专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JPS5928337A Projection aligner 失效
标题翻译：投影对准器
公开(公告)号：JPS5928337A
公开(公告)日：1984-02-15
申请号：JP13726982
申请日：1982-08-09
申请人： Hitachi Ltd , Hitachi Tokyo Electronics Co Ltd
发明人： MORITA MITSUHIRO , NOMURA KEIZOU , NISHIZUKA HIROSHI , HOSHI YASUSHI , TAMIYA YOUICHIROU , ASAKAWA TERUSHIGE
IPC分类号： G03B27/32 , G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70358 , G03F7/70066 , G03F7/702 , G03F7/70233 , G03F7/70558 , H01L21/30
摘要： PURPOSE: To maintain the distribution of brightness uniform at all times by such an arrangement wherein the distribution of brightness is detected by a brightness sensor which is caused to enter a light path every time an exposure is made through a photomask, and an alarm is generated when the distribution of brightness becomes uneven, or such uneven distribution is automatically corrected.
CONSTITUTION: On a substrate 1, a scan table 2 which is caused to reciprocate laterally by means of an air bearing mechanism is arranged, and a hole 3 is drilled at its one end and the hole is convered by a photomask 4 on which circuit patterns are provided. On the other end of the table 2, a semiconductor wafer 5 on which a layer of photoresist is provided is placed, another piercing hole 6 corresponding to the hole 3 is provided on the substrate 1 and an image forming part 21 on the table 2 and an illuminating unit 15 under the substrate 1 are interconnected by these two holes 3, 6. The light from a light source 7 in the illuminating unit 15 are sent to the image forming part 21 through reflecting mirrors, and similarly the wafer 5 is illuminated by using each reflecting mirror, and at this time, a brightness sensor 22 is caused to enter the piercing hole 3 every time an exposure is made, and its output is compared with a specified reference value.
COPYRIGHT: (C)1984,JPO&Japio
摘要翻译：目的：为了通过这样的配置来保持亮度均匀的分布，其中亮度分布由每次通过光掩模进行曝光而进入光路的亮度传感器检测到，并且产生报警当亮度分布不均匀时，或者这种不均匀分布被自动校正。构成：在基板1上设置有通过空气轴承机构横向往复运动的扫描台2，并且在其一端钻出孔3，并且孔由光掩模4覆盖，光掩模4在其上具有电路图案被提供。在表2的另一端，放置设置有光致抗蚀剂层的半导体晶片5，在基板1上设置与孔3对应的另一个穿孔6，在台面2上设置图像形成部21，基板1下方的照明单元15通过这两个孔3,6相互连接。来自照明单元15的光源7的光通过反射镜被发送到图像形成部21，类似地，晶片5被使用每个反射镜，此时，每当曝光时，使亮度传感器22进入穿孔3，并将其输出与指定的参考值进行比较。

2. 发明专利

JPS5764949A Continous processor 失效
标题翻译：连续处理器
公开(公告)号：JPS5764949A
公开(公告)日：1982-04-20
申请号：JP14045480
申请日：1980-10-09
申请人： Hitachi Ltd , Hitachi Tokyo Electronics Co Ltd
发明人： NANKOU SUSUMU , MAEJIMA HIROSHI , NOMURA KEIZOU , ISHIOKA MASATO
IPC分类号： H01L21/30 , H01L21/00 , H01L21/027 , H01L21/677 , H01L21/68
CPC分类号： H01L21/67276 , H01L21/67259 , H01L21/68
摘要： PURPOSE:To continously perform the different processings of a processing index by providing a stocker before a stopping position temporarily and accommodating tentatively a work. CONSTITUTION:A wafer 2 is fed to a photosensitive processor 1, is then processed, and is thereafter fed to a stocker 6. Four belt conveyors 7 are sequentially moved, the wafer 2 is temporarily stopped at the end of a conveyor 5 and when a vacant is produced at a development processor 3, the wafer 2 is automatically fed to the processor 3. After the wafer is processed, it is fed to the next step. The existence or absence of the wafer is detected by a pair of light emitting unit and photodetector in each belt conveyor 7 and the conveyor 5 of the stocker, and the information is fed to a mechanism. Since this configuration has a preliminary wafer, the processor 3 is not stopped even if the processor 1 is temporarily stopped to clean and exchange the mask. Since the processor 3 is slow in the processing index but the wafer 2 is contained in the stocker 6, the processor 1 is continously operated without stoppage.
摘要翻译：目的：通过临时提供储存者暂时停止处理工作指标，并暂时适应工作，持续执行加工指标的不同处理。构成：晶片2被馈送到光敏处理器1，然后被处理，然后被供给到储料器6.四个带式输送机7依次移动，晶片2在传送带5的端部暂时停止，并且当一个在显影处理器3处产生空白，晶片2被自动馈送到处理器3.在处理晶片之后，将其馈送到下一步骤。每个带式输送机7和储料器的输送机5中的一对发光单元和光电检测器检测晶片的存在或不存在，并将信息馈送到机构。由于该配置具有初步晶片，即使处理器1暂时停止以清洁和更换掩模，处理器3也不会停止。由于处理器3处理索引较慢，而晶片2被包含在储存器6中，所以处理器1不间断地运行。

3. 发明专利

JPS6039213A PRECISION POSITIONING DEVICE 失效
公开(公告)号：JPS6039213A
公开(公告)日：1985-03-01
申请号：JP14633883
申请日：1983-08-12
申请人： HITACHI LTD
发明人： NOMURA KEIZOU
IPC分类号： G05D3/00 , G05B19/23 , G05D3/12
摘要： PURPOSE:To exercise positioning control with high precision and high resolving power by revising stepwise a control variable to a mechanical movement system being an object to be controlled so as to converge stepwise the actual position of the mechanical movement system to an object position. CONSTITUTION:A position detector 22 like a laser range finder gives a position detecting value Dx to a comparator circuit 24 from a mechanical displacement of the mechanical movement system 20 such as an XY plotter, a difference data DELTAX between the Dx and an object value Dp and a code signal Sx are detected 26, and the result is fed to a register 32 via an adder/subtractor circuit 28. Further, the value stored in the register 32 is revised intermittently at each period of a clock phi of a clock generating circuit 30, its output is fed back to the circuit 28, where the output is added. After its output signal is D/A-converted (34), the result output drives (36) a piezoelectric element 40 so as to drive mechanically the mechanical movement system 20.

4. 发明专利

JPS5258811A PULSE MOTOR DRIVING CIRCUIT 失效
公开(公告)号：JPS5258811A
公开(公告)日：1977-05-14
申请号：JP13407275
申请日：1975-11-10
申请人： HITACHI LTD
发明人： NOMURA KEIZOU
IPC分类号： H02P8/14 , H02P8/00
摘要： PURPOSE:To start and control a driving circuit smoothly by the provision of a function generator, an integrator, a discharging circuit and a mono-stable multivibrator, and by driving a pulse motor by the outputs of the monostable multivibrator.

5. 发明专利

JPS5919326A Plasma processor 失效
标题翻译：等离子体处理器
公开(公告)号：JPS5919326A
公开(公告)日：1984-01-31
申请号：JP12755082
申请日：1982-07-23
申请人： Hitachi Ltd
发明人： KATOU SEIICHI , MAEJIMA HIROSHI , FUJISAWA ATSUSHI , NOMURA KEIZOU , OKABE TSUTOMU
IPC分类号： H01L21/302 , H01J37/32 , H01L21/3065
CPC分类号： H01J37/3244
摘要： PURPOSE:To equalize the processing gas concentration in a bell jar equalizing the processing on the surface of a wafer by a method wherein the electrode opposingly arranged on a wafer supporting electrode are formed into hollow shape and multiple gas supplying pores are formed on the surface of the electrodes. CONSTITUTION:A bell jar 10 comprising a base 11 and a cap 12 is provided with an exhaust hole 13 for vacumizing at the bottom. A lower electrode 14 supported by a supporting conductor 15 is arranged at the lower side of the bell jar 10 and a wafer W is placed on the surface of the lower electrode 14 above which an upper electrode 16 is supported by another supporting conductor 17. The electrode 16 is formed into a disc with thick wall internally formed into hollow shape to be a gas chamber 18 interconnecting to a gas supply source through the intermediary of the pipe type supporting conductor 17. On the other hand, multiple gas supplying pores 19 are opened in the gas chamber 18 on the surface of the electrode 16 jetting gas through these gas supplying pores 19.
摘要翻译：目的：为了均衡通过将晶片支撑电极相对布置的电极形成为中空形状的方法来平衡晶片表面上的处理的钟罩中的处理气体浓度，并且在表面上形成多个气体供给孔电极。构成：包括基座11和盖12的钟形瓶10设置有用于在底部放置的排气孔13。由支撑导体15支撑的下电极14布置在钟罩10的下侧，并且晶片W被放置在下电极14的表面上方，上电极16由另一支撑导体17支撑。电极16形成为具有内部形成为中空形状的厚壁的盘，其为通过管式支撑导体17的中间与气体供给源互连的气室18.另一方面，打开多个气体供给孔19 在电极16的表面上的气室18中，通过这些气体供应孔19喷射气体。

6. 发明专利

JPS54138974A POSITION CONTROL CIRCUIT 失效
公开(公告)号：JPS54138974A
公开(公告)日：1979-10-27
申请号：JP4653078
申请日：1978-04-21
申请人： HITACHI LTD
发明人： NOMURA KEIZOU , YABUHARA YOUJI
IPC分类号： H01L21/30 , G05D3/00 , G05D3/12 , G05D15/00 , G05D15/01 , H01L21/027 , H01L21/67 , H01L21/68
摘要： PURPOSE:To enable a control of contact pressure with high accuracy to be effected assuredly by constituting a position control circuit such that the contact pressure control is effected with taking into consideration, in addition to the amount of displacement due to contact of a movable member with a stationary member, the rate of change of such displacement amount. CONSTITUTION:A sampling hold circuit 2 receives and samples a signal Vi of the position of a movable member 2 to hold same, and a subtractor circuit 3 calculates the difference of the position signal Vi from the output of the sampling hold circuit 2. Integrator circuits 4, 5 integrate the output of the subtractor circuit 3 and a constant fixed voltage (-V), respectively. Another subtractor circuit 6 calculates the difference between the outputs Va, Vb of both integrator circuits 4, 5, and a voltage comparator circuit 7 effects a comparison of levels between the output of the subtractor circuit 6 and a reference voltage Vref for setting a predetermined contact pressure to generate an output representative of the result of the judgement of the actual contact pressure.

7. 发明专利

JPS5456356A DICING DEVICE 失效
公开(公告)号：JPS5456356A
公开(公告)日：1979-05-07
申请号：JP12235577
申请日：1977-10-14
申请人： HITACHI LTD
发明人： SHIMATA TSUTOMU , NOMURA KEIZOU , KABASHIMA AKIRA
IPC分类号： H01L21/677 , B65G60/00 , H01L21/301 , H01L21/302 , H01L21/68 , H01L21/78
摘要： PURPOSE:To form a mechanism of not damaging the wafer at the time of removing the wafer after working in a dicing device provided with automatic handling mechanism. CONSTITUTION:A wafer 10 is sucked to a Verneuil chuck 14 at the state of feeding. When an arm 15 moves and the wafer comes over a base 11, air jetting 20 is stopped and holding is released. The wafer is sucked to the base 11 and is subjected to grooving. After working, a mechanism 13 moves to push the edge of the wafer on the base 11 and transfer the same onto a jig 12. Even if washing solution intervenes between the bottom of the wafer and the face of the base, the wafer can move with extremely small force because the solution is of low viscosity, thus cracking of the wafer does not occur. The moisture between the bottom face of the wafer and the top face of the jig 12 is slight because of a multiplicity of deep grooves 17 on the top of the jig 12. The chuck 14 moves slightly above the wafer and carries the wafer to a desired position by holding the same in the absence of any contact with the bottom of the chuck owing to air jetting 20. Even at this time, the effect of the grooves 17 causes the wafer to be sucked and prevents the same from being cracked.

8. 发明专利

JPS52131284A ADJUSTING DEVICE FOR HEIGHT OF BLADE 失效
公开(公告)号：JPS52131284A
公开(公告)日：1977-11-04
申请号：JP4766476
申请日：1976-04-28
申请人： HITACHI LTD
发明人： KIYOUMASU RIYUUICHI , NOMURA KEIZOU
IPC分类号： H01L21/301 , B26D1/14 , H01L21/00
摘要： PURPOSE:To maintain a height of a blade at a constant by allowing a device table and a blade height detector to move an equivalent distance to a blade edge.

9. 发明专利

JPS59188384A Controller for dc motor 失效
标题翻译：直流电机控制器
公开(公告)号：JPS59188384A
公开(公告)日：1984-10-25
申请号：JP6076183
申请日：1983-04-08
申请人： Hitachi Ltd
发明人： OKABE TSUTOMU , NOMURA KEIZOU
IPC分类号： H02P3/12
CPC分类号： H02P3/12
摘要： PURPOSE:To enable to obtain high positioning accuracy of a DC motor by absorbing a counterelectromotive force generated from the motor at the stopping time of the motor through a bridge rectifier to a semiconductor switching element. CONSTITUTION:In order to abruptly stop a motor M, when a command signal Vs is rapidly set to a zero level, a counterelectromotive force is generated from the drive terminal of the motor M. Since a transistor Q1 becomes conductive state by setting the signal Vs to the zero level, the counterelectromotive force generated from the motor M is flowed through a bridge circuit BD1 to the transistor Q1. In this manner, the motor M is immediately regeneratively braked by an active load via the transistor Q1 and instantaneously stopped.
摘要翻译：目的：通过在电动机的停机时间通过桥式整流器吸收从电动机产生的反电动势到半导体开关元件，能够获得直流电动机的高定位精度。构成：为了突然停止电动机M，当指令信号Vs快速设定为零电平时，从电动机M的驱动端产生反电动势。由于晶体管Q1通过设定信号Vs而成为导通状态从零电平开始，从电动机M产生的反电动势通过桥式电路BD1流向晶体管Q1。以这种方式，电动机M立即通过晶体管Q1由有功负载再生制动并瞬时停止。

10. 发明专利

JPS5974630A Dry etching device 失效
标题翻译：干蚀设备
公开(公告)号：JPS5974630A
公开(公告)日：1984-04-27
申请号：JP18457082
申请日：1982-10-22
申请人： Hitachi Ltd
发明人： FUJISAWA ATSUSHI , MAEJIMA HIROSHI , KATOU SEIICHI , NOMURA KEIZOU , OKABE TSUTOMU
IPC分类号： H01L21/302 , H01L21/3065
CPC分类号： H01L21/302
摘要： PURPOSE:To etch the whole surface of a material to be etched uniformly by forming a mask for inhibiting etching coating adjacent to the peripheral section of the material to be etched on a susceptor electrode. CONSTITUTION:The mask 9 for inhibiting etching is placed and fixed on the central hole of a mask 8 for protecting an electrode. Since the peripheral section of a wafer 5 is coated with the mask 9 for inhibiting etching, a tendency of which an electric field concentrates to the periphery of the wafer is relaxed, and a physical anisotropic etching reaction by the acceleration of ions advances at approximately the same speed as the central section of the wafer. Reactive components generating a gas electrochemical reaction also flow into the peripheral section of the wafer because the peripheral section of the wafer 5 is not fast stuck and coated with the mask 9 but is coated while taking a slight space. Accordingly, gas electrochemical etching also advances at approximately the same speed in the peripheral section and the central section.
摘要翻译：目的：通过在基体电极上形成用于抑制邻近被蚀刻材料的周边部分的蚀刻涂层的掩模，来均匀蚀刻被蚀刻材料的整个表面。构成：将用于抑制蚀刻的掩模9放置并固定在用于保护电极的掩模8的中心孔上。由于晶片5的外围部分涂覆有用于抑制蚀刻的掩模9，因此放电了电场集中于晶片周围的趋势，并且通过离子加速的物理各向异性蚀刻反应大致在与晶片的中心部分相同的速度。产生气体电化学反应的反应性组分也流入晶片的周边部分，因为晶片5的周边部分没有被快速卡住并涂覆有掩模9，而是在稍微的空间的同时被涂覆。因此，气体电化学蚀刻也在周边部分和中心部分以大致相同的速度前进。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式