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    • 4. 发明专利
    • Scanning probe microscope and method of observing sample using the same
    • 扫描探针显微镜及其使用方法观察样品
    • JP2009236895A
    • 2009-10-15
    • JP2008252097
    • 2008-09-30
    • Hitachi Ltd株式会社日立製作所
    • NAKADA TOSHIHIKOWATANABE MASAHIROINOUE TAKASHIHIDAKA KISHIOOKAI MAKOTOMORITA TOSHIAKIHIROOKA MASAYUKI
    • G01Q60/06G01Q60/18G01Q60/22
    • G01Q60/06G01N21/648G01Q60/22G01Q70/12
    • PROBLEM TO BE SOLVED: To solve the problem of being a limit of resolution in several ten nanometer, and the problem of being remarkably low in measurement reproducibility by damage and abrasion of a probe, since the opening formation of several ten nm is practically a limit in a near-field scanning microscope using an opening probe and the external illuminating light becomes background noise in the near-field scanning microscope using a scattering probe. SOLUTION: A plasmon-increased near-field probe having the optical separation function of a nanometer-order is constituted by combining a cylindrical structure of the nanometer- order and a microscopic structure of the nanometer-order, and optical information and recess-projection information on a sample surface are measured with nanometer-order resolution and high reproducibility, without damaging both the probe and a sample, by repeating the approach-retreat by low contact force at respective measuring points on the sample. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:为了解决几纳米的分辨率极限的问题,以及由于探针的损伤和磨损而导致的测量再现性显着低的问题,由于几十nm的开口形成是 在使用散射探针的近场扫描显微镜中,使用开口探针的近场扫描显微镜实际上是极限,并且外部照明光成为背景噪声。 解决方案:具有纳米级的光学分离功能的等离子体增强的近场探针是通过将纳米级的圆柱形结构和纳米级的微观结构与光学信息和凹部 在样品表面上的投影信息以纳米级分辨率和高重现性测量,而不损害探针和样品,通过在样品的各个测量点处以低接触力重复接近 - 退回。 版权所有(C)2010,JPO&INPIT
    • 5. 发明专利
    • Test piece holder for electron microscope and electron microscope
    • 电子显微镜和电子显微镜的测试夹具
    • JP2005108743A
    • 2005-04-21
    • JP2003342926
    • 2003-10-01
    • Hitachi High-Technologies CorpHitachi Ltd株式会社日立ハイテクノロジーズ株式会社日立製作所
    • FUJIEDA TADASHIHIDAKA KISHIOHAYASHIBARA MITSUOTODOROKI KAZUYOSHIUENO TAKEOISAGOZAWA SHIGETO
    • H01J37/20H01J1/304H01J37/26
    • PROBLEM TO BE SOLVED: To realize high resolution observation of electron source structural change while monitoring field emission property with high precision. SOLUTION: A counterelectrode, linearly movable on an axis of the test piece until coming into contact with the test piece is provided in a position facing the test piece emitting electrons and a mean to apply voltage between the test piece and the countereletrode is provided in the test piece holder for electron microscope. The test piece holder for the electron microscope is provided with the surface of the counterelectrode facing the test piece as an approximate flat surface constituted from material with low production rate for secondary electrons. The test piece holder for electron microscope is provided with the counterelectrode which is the approximate flat surface with the surface facing the test piece constituted from the material with the low production rate of secondary electrons, or a hollow body provided with an opening part on one part of the approximate flat surface with the counterelectrode with at least one part of an inner wall of the hollow body constituted from material with low production rate for secondary electrons and a mechanism to cool the test piece. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:实现电子源结构变化的高分辨率观察,同时以高精度监测场发射特性。 解决方案:在与测试件接触的试件的轴线处可直线移动的反电极设置在面向发射电子的测试件的位置,并且在测试片和反电极之间施加电压的平均值是 设置在电子显微镜的试片架上。 电子显微镜的试片保持器具有面向试验片的反电极的表面,作为由二次电子生产率低的材料构成的近似平面。 电子显微镜用试片保持器设置有反电极,该对电极是由具有低二次电生成速率的材料构成的试验片的表面的近似平面,或者在一部分上设置有开口部的中空主体 具有反电极的大致平坦表面与中空体的内壁的至少一部分由二次电子的低生产率的材料构成,以及冷却试样的机构。 版权所有(C)2005,JPO&NCIPI