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1. 发明专利

JP2007010443A Cutting method of radioactive lattice structure 审中-公开
标题翻译：放射性结构的切割方法
公开(公告)号：JP2007010443A
公开(公告)日：2007-01-18
申请号：JP2005190867
申请日：2005-06-30
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ISHIGAMORI ISAO , IZUMI KIYOSHI , ADACHI KOICHI
IPC分类号： G21C19/02 , G21F9/30
摘要： PROBLEM TO BE SOLVED: To cut efficiently when an activated upper lattice plate is shredded before disposal in the water in an apparatus storing pool of a nuclear power plant.
SOLUTION: While allowing an abrasive water jet to hit onto the upper lattice plate 1 from a cutting nozzle 13 in the water in the apparatus storing pool 14, the cutting nozzle 13 is moved from the upside to the downside by a mast 38 of a multi-axial manipulator, to thereby execute the first cutting 8 of a crossing part of the lattice on the upper lattice plate 1 along a cutting line oblique to the lattice plate. Thereafter, while moving the cutting nozzle 13 from the upside to the downside by the mast 38 of the multi-axial manipulator, the second cutting 9 is executed at a position adjacent to the crossing part of the lattice of the upper lattice plate 1. The two-spot cutting is executed at the crossing part of each lattice, to thereby cut and divide the lattice plate of the upper lattice plate 1 into sawtooth-shaped cut pieces 25 including the lattice plate existing on two sides of the lattice.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：当在核电厂的存储池中的水中处理之前将活化的上格栅板切碎时，有效地切割。解决方案：当磨料水射流从设备储存池14中的水中的切割喷嘴13喷射到上格栅板1上时，切割喷嘴13通过桅杆38从上侧移动到下侧的多轴操作器，从而沿着与格子板倾斜的切割线执行上格子板1上的格子的交叉部分的第一切割8。此后，通过多轴操纵器的桅杆38将切割喷嘴13从上侧向下侧移动，在与上格子板1的格子的交叉部分相邻的位置处执行第二切割9。在每个格子的交叉部分执行两点切割，从而将上格栅板1的格板切割成包括存在于格子两侧的格子板的锯齿形切割片25。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2006242727A Partitioner in pool 审中-公开
标题翻译：分拣机在池中
公开(公告)号：JP2006242727A
公开(公告)日：2006-09-14
申请号：JP2005058320
申请日：2005-03-03
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ISHIGAMORI ISAO , KIMURA HIDE , ADACHI KOICHI
IPC分类号： G21C19/07 , G21C19/02 , G21C19/307
摘要： PROBLEM TO BE SOLVED: To suppress contamination of equipment caused by intrusion into an equipment storage domain, of contaminants generated at the cutting time by a cutting work in the equipment storage pool of a nuclear power plant.
SOLUTION: The equipment storage pool 41 of the nuclear power plant is partitioned by double curtains 1, 2, to be thereby divided into a cutting pool 9 and a storage pool 8, and clean water 12 acquired by purifying pool water in the cutting pool by a purification device 6 is injected into a pocket 3 formed between the double curtains 1, 2. As for a gap of the partition generated in a sealing part between the curtains 1, 2 and the pool inner surface, the clean water 12 is run from the pocket 3 into the cutting pool 9 and the storage pool 8 via the gap, to thereby prevent contaminated water generated on the cutting pool 9 side from entering the storage pool 8 side via the gap.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了抑制由于入侵到设备存储区域而导致的设备对在切割时产生的污染物，通过在核电站的设备存储池中的切割工作。解决方案：核电站的设备存储池41由双层帘幕1,2分隔，从而分为切割池9和储存池8，以及通过净化池中的池水获得的清洁水12 通过净化装置6将切割池注入到形成在双层帘1,2之间的袋3中。对于在窗帘1,2和池内表面之间的密封部分中产生的隔壁的间隙，清洁水12 经由间隙从口袋3进入切割池9和储存池8，从而防止在切割池9侧产生的污染水经由间隙进入储存池8侧。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2007192694A Method for mitigating adhesion of rust and nuclear power plant 审中-公开
标题翻译：降低RUST和核电厂粘合的方法
公开(公告)号：JP2007192694A
公开(公告)日：2007-08-02
申请号：JP2006011927
申请日：2006-01-20
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NISHIOKA EIJI , WATANABE ATSUSHI , NAGASE MAKOTO , HOSOKAWA HIDEYUKI , IZUMI KIYOSHI , ADACHI KOICHI
IPC分类号： G21C19/07 , G21C19/02 , G21D1/00
CPC分类号： Y02E30/40
摘要： PROBLEM TO BE SOLVED: To realize an ideal method for mitigating the adhesion of rust onto the surface of plant members.
SOLUTION: In the method for mitigating the adhesion of rust, a ferrite coating film is formed in a section in contact with water which contains suspended matter in it causing rust in a steam dryer/separator pool (DSP) 16, for example, constituting a plant or a cutting device 18 or a recovery device 20, for example, used for the plant.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：实现减轻生锈附着到植物表面上的理想方法。解决方案：在减轻锈蚀附着的方法中，在与蒸汽干燥器/分离器池（DSP）16中生成的悬浮物质的水接触的部分形成铁氧体涂膜，例如，构成例如用于植物的植物或切割装置18或恢复装置20。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2007130716A Method and device for generating abrasive water jet 有权
标题翻译：用于生成磨料水射流的方法和装置
公开(公告)号：JP2007130716A
公开(公告)日：2007-05-31
申请号：JP2005325545
申请日：2005-11-10
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： UENO YOHEI , IZUMI KIYOSHI , ADACHI KOICHI
IPC分类号： B24C7/00 , B24C5/02
摘要： PROBLEM TO BE SOLVED: To restrain variation of cutting performance of an abrasive water jet cutter.
SOLUTION: According to this method for generating abrasive water jet, an opening of an abrasive throttle device 4 provided in an abrasive supply passage 7 to a nozzle device 1 of the abrasive water jet cutter is adjusted to obtain a desired abrasive supply quantity for obtaining desired cutting performance, and abrasive in an abrasive storage tank 3 is supplied through an abrasive throttle device 4 to the nozzle device 1. On the other hand, a time change of mass of abrasive in the abrasive storage tank 3 is detected according to the measurement result of a load cell 5 receiving the abrasive storage tank 3, an abrasive supply quantity per unit time in measurement is obtained from the measurement result, and an opening of a compressed air throttle device 11 in a compressed air supply passage 12 force-feeding the abrasive to the nozzle device 1 is varied to adjust the supply quantity of the abrasive to the nozzle device 1.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：抑制磨料水射流切割机的切割性能的变化。解决方案：根据这种用于产生磨料水射流的方法，调节设置在磨料供应通道7中的研磨节流装置4到磨料水射流切割器的喷嘴装置1的开口，以获得期望的磨料供应量为了获得期望的切割性能，并且研磨储存罐3中的研磨剂通过研磨节流装置4供应到喷嘴装置1.另一方面，根据所述研磨储存罐3中的研磨储存罐3的磨料质量的时间变化被检测接收研磨储存箱3的测力传感器5的测量结果，从测量结果获得每单位时间的磨料供给量，并且压缩空气供给通道12中的压缩空气节流装置11的打开，将磨料送入喷嘴装置1是变化的，以调节磨料对喷嘴装置1的供给量。（C）2007年，JPO＆INPIT

5. 发明专利

JP2004170399A Array sensor for transmitting / receiving ultrasonic waves, and apparatus and method for ultrasonic flaw detection 有权
标题翻译：用于发射/接收超声波的阵列传感器，以及用于超声波检测的装置和方法
公开(公告)号：JP2004170399A
公开(公告)日：2004-06-17
申请号：JP2003369772
申请日：2003-10-30
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： FUJIMA MASAHIRO , KONO NAOYUKI , KOIKE MASAHIRO , ADACHI KOICHI , SHIMURA TAKAO , SENOO MAKOTO , MATSUI TETSUYA
IPC分类号： G01N29/24 , G01N29/04 , G01N29/26 , G21C17/003 , G21C19/02 , G01N29/10
CPC分类号： G01N29/069 , G01N2291/0258 , G01N2291/0427 , G01N2291/044 , G01N2291/2695
摘要： PROBLEM TO BE SOLVED: To detect diffracted waves in an object to be inspected, and thereby stabilizing the detection sensitivity of an ultrasonic flaw detector which carries out ultrasonic flaw detection processes and robustly keeping stability. SOLUTION: In the method, a focus point 17 in an acoustic focusing field is scanned electronically within a range including 30 degrees for half of the sum of the transmission angle value of ultrasonic waves 16 and a receiving angle value of the diffracted waves 18 in relation to the object material to be inspected 21, by using a transmitting transducer array 15 and a receiving transducer array 19 incorporated in a common sensor 14; then an edge section of a flaw 22 is detected from the received diffracted wave 18, as a result; and the detection of the flaw 22 and sizing of the flaw 22 in the depth direction are carried out. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：检测待检查物体中的衍射波，从而稳定超声波探伤仪的检测灵敏度，该超声波探伤仪进行超声波探伤过程并坚固地保持稳定性。解决方案：在该方法中，在超声波16的透射角值的和的一半和衍射波的接收角度值的一半的范围内，在包括30度的范围内电声扫描声聚焦场中的焦点17 通过使用并入公共传感器14的发送换能器阵列15和接收换能器阵列19，相对于被检查物体21，则从接收的衍射波18检测出缺陷22的边缘部分，结果是，并且进行缺陷22的检测和深度方向上的缺陷22的尺寸调整。版权所有（C）2004，JPO

6. 发明专利

JP2002071537A APPARATUS FOR COLLECTING DEFECTIVE REPLICA 失效
公开(公告)号：JP2002071537A
公开(公告)日：2002-03-08
申请号：JP2000263597
申请日：2000-08-31
申请人： HITACHI LTD
发明人： HIRANO AKIHIKO , SATO NAOTO , SAKATA HIROSHI , SUGANO SATOSHI , SHIMURA TAKAO , ADACHI KOICHI , SAITO NOBORU
IPC分类号： G01B1/00 , G01N1/28 , G21C17/00 , G21C17/017 , G21C19/02
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for collecting defective replicas which is made possible to highly accurately and surely collect replicas even from the surface of a structure in water. SOLUTION: A deforming member such as a void-like expansion member 17 or the like is arranged in a container part 14 set to a leading end of a replica-collecting part 40. The deforming member is superior in adhesion to the replica and is deformed when a replica material is injected to the surface of the structure 22. The replica material is injected from a replica material supply nozzle 18 to between the surface of the structure 22 and the void-like expansion member 17. The replica is collected with the utilization of the adhesion to the void-like expansion member 17.

7. 发明专利

JP2000346982A UNDERWATER CUTTING DEVICE 失效
公开(公告)号：JP2000346982A
公开(公告)日：2000-12-15
申请号：JP15901199
申请日：1999-06-07
申请人： HITACHI LTD
发明人： ADACHI KOICHI , SUGAWARA NOBUHIKO , KOTANI KOICHI , SHIMURA TAKAO , OMOTE TATSUYUKI
IPC分类号： B23K9/00 , B23K9/32 , B23K10/00 , B23K37/02 , G21C19/02 , G21F9/30
摘要： PROBLEM TO BE SOLVED: To make performable the maintenance work of the cutting actuator of an underwater cutting device. SOLUTION: In the maintenance of a plasma torch 7 of an underwater cutting device for the structures in a reactor with a constitution independently provided with a torch mast 6b holding the plasma torch 7 and a hood mast 6a holding a gas recovery hood 11 and with a hinge 15 in the torch mast 6b, a connection tool 12 is opened, the hood mast 6a and the torch mast 6b are separated, the plasma torch 7 and the torch must 6b are lifted on the air by using a jib crane 13 and the gas recovery hood 11 being a high radiation source is put always in water so as to reduce the radiation exposure of workers during maintenance of the plasma torch 7.

8. 发明专利

JPH0550077B2 失效
公开(公告)号：JPH0550077B2
公开(公告)日：1993-07-28
申请号：JP22688283
申请日：1983-12-02
申请人： HITACHI MICRO SYSTEM KK , HITACHI LTD
发明人： TACHIMORI HIROSHI , FUKUDA HIROSHI , ADACHI KOICHI , TAKAHASHI OSAMU
IPC分类号： G11C11/34 , G11C11/41

9. 发明专利

JP2002257697A APPARATUS FOR COLLECTING FLAWED REPLICA 失效
公开(公告)号：JP2002257697A
公开(公告)日：2002-09-11
申请号：JP2001059841
申请日：2001-03-05
申请人： HITACHI LTD
发明人： SATO NAOTO , SAKATA HIROSHI , HIRANO AKIHIKO , SHIMURA TAKAO , ADACHI KOICHI
IPC分类号： G01N1/28
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for collecting a flawed replica with high accuracy as well s with sureness even from the surface of a submerged structure. SOLUTION: In an container part disposed at the tip end of a replica collecting body 40, a transformation member such as a gap-like extendable and shrinkable member 17 having excellent adherence to the replica as well as being transformed when replica materials are injected between the surface of the structure 22, is arranged. Then, by means of a replica material supply nozzle 18, a replica material is injected between the surface of a structure 22 and the extendable and shrinkable member 17, and the replica is thus collected by the use of such adherence that occurs between the extendable and shrinkable member 17 and the replica material. A water supply nozzle 45 is provided as well.

10. 发明专利

JPS61219955A PHOTOMASK 失效
公开(公告)号：JPS61219955A
公开(公告)日：1986-09-30
申请号：JP6063485
申请日：1985-03-27
申请人： HITACHI MICROCUMPUTER ENG , HITACHI LTD
发明人： FUKUDA HIROSHI , TACHIMORI HIROSHI , KUNIMOTO YUKINORI , ADACHI KOICHI
IPC分类号： G03F1/00 , G03F1/54 , H01L21/027
摘要： PURPOSE:To prevent the breakdown of a metallic film pattern of a photomask by forming a corner part of a semiconductor area, to an obtuse angle or a circular arc shape so that a distance between each semiconductor area becomes larger than a prescribed value, and using the photomask of the metallic film pattern. CONSTITUTION:In a semiconductor substrate consisting of an (n )-type single crystal silicon, a field insulating film is formed on a main surface on the substrate by using a photomask 22. This photomask 22 is used for a negative type photoresist by forming a chrome thin film 23 in a rectangular shape on a quartz substrate. In this regard, in accordance with the shape of the chrome thin film 23, a field insulating film is formed on the semiconductor substrate. A corner part 23A of this chrome thin film 23 is formed in a circular arc shape. This circular arc shape is formed so that a distance between each semiconductor area becomes larger than a prescribed value. Accordingly, when the photomask has been set to an exposing device, a corner part of a metallic pattern causes no melt breakdown, and a drop of the yield can be prevented.

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