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    • 1. 发明专利
    • Magnetic memory
    • 磁记忆
    • JP2012178541A
    • 2012-09-13
    • JP2011237544
    • 2011-10-28
    • Renesas Electronics Corpルネサスエレクトロニクス株式会社
    • KARIYADA HIDETSUGUSUEMITSU KATSUMITANIGAWA HIRONOBUMORI KAORUSUZUKI AKIHIRONAGAHARA KIYOKAZUOZAKI KOSUKEOSHIMA NORIKAZU
    • H01L27/105H01L21/8246H01L29/82H01L43/08
    • H01L43/10G01R33/091G01R33/098G11C11/02G11C11/14G11C11/15G11C11/161Y10T428/1114Y10T428/1121Y10T428/1143
    • PROBLEM TO BE SOLVED: To provide a magnetic memory in which a data storage layer has strong vertical magnetic anisotropy and magnetic coupling is strong between the data storage layer and a magnetization fixed layer provided below the data storage layer.SOLUTION: A magnetic memory comprises magnetization fixed layers 50a and 50b which have vertical magnetic anisotropy and in which a magnetization direction is fixed, an interlayer insulation layer 60, an underlying layer 40 formed on upper surfaces of the magnetization fixed layers 50a and 50b and the interlayer insulation layer 60, and a data storage layer 10 which is formed on an upper surface of the underlying layer 40 and has vertical magnetic anisotropy. The underlying layer 40 includes a first magnetic underlying layer 41 formed from a magnetic material and a non-magnetic underlying layer 42 formed on the first magnetic underlying layer 41. A thickness of the first magnetic underlying layer 41 is adjusted to prevent the first magnetic underlying layer 41 from presenting intra-plane magnetic anisotropy on the interlayer insulation layer 60.
    • 要解决的问题:提供一种数据存储层在数据存储层和设置在数据存储层下方的磁化固定层之间具有强垂直磁各向异性并且磁耦合强的磁存储器。 解决方案:磁存储器包括具有垂直磁各向异性并且其中磁化方向固定的磁化固定层50a和50b,层间绝缘层60,形成在磁化固定层50a的上表面上的下层40和 50b和层间绝缘层60,以及形成在下层40的上表面上并具有垂直磁各向异性的数据存储层10。 下层40包括由磁性材料形成的第一磁性下层41和形成在第一磁性下层41上的非磁性下层42.调整第一磁性下层41的厚度以防止第一磁性底层 层41在层间绝缘层60上呈现面内磁各向异性。版权所有(C)2012,JPO&INPIT
    • 3. 发明专利
    • Domain wall motion element manufacturing method
    • 域墙运动元件制造方法
    • JP2013175598A
    • 2013-09-05
    • JP2012039173
    • 2012-02-24
    • Renesas Electronics Corpルネサスエレクトロニクス株式会社
    • TANIGAWA HIRONOBUOZAKI KOSUKESUZUKI AKIHIROKARIYADA HIDETSUGU
    • H01L21/8246G11C11/15H01L27/105H01L29/82H01L43/08H01L43/12
    • G11C11/161G11C11/1675
    • PROBLEM TO BE SOLVED: To reliably perform initialization of a domain wall motion element whose magnetization state changes through domain wall motion.SOLUTION: A domain wall motion element manufacturing method includes: a step (A) for forming a first pinning layer and a second pinning layer whose magnetization directions are respectively fixed in a first direction and a second direction that are opposite to each other; and a step (B) for forming, after the step (A), a magnetization free layer that magnetically couples with both of the first pinning layer and the second pinning layer. Here, in the magnetization free layer, a first magnetization fixed region that magnetically couples with the first pinning layer, a second magnetization fixed region that magnetically couples with the second pinning layer, and a domain wall motion region sandwiched between the first magnetization fixed region and the second magnetization fixed region are formed. The domain wall motion element manufacturing method further includes a step (C) for setting a magnetization direction of the domain wall motion region in the first direction or the second direction.
    • 要解决的问题:可靠地执行其磁化状态通过畴壁运动而改变的畴壁运动元件的初始化。解决方案:畴壁运动元件制造方法包括:步骤(A),用于形成第一钉扎层和第二钉扎 其磁化方向分别固定在彼此相对的第一方向和第二方向上; 和步骤(B),用于在步骤(A)之后形成与第一钉扎层和第二钉扎层两者磁耦合的无磁化层。 这里,在无磁化层中,与第一钉扎层磁耦合的第一磁化固定区域,与第二钉扎层磁耦合的第二磁化固定区域和夹在第一磁化固定区域和第一磁化固定区域之间的畴壁运动区域 形成第二磁化固定区域。 畴壁运动元件制造方法还包括用于设定第一方向或第二方向上的畴壁运动区域的磁化方向的步骤(C)。
    • 4. 发明专利
    • Semiconductor device and manufacturing method of the same
    • 半导体器件及其制造方法
    • JP2014036146A
    • 2014-02-24
    • JP2012177174
    • 2012-08-09
    • Renesas Electronics Corpルネサスエレクトロニクス株式会社
    • MORI KAORUSUZUKI AKIHIROKARIYADA HIDETSUGUSUEMITSU KATSUMI
    • H01L21/8246G11C11/15H01L27/105H01L29/82H01L43/08H01L43/10
    • G11C11/161G11C11/1659G11C11/1675
    • PROBLEM TO BE SOLVED: To provide an initialization technique regarding a domain wall motion element, which is suitable for the case where a CoFeB film having perpendicular magnetic anisotropy is used as a domain wall motion layer.SOLUTION: A semiconductor device comprises: a CoFeB film having perpendicular magnetic anisotropy; a first magnetization hard layer which has perpendicular magnetic anisotropy and is magnetically coupled with a first magnetization fixed region of the CoFeB film; a second magnetization hard layer which has perpendicular magnetization anisotropy and is magnetically coupled with a second magnetization fixed region of the CoFeB film; and a magnetization direction control layer having perpendicular magnetization anisotropy stronger than that of the second magnetization hard layer. The second magnetization hard layer is formed on the magnetization direction control layer via a non-magnetic layer and antiferromagnetically coupled with the magnetization direction control layer via the non-magnetic layer. A thickness of the magnetization direction control layer is smaller than a thickness of the second magnetization hard layer.
    • 要解决的问题:提供一种适用于具有垂直磁各向异性的CoFeB膜作为畴壁运动层的畴壁运动元件的初始化技术。解决方案:一种半导体器件包括:CoFeB膜 具有垂直磁各向异性; 具有垂直磁各向异性并与CoFeB膜的第一磁化固定区磁耦合的第一磁化硬化层; 具有垂直磁化各向异性并与CoFeB膜的第二磁化固定区磁耦合的第二磁化硬化层; 磁化方向控制层具有比第二磁化硬化层更强的垂直磁化各向异性。 第二磁化硬化层经由非磁性层形成在磁化方向控制层上,并经由非磁性层与磁化方向控制层反铁磁耦合。 磁化方向控制层的厚度小于第二磁化硬化层的厚度。