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1. 发明专利

JP2014070241A Vapor deposition device and vapor deposition method 审中-公开
标题翻译：蒸气沉积装置和蒸气沉积方法
公开(公告)号：JP2014070241A
公开(公告)日：2014-04-21
申请号：JP2012216333
申请日：2012-09-28
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： WAKABAYASHI MASA , KATO NOBORU , ISHIZAWA YASUAKI , ZUSHI AN
IPC分类号： C23C14/56 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To reduce a waste evaporation time of an evaporation source as much as possible in a horizontal vapor deposition type evaporation device for organic EL film deposition.SOLUTION: An vapor deposition device for organic EL film deposition has: a robot conveying chamber in which a vacuum robot is arranged; two vapor deposition chambers connected to the robot conveying chamber; an index table on which two substrates can be located and that is horizontally housed in the vapor deposition chamber; rotation means for rotating the index table in a horizontal direction; and an evaporation source arranged movably in the horizontal direction below the index table. The vacuum robot can convey the substrates in and out in the horizontal direction between the vapor deposition chamber and the robot conveying chamber. While one of the two substrates located on the index table is vapor deposited by the evaporation source, using the vacuum robot, the other substrate is conveyed to the robot conveying chamber from the vapor deposition chamber, and instead a new substrate is conveyed from the robot conveying chamber to the vapor deposition chamber. After completing the vapor deposition, the index table is rotated.
摘要翻译：要解决的问题：在用于有机EL膜沉积的水平气相沉积型蒸发装置中尽可能地减少蒸发源的蒸发时间。解决方案：用于有机EL膜沉积的气相沉积装置具有：机器人输送室其中布置有真空机器人; 两个气相沉积室连接到机器人输送室; 两个基板可以位于并且水平地容纳在气相沉积室中的分度台; 旋转装置，用于沿水平方向旋转分度台; 以及蒸发源，其在所述分度台下方的水平方向上可移动地配置。真空机器人可以在气相沉积室和机器人输送室之间沿水平方向输送和移出基板。虽然位于分度台上的两个基板之一由蒸发源气相沉积，但是使用真空机器人，另一个基板从气相沉积室传送到机器人传送室，而是从机器人传送新的基板输送室到蒸镀室。完成气相沉积后，分度表旋转。

2. 发明专利

JP2014055342A Film deposition apparatus 审中-公开
标题翻译：胶片沉积装置
公开(公告)号：JP2014055342A
公开(公告)日：2014-03-27
申请号：JP2012202414
申请日：2012-09-14
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： TAKEI TETSUYA , ZUSHI AN , KATO NOBORU
IPC分类号： C23C14/24 , H01L51/50 , H05B33/10 , H05B33/26
摘要： PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus which allows the uniformity of film thickness by stabilizing the control of evaporation rate to maintain actual evaporation rate to substrates during evaporation, and to provide an evaporation method.SOLUTION: In a film deposition apparatus including a substrate holding mechanism to hold a substrate, an evaporation source which is disposed at a position opposite to the substrate and evaporates to the substrate, and an evaporation source transportation mechanism which moves the evaporation source relatively to the substrate, the evaporation source transportation mechanism has a standby position on the trajectory of transporting the evaporation source, which controls the amount of evaporation material evaporating from the evaporation source, a deposition preventing member is disposed in front of the standby position, and a reflection heat restricting member for restricting reflection heat emitting from the surface of the deposition preventing member is disposed .
摘要翻译：要解决的问题：提供一种气相沉积设备，其允许通过稳定蒸发速率的控制来稳定膜厚度，以保持蒸发期间对基板的实际蒸发速率，并提供蒸发方法。解决方案：在包括用于保持基板的基板保持机构，设置在与基板相反的位置并蒸发到基板的位置的蒸发源以及相对于基板移动蒸发源的蒸发源输送机构，蒸发源输送机构具有运送蒸发源的轨迹上的备用位置，其控制从蒸发源蒸发的蒸发材料的量，在待机位置的前面设置有防沉积构件，以及反射热限制构件，用于限制从表面的depos 配置防尘部件。

3. 发明专利

JP2013247040A Organic el device manufacturing apparatus and organic el device manufacturing method 审中-公开
标题翻译：有机EL器件制造设备和有机EL器件制造方法
公开(公告)号：JP2013247040A
公开(公告)日：2013-12-09
申请号：JP2012121433
申请日：2012-05-29
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： WAKABAYASHI MASA , KATO NOBORU , YUMIBA KENJI , ZUSHI AN
IPC分类号： H05B33/10 , C23C14/04 , H01L51/50
摘要： PROBLEM TO BE SOLVED: To provide an organic EL device manufacturing apparatus and an organic EL device manufacturing method which are capable of performing vapor deposition with high definition by preventing blurring due to a mask.SOLUTION: In the organic EL device manufacturing method of the present invention according to which an organic EL device is manufactured by vapor-depositing a vapor deposition material on a substrate via a mask having a predetermined vapor deposition pattern, the vapor deposition is performed by pressing predetermined interval portions at which the predetermined vapor deposition pattern is formed in a predetermined interval.
摘要翻译：要解决的问题：提供能够通过防止由于掩模引起的模糊而以高清晰度进行气相沉积的有机EL器件制造装置和有机EL器件制造方法。解决方案：在本发明的有机EL器件制造方法中通过经由具有预定的气相沉积图案的掩模将气相沉积材料气相沉积在基板上制造有机EL器件的发明，通过按压预定的气相沉积图案形成的预定间隔部分进行气相沉积以预定间隔。

4. 发明专利

JP2013167001A Vacuum deposition system and vacuum deposition method 审中-公开
标题翻译：真空沉积系统和真空沉积方法
公开(公告)号：JP2013167001A
公开(公告)日：2013-08-29
申请号：JP2012031531
申请日：2012-02-16
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： WAKABAYASHI MASA , KATO NOBORU , ISHIZAWA YASUAKI
IPC分类号： C23C14/24 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide a system and a method capable of reducing a material loss in a vacuum deposition system in which vacuum transfer chambers and vacuum deposition chambers are arranged in series.SOLUTION: This vacuum deposition system 100 consists of lines LA and LB provided with vacuum transfer chambers HA1 to HA3, and HB1 to HB4 for horizontally transferring workpieces W, and vacuum deposition chambers CA, CB and CC for depositing a vapor deposition material to the workpieces, which are alternately arranged in series, and a plurality of vacuum deposition chambers. Therein, N lines (N is two or more) are provided by arranging the lines in parallel to each other, the vacuum deposition chambers are N line vacuum deposition chambers provided astriding each of N lines, and the N line vacuum deposition chambers have deposition positions for depositing the workpieces in each line. During vacuum deposition of a first workpiece in a first line of the N lines, a second workpiece is transferred out to the vacuum transfer chamber of a downstream side in another line different from the first line, and a third workpiece is transferred in from the vacuum transfer chamber of an upstream side.
摘要翻译：要解决的问题：提供能够减少真空沉积系统中的材料损耗的系统和方法，其中真空传送室和真空沉积室串联布置。解决方案：该真空沉积系统100由管线LA和LB 设置有用于水平传送工件W的真空传送室HA1至HA3和HB1至HB4，以及用于将交替排列成串联的气相沉积材料沉积到工件上的真空沉积室CA，CB和CC以及多个真空沉积室。其中，N线（N为2个以上）通过将线并列布置而提供，真空沉积室是N线真空沉积室，其设置为跨越N线，N线真空沉积室具有沉积位置用于将工件沉积在每条线上。在第一工件在N线的第一线中进行真空沉积时，第二工件被传送到不同于第一线的另一条线中的下游侧的真空传送室，并且第三工件从真空上游侧的传送室。

5. 发明专利

JP2012207263A Vapor deposition method, and vapor deposition apparatus 审中-公开
标题翻译：蒸气沉积法和蒸气沉积装置
公开(公告)号：JP2012207263A
公开(公告)日：2012-10-25
申请号：JP2011073410
申请日：2011-03-29
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MATSUURA HIROYASU , MINEKAWA HIDEAKI , MUNETO MASATOSHI , KATO NOBORU , MIYAKE TATSUYA , YAMAMOTO KENICHI
IPC分类号： C23C14/00 , C23C14/24 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide technology that is applied to a film-forming step for forming a vapor deposition film on a substrate and to shorten cooling time of an evaporation source.SOLUTION: In a vapor deposition preparation step, an object to be treated and an evaporation source 10 including a crucible 13 for containing a vapor deposition material 30, a heating part 14 for heating the crucible 13, and a nozzle 12 for discharging the vapor deposition material 30 gasified in the crucible 13 toward the object to be treated are arranged in a vacuum chamber. Then, the gasified vapor deposition material gas is generated by heating the vapor deposition material 30 contained in the crucible 13 using the heating part 14, and the vapor deposition film is formed on the object to be treated. Then, gas 26 is supplied into the crucible 13 through the nozzle 12 from outside the evaporation source 10, and the crucible 13 is cooled by turning off the heating part 14.
摘要翻译：要解决的问题：提供应用于在基板上形成气相沉积膜的成膜步骤并缩短蒸发源的冷却时间的技术。解决方案：在气相沉积制备步骤中，要处理的物体和包括用于容纳蒸镀材料30的坩埚13的蒸发源10，用于加热坩埚13的加热部14和用于排出的喷嘴12 在坩埚13中朝向被处理物体气化的蒸镀材料30配置在真空室内。然后，通过使用加热部14加热包含在坩埚13中的蒸镀材料30来生成气化蒸镀材料气体，在被处理体上形成蒸镀膜。然后，将气体26从蒸发源10的外部经由喷嘴12供给到坩埚13中，通过关闭加热部14来冷却坩埚13.（C）2013，JPO＆INPIT

6. 发明专利

JP2011045916A Laser processing device, apparatus for manufacturing of solar cell panel, solar cell panel, and laser processing method 审中-公开
标题翻译：激光加工装置，制造太阳能电池板，太阳能电池板和激光加工方法的装置
公开(公告)号：JP2011045916A
公开(公告)日：2011-03-10
申请号：JP2009197717
申请日：2009-08-28
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： IZAKI MAKOTO , KATO NOBORU
IPC分类号： B23K26/00 , B23K26/067 , B28D5/00 , H01L31/04
CPC分类号： Y02E10/50
摘要： PROBLEM TO BE SOLVED: To improve productivity and to simplify mechanism by suppressing generation of powder during rinsing after thin film processing by laser scribe treatment. SOLUTION: The apparatus includes a laser processing device 10 which generates a transformation laser beam L1 to irradiate the thin film laminated on a substrate 2 and a peeling laser beam L2 to irradiate portions on the thin film that have been irradiated by the transformation laser beam L1 by tracing them, and a stage shifting section 12 which relatively moves the laser processing device 10 and the substrate 2. Thus the powder generated during the laser scribe treatment can be significantly or completely eliminated. Moreover, even if the powder is generated, the powder is transformed from the thin film so that it does not stick or fix to the thin film and can be easily removed by simple rinsing. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：通过激光划片处理的薄膜处理之后通过抑制漂洗过程中的粉末产生来提高生产率和简化机制。解决方案：该装置包括：激光加工装置10，其产生变换激光束L1以照射层压在基板2上的薄膜;以及剥离激光束L2，照射经转换照射的薄膜上的部分通过跟踪它们的激光束L1和相对移动激光加工装置10和基板2的级移动部分12.因此，可以显着或完全地消除在激光刻划处理期间产生的粉末。此外，即使产生粉末，粉末从薄膜转变成不粘附或固定在薄膜上，并且可以通过简单的冲洗容易地去除。版权所有（C）2011，JPO＆INPIT

7. 发明专利

JP2011017708A Substrate-inspecting device and substrate inspection method 有权
标题翻译：基板检测装置和基板检查方法
公开(公告)号：JP2011017708A
公开(公告)日：2011-01-27
申请号：JP2010175822
申请日：2010-08-04
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： KUMAZAWA YUTAKA , SUZUKI SHINJI , KATAHO HIDEAKI , OKADA HIROSHI , KATO NOBORU
IPC分类号： G01N21/956 , G02F1/13
摘要： PROBLEM TO BE SOLVED: To reduce the size of inspection device for reducing installation area thereof.SOLUTION: A stage 10 having a substrate 1 mounted thereon is provided with a plurality of blocks 12 supporting a bottom surface of the substrate 1 at a predetermined distance in a direction perpendicular to a scanning direction of inspection light, thereby forming grooves in the scanning direction of the inspection light among the blocks 12. The stage 10 and an optical system having a light projection system and a light-receiving system are moved in mutually opposite directions; while the stage 10 and the optical system are concurrently moved, the belt-like inspection light having a cross-sectional length L, which is shorter than the distance between the blocks 12, is emitted obliquely from the light projection system to a portion of the substrate 1 mounted onto the stage 10 and not supported by the blocks 12 along the scanning direction of the inspection light, thus the substrate 1 is scanned by the inspection light.
摘要翻译：要解决的问题：减小安装面积减小的检查装置的尺寸。解决方案：安装有基板1的载物台10设置有多个块12，其以预定距离支撑基板1的底表面与检查光的扫描方向垂直的方向，从而在块12之间沿检查光的扫描方向形成槽。台10和具有光投射系统和光接收系统的光学系统相互相反地移动方向; 同时台架10和光学系统同时移动，具有比块12之间的距离短的截面长度L的带状检查光从光投影系统倾斜地发射到基板1沿着检查光的扫描方向安装在台架10上并且不被块体12支撑，因此基板1被检查光扫描。

8. 发明专利

JP2009271452A Colored pattern correction apparatus and colored pattern correction method of color filter 有权
标题翻译：彩色滤光片的彩色图案校正装置和彩色图案校正方法
公开(公告)号：JP2009271452A
公开(公告)日：2009-11-19
申请号：JP2008124085
申请日：2008-05-09
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MURAMATSU GO , KATO NOBORU , KUMAZAWA YUTAKA , SENOO JUNJI , NAEMURA TAKAHIRO
IPC分类号： G02B5/20 , G02F1/13 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To correct a colored pattern of a color filter in a short time.
SOLUTION: A color filter substrate 1, where the colored pattern is formed and defect of foreign matter or defect of color missing is detected in the colored pattern, is mounted on a stage 10. The stage 10 and a laser device 30 are relatively moved and the laser device 30 is opposed to an pixel having the defect in its colored pattern of the color filter substrate 1 and the whole colored pattern in the pixel having the defect in its colored pattern is cut off by the laser device 30 regardless of defect of foreign matter or defect of color missing and regardless of size and height of the foreign matter or size of color missing. Then the stage 10 and an ink charging apparatus 40 are relatively moved and the ink charging apparatus 40 is opposed to the pixel where the colored pattern is cut off by the laser device 30 and one pixel amount of color ink is charged from the ink charging apparatus 40 into the pixel where the colored pattern is cut off by the laser device 30.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：在短时间内校正滤色器的着色图案。解决方案：在彩色图案上检测到形成着色图案的滤色器基板1和异物缺陷或缺陷缺陷，安装在载物台10上。载物台10和激光装置30是相对移动并且激光装置30与滤色器基板1的着色图案中的缺陷的像素相对，并且具有其着色图案的缺陷的像素中的整个着色图案被激光装置30切断，而不管外来物质的缺陷或缺陷的颜色缺失，不管异物的大小和高度，还是颜色的大小都缺失。然后，阶段10和墨水充填装置40相对移动，并且墨水填充装置40与由激光装置30切断的着色图案的像素相对，并且从墨水充填装置充电一个像素量的彩色墨水 40进入通过激光装置30切断着色图案的像素。（C）2010年，JPO和INPIT

9. 发明专利

JP2013172015A Deposition device, and substrate transfer mechanism therefor 审中-公开
标题翻译：沉积装置及其基板传送机构
公开(公告)号：JP2013172015A
公开(公告)日：2013-09-02
申请号：JP2012035323
申请日：2012-02-21
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： WAKABAYASHI MASA , KATO NOBORU , ZUSHI AN , ISHIZAWA YASUAKI
IPC分类号： H01L21/677 , B65G49/06 , C23C14/56 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide a long stroke transfer mechanism in which the height of a delivery chamber and a process chamber is low, and the size of opening of a gate valve can be decreased in the vertical direction.SOLUTION: In a direct-acting bearing at the second stage from below, two vertical rolling body holding parts are secured back-to-back to the base (first mover). In a direct-acting bearing at the next stage, two vertical orbit axes are secured back-to-back to the base (second mover). First mover and second mover are combined alternately to form a cross roller guide, and transfer a substrate mounted on a plate by a predetermined distance in the vacuum.
摘要翻译：要解决的问题：提供一种长行程传送机构，其中输送室和处理室的高度低，并且可以在垂直方向上减小闸阀的打开尺寸。解决方案：两个垂直滚动体保持部件相对于底座（第一移动件）背靠背地固定在第二阶段的下方的作用轴承。在下一阶段的直接作用轴承中，两个垂直轨道轴背靠背固定到基座（第二推动器）上。第一移动器和第二移动器交替组合以形成交叉滚子引导件，并将安装在板上的基板在真空中传送预定距离。

10. 发明专利

JP2011187362A Device for cleaning of vapor deposition mask for organic el, apparatus for manufacturing of organic el display, and vapor deposition mask cleaning method for organic el 有权
标题翻译：用于清洁有机EL的蒸气沉积掩模的装置，用于制造有机EL显示器的装置和用于有机EL的蒸气沉积掩模清洁方法
公开(公告)号：JP2011187362A
公开(公告)日：2011-09-22
申请号：JP2010052852
申请日：2010-03-10
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： KITANI YUKA , KATO NOBORU , YUMIBA KENJI , KATAGIRI KENJI , IZAKI MAKOTO
IPC分类号： H05B33/10 , C23C14/00 , C23C14/04 , H01L51/50
摘要： PROBLEM TO BE SOLVED: To establish an appropriate energy according to a vapor deposition mask for an organic EL, when carrying out cleaning of the vapor deposition mask for the organic EL.
SOLUTION: A device for cleaning of vapor deposition mask for the organic EL includes a laser scanner 4 which scans laser beams L on the surface of an organic EL vapor deposition mask 2 on which an organic material is adhered and exfoliates the organic material, a laser control unit 55 which scans the laser beams L by test on a part of the region out of the organic EL vapor deposition mask 2, an image processing unit 52 which detects whether the organic material of a portion which has undergone test scanning out of the organic EL vapor deposition mask is exfoliated, and a current correction part 53 and a focusing correction part 54 which correct irradiation condition of the laser beams L irradiated on the organic EL vapor deposition mask 2, based on the detection results of the image processing apparatus 52.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为进行有机EL的气相沉积掩模的清洁时，根据有机EL的气相沉积掩模建立适当的能量。解决方案：用于清洁有机EL的气相沉积掩模的装置包括：激光扫描器4，其在有机EL气相沉积掩模2的表面上扫描有机EL气相沉积掩模2的表面上的有机材料，并剥离有机材料，激光控制单元55，其通过在有机EL蒸镀掩模2中的一部分区域上的测试对激光束L进行扫描;图像处理单元52，其检测经过测试扫描的部分的有机材料剥离有机EL蒸镀掩模的电流校正部53以及照射在有机EL蒸镀掩模2上的激光L的照射条件的聚焦校正部54，根据图像处理的检测结果设备52.版权所有（C）2011，JPO＆INPIT

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