专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2005174599A Wafer holder and electron microscope device 有权
标题翻译： WAFER HOLDER和ELECTRON MICROSCOPE DEVICE
公开(公告)号：JP2005174599A
公开(公告)日：2005-06-30
申请号：JP2003409235
申请日：2003-12-08
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： SEYA HIDEKAZU
IPC分类号： H01J37/20
摘要： PROBLEM TO BE SOLVED: To reduce wafer vibration causing image vibration, in an electron microscope for carrying out inclined observation of a semiconductor wafer.
SOLUTION: A damping seat is mounted at the center part of this wafer holder. The damping seat is so structured as to support a contact part to the back face of a wafer by a thin plate of a resin material; and a longitudinal spring constant is set in a range 1-5 times as much as that at the center part of the wafer with a periphery fixed. Thereby, vibration of the wafer can efficiently be reduced while avoiding adhesion of foreign matter, and high-resolution observation is enabled.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了减少导致图像振动的晶片振动，在用于进行半导体晶片的倾斜观察的电子显微镜中。解决方案：阻尼座安装在该晶片座的中心部分。阻尼座被构造为通过树脂材料的薄板将接触部分支撑在晶片的背面; 并且纵向弹簧常数设定在晶片的中心部分的周长固定的1-5倍的范围内。由此，能够有效地降低晶片的振动，同时避免异物的附着，能够进行高分辨率的观察。版权所有（C）2005，JPO＆NCIPI

2. 发明专利

JP2004317758A Biaxial stage for microscope 审中-公开
公开(公告)号：JP2004317758A
公开(公告)日：2004-11-11
申请号：JP2003110976
申请日：2003-04-16
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： NAKAGAWA SHUICHI , SEYA HIDEKAZU
IPC分类号： G01N23/225 , G02B21/26 , H01J37/20 , H01L21/68
CPC分类号： G02B21/26
摘要： PROBLEM TO BE SOLVED: To realize a biaxial stage for microscope with thin shape, low vibration, corresponding to speed up of a stage and in which the floor projection area does not change even when it is arranged in a chamber. SOLUTION: In an XY stage having a base 1, an X table 2 which can move in the X direction on the base 1 by an X feeding screw 7 and a Y table 3 supported so that it moves in the Y direction on the X table 2, a third table 4 which can move in the Y direction on the base 1 by a Y feeding screw 8 arranged on the base 1 is provided, a slide part 14 which can move in the X direction is further provided on the third table 4 and the slide part 14 is coupled with the Y table 3. COPYRIGHT: (C)2005,JPO&NCIPI

3. 发明专利

JP2004031537A Xy stage and electron microscope apparatus 审中-公开
公开(公告)号：JP2004031537A
公开(公告)日：2004-01-29
申请号：JP2002183965
申请日：2002-06-25
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： SEYA HIDEKAZU , NAKAGAWA SHUICHI
IPC分类号： H01J37/20 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To achieve an XY stage for electron microscopes having a small precision decrease also to the distortion of a base by achieving a high-magnification observation in a light and simple structure. SOLUTION: On the XY stage for electron microscopes, a wafer table is supported on a horizontal guidance surface by three two-dimensional ultrasonic motors having a wafer table, and the wafer table is connected to the edge section of the base by a linking mechanism so that the wafer table can make only a parallel movement without accompanying any rotations. COPYRIGHT: (C)2004,JPO

4. 发明专利

JP2008218163A Stage mechanism, electron microscope equipped with the same, and positioning control method for stage mechanism 有权
标题翻译：舞台机构，配备其的电子显微镜，以及用于舞台机构的定位控制方法
公开(公告)号：JP2008218163A
公开(公告)日：2008-09-18
申请号：JP2007053271
申请日：2007-03-02
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： SEYA HIDEKAZU , NAGAMATSU TAKASHI
IPC分类号： H01J37/20 , G05D3/00 , H01J37/28 , H02N2/00
CPC分类号： H01J37/20 , H01J37/28 , H01J2237/20264 , H01J2237/20278 , H02N2/0025 , H02N2/026 , H02N2/028
摘要： PROBLEM TO BE SOLVED: To provide a stage mechanism for an electron microscope low in vibration, small in drift, and capable of executing accurate positioning. SOLUTION: An ultrasonic motor is used for a driving mechanism of a stage, and a fixing mechanism that enhances stop rigidity is integrated with the motor. That is to say, the stage mechanism is structured, such that a structure composed by mounting piezoelements of the fixation mechanism in a pressurization mechanism along with the ultrasonic motor is used; and when acceleration/deceleration and positioning of the stage is carried out by the driving mechanism and thereafter, the stage is fixed by the fixing mechanism, the piezoelements positioned on both sides of the stage are extended to press the stage. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供低振动，漂移小，能够执行精确定位的电子显微镜的平台机构。解决方案：超声波马达用于平台的驱动机构，并且具有增强止动刚度的固定机构与马达一体化。也就是说，舞台机构被构造成使用通过将固定机构的压电元件与超声波马达一起安装在加压机构中而构成的结构; 并且当通过驱动机构进行加速/减速以及平台的定位之后，通过固定机构来固定平台，将位于台架两侧的压电元件延伸以按压平台。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2010160080A Method of measuring size using charged particle beam and size measuring instrument 有权
标题翻译：使用充电粒子束和尺寸测量仪器测量尺寸的方法
公开(公告)号：JP2010160080A
公开(公告)日：2010-07-22
申请号：JP2009003021
申请日：2009-01-09
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： KITSUNAI HIROYUKI , SEYA HIDEKAZU , KUDO TOMOYOSHI , TAMURA TAKUO , KOBAYASHI MASAYUKI
IPC分类号： G01B15/00 , H01J37/22 , H01J37/28 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To measure sizes with high accuracy without being affected by the factors of size variation difficult to prevent by only controlling an irradiation amount on an area-by-area basis of beam scanning. SOLUTION: In this method and instrument, a position in a scanning area where a positive heap and a negative heap offset each other is selected as a measuring part, with the positive heap owing to the deposition of contamination caused by a beam while the negative heap owing to the removal of a specimen. Alternately, in the scanning area, a portion not affected or little affected by size variation is selected as a measurement part. In the scanning area, a proper position is selected in measuring sizes. Sizes are measured with high accuracy without being affected by the factors of size variation caused by beam application. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：通过仅在每个区域的基础上控制光束扫描的照射量，不会受尺寸变化的因素的影响而高精度地测量尺寸。解决方案：在该方法和仪器中，选择正堆和负堆彼此偏移的扫描区域中的位置作为测量部分，由于由于光束引起的污染的沉积而产生正堆由于去除了一个样本，这个负堆。或者，在扫描区域中，选择不受尺寸变化影响或影响较小的部分作为测量部分。在扫描区域中，在测量尺寸中选择适当的位置。尺寸以高精度测量，不受光束应用引起的尺寸变化的因素的影响。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2010092633A Method for measuring gas component in vacuum chamber, and vacuum device 有权
标题翻译：用于测量真空室中的气体组分的方法和真空装置
公开(公告)号：JP2010092633A
公开(公告)日：2010-04-22
申请号：JP2008259181
申请日：2008-10-06
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： SATO OSAMU , KITSUNAI HIROYUKI , SEYA HIDEKAZU , KUDO TOMOYOSHI
IPC分类号： H01J37/18 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide: a method for accurately measuring gas components in a vacuum chamber capable of high evacuation; and a vacuum device.
SOLUTION: In the method for measuring gas component of the device provided with a gas component measuring device to measure the gas components in the vacuum chamber, upon measuring gas components, the speed of evacuation in the vacuum chamber is lowered. That is, after creating an environment in which residual gas is not easily exhausted, analysis of the gas components is carried out.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供：精确测量能够进行高排气的真空室中的气体成分的方法; 和真空装置。解决方案：在设置有用于测量真空室中的气体成分的气体成分测量装置的装置的气体成分测量方法中，在测量气体成分时，真空室中的抽空速度降低。也就是说，在产生残留气体不容易耗尽的环境之后，进行气体成分的分析。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2008085290A Electrostatic adsorption mechanism and charged particle beam device 审中-公开
标题翻译：静电吸附机构和充电颗粒光束装置
公开(公告)号：JP2008085290A
公开(公告)日：2008-04-10
申请号：JP2007059352
申请日：2007-03-09
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： SEYA HIDEKAZU
IPC分类号： H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide an electrostatic adsorption mechanism capable of suppressing a contact area between the rear face of a wafer and an electrostatic adsorption surface and maintaining a high rigidity state in the surface direction of the wafer even when deformation such as a warp exists in the wafer. SOLUTION: In the electrostatic adsorption mechanism 11 provided with a base 2, at least three support seats 5 supported on the base 2 and an electrostatic adsorption surface 6 for electrostatically adsorbing a mounted sample, the electrostatic adsorption surface 6 is supported by a plate sprint, and the plate spring is formed like a ring along the edge part of the sample or arranged in a divided state like a ring so that a straight line connecting a connection part with the base and a connection part with the electrostatic adsorption surface 6 is vertical to the tangent of a circle formed by the ring. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：解决问题：提供一种静电吸附机构，其能够抑制晶片的背面与静电吸附面之间的接触面积，并且在晶片的表面方向上保持高的刚性状态，即使当诸如在晶片中存在翘曲。解决方案：在设置有基座2的静电吸附机构11中，支撑在基座2上的至少三个支撑座5和用于静电吸附安装的样品的静电吸附面6，静电吸附面6由并且板簧沿着样品的边缘部分形成为环状，或者以类似环的分开状态布置，使得将连接部分与基部的直线连接到静电吸附表面6的连接部分垂直于由环形成的圆的切线。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2007194126A Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：JP2007194126A
公开(公告)日：2007-08-02
申请号：JP2006012744
申请日：2006-01-20
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： TANII KAZUMASA , KASAI YUJI , SASADA KATSUHIRO , SEYA HIDEKAZU
IPC分类号： H01J37/28 , H01J37/21
CPC分类号： G01N23/2251 , H01J37/28 , H01J2237/004 , H01J2237/216 , H01J2237/24564
摘要： PROBLEM TO BE SOLVED: To provide a scanning electron microscope which is capable of high-speed focus alignment through precise, simple, and quick automatic measurement of a charged voltage of a wafer surface in a sample chamber, where wafer surface shows different charged voltages at the outside and inside of the sample chamber.
SOLUTION: An electrode plate for applying a retarding voltage disposed above a sample is divided into two portions, and the potential of each of the divided electrode plates is changed for measuring the charged voltage of the sample from a capacitance between both divided electrode plates. Based on a result of the measurement, an optical system is controlled.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种扫描电子显微镜，其能够通过精确，简单且快速地自动测量样品室中的晶片表面的带电电压而能够进行高速聚焦取向，其中晶片表面显示不同在样品室的外部和内部的充电电压。解决方案：将用于施加设在样品上方的延迟电压的电极板分成两部分，并且改变每个分隔电极板的电位，以从两个分离电极之间的电容测量样品的充电电压板。基于测量的结果，控制光学系统。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2004342471A Wafer holder and electron microscope 有权
公开(公告)号：JP2004342471A
公开(公告)日：2004-12-02
申请号：JP2003138140
申请日：2003-05-16
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： SEYA HIDEKAZU , NAKAGAWA SHUICHI
IPC分类号： H01J37/20 , H01L21/68 , H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide a wafer holder capable of preventing a wafer backside from contamination deposition, and reducing wafer vibration in surface vertical direction, and to provide an electron microscope in which image vibration is reduced even in inclination observation. SOLUTION: A part of a supporting seat of the wafer holder is movable in vertical direction. A fixing mechanism is provided to allow the movable supporting seat to be fixedly opened. An opening mechanism is provided in a vacuum discharge chamber of the electron microscope for opening the fixing mechanism. COPYRIGHT: (C)2005,JPO&NCIPI

10. 发明专利

JP2009224234A Stage, and electron microscope device 审中-公开
标题翻译：阶段和电子显微镜装置
公开(公告)号：JP2009224234A
公开(公告)日：2009-10-01
申请号：JP2008068660
申请日：2008-03-18
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： SEYA HIDEKAZU , NAGAMATSU TAKASHI
IPC分类号： H01J37/20 , G01B15/00 , H01L21/027 , H01L21/68
CPC分类号： H01J37/20 , H01J37/265 , H01J37/28 , H01J2237/0216 , H01J2237/20264
摘要： PROBLEM TO BE SOLVED: To provide a stage mechanism in which a drift is small while being stopped, and to provide an electron microscope provided with the mechanism. SOLUTION: A test-piece stage is provided with a plurality of driving elements which can conduct an expansion and contraction or a rocking and in which a stage can be shifted by co-working of the above two driving elements. In the stage mechanism, by the co-working of the above driving elements, various kinds of controls can be done by combining workings of the above two driving elements, and as a result, not only a shift of the stage but also a control of a drift while being stopped are made possible. COPYRIGHT: (C)2010,JPO&INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式