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    • 4. 发明专利
    • Substrate treatment method
    • 基板处理方法
    • JP2005136439A
    • 2005-05-26
    • JP2005014374
    • 2005-01-21
    • Mitsubishi Electric CorpShimada Phys & Chem Ind Co Ltd三菱電機株式会社島田理化工業株式会社
    • KUZUMOTO MASAKINODA SEIJIOYA IZUMIMIYAMOTO MAKOTOHORIBE HIDEOKATAOKA TATSUOOISHI TETSUSHI
    • B08B3/08B08B3/10H01L21/027H01L21/304H01L21/308
    • PROBLEM TO BE SOLVED: To provide a substrate treatment method and a device where the device can be markedly improved in the treatment speed, by controlling the volume ratio of ozone to water vapor of the wet ozone-control gas fed to the substrate. SOLUTION: A substrate treating device treats an object of treatment, by supplying the wet ozone-containing gas wetted by a treating solution to the object of treatment on the surface of the substrate 2 in a treatment chamber 1 through a header 5 which is arranged so as to face the surface of the substrate 2. The wet ozone-containing gas includes a more amount of the vapor of the treatment solution than a saturated vapor amount at the temperature of the substrate 2 in another space, which is provided separately from the treatment chamber 1. The temperature of the wet ozone-containing gas is controlled to be 5 to 15°C higher than the temperature of the substrate. A spacing of the substrate 2 and the header 5 is 1 to 20 mm. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了提供一种基板处理方法和其中可以通过控制供给到基板的湿臭氧层控制气体的臭氧与水蒸气的体积比来显着提高处理速度的装置 。 解决方案:基板处理装置通过头5将处理室1中的处理溶液润湿的含湿臭氧气体供给到处理室1中的基板2的表面上,处理对象物 布置成面对基板2的表面。含湿臭氧的气体包括比另一空间中的基板2的温度下的饱和蒸汽量更多的处理溶液的蒸气,其分开设置 湿态含臭氧气体的温度被控制在比衬底温度高5至15℃的温度。 基板2和集管5的间隔为1〜20mm。 版权所有(C)2005,JPO&NCIPI
    • 5. 发明专利
    • Water treatment apparatus
    • 水处理设备
    • JP2006000755A
    • 2006-01-05
    • JP2004179422
    • 2004-06-17
    • Mitsubishi Electric Corp三菱電機株式会社
    • OYA IZUMIYAMAUCHI TOKIKOFURUKAWA SEIJI
    • C02F1/78C02F1/32
    • PROBLEM TO BE SOLVED: To obtain a water treatment apparatus in which the quality of treated water can be stabilized by adjusting an exposure dose of ultraviolet rays optionally.
      SOLUTION: This water treatment apparatus is provided with: a reaction tank 1 through which the water to be treated is circulated; an ozonizer 3 for supplying ozone gas to the water to be treated in the reaction tank 1; an ultraviolet lamp 2a for irradiating the water to be treated in the reaction tank 1 with ultraviolet rays; an ultraviolet absorbing agent flow passage 6 through which an ultraviolet absorbing agent is made to flow to control the exposure dose of the ultraviolet rays to be emitted from the ultraviolet lamp 2a by causing the ultraviolet absorbing agent to absorb a part of the ultraviolet rays; and an ultraviolet absorbing agent concentration adjuster 7 for controlling the concentration of the ultraviolet absorbing agent.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了获得可以通过任意调整紫外线的曝光剂量来稳定处理水的质量的水​​处理设备。 解决方案:该水处理装置设置有:待处理水循环通过的反应槽1; 用于向反应罐1中待处理的水供给臭氧气体的臭氧发生器3; 用于用紫外线照射反应槽1中待处理水的紫外线灯2a; 使紫外线吸收剂流过紫外线吸收剂流路6,通过使紫外线吸收剂吸收紫外线的一部分来控制从紫外灯2a发射的紫外线的曝光量; 紫外线吸收剂浓度调节器7,用于控制紫外线吸收剂的浓度。 版权所有(C)2006,JPO&NCIPI
    • 9. 发明专利
    • METHOD AND APPARATUS FOR PRODUCING OZONE WATER
    • JP2000262874A
    • 2000-09-26
    • JP6837199
    • 1999-03-15
    • MITSUBISHI ELECTRIC CORP
    • MIYAMOTO MAKOTOOYA IZUMINODA SEIJIKUZUMOTO MASAKIKANEGAE YUZO
    • B01F1/00C01B13/10
    • PROBLEM TO BE SOLVED: To produce ozone water high in ozone concentration with the use of ultrapure water by a charge control substance is added into the ultrapure water, and the water is passed through fluororesin hollow fibers in a method for producing ozone water in which ozone is dissolved in the ultrapure water through the hollow fibers. SOLUTION: By the control of a control part 3, oxygen of a raw material gas is mixed with nitrogen and supplied to an ozone gas producing machine 2. In the machine 2, discharge is generated corresponding to input from a power source 4, part of the raw material gas is ozonized into an ozone-containing gas, which is supplied to a fluororesin hollow fiber module 1 by way of a flow rate controller 17. Ultrapure water to be controlled by a flow rate controller 19 for ozone water and others is mixed with a charge control substance such as hydrochloric acid while being controlled by a flow rate controller 18 and supplied to the module 1. The ozone-containing gas and the ultrapure water are subjected to gas-liquid contact in pores. After that, the ozone-containing gas is discharged with ozone decomposed by a residual ozone decomposition device 11.