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1. 发明专利

JP2007149571A Sample measuring method and charged particle beam apparatus 有权
标题翻译：样品测量方法和充电颗粒光束装置
公开(公告)号：JP2007149571A
公开(公告)日：2007-06-14
申请号：JP2005344855
申请日：2005-11-30
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MITSUFUJI KEIMEI , SASADA KATSUHIRO , KATO KAZUO , KUDO TOMOYOSHI , SAEKI TOMONORI
IPC分类号： H01J37/20 , H01J37/28 , H01L21/66
CPC分类号： H01J37/185 , H01J37/20 , H01J2237/18 , H01J2237/2001 , H01J2237/204 , H01J2237/2817 , H01L21/67028 , H01L21/67213 , H01L21/67248
摘要： PROBLEM TO BE SOLVED: To provide a sample measuring method for removing impure substances adhered to a sample chamber of an electron microscope or the like, capable of restraining adverse effects to subsequent manufacturing processes, and to provide a charged particle apparatus.
SOLUTION: A device for removing the impure substances on a sample, after sample measurement or inspection by using charged particle beam, and before the following semiconductor manufacturing process, is provided. Accordingly, since the impure substances adhered inside the sample chamber or the like can be removed, generation of defects at the semiconductor manufacturing processes, after the measurement and inspection, can be restrained.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于去除附着在电子显微镜等的样品室上的不纯物质的样品测量方法，其能够抑制后续制造过程的不利影响，并提供带电粒子装置。解决方案：提供一种用于通过使用带电粒子束在样品测量或检查之后以及在随后的半导体制造过程之前去除样品上的不纯物质的装置。因此，由于可以除去附着在样品室等内的不纯物质，因此可以抑制在半导体制造过程之后的测量和检查中的缺陷的产生。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2008166062A Device having vacuum vessel 审中-公开
标题翻译：具有真空容器的装置
公开(公告)号：JP2008166062A
公开(公告)日：2008-07-17
申请号：JP2006352761
申请日：2006-12-27
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： YAHAGI YASUO , KOBAYASHI MASAYUKI , MITSUFUJI KEIMEI , KUDO TOMOYOSHI , SAEKI TOMONORI
IPC分类号： H01J37/20
CPC分类号： G01N33/00 , H01J37/16 , H01J37/28 , H01J2237/022 , H01J2237/16 , H01J2237/182 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide a device having a mechanism using lubricant in a vacuum vessel, and causing no defect nor fault in a sample brought into the vacuum vessel, even if lubricating oil or grease are applied to the device. SOLUTION: This device such as a CD-SEM has the mechanism using the lubricant in the vacuum vessel. The lubricant (oil, grease), of which an amount of adsorption per minute to the surface of a substance brought into the vacuum vessel of a lubricant evaluating device is less than 0.09 ng/cm 2 after reaching an equilibrium state after starting evacuation, is used for the mechanism in the vacuum vessel. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：即使在设备中施加润滑油或润滑脂，提供一种具有在真空容器中使用润滑剂的机构的装置，并且不会导致真空容器中的样品的缺陷或缺陷。解决方案：该装置如CD-SEM具有在真空容器中使用润滑剂的机构。润滑剂（油，油脂），其在进入润滑剂评估装置的真空容器中的物质表面每分钟吸附量在达到0.09ng / cm 2 / SP> 启动抽气后的平衡状态用于真空容器中的机构。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2011029044A Vacuum evacuation method, and vacuum device 有权
标题翻译：真空脱气方法和真空装置
公开(公告)号：JP2011029044A
公开(公告)日：2011-02-10
申请号：JP2009174880
申请日：2009-07-28
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： SATO OSAMU , KITSUNAI HIROYUKI , KATO KAZUO , KUDO TOMOYOSHI
IPC分类号： H01J37/20 , H01J37/18
摘要： PROBLEM TO BE SOLVED: To provide a vacuum evacuation method and a vacuum evacuation device, removing discharge gas discharged from a sliding part which is considered to be a discharge gas generation site with high efficiency and a simple structure.
SOLUTION: In a vacuum device equipped with a moving device in a vacuum chamber, the vacuum device is provided with a sliding mechanism sliding in accordance with a move of the moving device, a slid part of the sliding mechanism is to be a getter surface containing an active metal material, and the sliding part is to be a friction member frictioning the getter surface. In the vacuum evacuation method, the getter surface is newly generated by frictioning the active metal material accompanying the move of the moving mechanism.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种真空排气方法和真空排气装置，从高效率和简单结构的排放气体产生部位的滑动部排出的排出气体去除。解决方案：在真空室中配备有移动装置的真空装置中，真空装置设置有滑动机构，其根据移动装置的移动而滑动，滑动机构的滑动部分将成为吸气剂表面含有活性金属材料，滑动部分是与吸气剂表面摩擦的摩擦件。在真空排气方法中，吸附剂表面是通过伴随移动机构移动的活性金属材料摩擦而新产生的。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2010160080A Method of measuring size using charged particle beam and size measuring instrument 有权
标题翻译：使用充电粒子束和尺寸测量仪器测量尺寸的方法
公开(公告)号：JP2010160080A
公开(公告)日：2010-07-22
申请号：JP2009003021
申请日：2009-01-09
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： KITSUNAI HIROYUKI , SEYA HIDEKAZU , KUDO TOMOYOSHI , TAMURA TAKUO , KOBAYASHI MASAYUKI
IPC分类号： G01B15/00 , H01J37/22 , H01J37/28 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To measure sizes with high accuracy without being affected by the factors of size variation difficult to prevent by only controlling an irradiation amount on an area-by-area basis of beam scanning. SOLUTION: In this method and instrument, a position in a scanning area where a positive heap and a negative heap offset each other is selected as a measuring part, with the positive heap owing to the deposition of contamination caused by a beam while the negative heap owing to the removal of a specimen. Alternately, in the scanning area, a portion not affected or little affected by size variation is selected as a measurement part. In the scanning area, a proper position is selected in measuring sizes. Sizes are measured with high accuracy without being affected by the factors of size variation caused by beam application. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：通过仅在每个区域的基础上控制光束扫描的照射量，不会受尺寸变化的因素的影响而高精度地测量尺寸。解决方案：在该方法和仪器中，选择正堆和负堆彼此偏移的扫描区域中的位置作为测量部分，由于由于光束引起的污染的沉积而产生正堆由于去除了一个样本，这个负堆。或者，在扫描区域中，选择不受尺寸变化影响或影响较小的部分作为测量部分。在扫描区域中，在测量尺寸中选择适当的位置。尺寸以高精度测量，不受光束应用引起的尺寸变化的因素的影响。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2010092633A Method for measuring gas component in vacuum chamber, and vacuum device 有权
标题翻译：用于测量真空室中的气体组分的方法和真空装置
公开(公告)号：JP2010092633A
公开(公告)日：2010-04-22
申请号：JP2008259181
申请日：2008-10-06
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： SATO OSAMU , KITSUNAI HIROYUKI , SEYA HIDEKAZU , KUDO TOMOYOSHI
IPC分类号： H01J37/18 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide: a method for accurately measuring gas components in a vacuum chamber capable of high evacuation; and a vacuum device.
SOLUTION: In the method for measuring gas component of the device provided with a gas component measuring device to measure the gas components in the vacuum chamber, upon measuring gas components, the speed of evacuation in the vacuum chamber is lowered. That is, after creating an environment in which residual gas is not easily exhausted, analysis of the gas components is carried out.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供：精确测量能够进行高排气的真空室中的气体成分的方法; 和真空装置。解决方案：在设置有用于测量真空室中的气体成分的气体成分测量装置的装置的气体成分测量方法中，在测量气体成分时，真空室中的抽空速度降低。也就是说，在产生残留气体不容易耗尽的环境之后，进行气体成分的分析。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2007141741A Charged particle beam apparatus 有权
标题翻译：充电颗粒光束装置
公开(公告)号：JP2007141741A
公开(公告)日：2007-06-07
申请号：JP2005336461
申请日：2005-11-22
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MITSUFUJI KEIMEI , SASADA KATSUHIRO , KATO KAZUO , KUDO TOMOYOSHI , SAEKI TOMONORI , YAHAGI YASUO , KOBAYASHI MASAYUKI
IPC分类号： H01J37/20
CPC分类号： H01J37/20 , H01J2237/022 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus that is capable of handling samples without adhering impurities onto the samples.
SOLUTION: In a scanning electron microscope in which a lubricant is coated on a sliding portion of a movable member that moves inside a vacuum chamber, a substance from which low molecular components were removed is used as the lubricant. It is thus possible to inhibit sample contamination and suppress the occurrence of defects in a process following measurement of the samples.
COPYRIGHT: (C)2007,JPO&INPIT

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