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1. 发明专利

JP2008164857A Color filter substrate, manufacturing method thereof and display device 有权
标题翻译：彩色滤光片，其制造方法和显示装置
公开(公告)号：JP2008164857A
公开(公告)日：2008-07-17
申请号：JP2006353344
申请日：2006-12-27
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： TEJIMA DAISUKE , KOBAYASHI TETSUYA , KUBO MASAHIRO , USUKI JUNJI , MIMA SHOJI , IWASE HIROSHI , MATSUSEI KENJI
IPC分类号： G02B5/20 , G02F1/1335 , G02F1/1339
摘要： PROBLEM TO BE SOLVED: To provide a color filter substrate retaining the predetermined height of a photospacer without adjusting the thickness of a colored layer or a protrusion layer, and also to provide a manufacturing method and display device for the color filter substrate.
SOLUTION: The manufacturing method of the color filter substrate comprises processes of: forming a light-shielding layer of a prescribed pattern having a spacer forming region on a transparent substrate; stacking colored layers of a plurality of colors on regions divided by the light-shielding layer and stacking spacer colored layers of a plurality of colors on spacer forming regions three-dimensionally; forming a transparent electrically conductive film on the colored layers and spacer colored layers of the plurality of colors; and forming the photospacer having a height Y from the upper surface of the transparent electrically conductive film on the colored layers of the plurality of colors two-dimensionally arranged to the upper surface of the spacer protruded layer. The thickness of the light-shielding layer is controlled in accordance with an area of spacer forming regions of the light-shielding layer so as to obtain a desired value of the height Y of the photospacer.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种在不调节着色层或突起层的厚度的情况下保持光电隔离器的预定高度的滤色器基板，并且还提供用于滤色器基板的制造方法和显示装置。滤色器基板的制造方法包括以下工序：在透明基板上形成具有间隔物形成区域的规定图案的遮光层; 在由遮光层划分的区域上堆叠多个颜色的彩色层，并且在间隔物形成区域上三维堆叠多个颜色的间隔物着色层; 在多个颜色的着色层和间隔色层上形成透明导电膜; 并且在二维布置在间隔物突出层的上表面上的多种颜色的着色层上从透明导电膜的上表面形成具有高度Y的光阻剂。根据遮光层的间隔物形成区域的面积来控制遮光层的厚度，以获得所希望的光学层的高度Y值。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JPH11219665A APERTURE GRILLE TYPE SHADOW MASK 失效
公开(公告)号：JPH11219665A
公开(公告)日：1999-08-10
申请号：JP1981098
申请日：1998-01-30
申请人： TOPPAN PRINTING CO LTD
发明人： KOBAYASHI TETSUYA , YAMAMOTO TATSUHIKO , YAGO KYUICHI
IPC分类号： H01J29/07
摘要： PROBLEM TO BE SOLVED: To improve the display quality of a color picture tube by forming a linear through hole pattern with multiple rectangular through hole patterns connected in the longitudinal direction, and irregularly drifting the center lines in the longitudinal direction of the rectangular through hole patterns from the prescribed pitch centers between the linear through hole patterns by the specific length in the repeating direction of the linear through hole patterns. SOLUTION: A linear through hole is properly split into rectangles cut in the direction perpendicular to the longitudinal direction of the linear through hole, and a nearly linear through hole 2 is formed with connected rectangular through holes. The center lines of rectangular through holes 5 split with the linear through hole portion 4 of the through hole 2 are drifted in parallel from the center line of the original linear through hole in the repeating direction of the linear through hole portion 4, and the center lines of the rectangular through holes 5 are likewise drifted from the center line of the original through hole in other through holes 2. The drift quantity is irregularly set to the range of ±0.1-0.3 μm, thereby the occurrence of a moire pattern can be prevented.

3. 发明专利

JPH11212245A FORMATION OF MASK FOR EXPOSURE 失效
公开(公告)号：JPH11212245A
公开(公告)日：1999-08-06
申请号：JP1253398
申请日：1998-01-26
申请人： TOPPAN PRINTING CO LTD
发明人： KOBAYASHI TETSUYA , FUKAGAWA HIROTAKA , YAGO KYUICHI
IPC分类号： G03F1/00
摘要： PROBLEM TO BE SOLVED: To provide a method for formation of a mask for exposure by which elliptical patterns having desired good accuracy are obtainable and good pattern position accuracy may be obtd. by shortening the time required for exposure in the formation of the mask for exposure used for production of a slot type shadow mask. SOLUTION: At the time of forming the elliptical patterns 3 on a transparent substrate in the method for forming the mask for exposure which is used at the time of producing the slot type shadow mask and is obtd. by forming at least the plural elliptical pattern on the transparent substrate, the patterns to be exposed onto the photosensitive substrate 8 are formed as circular patterns 4 and are so formed that the centers of the circular patterns 4 of the same diameter ride on a straight line. The elliptical pattern are exposed and formed by the chain of the plural circular patterns exposed in overlap while these patterns are offset from each other.

4. 发明专利

JP2017088936A 蒸着マスク、マスク基材の補修方法、および、マスク基材の補修装置审中-公开
公开(公告)号：JP2017088936A
公开(公告)日：2017-05-25
申请号：JP2015217961
申请日：2015-11-05
申请人：凸版印刷株式会社 , Toppan Printing Co Ltd
发明人： DEMACHI YASUYUKI , KOBAYASHI TETSUYA , NODA SATOSHI , TAKAHASHI YUSUKE
IPC分类号： C23C14/04 , B29C73/02 , B29C73/24
摘要：【課題】機械的な強度を高めることができる蒸着マスク、マスク基材の補修方法、および、マスク基材の補修装置を提供する。【解決手段】メタルマスク10は、第1面11aと第1面11aとは反対側の第2面11bとを含み、第1面11aと第2面11bとの間を貫通する貫通孔11cであって内周面11dによって区画された複数の貫通孔11cを有した金属製のマスク基材11と、複数の貫通孔11cは、複数の第1貫通孔11c1と、少なくとも1つの第2貫通孔11c2であって、第1貫通孔11c1よりも容積が大きい第2貫通孔11c2とから構成され、第2貫通孔11c2を区画する内周面11dの少なくとも一部に位置する樹脂製の補修部12と、を備える。第2貫通孔11c2と補修部12とが補修孔11c3を構成し、補修部12は、補修孔11c3における内周面11d1の形状を第1貫通孔11c1における内周面11dの形状に適合させる形状を有する。【選択図】図2

5. 发明专利

JP2003013260A Method and apparatus for manufacturing etched parts 有权
标题翻译：用于制造蚀刻部件的方法和装置
公开(公告)号：JP2003013260A
公开(公告)日：2003-01-15
申请号：JP2001201840
申请日：2001-07-03
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： KOBAYASHI TETSUYA
IPC分类号： F26B13/02 , C23F1/00
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing etched parts, which does not generate excess and deficiency in drying a metal sheet across a widthwise direction, even when drying it with a plane view rectangular long and thin drying heater, in a drying process for manufacturing the etched parts, hence makes a dimension of an etched pattern of the metal sheet after etched uniform, and stably manufactures the etched parts of high quality, and to provide an apparatus therefor.
SOLUTION: This method comprises horizontally arranging many plane view rectangular long and thin drying heaters in parallel with a carrying direction of the metal sheet, across the widthwise direction of the metal sheet, and controlling each temperature of the drying heaters, to dry the sheet with the drying heater.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：为了提供一种用于制造蚀刻部件的方法，其不会在宽度方向上干燥金属板时产生过量和不足，即使在用平面图矩形长而细的干燥加热器进行干燥时，在干燥过程中为了制造蚀刻部分，因此使蚀刻后的金属片的蚀刻图案的尺寸均匀，并且稳定地制造高品质的蚀刻部分，并提供其设备。解决方案：该方法包括横跨金属板的宽度方向水平布置许多平面视图矩形长而薄的干燥加热器，与金属板的运送方向平行，并控制干燥加热器的每个温度，以便用干燥加热器。

6. 发明专利

JP2000330254A CONTACT PRINTER 失效
公开(公告)号：JP2000330254A
公开(公告)日：2000-11-30
申请号：JP14399799
申请日：1999-05-24
申请人： TOPPAN PRINTING CO LTD , TOPCON CORP
发明人： KOBAYASHI TETSUYA , SUZUKI ETSUYA
IPC分类号： H01J9/14 , G03F1/00
摘要： PROBLEM TO BE SOLVED: To obtain a contact printer capable of preventing the blur of a pattern, faulty shape and the positional deviation of the pattern from occurring on an obtained copying mask as a contact printer used in the case of forming the copying mask for producing a shadow mask. SOLUTION: In this vertical type contact printer, a photosensitive material substrate frame 20 and an original plate mask frame 30 are coupled through a hinge 80. In such a case, the frame 20 is equipped with an external frame 21 for a photosensitive material substrate frame and a surface plate 22 which is vertically held by the frame 21 through a supporting base 23 and whose material is mineral such as granite whose tissue is fine, and the frame 30 is equipped with an external frame 31 for an original plate mask frame, an internal frame 32 whose material is an elastic body, and a temporary holding tool 33 for an original plate mask.

7. 发明专利

JPH11339650A MANUFACTURE OF APERTURE GRILL 失效
公开(公告)号：JPH11339650A
公开(公告)日：1999-12-10
申请号：JP14446598
申请日：1998-05-26
申请人： TOPPAN PRINTING CO LTD
发明人： IWASHITA TAKASHI , KAWAMOTO YASUHIRO , KOBAYASHI TETSUYA
IPC分类号： H01J9/14
摘要： PROBLEM TO BE SOLVED: To prevent an aperture grill from being deformed even if an external force caused by contact with a carrying means, vibration during carriage and the like is applied on a thin sheet of metal, in a manufacturing method of the aperture grill in which after the aperture grill is formed on the thin sheet of metal, the aperture grill is completed by removing the unnecessary part. SOLUTION: In this manufacturing method, after an aperture grill 1 having linear through holes with plural pieces repeated to form a grill shape is formed on a thin sheet of metal by a photo etching method with the thin metal sheet as a raw material, the aperture grill is completed by removing the unnecessary part of the thin sheet of metal. In this case, a dummy pattern of through holes 4 to ease an external force applied on the thin sheet of metal during carriage and to prevent deformation of the aperture grill is formed on the unnecessary part of the thin sheet of metal.

8. 发明专利

JPH07228988A PRETREATMENT OF METALLIC THIN SHEET FOR SHADOW MASK 失效
公开(公告)号：JPH07228988A
公开(公告)日：1995-08-29
申请号：JP2022594
申请日：1994-02-17
申请人： TOPPAN PRINTING CO LTD
发明人： WATANABE HIROKI , KOBAYASHI TETSUYA
IPC分类号： B08B3/08 , C23G1/24
摘要： PURPOSE:To provide a method for pretreating the metallic thin sheet for the shadow mask used for a color picture tube, etc., capable of reducing the defects such as dripping, discoloration and spotting in production or the defects such as reoxidation, discoloration and distortion due to use of chemicals and heating, CONSTITUTION:A metallic thin sheet for a shadow mask is degreased and surfaced conventionally and then dipped in ozonized water and cleaned. Otherwise, one or both of the conventional degreasing and surfacing are omitted, and the sheet is dipped in ozonized water and cleaned.

9. 发明专利

JP2008164858A Color filter substrate, manufacturing method thereof and display device 审中-公开
标题翻译：彩色滤光片，其制造方法和显示装置
公开(公告)号：JP2008164858A
公开(公告)日：2008-07-17
申请号：JP2006353345
申请日：2006-12-27
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： TEJIMA DAISUKE , KOBAYASHI TETSUYA , KUBO MASAHIRO , USUKI JUNJI , MIMA SHOJI , IWASE HIROSHI , MATSUSEI KENJI
IPC分类号： G02B5/20 , G02F1/1335 , G02F1/1339 , G09F9/30
摘要： PROBLEM TO BE SOLVED: To provide a color filter substrate capable of retaining the predetermined height of a photospacer without adjusting the thickness of a colored layer or a protrusion layer, and also to provide a manufacturing method and display device for the color filter substrate. SOLUTION: The manufacturing method of the color filter substrate comprises processes of: forming a light-shielding layer of a prescribed pattern having a spacer forming region on a transparent substrate; arranging pixel colored layers of a plurality of colors two-dimensionally on regions divided by the light-shielding layer and, at the same time, successively stacking spacer colored layers of a plurality of colors three-dimensionally on spacer forming regions of the light-shielding layer; forming a transparent electrically conductive film on the pixel colored layers and spacer colored layers of the plurality of colors; and forming the photospacer having a height Y from the upper surface of the transparent electrically conductive film on the pixel colored layers of the plurality of colors two-dimensionally arranged to the upper surface of the spacer protruded layer. The thickness of the light-shielding layer is controlled in accordance with a thickness of the pixel colored layer so as to obtain a desired value of the height Y of the photospacer. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在不调整着色层或突起层的厚度的情况下保持光电隔离器的预定高度的滤色器基板，并且还提供用于滤色器的制造方法和显示装置基质。滤色器基板的制造方法包括以下工序：在透明基板上形成具有间隔物形成区域的规定图案的遮光层; 在由遮光层分割的区域上二维排列多个颜色的像素着色层，同时在屏蔽层的隔离物形成区域上依次层叠多个颜色的多个颜色的间隔色素层; 在多个颜色的像素着色层和间隔色层上形成透明导电膜; 并且在二维布置在间隔物突出层的上表面的多种颜色的像素着色层上，从透明导电膜的上表面形成具有高度Y的光隔片。根据像素着色层的厚度来控制遮光层的厚度，以获得所希望的光学层的高度Y值。版权所有（C）2008，JPO＆INPIT

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