the 2nd exposure. CONSTITUTION:Positioning of a glass dryplate 11 and an outside shape part 15 is executed with good accuracy by matching the positioning mark 14' of the plate 11 and the positioning mark 17 of the mask 15 with each other. The latent image of the unnecessary hole pattern except the required hole pattern shielded by a shielding part 16 is erased by the exposure thereof. The latent image of the hole pattern of the plate 11 which is not erased is then developed to manufacture a negative type master plate 19 having a hole pattern 18 in the effective part. The plate 19 is finally reversed to the other glass dryplate by which a small hole side pattern plate 20 for a shadow mask having the positive type pattern 18' is obtd.

5. 发明专利

JPS60163333A MANUFACTURE OF PATTERN FOR GRADED TYPE SHADOW MASK 失效
公开(公告)号：JPS60163333A
公开(公告)日：1985-08-26
申请号：JP1748284
申请日：1984-02-02
申请人： TOPPAN PRINTING CO LTD
发明人： SEN TAKUROU , SHIRAKAWA KAZUO , NAKAYAMA NAOMI , WAKIKATSU JIROU , AWANO HIDEKI , MATSUYOSHI MASAHIKO
IPC分类号： G03F1/00 , H01J9/14
摘要： PURPOSE:To form easily a shadow mask pattern from a flat type mask pattern through contact printing by using a light-transmitting rotary disc which has a light shading section changing its shading area continuously from the optical axis of artificial parallel light rays toward the circumferential area. CONSTITUTION:The light from a light source 1 is spreaded through a lens 2 to form artificial parallel light rays 3 so that those light rays are irradiated on the screen on which a flat type shadow mask pattern 13, a contact printer 12, and a sensitive material 14 are arranged. And, between the light source and the screen, a light-transmitting rotary disc 4, which has a light shading section 6 changing its shading area continuously from its center area 7 toward its circumferential area 8, is placed in such a manner that the rotary disk 4 may rotate freely and the distance to the lens 2 can be changed. After being exposed to the light, the sensitive material 14 is taken out from the contact printer 12, and then developed to produce a graded type shadow mask pattern. Therefore, the grading can be made freely at the position of the rotary disk 4 and it can be easily produced with high accuracy.

6. 发明专利

JPS5357145A METHOD OF PARTIALLY COLORING METALLIC PLATE 失效
公开(公告)号：JPS5357145A
公开(公告)日：1978-05-24
申请号：JP13263276
申请日：1976-11-04
申请人： TOPPAN PRINTING CO LTD
发明人： AWANO HIDEKI
IPC分类号： C25D13/00 , C23C26/00 , C23F1/02

7. 发明专利

JPH0362264B2 失效
公开(公告)号：JPH0362264B2
公开(公告)日：1991-09-25
申请号：JP7218384
申请日：1984-04-11
申请人： TOPPAN PRINTING CO LTD
发明人： NAKAYAMA NAOMI , AWANO HIDEKI , NISHIMURA MASAYOSHI , YAMAMOTO TATSUHIKO
IPC分类号： G03F7/26 , G03F7/30 , G03F7/40

8. 发明专利

JPS6319860B2 失效
公开(公告)号：JPS6319860B2
公开(公告)日：1988-04-25
申请号：JP3284084
申请日：1984-02-23
申请人： TOPPAN PRINTING CO LTD
发明人： SEN TAKURO , SHIRAKAWA KAZUO , NAKAYAMA NAOMI , WAKI KATSUJIRO , AWANO HIDEKI , MATSUYOSHI MASAHIKO
IPC分类号： H01J9/14 , G03F1/00

9. 发明专利

JPS60214356A Method for developing pattern of water-soluble photosensitive material 失效
标题翻译：用于开发水溶性光敏材料图案的方法
公开(公告)号：JPS60214356A
公开(公告)日：1985-10-26
申请号：JP7218384
申请日：1984-04-11
申请人： Toppan Printing Co Ltd
发明人： NAKAYAMA NAOMI , AWANO HIDEKI , NISHIMURA MASAYOSHI , YAMAMOTO TATSUHIKO
IPC分类号： G03F7/26 , G03F7/30 , G03F7/40
CPC分类号： G03F7/405
摘要： PURPOSE:To prevent bleeding by treating a developed photosensitive material with an aq. soln. of chromic acid anhydride. CONSTITUTION:The water-soluble photosensitive material formed on the material 1 to be etched and imagewise exposed is developed by ejecting water from nozzles 4 arranged on both sides of the material 1 while the material 1 is moved up and down through a roller 3. The material 1 drawn out of this device with a roller 5 is squeezed with a water squeezing roller 6 to squeeze water out of the material 1. Then, the material 1 is sprayed with an aq. sol. of chromic acid anhydride in advance on both sides and immersed into said soln. in a vessel 9. After it is drawn out of the vessel 9 through the roller 12, it is again sprayed with said soln., thus permitting nonuniform treatment of the water-soluble photosensitive material wit said soln., and uneven hardening due to the foam of said soln. to be prevented.
摘要翻译：目的：通过用水洗处理显影的感光材料来防止出血。索恩的铬酸酐。构成：在材料1通过辊3上下移动时，通过从设置在材料1两侧的喷嘴4喷出水来形成形成在待蚀刻和图像曝光的材料1上的水溶性感光材料。用辊5从该装置中拉出的材料1用挤压辊6挤压，将水从材料1中挤出。然后，将材料1喷洒在水中。溶胶的铬酸酐，并浸入所述溶胶中。在容器9中。在通过辊12从容器9中抽出之后，再次用所述溶液喷雾，从而使所述溶剂对水溶性感光材料进行不均匀的处理，并且由于所述溶胶的泡沫。被预防。

10. 发明专利

JPS60176041A PRODUCTION OF PATTERN PLATE FOR SHADOW MASK 失效
公开(公告)号：JPS60176041A
公开(公告)日：1985-09-10
申请号：JP3284184
申请日：1984-02-23
申请人： TOPPAN PRINTING CO LTD
发明人： SEN TAKUROU , SHIRAKAWA KAZUO , NAKAYAMA NAOMI , WAKI KATSUJIROU , AWANO HIDEKI , MATSUYOSHI MASAHIKO
IPC分类号： H01J9/14 , G03C5/00 , G03F1/00 , G03F7/26
摘要： PURPOSE:To obtain a pattern plate for a shadow mask with high accuracy and high efficiency by superposing a mask plate for an outside shape part having an outside frame pattern, etc. on a glass dryplate in such a way that the positioning marks of the two plates coincide with each other and subjecting the plates to the 2nd exposure. CONSTITUTION:The latent image of an unnecessary hole pattern except the region covered by the shielding part 18 of a mask 16 for an outside shape part is erased from a glass dryplate 11 by exposure and on the other hand, the latent image of an outside frame pattern is formed thereon. The latent image of the hole pattern of the plate 11 which is not erased and the latent image of the outside frame pattern are developed to manufacture a negative type master plate 22 having a hole pattern 20 and outside frame pattern 21 of a negative type. The master plate 22 is finally reversed to the other glass dryplate and a pattern plate 23 for a shadow mask having a hole pattern 26 and outside frame pattern 21' of a positive type is obtd.

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