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1. 发明专利

JP2013178877A Charged particle beam device 审中-公开
标题翻译：充电颗粒光束装置
公开(公告)号：JP2013178877A
公开(公告)日：2013-09-09
申请号：JP2012040860
申请日：2012-02-28
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： KAWADA HIROKI , INOUE OSAMU , YAMAGUCHI ATSUKO
IPC分类号： H01J37/147 , G01B15/04 , H01J37/20 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam device in which a beam is made incident vertically to a sample without performing an adjustment or the like using any other deflector than a deflector for visual field movement.SOLUTION: A charged particle beam device is provided which comprises a deflector which moves a scan area of a charged particle beam emitted from a charged particle source and a sample stage for moving a sample. In the charged particle beam device, the sample is moved by the sample stage so as to position the scan area in a location deviated from a target visual field by a predetermined amount and after the sample is moved, the sample stage and the deflector are controlled so as to position the scan area to the target visual field through the deflector.
摘要翻译：要解决的问题：提供一种带电粒子束装置，其中垂直于垂直于样品入射，而不使用任何其它偏转器进行调节等而不是用于视野运动的偏转器。解决方案：带电粒子束装置是其包括偏转器，该偏转器移动从带电粒子源发射的带电粒子束的扫描区域和用于移动样本的样品台。在带电粒子束装置中，样品被样品台移动，以将扫描区域定位在偏离目标视野的位置预定量，并且在样品移动之后，样品台和偏转器被控制以便通过偏转器将扫描区域定位到目标视野。

2. 发明专利

JP2012137454A Standard member for calibration, manufacturing method thereof, and scanning electron microscope using the same 有权
标题翻译：用于校准的标准构件，其制造方法和使用其的扫描电子显微镜
公开(公告)号：JP2012137454A
公开(公告)日：2012-07-19
申请号：JP2010291517
申请日：2010-12-28
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： NAKAYAMA YOSHINORI , TASE TAKASHI , YAMAMOTO JIRO , INOUE OSAMU
IPC分类号： G01B15/00
CPC分类号： H01J37/261 , B32B38/0004 , B32B38/10 , G01B15/00 , H01J37/28 , H01J2237/2826
摘要： PROBLEM TO BE SOLVED: To provide a standard member performing calibration of magnification used for an electron microscope in an automatic and stable manner with high accuracy.SOLUTION: On the same surface, a standard member for calibration has: multilayer film cross sections formed by alternately laminating materials different from each other; a plurality of first mark patters interposing a first silicon layer therebetween and being disposed in parallel with the multilayer film cross sections; at least a pair of second mark patterns interposing a second silicon layer having a thickness larger than that of the first silicon layer therebetween at an opposite side to the plurality of first mark patterns with respect to the multilayer film cross sections and being disposed in parallel with the multilayer film cross sections; and a silicon layer disposed outside the first mark patterns and the second mark patterns with respect to the multilayer film cross sections.
摘要翻译：要解决的问题：提供以高精度以自动和稳定的方式进行用于电子显微镜的放大倍数校准的标准构件。解决方案：在相同的表面上，用于校准的标准构件具有：通过交替层叠彼此不同的材料形成的多层膜横截面; 多个第一标记图案，其间插入第一硅层并与所述多层膜横截面平行设置; 至少一对第二标记图案，相对于所述多层膜横截面，在与所述多个第一标记图案相对的一侧相对于所述多层膜截面插入厚度大于所述第一硅层的厚度的第二硅层，并且与多层薄膜横截面; 以及相对于多层膜横截面设置在第一标记图案之外的硅层和第二标记图案。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2014016174A Overlay error measurement device, and computer program for causing computer to measure a pattern 有权
标题翻译：覆盖误差测量装置和计算机计算机用于测量图形的计算机程序
公开(公告)号：JP2014016174A
公开(公告)日：2014-01-30
申请号：JP2012152008
申请日：2012-07-06
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： YAMAGUCHI SATOSHI , SAKAI KEI , INOUE OSAMU , HIRAO KAZUYUKI , KOMURO OSAMU
IPC分类号： G01B15/00 , G01B15/04
CPC分类号： G01B15/00 , G03F7/70633 , H01J37/26 , H01J2237/221 , H01J2237/24578 , H01J2237/2817 , H01L22/12
摘要： PROBLEM TO BE SOLVED: To provide an overlay error measurement device capable of accurately measuring an overlay error even in a case where a lower-layer pattern is disposed under a thin film and unable to secure an adequate amount of signal quantity.SOLUTION: An overlay error measurement device includes an arithmetic processing unit for measuring a pattern formed on a specimen on the basis of a signal waveform obtained by a charged particle beam device. Further, the arithmetic processing unit performs: using a partial waveform obtained on the basis of partial extraction of a signal waveform to calculate correlation therewith; forming a correlation profile 501 indicating the correlation; and measuring an overlay error using the correlation profile 501.
摘要翻译：要解决的问题：提供即使在下层图案设置在薄膜下方并且不能确保足够量的信号量的情况下也能够精确地测量覆盖误差的覆盖误差测量装置。解决方案：覆盖层误差测量装置包括：运算处理单元，用于根据由带电粒子束装置得到的信号波形，测量在样本上形成的图案。此外，算术处理单元执行：使用基于信号波形的部分提取而获得的部分波形来计算与其的相关性; 形成指示相关性的相关特征501; 以及使用相关轮廓501测量重叠误差。

4. 发明专利

JP2013156959A Image processing device and method, distortion correction map creation device and method, and semiconductor measurement device 有权
标题翻译：图像处理装置和方法，失真校正映射创建装置和方法以及半导体测量装置
公开(公告)号：JP2013156959A
公开(公告)日：2013-08-15
申请号：JP2012019247
申请日：2012-01-31
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： TAGUCHI JUNICHI , IKEDA KOJI , ABE YUICHI , INOUE OSAMU , KAWASAKI TAKAHIRO
IPC分类号： G06T3/00 , H04N1/409
CPC分类号： G06T7/0004 , G01R31/311 , G06T3/4007 , G06T5/006 , G06T5/20 , G06T2207/20056 , G06T2207/20182 , G06T2207/30148 , H04N1/387 , H04N1/3878
摘要： PROBLEM TO BE SOLVED: To provide technology to reduce an error between an original image and an image after correction without increasing the number of neighboring pixels used for interpolation of the pixels.SOLUTION: An image processing device comprises: interpolation processing image acquisition means acquiring an interpolation processing image of a predetermined size including an interpolation point of an input image; Fourier transformation means performing Fourier transformation of the interpolation processing image acquired by the interpolation processing image acquisition means; phase modification means modifying a phase of each value of the interpolation processing image after the Fourier transformation by the Fourier transformation means based on the shift theorem so that the interpolation point shifts in an integer coordinate position near a desired point; inverse Fourier transformation means performing inverse Fourier transformation of the interpolation processing image in which the phases are changed by the phase modification means; and interpolated value determination means determining the value of the pixel in the integer coordinate position from among the interpolation processing image after the inverse Fourier transformation by the inverse Fourier transformation means as an interpolated value of the interpolation point.
摘要翻译：要解决的问题：提供减少校正后的原始图像和图像之间的误差的技术，而不增加用于像素插值的相邻像素的数量。解决方案：图像处理装置包括：内插处理图像获取装置，包括输入图像的内插点的预定尺寸的插值处理图像; 傅里叶变换装置对由内插处理图像获取装置获取的内插处理图像进行傅里叶变换; 相位修正装置是通过傅里叶变换装置基于移位定理来修正傅里叶变换后的内插处理图像的每个值的相位，使得内插点在所需点附近的整数坐标位置移动; 逆傅里叶变换装置对相位改变装置改变相位的内插处理图像进行傅立叶逆变换; 并且内插值确定装置从反傅立叶变换装置进行的逆傅立叶变换之后的内插处理图像中确定整数坐标位置中的像素的值作为内插点的内插值。

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