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1. 发明专利

JP2005108743A Test piece holder for electron microscope and electron microscope 有权
标题翻译：电子显微镜和电子显微镜的测试夹具
公开(公告)号：JP2005108743A
公开(公告)日：2005-04-21
申请号：JP2003342926
申请日：2003-10-01
申请人： Hitachi High-Technologies Corp , Hitachi Ltd , 株式会社日立ハイテクノロジーズ , 株式会社日立製作所
发明人： FUJIEDA TADASHI , HIDAKA KISHIO , HAYASHIBARA MITSUO , TODOROKI KAZUYOSHI , UENO TAKEO , ISAGOZAWA SHIGETO
IPC分类号： H01J37/20 , H01J1/304 , H01J37/26
摘要： PROBLEM TO BE SOLVED: To realize high resolution observation of electron source structural change while monitoring field emission property with high precision. SOLUTION: A counterelectrode, linearly movable on an axis of the test piece until coming into contact with the test piece is provided in a position facing the test piece emitting electrons and a mean to apply voltage between the test piece and the countereletrode is provided in the test piece holder for electron microscope. The test piece holder for the electron microscope is provided with the surface of the counterelectrode facing the test piece as an approximate flat surface constituted from material with low production rate for secondary electrons. The test piece holder for electron microscope is provided with the counterelectrode which is the approximate flat surface with the surface facing the test piece constituted from the material with the low production rate of secondary electrons, or a hollow body provided with an opening part on one part of the approximate flat surface with the counterelectrode with at least one part of an inner wall of the hollow body constituted from material with low production rate for secondary electrons and a mechanism to cool the test piece. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：实现电子源结构变化的高分辨率观察，同时以高精度监测场发射特性。解决方案：在与测试件接触的试件的轴线处可直线移动的反电极设置在面向发射电子的测试件的位置，并且在测试片和反电极之间施加电压的平均值是设置在电子显微镜的试片架上。电子显微镜的试片保持器具有面向试验片的反电极的表面，作为由二次电子生产率低的材料构成的近似平面。电子显微镜用试片保持器设置有反电极，该对电极是由具有低二次电生成速率的材料构成的试验片的表面的近似平面，或者在一部分上设置有开口部的中空主体具有反电极的大致平坦表面与中空体的内壁的至少一部分由二次电子的低生产率的材料构成，以及冷却试样的机构。版权所有（C）2005，JPO＆NCIPI

2. 发明专利

JP2003035682A Sample holder and sample analysis method 有权
标题翻译：样本持有人和样本分析方法
公开(公告)号：JP2003035682A
公开(公告)日：2003-02-07
申请号：JP2001223167
申请日：2001-07-24
申请人： Hitachi Ltd , Hitachi Sci Syst Ltd , 株式会社日立サイエンスシステムズ , 株式会社日立製作所
发明人： YAGUCHI NORIE , UENO TAKEO , KOIKE HIDEMI
IPC分类号： G01N23/04 , G01N1/28 , G01R31/28 , G01R31/302 , H01J37/20
摘要： PROBLEM TO BE SOLVED: To observe a phenomenon that is generated in a device by directly applying a voltage to a specific section inside an LSI whose design dimensions are approximately 0.1 μm. SOLUTION: A process for mounting fine conductors 30a and 30b to an extracted fine sample piece 72, and a process for applying a voltage to the mounted fine conductors are added to a process for machining and extracting an arbitrary region in a target sample into fine sample pieces using charge particle beams.
摘要翻译：要解决的问题：通过直接向设计尺寸为约0.1μm的LSI内的特定部分施加电压来观察在器件中产生的现象。解决方案：将精细导体30a和30b安装到提取的细样品72上的过程以及向安装的细导体施加电压的处理被添加到用于将目标样品中的任意区域加工和提取为细样品的处理使用电荷粒子束。

3. 发明专利

JP2004063463A Operating method of electron microscope, and electron microscope 审中-公开
公开(公告)号：JP2004063463A
公开(公告)日：2004-02-26
申请号：JP2003191579
申请日：2003-07-04
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： HIDAKA KISHIO , UENO TAKEO , YAGUCHI NORIE , USAMI KATSUHISA , AOYAMA TAKASHI , NAKAMURA SHIGEYOSHI , HIRAGA MAKOTO , TOMITA MASAHIRO
IPC分类号： G01N1/28 , H01J37/20
摘要： PROBLEM TO BE SOLVED: To provide an operating method at a high temperature, of an electron microscope, and the electron microscope, capable of stably setting a sample and efficiently heating the same with respect to high temperature properties such as phase transformation and phase transition required in the development of a heat-proof material. SOLUTION: The sample to be observed is positioned on a central hole of a double spiral flat filament, a detachable heating stage is fixed to a heating holder by a screw of a pivot, and the heating stage is vertically inclined by a crank-type arm. The heating stage and the arm are insulated from each other by an insulating member, and the electric current from a power source is conducted by a conductive wire to heat the filament. COPYRIGHT: (C)2004,JPO

4. 发明专利

JP2007279070A Sample analysis method 有权
标题翻译：样本分析方法
公开(公告)号：JP2007279070A
公开(公告)日：2007-10-25
申请号：JP2007190890
申请日：2007-07-23
申请人： Hitachi High-Tech Science Systems Corp , Hitachi Ltd , 株式会社日立ハイテクサイエンスシステムズ , 株式会社日立製作所
发明人： YAGUCHI NORIE , UENO TAKEO , KOIKE HIDEMI
IPC分类号： G01N23/04
摘要： PROBLEM TO BE SOLVED: To observe the phenomenon generated within a device by directly applying voltage at a specific position within an LSI with design dimensions of about 0.1 μm.
SOLUTION: This method comprises, in addition to a process for processing arbitrary area of an object sample into a fine sample piece by using charged particle beam and extracting the sample piece, a process for attaching fine conductors 30a and 30b to the extracted fine sample piece 72, and a process for applying voltage to the attached fine conductors.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：通过在设计尺寸为约0.1μm的LSI内的特定位置处直接施加电压来观察装置内产生的现象。解决方案：除了通过使用带电粒子束并提取样品片将物体样品的任意区域处理成细样品的方法之外，还包括将精细导体30a和30b附接到提取的细样片72，以及向附着的细导体施加电压的处理。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2002367551A Electron beam device 有权
标题翻译：电子束装置
公开(公告)号：JP2002367551A
公开(公告)日：2002-12-20
申请号：JP2001172662
申请日：2001-06-07
申请人： Hitachi Ltd , Hitachi Sci Syst Ltd , 株式会社日立サイエンスシステムズ , 株式会社日立製作所
发明人： KONNO MITSURU , UENO TAKEO , HASHIMOTO TAKAHITO
IPC分类号： G21K5/04 , H01J37/153 , H01J37/20 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide an electron beam device capable of quickly correcting astigmatism in a short time, and easily achieving precise calibration of magnification and correction of camera length using a sharp image of a sample.
SOLUTION: An electron microscope has a sample holder 5 for a sample P to be observed and a sample holder 11 provided with a standard sample R, and achieves calibration of magnification and correction of camera length using an observed image of the standard sample R. A crystal grain having an island structure and positioned on an amorphous film is used as the standard sample R. Astigmatism is corrected using an observed image of the amorphous film and thereby an image of the crystal grain is observed while the astigmatism is corrected to allow calibration of magnification and correction of camera length.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供能够在短时间内快速校正像散的电子束装置，并且可以使用样本的清晰图像容易地实现放大倍数的精确校准和相机长度的校正。解决方案：电子显微镜具有用于待观察的样品P的样品保持器5和具有标准样品R的样品保持器11，并且使用标准样品R的观察图像实现放大倍数的校正和相机长度的校正。使用具有岛状结构且位于非晶膜上的晶粒作为标准样品R.使用非晶膜的观察图像来校正散光，从而观察晶体的图像，同时校正像散以允许校准相机长度的放大和校正。

6. 发明专利

JP2002063484A ELECTRONIC PROCURING SYSTEM, ELECTRONIC PROCUREMENT SUPPORT DEVICE AND ELECTRONIC PROCURING METHOD 失效
公开(公告)号：JP2002063484A
公开(公告)日：2002-02-28
申请号：JP2000254251
申请日：2000-08-21
申请人： HITACHI LTD
发明人： MIZUNO HISAKAZU , UENO TAKEO , EHATA MAKOTO , TAKAOKA HIROSHI , NAKAJIMA MAKOTO , SAITO HISAFUMI , ITO KINJI , YOSHIDA TAKAHIRO , MATSUMOTO YASUNARI
IPC分类号： G06Q30/02 , G06F17/30 , G06Q30/06 , G06Q50/00 , G06F17/60
摘要： PROBLEM TO BE SOLVED: To provide an electronic procuring system and its method, by which parts whose quality is guaranteed are procured. SOLUTION: The system is provided with a computer having a parts approval file 11 which is constituted by comprising a parts approval information database, a procurement destination approval information database and a procurement article specification information database so that approved parts information and parts specifications are provided by the computer via a network 9.

7. 发明专利

JP2001084937A SAMPLE HEATING DEVICE FOR ELECTRON MICROSCOPE 失效
公开(公告)号：JP2001084937A
公开(公告)日：2001-03-30
申请号：JP26322599
申请日：1999-09-17
申请人： HITACHI LTD , HITACHI SCIENCE SYSTEMS LTD
发明人： YAGUCHI NORIE , UENO TAKEO , KOBAYASHI HIROYUKI
IPC分类号： H01J37/153
摘要： PROBLEM TO BE SOLVED: To easily correct shift of optical axis of electron beam, astigmatism of a permeation image, and the like generated by heating ferromagnetic material by providing a magnetic field control mechanism for varying magnetic field near a sample according to a sample temperature. SOLUTION: A sample 2 is heated by a heater 3. A temperature of the sample 2 is detected by a temperature detector 7 and inputted into a comparing circuit 13 in a magnetic field control part 10 at any time. The inputted temperature is compared with the Curie temperature of the sample 2 previously inputted into a storage circuit 11 in the comparing circuit 13. When the inputted temperature and the Curie temperature are different, the magnetic field control part 10 controls a magnetic coil power source 9 to be constant and the current flowing through a magnetic coil 8 is constant. When the inputted temperature and the Curie temperature become the same temperature, the magnetic field control part 10 controls the magnetic coil power source 9 from a magnetic coil power source control part 12, so as to cut-off the current flowing through the magnetic coil 8 for the ferromagnetic body to become a paramagnetic material.

8. 发明专利

JP2000123774A SCANNING TUNNELING ELECTRON MICROSCOPE 失效
公开(公告)号：JP2000123774A
公开(公告)日：2000-04-28
申请号：JP29343898
申请日：1998-10-15
申请人： HITACHI LTD , HITACHI INSTRUMENTS ENG
发明人： YAGUCHI NORIE , HASHIMOTO TAKAHITO , KONNO MITSURU , UENO TAKEO , ISAGOZAWA SHIGETO
IPC分类号： H01J37/22 , H01J37/141 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To observe and record a scanned/transmitted image and an electron beam diffraction image with a simple structure without requiring a two-dimensional detector by scanning a sample with an electron beam focused below the sample, and providing a function for displaying the electron beam diffraction image of the sample with the electron beam. SOLUTION: When a sample 6 is scanned by an electron beam 5 for observing a scanned/transmitted image with an objective lens 4 strongly excited, an electron beam 17 transmitting the sample 6 invariably enters a detector 13, and the scanned/transmitted image of the sample 6 is observed on a CRT 9 scanned synchronously with electron beam scanning. The electron beam diffracted by the sample 6 does not enter the detector 13. A lens power supply 15 is controlled by a lens current controller 16 to weakly excite the objective lens 4 for displaying an electron beam diffraction image. The electron beam incidence angle is changed synchronously with the scanning of the incident electron beam 5 in this case, spots of the electron beam diffraction image enter the detector 13, and the electron beam diffraction image is displayed on the CRT 9.

9. 发明专利

JPH11101756A ELECTRON MICROSCOPE 失效
公开(公告)号：JPH11101756A
公开(公告)日：1999-04-13
申请号：JP26325397
申请日：1997-09-29
申请人： HITACHI LTD , HITACHI INSTRUMENTS ENG
发明人： SAITO KIYOTAKA , UENO TAKEO , TANAKA HIROYUKI
IPC分类号： G01N23/225 , H01J37/22
摘要： PROBLEM TO BE SOLVED: To obtain an electron microscope by which an X-ray analysis in a plurality of visual fields is performed automatically, which omits a complicated operation and whose operability and operating efficiency are enhanced, by a method wherein a plurality of points to be analyzed are stored on the side of the electron microscope and on the side of a video camera system and a movement to an arbitrary point to be analyzed and a dislocation in the movement are corrected automatically. SOLUTION: A visual field in which an X-ray analysis is performed is fecthed by a camera control unit 2, image data in which the center of its image is used as a measuring point is stored in a microcomputer 5 so as to be used as an image A, and also the position of a sample in an electron microscope 3 is stored simultaneously. Then, the position of the sample in the measuring point of a selected visual field is fetched into a television camera 1 and the unit 2 by a sample control unit 7 so as to be used as an image B, a place with which the image A agrees in the image B is specified, an electron beam is deflected to its coordinates by an electron beam control unit 9, a beam spot is applied, and the X-ray analysis is started. As a result, a plurality of visual fields can be analyzed automatically and continuously in such a way that an observing and photographing operation and the X-ray analysis are not repeated alternately by the microscope 3.

10. 发明专利

JPH09134700A FOCUSING ION BEAM MACHINING DEVICE 失效
公开(公告)号：JPH09134700A
公开(公告)日：1997-05-20
申请号：JP29111195
申请日：1995-11-09
申请人： HITACHI LTD , HITACHI INSTRUMENTS ENG
发明人： YAGUCHI NORIE , UENO TAKEO
IPC分类号： G01N1/28 , C23F4/00 , G01N1/32 , H01J37/244 , H01J37/30
摘要： PROBLEM TO BE SOLVED: To provide a machining device which can automatically detect machining speed of a sample, a machined quantity and a residual thickness of the sample with high accuracy and can prepare a thin film sample for observation of an electron microscope with high accuracy and with high efficiency. SOLUTION: A sample 5 is loaded on a sample holder 8, and the sample 5 is connected in series to a voltage power source 16 to impress voltage on this and an ammeter 17 to measure an electric current flowing to the sample 5. The voltage power source 16 is connected to a voltage power source control part 18, and voltage is intermittently impressed on the sample 5 at work time, and an electric current flowing to the sample 5 is measured, and a resistance change in the sample 5 is calculated by a computer 10. A thickness change in the sample 5 is calculated from the calculated resistance change in the sample 5, and whether or not it is machined into a prescribed thickness is judged. the machined volume and machining speed of the sample 5 at machining time are displayed on a data display part 19, and when the sample 5 is machined into the prescribed thickness, machining of the sample 5 is automatically stopped.

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