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1. 发明专利

JP2003042928A Scanning probe microscope 有权
标题翻译：扫描探针显微镜
公开(公告)号：JP2003042928A
公开(公告)日：2003-02-13
申请号：JP2001234742
申请日：2001-08-02
申请人： Hitachi Kenki Fine Tech Co Ltd , Hitachi Ltd , 日立建機ファインテック株式会社 , 株式会社日立製作所
发明人： MURAYAMA TAKESHI , NAKADA TOSHIHIKO , NOMOTO MINEO , OSHIDA YOSHITADA , KENBO YUKIO , MORIMOTO TAKASHI , YAMAMOTO HIROSHI
IPC分类号： G01B11/00 , G01B11/30 , G01B21/30 , G01Q10/04 , G01Q20/02 , G01Q60/24 , G01N13/10 , G01N13/16
摘要： PROBLEM TO BE SOLVED: To reduce the probability of incidence of a diffracted light into a photoreceiving face of a photodetector, when one portion of a laser beam emitted toward a backface of a cantilever leakes to irradiate a sample surface, and when diffracted light is generated thereby in the sample surface, to reduce the errors in measurement.
SOLUTION: A microscope is provided with the cantilever 21 having a probe 20, a Z fine-motion mechanism for bringing displacement between the probe and a sample, an XY scanning mechanism for providing relative displacement for the probe along the sample surface, an optical detection means for detecting a displacement level generated in the cantilever, and a controller 31 for controlling the Z fine-motion mechanism based on a detection signal from the optical detecting means and a reference value, and for controlling the XY scanning mechanism, while keeping the space between the probe and the sample, for scanning on the sample surface. A plane, formed by a laser beam reflecting point B in the cantilever, a laser beam emitting point A in a laser beam source and a laser beam-incident point C in the photodetector is arranged to be inclined, with respect to a standard face of the sample surface.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：为了降低衍射光入射到光电检测器的光接收面的可能性，当朝向悬臂的背面发射的激光束的一部分泄漏以照射样品表面时，以及当产生衍射光时从而在样品表面，以减少测量误差。解决方案：显微镜设有悬臂21，悬臂21具有探针20，Z精细运动机构，用于使探针与样品之间发生位移; XY扫描机构，用于沿着样品表面提供探针的相对位移;光学检测用于检测在悬臂中产生的位移水平的装置，以及控制器31，用于基于来自光学检测装置的检测信号和参考值来控制Z微动机构，并且用于控制XY扫描机构，同时保持空间探头和样品之间，用于扫描样品表面。由激光束反射点B在悬臂中形成的平面，激光束源中的激光束发射点A和光电检测器中的激光束入射点C相对于标准面倾斜样品表面。

2. 发明专利

JP2007309919A Scanning probe microscope 审中-公开
标题翻译：扫描探针显微镜
公开(公告)号：JP2007309919A
公开(公告)日：2007-11-29
申请号：JP2007063377
申请日：2007-03-13
申请人： Hitachi Kenki Fine Tech Co Ltd , 日立建機ファインテック株式会社
发明人： BABA SHUICHI , WATANABE MASAHIRO , NAKADA TOSHIHIKO , KENBO YUKIO , KURENUMA TORU , MORIMOTO TAKASHI , EDAMURA MANABU , KURODA HIROSHI
IPC分类号： G01Q60/28 , G01Q10/02 , G01Q10/06 , G01Q30/06 , G01Q60/24 , G01Q60/26 , G01Q60/38 , H01L21/66
CPC分类号： G01Q60/28 , G01Q10/06 , G01Q30/04
摘要： PROBLEM TO BE SOLVED: To surely detect sample characteristics with high accuracy in the necessary minimum measurement time, when measuring the plurality of sample characteristics by a scanning system, wherein a probe is brought close to/retreated from a sample in a scanning probe microscope, and to solve the problem, wherein since the working force working between the probe and the sample is changed by the kind of probe or the abrasion state of the probe tip, characteristic values acquired by a different probe cannot be compared, so long as the influence of a measurement probe is not removed. SOLUTION: In this scanning probe microscope, the probe is intermittently brought into contact with the sample, while the probe is repeatedly brought close to/retreated from the sample with a variable amplitude by a driving means, to thereby acquire the sample characteristics at a high speed. One or more points of focus curve are acquired, by using a sample for calibration under fixed environment (with the temperature and the humidity held constant), and the measured value is corrected, by using information acquired from the focus curve, and the distribution of the sample characteristics is displayed. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了在必要的最小测量时间内以高精度可靠地检测样品特性，当通过扫描系统测量多个样品特性时，其中探针在扫描中被从样品接近/退出探针显微镜，并且解决了这样的问题，其中由于探针和样品之间的作用力由于探针的种类或探针尖端的磨损状态而改变，所以不能比较由不同探针获得的特征值因为测量探头的影响没有被去除。
解决方案：在该扫描探针显微镜中，探针间断地与样品接触，同时通过驱动装置将探头重复地从样品以可变的幅度接近/退出，从而获得样品特征以高速度。通过在固定环境（温度和湿度保持不变）下使用样品进行校准，并通过使用从焦点曲线获取的信息和测量值进行校正，获得一个或多个焦点曲线，并且分布显示样品特性。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2010038856A Scanning probe microscope 审中-公开
标题翻译：扫描探针显微镜
公开(公告)号：JP2010038856A
公开(公告)日：2010-02-18
申请号：JP2008205235
申请日：2008-08-08
申请人： Hitachi Kenki Fine Tech Co Ltd , 日立建機ファインテック株式会社
发明人： BABA SHUICHI , WATANABE MASAHIRO , NAKADA TOSHIHIKO , KURENUMA TORU , MORIMOTO TAKASHI , SEKINO SATOSHI
IPC分类号： G01Q30/06
摘要： PROBLEM TO BE SOLVED: To solve the problem that a highly precise measurement result cannot be obtained owing to distortion of a measured image caused by drifting in measurement of a pattern shape and a pattern arrangement in nanometer order in the fields of semiconductor and storage having further increasing demands in the future.
SOLUTION: A previously selected reference pattern region is measured at a certain timing during measurement of a measurement region of sample characteristics with a scanning probe microscope, and the displacement of a probe is corrected while necessarily specifying the displacement in an XYZ axis from a measured image of the reference pattern. Further, the specified displacement and the temperature data in a measurement chamber are used to correct the distortion of the measurement image of the sample characteristics.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：为了解决由于在半导体领域中的图案形状和图案排列的测量中由漂移引起的测量图像的失真而导致的无法获得高精度测量结果的纳米级的问题，存储在未来有更进一步的需求。解决方案：在扫描探针显微镜测量样品特性的测量区域期间，在某个定时测量先前选择的参考图案区域，并且校正探针的位移，同时必须指定XYZ轴中的位移参考图案的测量图像。此外，使用测量室中的指定位移和温度数据来校正样品特性的测量图像的失真。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2009150696A Scanning probe microscope 审中-公开
标题翻译：扫描探针显微镜
公开(公告)号：JP2009150696A
公开(公告)日：2009-07-09
申请号：JP2007327210
申请日：2007-12-19
申请人： Hitachi Kenki Fine Tech Co Ltd , 日立建機ファインテック株式会社
发明人： BABA SHUICHI , WATANABE MASAHIRO , NAKADA TOSHIHIKO , KENBO YUKIO , KURENUMA TORU , MORIMOTO TAKASHI , EDAMURA MANABU , SEKINO SATOSHI
IPC分类号： G01Q30/06 , G01Q60/24
CPC分类号： G01Q10/00 , B82Y35/00 , G01Q60/28 , G01Q60/34
摘要： PROBLEM TO BE SOLVED: To solve the problems that, when measuring a pattern with precipitous sidewalls, a probe sticks to a sidewall due to the van der Waals force between the probe and the sidewall as the probe comes close to the sidewall of the pattern, thereby causing an error on the measured shape of the sidewall part; and when measuring a pattern having grooves with its width approximately same as the diameter of the probe, depth of the groove cannot be measured since the probe cannot reach the bottom part of a groove as the probe sticks to both the sidewalls. SOLUTION: In a measurement of a micro high-aspect-ratio pattern using an elongated probe, when the probe sticks to a sidewall of the pattern, touch of the probe and the sidewall is detected and contact force between the probe and an object is temporarily increased so that the probe reaches the bottom of the sidewall. Moreover, data of the amount of twist of cantilever together with shape data of the pattern are obtained, and a shape error of the sidewall part caused by the touch is calibrated from the obtained data of the amount of twist. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了解决当测量具有陡峭侧壁的图案时，探针由于探针和侧壁之间的范德华力而粘附到侧壁上，因为探头靠近侧壁从而导致侧壁部分的测量形状的误差; 并且当测量其宽度与探针的直径大致相同的凹槽的图案时，由于当探针粘附到两个侧壁上时探针不能到达凹槽的底部，所以不能测量凹槽的深度。解决方案：在使用细长探针的微高宽比比图案的测量中，当探针粘附到图案的侧壁时，探测器和侧壁的触摸被检测，并且探针与一个物体临时增加，使得探针到达侧壁的底部。此外，获得悬臂的扭转量与图案的形状数据的数据，并根据获得的扭曲数据来校准由触摸引起的侧壁部分的形状误差。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2008224412A Scanning probe microscope 审中-公开
标题翻译：扫描探针显微镜
公开(公告)号：JP2008224412A
公开(公告)日：2008-09-25
申请号：JP2007063021
申请日：2007-03-13
申请人： Hitachi Kenki Fine Tech Co Ltd , 日立建機ファインテック株式会社
发明人： WATANABE MASAHIRO , KURENUMA TORU , KURODA HIROSHI , MORIMOTO TAKASHI , BABA SHUICHI , NAKADA TOSHIHIKO , EDAMURA MANABU , KENBO YUKIO
IPC分类号： G01Q10/06 , G01Q20/02 , G01Q20/04 , G01Q60/30
CPC分类号： G01Q70/04 , G01Q10/06
摘要： PROBLEM TO BE SOLVED: To provide a scanning probe microscope for measuring shapes without being affected by the charge distribution of a sample. SOLUTION: A charge state is monitored by detecting the change in the distortion or vibration state of a cantilever caused by charge in synchronizing with scanning during the measurement of the relative scanning of a probe and the sample. The prevention of the damage of the probe and the sample due to discharge, and the reduction of a measuring error due to a charge distribution are performed by performing adjustment of potential so as to cancel the effect of the charge distribution. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供用于测量形状的扫描探针显微镜，而不受样品的电荷分布的影响。
解决方案：通过在测量探针和样品的相对扫描期间检测与扫描同步的电荷引起的悬臂的失真或振动状态的变化来监测充电状态。通过进行电位调整来防止由于放电而引起的探头和样品的损坏以及由于电荷分布引起的测量误差的降低，从而消除电荷分布的影响。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2014142291A Scanning probe microscope and observation method of sample using the same 有权
标题翻译：扫描探针显微镜及其使用观察方法
公开(公告)号：JP2014142291A
公开(公告)日：2014-08-07
申请号：JP2013011604
申请日：2013-01-25
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NAKADA TOSHIHIKO , BABA SHUICHI
IPC分类号： G01Q60/18 , G01Q30/14 , G01Q60/22
CPC分类号： G01Q60/22 , B82Y20/00 , B82Y35/00 , G01Q30/14
摘要： PROBLEM TO BE SOLVED: To increase, in applying a near-field scanning microscope to in-liquid measurement, the detection intensity of near-field light occurring between a measurement probe and an inspection object sample in liquid, so as to improve an SN ratio of a near-field light image and measurement reproducibility.SOLUTION: There is provided a scanning probe microscope comprising: a measurement probe that relatively scans on an inspection object sample; a laser beam irradiation system that irradiates the measurement probe with laser beams; a sample cell that transmits scattering light of near-field light occurring between the measurement probe and the inspection object sample due to the irradiation of the laser beams, and holds the inspection object sample; and a detection unit that detects the scattering light transmitted through the sample cell.
摘要翻译：要解决的问题：为了在将近场扫描显微镜应用于液体内测量中增加在液体中测量探针和检查对象样品之间发生的近场光的检测强度，以提高SN比的近场光图像和测量再现性。解决方案：提供了一种扫描探针显微镜，包括：相对于检查对象样品扫描的测量探针; 用激光束照射测量探头的激光束照射系统; 由于照射激光而发射在测量探针与检查对象样品之间的近场光的散射光的样品池，并保持检查对象样品; 以及检测单元，其检测透过所述样品池的散射光。

7. 发明专利

JP2014013160A Scanning probe microscope 审中-公开
标题翻译：扫描探针显微镜
公开(公告)号：JP2014013160A
公开(公告)日：2014-01-23
申请号：JP2012150066
申请日：2012-07-04
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TACHIZAKI TAKEHIRO , NAKADA TOSHIHIKO , WATANABE MASAHIRO
IPC分类号： G01Q60/22 , G01Q70/08
CPC分类号： G01Q60/18 , G01Q60/22 , G01Q70/10 , G01Q70/14
摘要： PROBLEM TO BE SOLVED: To provide a scanning probe microscope that improves excitation efficiency of plasmon so that excitation efficiency of near-field light is improved.SOLUTION: The scanning probe microscope includes: a cantilever that scans a probe to a measuring object; a light source that irradiates the cantilever with excitation light; a near-field light detection sensor that detects the near-field light generated from a tip of the probe by plasmon excited by the cantilever excitation light, and scattered from a surface of the measuring object; and a microstructure that guides the excitation light to an excitation point of the plasmon, in a part of the cantilever which the excitation light irradiates.
摘要翻译：要解决的问题：提供一种提高等离子体激发效率的扫描探针显微镜，从而提高近场光的激发效率。解决方案：扫描探针显微镜包括：将探针扫描到测量对象的悬臂; 用激发光照射悬臂的光源; 近场光检测传感器，其通过由悬臂激发光激发的等离子体激元检测从探针的尖端产生的近场光，并从测量对象的表面散射; 以及在激发光照射的悬臂的一部分中将激发光引导到等离子体激元的激发点的微结构。

8. 发明专利

JP2012220191A Scanning probe microscope and measurement method using the same 有权
标题翻译：扫描探针显微镜和使用它的测量方法
公开(公告)号：JP2012220191A
公开(公告)日：2012-11-12
申请号：JP2011082396
申请日：2011-04-04
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TACHIZAKI TAKEHIRO , NAKADA TOSHIHIKO , WATANABE MASAHIRO
IPC分类号： G01Q60/18
CPC分类号： G01Q60/18 , B82Y15/00 , B82Y20/00 , B82Y35/00 , G01N21/554 , G01Q60/22 , G01Q70/12
摘要： PROBLEM TO BE SOLVED: To provide a measurement method of a scanning probe microscope for measuring a shape and optical characteristics of a sample using near field light without reducing a signal-to-noise ratio in a plasmon propagation beam SPM.SOLUTION: The measurement method of a scanning probe microscope for observing a shape and optical characteristics of a sample by exciting near field light, scanning a relative position between the near field light and the sample, and detecting scattered light of the near field light on the sample, comprises: modulating the near field light; periodically varying a relative position between the near field light and the sample; and selectively extracting interference signals generated by a modulation frequency applied to the near field light, and a frequency varying the relative position between the near field light and the sample.
摘要翻译：要解决的问题：提供一种用于使用近场光测量样品的形状和光学特性而不降低等离子体激元传播光束SPM中的信噪比的扫描探针显微镜的测量方法。解决方案：扫描探针显微镜的测量方法，用于通过激发近场光来观察样品的形状和光学特性，扫描近场光和样品之间的相对位置，并检测近场的散射光样品上的光，包括：调制近场光; 周期性地改变近场光和样品之间的相对位置; 并且选择性地提取由施加到近场光的调制频率产生的干扰信号，以及改变近场光和样本之间的相对位置的频率。版权所有（C）2013，JPO＆INPIT

9. 发明专利

JP2012047607A Internal flaw detection method and device for the same 审中-公开
标题翻译：内部FLAW检测方法及其装置
公开(公告)号：JP2012047607A
公开(公告)日：2012-03-08
申请号：JP2010190253
申请日：2010-08-27
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NAKADA TOSHIHIKO , MATSUI TETSUYA , TACHIZAKI TAKEHIRO , YOSHIMURA KAZUSHI , WATANABE MASAHIRO
IPC分类号： G01N29/06
CPC分类号： G01N29/221 , G01N29/04 , G01N29/043 , G01N29/0654 , G01N29/2418
摘要： PROBLEM TO BE SOLVED: To provide an internal flaw detection method for exciting ultrasonic waves to a sample without contact and without damaging the sample, and detecting the ultrasonic waves from a flaw inside the sample without contact, with high sensitivity, and without being affected by the surface of the sample; and a device for the same.SOLUTION: Ultrasonic waves are emitted from a ultrasonic transmission part toward a sample to detect the ultrasonic waves reflected from the sample as an interference signal by an image-formation type common optical path interferometer. An ultrasonic signal is obtained from the interference signal to detect a flaw inside the sample from the ultrasonic signal.
摘要翻译：要解决的问题：提供一种用于在不接触的情况下向样品激发超声波而不损坏样品的内部探伤方法，并且以高灵敏度和高灵敏度检测来自样品内部的缺陷的超声波而不接触受样品表面的影响; 和相同的设备。解决方案：超声波从超声波发送部分发射到样品，以通过图像形成型公共光路干涉仪检测从样品反射的超声波作为干扰信号。从干扰信号获得超声波信号，以从超声波信号中检测样品内的缺陷。版权所有（C）2012，JPO＆INPIT

10. 发明专利

JP2010197347A Pattern inspection device and pattern inspection method of substrate surface 有权
标题翻译：基板表面图案检测装置及图案检测方法
公开(公告)号：JP2010197347A
公开(公告)日：2010-09-09
申请号：JP2009045707
申请日：2009-02-27
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： WATANABE MASAHIRO , NAKADA TOSHIHIKO , YOSHITAKE YASUHIRO , SASAZAWA HIDEAKI , YOSHIDA MINORU
IPC分类号： G01N21/956 , G01B11/30 , G01N21/27 , G01Q60/18 , G11B5/84
CPC分类号： G01Q60/22 , B82Y20/00 , B82Y35/00 , G01N21/95607 , G11B5/84
摘要： PROBLEM TO BE SOLVED: To provide a pattern inspection device of a substrate surface capable of speedily inspecting substrate which includes a pattern below a resolution limit of light. SOLUTION: The pattern inspection device of the substrate surface includes a near-field light head 101 having a fine repeated pattern, a θ drive part 311 for scanning relatively the near-field light head 101 and a substrate 900 to be inspected, a clearance holding mechanism for keeping constant a clearance between the near-field light head 101 and the substrate 900 to be inspected, a light source 110 for irradiating the near-field light head 101 with light, a detection system 201 for detecting scattered light intensity generated by an interaction between the fine repeated pattern on the near-field light head 101 and a fine repeated pattern on the substrate 900 to be inspected, and a signal processing part 321 for inspecting the fine pattern on the substrate 900 to be inspected based on an output from the detection system 201. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够快速检查基板的基板表面的图案检查装置，该基板包括低于分辨率极限的图案。解决方案：基板表面的图案检查装置包括具有精细重复图案的近场光头101，用于相对于近场光头101扫描的θ驱动部311和待检查的基板900，用于保持近场光头101和要检查的基板900之间的间隙恒定的间隙保持机构，用于对近场光头101照射光的光源110，用于检测散射光强度的检测系统201 通过近场光头101上的精细重复图案与要检查的基板900上的精细重复图案之间的相互作用产生的信号处理部321，用于检查基板900上的精细图案以进行检查，信号处理部321基于来自检测系统201的输出。版权所有（C）2010，JPO＆INPIT

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