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1. 发明专利

JP2014062310A Film thickness sensor, and vacuum evaporation apparatus and vacuum evaporation method using the same 审中-公开
标题翻译：薄膜厚度传感器，真空蒸发装置和真空蒸发方法
公开(公告)号：JP2014062310A
公开(公告)日：2014-04-10
申请号：JP2012209253
申请日：2012-09-24
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： YAZAKI AKIO , MATSUURA HIROYASU , IZAKI MAKOTO , KITANI YUKA , SASAKI JUNYA
IPC分类号： C23C14/24
摘要： PROBLEM TO BE SOLVED: To provide a film thickness sensor in which adsorption efficiency of a light element, deposition of that on electrode films of a crystal vibrator is difficult, to a surface is highly improved, resulting in deleting a pre-coating process, and a vacuum evaporation apparatus and a vacuum evaporation method using the same.SOLUTION: A film thickness sensor 43 includes a crystal vibrator 10, which has a crystal 11 being put between electrode films 13 on both primary surfaces. A conductive oxide thin film 15 is formed on one of the primary surfaces on which evaporation material shall be deposited. A vacuum evaporation apparatus and a vacuum evaporation method control film forming rate by using the film thickness sensor.
摘要翻译：要解决的问题：为了提供一种薄膜厚度传感器，其特征在于，提高了光元件的吸附效率，难以在晶体振子的电极膜上的沉积对表面的吸附效果，导致预涂工序的缺失，真空蒸发装置和使用该蒸镀装置的真空蒸发方法。薄膜厚度传感器43包括晶体振子10，晶体振子10被放置在两个主表面上的电极膜13之间。导电氧化物薄膜15形成在要沉积蒸发材料的主表面之一上。真空蒸发装置和真空蒸发法通过使用膜厚度传感器控制成膜速率。

2. 发明专利

JP2014198861A 真空蒸着装置及び真空蒸着方法审中-公开
标题翻译：真空蒸发系统和真空沉积方法
公开(公告)号：JP2014198861A
公开(公告)日：2014-10-23
申请号：JP2013073900
申请日：2013-03-29
申请人：株式会社日立ハイテクノロジーズ , Hitachi High-Technologies Corp
发明人： OGATA TOMOHIKO , MIYAKE TATSUYA , MATSUURA HIROYASU , KITANI YUKA , SASAKI JUNYA
IPC分类号： C23C14/24 , H01L51/50 , H05B33/10
摘要：【課題】基板の蒸着に利用されない無駄な蒸着材料を低減できる、又は、単純な機構で膜厚の制御が可能な真空蒸着装置及び真空蒸着方法を提供する。【解決手段】真空蒸着装置又は真空蒸着方法において、坩堝内の蒸着材料の量に応じて変化する蒸気分布を蒸発源1のノズルから噴出させ、回転している基板2に対して前記蒸着材料を蒸着し、前記蒸着材料の蒸着量を膜厚センサで検出し、前記検出した結果に基づいて、前記基板の回転中心軸2cと前記回転中心軸と平行な前記ノズルの法線10hとの距離Lを変動させる。【選択図】図5
摘要翻译：要解决的问题：提供一种真空蒸发系统和真空沉积方法，其能够减少未用于气相沉积在基板上的无用蒸气沉积材料，或能够通过简单的机构控制膜厚度。解决方案：在真空中蒸发系统或真空沉积方法，从蒸发源1的喷嘴吹出与坩埚中的气相沉积材料的量相对应的蒸汽分布变化，并将蒸镀材料沉积在旋转的基板2上。通过膜厚度传感器检测蒸镀材料的沉积量，基于检测结果，改变基板的旋转中心轴2c与平行于旋转中心轴的喷嘴的正常10h之间的距离L。

3. 发明专利

JP2013204129A Vacuum deposition device and vacuum deposition method 审中-公开
标题翻译：真空沉积装置和真空沉积方法
公开(公告)号：JP2013204129A
公开(公告)日：2013-10-07
申请号：JP2012076834
申请日：2012-03-29
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ , Samsung Display Co Ltd , 三星ディスプレイ株式會社Samsung Display Co.,Ltd.
发明人： KITANI YUKA , IZAKI MAKOTO , TAKEI TETSUYA , JUNG JAE HOON , LEE SANG-WOO
IPC分类号： C23C14/24 , H01L51/50 , H05B33/10 , H05B33/14
摘要： PROBLEM TO BE SOLVED: To provide an excellent vacuum deposition device and an excellent vacuum deposition method, capable of preventing degradation in the productivity even when the size of a panel is increased.SOLUTION: A vacuum vapor deposition device for executing the vapor deposition of a luminescent material layer on a surface of a substrate to be vapor-deposited includes in a vacuum chamber 10: a cooling plate 13 in which a substrate to be vapor-deposited is mounted on its surface and held; a mask 30 to be mounted on a surface of a substrate 100 held by the cooling plate; and an evaporation source device 20 for supplying evaporated EL material in a moving mode via the mask on the surface of the substrate held by the cooling plate. The mask is fixed to a frame 33 while a mask sheet 31 formed of magnetic metal with a plurality of patterns being formed thereon is subjected to the tension. The cooling plate has a magnet 200 which attracts a part of the mask sheet to the surface of the substrate, and is moved synchronously with the movement of the evaporation source device.
摘要翻译：要解决的问题：提供一种优异的真空沉积装置和优异的真空沉积方法，即使当面板的尺寸增加时也能够防止生产率的降低。解决方案：一种用于执行气相沉积的真空气相沉积装置将要蒸镀的基板的表面上的发光材料层包括在真空室10中，在其表面上安装有被蒸镀的基板被保持的冷却板13; 安装在由冷却板保持的基板100的表面上的掩模30; 以及蒸发源装置20，用于通过在由冷却板保持的基板的表面上的掩模以移动模式供应蒸发的EL材料。掩模固定在框架33上，同时由形成有多个图案的磁性金属形成的掩模片31受到张力。冷却板具有磁体200，其将掩模片的一部分吸引到基板的表面，并与蒸发源装置的运动同步地移动。

4. 发明专利

JP2011219808A Mask dry cleaning apparatus and mask dry cleaning method, and apparatus for manufacturing mask dry 审中-公开
标题翻译：遮蔽清洁装置和面漆清洁方法，以及制造面包干燥的装置
公开(公告)号：JP2011219808A
公开(公告)日：2011-11-04
申请号：JP2010089399
申请日：2010-04-08
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： KITANI YUKA , YUMIBA KENJI , KATAGIRI KENJI , IZAKI MAKOTO
IPC分类号： C23C14/00 , B08B7/00 , C23C14/24 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide a mask dry cleaning apparatus and a mask dry cleaning method capable of enhancing the throughput and increasing the number for treatment in a dry cleaning method, and to provide an apparatus for manufacturing mask dry capable of cleaning the mask dry in a short time by providing the mask dry cleaning apparatus adjacent to a vapor deposition apparatus.SOLUTION: When cleaning a mask by irradiating a vapor deposition material deposited on the mask with laser beam emitted from a laser beam source, the shape of the laser beam is changed from a circular shape to an elliptical shape, and the vapor deposition material deposited on the mask is irradiated with the laser beam of the elliptical shape for cleaning.
摘要翻译：要解决的问题：提供一种能够提高干燥清洁方法中的处理量和提高处理次数的面罩干燥装置和面膜干燥方法，并且提供一种用于制造能够清洗的面罩干燥的装置通过设置与蒸镀装置相邻的面膜干燥装置，能够在短时间内干燥面膜。解决方案：通过从激光束源发射的激光束照射沉积在掩模上的蒸镀材料来清洁掩模时，激光束的形状从圆形变为椭圆形，并且气相沉积用椭圆形的激光束照射沉积在掩模上的材料进行清洁。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP2014154315A Organic el device manufacturing apparatus and organic el device manufacturing method 审中-公开
标题翻译：有机EL器件制造设备和有机EL器件制造方法
公开(公告)号：JP2014154315A
公开(公告)日：2014-08-25
申请号：JP2013022131
申请日：2013-02-07
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： KITANI YUKA , YANAGISAWA KOICHI , IZAKI MAKOTO , TAKEI TETSUYA
IPC分类号： H05B33/10 , C23C14/24 , H01L51/50
摘要： PROBLEM TO BE SOLVED: To provide an organic EL device manufacturing apparatus and an organic EL device manufacturing method, when high definition pixels are formed, capable of depositing each of the pixels in a required position, size and shape.SOLUTION: In the present invention, a mask made of a magnetic material is given with a predetermined first magnetic force strength to be brought into close contact with a substrate to be deposited, then, after a predetermined lapse time, the mask is brought into close contact with the substrate to be deposited by a second magnetic force strength that is increased than the first magnetic force strength, and a deposition material is deposited on the substrate to be deposited via the mask in a vacuum state.
摘要翻译：要解决的问题：为了提供一种有机EL器件制造装置和有机EL器件制造方法，当形成高分辨率像素时，能够将每个像素沉积在所需位置，尺寸和形状上。解决方案：在本发明中以规定的第一磁力强度赋予由磁性材料制成的掩模，与要沉积的基板紧密接触，然后在预定的时间之后，使掩模与基板紧密接触通过比第一磁力强度增加的第二磁力强度沉积，并且沉积材料以真空状态经由掩模沉积在待沉积的基板上。

6. 发明专利

JP2014150019A Device and method for manufacturing organic el device 审中-公开
标题翻译：用于制造有机EL器件的装置和方法
公开(公告)号：JP2014150019A
公开(公告)日：2014-08-21
申请号：JP2013019277
申请日：2013-02-04
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： SASAKI JUNYA , IZAKI MAKOTO , KITANI YUKA
IPC分类号： H05B33/10 , C23C14/24 , H01L51/50
摘要： PROBLEM TO BE SOLVED: To provide a device or a method for manufacturing an organic EL device in which film formation is possible in a stable rate and with uniform film thickness even by using a material which is liable to be fluctuated in rate due to abrupt boiling and which has high productivity and quality.SOLUTION: In a film formation using a material which is liable to induce rate fluctuation in a device for manufacturing an organic EL device, abrupt boiling is suppressed by using a crucible which has a porous material loaded inside thereof, or a crucible in which a part or the whole thereof or a part or the whole of the upper lid is constituted of a porous material and supplying fine bubbles to a film forming material filled in the crucible, and rate fluctuation is avoided.
摘要翻译：要解决的问题：提供一种用于制造有机EL器件的器件或方法，其中即使使用易于由于突然沸腾的速率波动的材料，也可以以稳定的速率和均匀的膜厚度进行成膜并且具有高的生产率和质量。解决方案：在使用易于引起有机EL器件制造装置中的速率波动的材料的成膜中，通过使用其内装有多孔材料的坩埚来抑制突然沸腾，或其一部分或整体或上盖的一部分或全部由多孔材料构成并且向填充在坩埚中的成膜材料供给微小气泡的坩埚，并且避免了速率波动。

7. 发明专利

JP2014011123A Deposition apparatus and deposition method 审中-公开
标题翻译：沉积装置和沉积方法
公开(公告)号：JP2014011123A
公开(公告)日：2014-01-20
申请号：JP2012148969
申请日：2012-07-03
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： IZAKI MAKOTO , TAKEI TETSUYA , KITANI YUKA
IPC分类号： H05B33/10 , C23C14/24 , H01L51/50
摘要： PROBLEM TO BE SOLVED: To provide a deposition apparatus or a deposition method having a high thick film uniformity by using a high response evaporation source capable of obtaining thick film uniformity.SOLUTION: The deposition apparatus includes an evaporation source which includes a crucible for housing an evaporation material, a nozzle for discharging vapor of the evaporation material generated from the crucible, and a casing for storing the crucible and the nozzle, and deposits the evaporation material thus discharged on a substrate, and a vacuum evaporation system internally housing the evaporation source. The evaporation source includes a vapor pressure adjustment valve for adjusting the vapor pressure in the crucible by discharging a specified quantity of the vapor of evaporation material generated from the crucible to the outside of the casing.
摘要翻译：要解决的问题：通过使用能够获得厚膜均匀性的高响应性蒸发源，提供具有高厚膜均匀性的沉积设备或沉积方法。溶解：沉积设备包括蒸发源，该蒸发源包括用于容纳蒸发材料，用于排出由坩埚产生的蒸发材料的蒸气的喷嘴，以及用于储存坩埚和喷嘴的壳体，并将如此排出的蒸发材料沉积在基板上，以及内部容纳蒸发源的真空蒸发系统。蒸发源包括蒸汽压力调节阀，用于通过将规定量的从坩埚产生的蒸发材料的蒸气排放到壳体的外部来调节坩埚中的蒸气压。

8. 发明专利

JP2011206720A Mask cleaner device for dry complete type organic el and mask cleaning method for the same 审中-公开
标题翻译：用于干式完全型有机EL的掩模清洁装置及其相同的掩模清洁方法
公开(公告)号：JP2011206720A
公开(公告)日：2011-10-20
申请号：JP2010078493
申请日：2010-03-30
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： IZAKI MAKOTO , KATAOKA FUMIO , YUMIBA KENJI , KATAGIRI KENJI , KITANI YUKA
IPC分类号： B08B7/00 , H01L51/50 , H05B33/10 , H05H1/24
摘要： PROBLEM TO BE SOLVED: To provide a mask cleaner device for organic EL and the method, in which a large-size mask is washable and there is no application due to physical and thermal causes to the mask and no load growth to circumstances.SOLUTION: The mask cleaner device for dry complete type organic EL for removing an organic substance adhering to a surface from a mask containing the organic substance adhering to the surface in a vapor deposition process comprises a laser cleaning apparatus (10) carrying out a laser cleaning, an oxygen ashing device (20) carrying out an ashing by an oxygen plasma, an EUV apparatus (30) irradiating the surface of the mask with an EUV, and an atmospheric-pressure plasma treatment apparatus (40) carrying out an atmospheric-pressure plasma treatment, each being arranged mutually adjacently, and at the same time, a conveying means (50) for conveying the mask being provided.
摘要翻译：要解决的问题：提供一种用于有机EL的面罩清洁器装置，其中大尺寸面罩是可洗涤的，并且由于面罩的物理和热原因而没有应用，并且无负载增长的情况。解决方案：用于从气相沉积工艺中附着在表面上的含有有机物的掩模中除去附着在表面上的有机物的干式完全型有机EL的面罩清洁装置包括进行激光清洗的激光清洗装置（10）通过氧等离子体进行灰化的氧灰化装置（20），以EUV照射面罩表面的EUV装置（30）和进行大气压等离子体处理的大气压等离子体处理装置（40）每个都相互相邻布置，并且同时具有用于传送设置的面罩的输送装置（50）。

9. 发明专利

JP2014070969A Rate sensor, linear source and vapor deposition device 审中-公开
标题翻译：速率传感器，线性源和蒸气沉积装置
公开(公告)号：JP2014070969A
公开(公告)日：2014-04-21
申请号：JP2012216332
申请日：2012-09-28
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： IZAKI MAKOTO , KITANI YUKA , MITSUI RYUSEI , KATO NOBORU , ZUSHI AN
IPC分类号： G01B17/02 , C23C14/24 , C23C14/52 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide a rate sensor that reduces a time required for pre-coating and reduces production man-hours, a linear source, and a vapor deposition device.SOLUTION: In a rate sensor in which a predetermined number of crystal oscillators are arranged on a concentric circle, a first crystal oscillator is pre-coated at a higher temperature than a normal vapor deposition temperature. Since the rate sensor includes a cover having a first opening part provided so as to expose with respect to steam from an evaporation source and a second opening part adjacent to the first opening part, a second crystal oscillator is pre-coated simultaneously at normal vapor deposition while exposing the crystal oscillator of the second opening part.
摘要翻译：要解决的问题：提供一种速率传感器，其减少预涂所需的时间并减少生产工时，线性源和蒸镀装置。解决方案：在速率传感器中，其中预定数量的晶体振荡器布置在同心圆上，第一晶体振荡器在比常规气相沉积温度更高的温度下预涂覆。由于速率传感器包括具有设置成相对于来自蒸发源的蒸汽暴露的第一开口部和与第一开口部相邻的第二开口部的盖，因此在通常的气相沉积下同时预涂了第二晶体振荡器同时暴露第二开口部分的晶体振荡器。

10. 发明专利

JP2014066673A Rate sensor, linear source, and vapor depositing apparatus 审中-公开
标题翻译：速率传感器，线性源和蒸气沉积装置
公开(公告)号：JP2014066673A
公开(公告)日：2014-04-17
申请号：JP2012213902
申请日：2012-09-27
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： IZAKI MAKOTO , YAZAKI AKIO , KITANI YUKA
IPC分类号： G01B17/02 , C23C14/24 , C23C14/52 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide a rate sensor, a linear source and a vapor depositing apparatus that make possible pre-coating of a plurality of quartz oscillators with the same quantity of depositing steam as in regular production in a pre-coating process, a saving in the number of man-hours required in the pre-coating process and accordingly a reduction in the number of man-hours spent in production.SOLUTION: A rate sensor having a plurality of serially arranged quartz oscillators comprises a cover having an opening for quartz oscillators for rate detection and an opening for quartz oscillators for pre-coating; a rate detecting nozzle of a linear source is arranged pointing at the openings for the quartz oscillators for rate detection of the rate sensor, and a pre-coating nozzle is arranged pointing at the opening for the quartz oscillators for pre-coating detection of the rate sensor.
摘要翻译：要解决的问题：提供一种速率传感器，线性源和气相沉积设备，其可以预先涂覆具有与预涂工艺中的常规生产相同数量的沉积蒸汽的多个石英振荡器，节省了预涂工艺中所需的工时数量，从而减少了在生产中花费的工时数量。解决方案：具有多个串联布置的石英振荡器的速率传感器包括：盖，其具有用于用于速率检测的石英振荡器和用于预涂层的石英振荡器的开口; 线性源的速率检测喷嘴被布置成指向用于速率传感器的速率检测的石英振荡器的开口，并且预定喷嘴布置成指向用于石英振荡器的开口以用于预涂覆检测速率传感器。

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