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1. 发明专利

JP2001014764A TURNTABLE 失效
公开(公告)号：JP2001014764A
公开(公告)日：2001-01-19
申请号：JP18477799
申请日：1999-06-30
申请人： HITACHI LTD
发明人： YAMANE TOMOYUKI , KIMURA NOBUO , YANAGI MASASHI , SUMIYA MASANORI
IPC分类号： G11B17/028 , G11B7/26 , G11B19/20 , G11B25/04
摘要： PROBLEM TO BE SOLVED: To perform various processing operations for a master disk with one device by adsorbing in vacume and desorbing the master disk on a turntable irrespective of the size/shape of the master disk. SOLUTION: A turntable head 2 includes a groove 7 for evacuation and gas purging and a hole 1 independently provided for each radius of a circumference, evacuation and gas purging are controlled independently for each groove 7, the holes 1 are collected inside a turntable, and a shaft is provided to close the holes independently. Depending on the size or shape of a master disk, the hole 1 is closed by the shaft or opened. Thus, vacuum adsorption/desorption is controlled for each size or shape of the master disk, flexibility for the master disk is increased, and various processing operations are carried out for the master disk with one device.

2. 发明专利

JP2001014740A MASTER PLATE EXPOSURE DEVICE AND ITS METHOD 失效
公开(公告)号：JP2001014740A
公开(公告)日：2001-01-19
申请号：JP18477899
申请日：1999-06-30
申请人： HITACHI LTD
发明人： YAMANE TOMOYUKI , KIMURA NOBUO , YANAGI MASASHI , SUMIYA MASANORI
IPC分类号： G11B7/26
摘要： PROBLEM TO BE SOLVED: To raise the cleanliness of a required part to a desired level by setting the inside of the container, which encloses a master plate and a prescribed transporting path or the exposure device itself, at the external pressure or below. SOLUTION: With the purpose of setting the pressure lower than the external pressure in the area enclosed with a wall 10, an evacuation valve 13 is opened, operating a rotary pump 15 for evacuation, running a turbo-molecular pump 16, and adjusting the pressure with a pressure regulating valve 14. After the reduction in the pressure to an arbitrary level, master plate exposure is performed; with the completion of the exposure, the evacuation valve 13 and the pressure regulating valve 14 are closed; and then, a gas purging valve 18 in a gas source 19 is opened, purging the gas into a vacuum container. After the pressure is equalized to the external pressure level, the master plate is taken out. As a result, the area enclosed with the wall 10 in the periphery including the master plate 6 is evacuated and put under the low pressure; hence, the generation and entry of foreign matters as dust are suppressed, bringing an area with little foreign matters and enhancing the cleanliness.

3. 发明专利

JP2001014739A MASTER PLATE EXPOSURE DEVICE 失效
公开(公告)号：JP2001014739A
公开(公告)日：2001-01-19
申请号：JP18477699
申请日：1999-06-30
申请人： HITACHI LTD
发明人： YANAGI MASASHI , KIMURA NOBUO , SUMIYA MASANORI , YAMANE TOMOYUKI
IPC分类号： G11B7/26
摘要： PROBLEM TO BE SOLVED: To prevent sticking of dust due to manual operation by locally cleaning only the part that deals with a master plate inside the device and using a hermetically sealing type cassette case for the master plate when it is moved inside a clean room. SOLUTION: A master plate 11 is transported from a master plate cassette 12 to a turntable 7 by means of a master plate transporting robot 9. In this case, the opening/closing part of the device enclosure 5 is open, but the container of the master plate cassette case 13 is hermetically sealed, leaving no openings as a whole, with cleanliness maintained by the down flow of air of No.2 cleanliness level. The master plate 11 after exposure is transported from the turntable 7 to the cassette 12 by the robot 9 and, after the completion of the transportation, is returned to the cassette case 13 by a cassette case opening/closing mechanism 8; the cassette case 13 is closed linked with its opening/closing part 14 and the opening/closing part 15 of the device enclosure 5, and is again put to the hermetically sealed state.

4. 发明专利

JP2001101705A OPTICAL TRANSMITTER AND DEVICE EQUIPPED WITH OPTICAL TRANSMITTER 失效
公开(公告)号：JP2001101705A
公开(公告)日：2001-04-13
申请号：JP2000220507
申请日：2000-07-21
申请人： HITACHI MAXELL , HITACHI LTD
发明人： SUGIYAMA TOSHINORI , SUMIYA MASANORI
IPC分类号： G03F7/20 , G11B7/09 , G11B7/135 , G11B7/26 , H01S3/00
摘要： PROBLEM TO BE SOLVED: To suppress the position to be irradiated with a light beam on a light receiving element from being changed due to the change in the wavelength of the light beam in a device which transmits the light beam variable in wavelength from a light source to the light receiving element. SOLUTION: This optical transmitter has an optical element which receives and emits light beam and changes the deflection angle between the received light beam and the emitted light beam according to the change in the wavelength, and a compensation optical element which receives and emits the light beam and changes the compensation deflection angle between the received light beam and the emitted light beam according to the change in the wavelength. The optical element and the compensation optical element are disposed optically in series between a light source and the light receiving element, and the deflection angle changes in a first direction with an increase in the wavelength while the compensation deflection angle changes in a second direction with an increase in the wavelength. The change in the first direction of the deflection angle is compensated by the changes in the second direction of the compensation deflection angle so that the position to be irradiated with the light beam on the light receiving element is suppressed from being changed due to the increase in the wavelength.

5. 发明专利

JP2000348370A EXPOSURE SYSTEM FOR MASTER DISK 失效
公开(公告)号：JP2000348370A
公开(公告)日：2000-12-15
申请号：JP15741899
申请日：1999-06-04
申请人： HITACHI LTD , HITACHI MAXELL
发明人： KIMURA NOBUO , YANAGI MASASHI , SUMIYA MASANORI , YAMANE TOMOYUKI , ITO SHO
IPC分类号： G11B7/09 , B23K26/06 , B23K26/073 , G11B7/125 , G11B7/126 , G11B7/135 , G11B7/1392 , G11B7/26
摘要： PROBLEM TO BE SOLVED: To prevent the misalignment of focuses of a recording laser and a focusing laser by mounting a lens to give an incident angle on an elevating bed which is mounted on a mobile table moving in the radial direction with respect to the master disk plane, which moves in the direction perpendicular to the master disk plane and which holds a recording lens. SOLUTION: An optical system for focusing is mounted on a elevating bed 14. The laser light of a focusing laser 9 passes through a collimator lens 17, polarizing beam splitter 10 and λ/4 plate 11, then enters a convex lens 19 to generate a specified incident angle, is mixed with the recording laser light on a dichroic mirror 22, and enters a recording lens 7 fixed on the bed 14. The laser light of a recording laser 2 passes through the optical system on a fixed table 21 and enters the recording lens. Even when the thickness of the master disk 15 slightly changes and the recording lens 7 is vertically moved by vertically moving the elevating bed 14, the focusing laser 9 also vertically moves linked with the aforementioned movement so that the distance between the recording lens 7 and the focusing laser 9 is always controlled to be constant.

6. 发明专利

JP2000173983A PLASMA TREATING METHOD AND DEVICE 失效
公开(公告)号：JP2000173983A
公开(公告)日：2000-06-23
申请号：JP34136498
申请日：1998-12-01
申请人： HITACHI LTD
发明人： YAMASU HIROAKI , FUJII TAKASHI , MATANO KATSUJI , KIHARA HIDEKI , SUMIYA MASANORI , KANEKIYO TAKAMITSU
IPC分类号： H01L21/302 , C23C16/50 , C23C16/511 , C23F4/00 , H01L21/3065 , H01L21/31 , H05H1/46
摘要： PROBLEM TO BE SOLVED: To prevent the generation of foreign matters in a treating chamber by eliminating a deposition of reaction products, which are generated on the inner wall of the treating chamber by etching, by a method wherein the low-temperature part of a plasma generating part in a container is warmed by an electromagnetic wave absorber. SOLUTION: Deposition amount of reaction products which are generated on the inner wall of a treating chamber at the time of an etching treatment is great in the vicinity of the outermost peripheral part of a shower plate 3, which is also a high-frequency transmitting window, and these reaction products are separated from the outermost peripheral part to turn into a foreign matter source, which is generated in the chamber. In this case as the main cause due to the deposition amount of the reaction products, a fact is mentioned that the temperature of the plate 3 is low. There, for raising the temperature of the outer peripheral part of the plate 3, a ring 13 formed by forming an SiC, for example, into a ring shape using a microwave absorber, is provided to bring it into contact with the plate 3, and the outer peripheral part of the plate 3 is heated by this ring 13. Thereby, the reaction products does not deposit on the inner wall of the chamber, the generation of foreign matters in the chamber can be prevented.

7. 发明专利

JPH09171997A DRY ETCHING APPARATUS 失效
公开(公告)号：JPH09171997A
公开(公告)日：1997-06-30
申请号：JP33217395
申请日：1995-12-20
申请人： HITACHI LTD , HITACHI TECHNO ENG
发明人： SUMIYA MASANORI , FUJII TAKASHI , KIKKAI MOTOHIKO , MATANO KATSUJI
IPC分类号： C23F4/00 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To obtain a dry etching apparatus by which an etching treatment is performed uniformly by a method wherein a ring which is situated at the upper part from a wafer in a plasma and which is not situated directly above the wafer is installed so as not to come into contact width the wafer. SOLUTION: A wafer 13 is conveyed to the position of a wafer 13 inside a plasma treatment apparatus by means of a conveyance device. An insulating film 12 is formed between the wafer 13 and an electrode 10, a groove its formed on the insulating film 12, the groove is filled with a gas for wafer cooling, and the wafer 13 can be adjusted to a prescribed temperature. In addition, in order to protect the electrode 10 and the insulating film from a generated plasma, a ring 17 which is supported at a treatment-chamber wall 18 by a support 21 is installed on the whole circumference near the wafer 13. In this state, a DC bias voltage is applied to the electrode 10 by a DC power supply 11, the wafer 13 is attracted to the electrode 10 via the insulating film 12, a cooling gas is then introduced to the rear of the wafer 13, high-frequency power is applied to the electrode 10 by a high-frequency power supply 15, and the etching treatment of the wafer 13 is performed. Thereby, the etching treatment of the wafer can be performed with high uniformity.

8. 发明专利

JP2001250278A DEVICE AND METHOD FOR EXPOSING ORIGINAL DISK 失效
公开(公告)号：JP2001250278A
公开(公告)日：2001-09-14
申请号：JP2000061812
申请日：2000-03-02
申请人： HITACHI LTD
发明人： SUMIYA MASANORI , YANAGI MASASHI , YAMANE TOMOYUKI , KIMURA NOBUO
IPC分类号： G11B7/26
摘要： PROBLEM TO BE SOLVED: To perform normal exposure by controlling an original disk to a low temperature so as to suppress chemical reaction between PED in a device and a method for exposing the original disk, designed to expose photosensitizer by radiating a laser beam to the potosensitizer disposed on the original disk. SOLUTION: Temperature-controlled gas is purged from the surface of an original disk before exposure, and the exposure is started after the drop of the original disk surface temperature to a specified temperature is confirmed. Before the original disk is taken out from the device after the exposure, the surface temperature of the original disk is increased to another temperature, e.g. the temperature of Post Exposure Bake(PEB), and the original disk is taken out from the device after its holding for a certain period.

9. 发明专利

JP2001229583A DEVICE AND METHOD FOR EXPOSURE OF MASTER DISK 失效
公开(公告)号：JP2001229583A
公开(公告)日：2001-08-24
申请号：JP2000043522
申请日：2000-02-16
申请人： HITACHI LTD
发明人： SUMIYA MASANORI , YANAGI MASASHI , YAMANE TOMOYUKI , KIMURA NOBUO
IPC分类号： G11B7/26 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To solve such a problem that when the temperature of a photosensitive material varies from the process of applying the photosensitive material to the process of developing, the photosensitive characteristics changes and specified photosensitive performance can not be obtained. SOLUTION: The temperature of the master disk and the photosensitive material is controlled by purging the circumference of the master disk during exposure with gas at a controlled temperature or by controlling the temperature of the sample bed where the master disk is mounted. By this method, the temperature of the photosensitive material during exposure can be controlled and changes in the photosensitive characteristics can be suppressed.

10. 发明专利

JPH11340203A VACUUM TREATMENT APPARATUS AND TREATMENT STAGE 失效
公开(公告)号：JPH11340203A
公开(公告)日：1999-12-10
申请号：JP14334798
申请日：1998-05-25
申请人： HITACHI LTD , HITACHI TECHNO ENG
发明人： SUMIYA MASANORI , KANAI SABURO , ITO YOICHI , FUJII TAKASHI , KAWAHARA HIRONORI , HAMAZAKI RYOJI , TAKAHASHI NUSHITO , KIKKAI MOTOHIKO
IPC分类号： C23F4/00 , H01L21/00 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide a vacuum treatment apparatus and a treatment stage with an electrostatically chucking means suitable for treating a wafer at high temperatures. SOLUTION: In a vacuum treatment apparatus, a treatment stage 7 is provided in a treatment chamber 3. A workpiece is electrostatically chucked to the treatment stage 7 in atmosphere under lowered pressure, and then the treatment stage 7 is heated to treat the workpiece at a high temperature. The treatment stage 7 has an electrode member made of titanium or titanium-based alloy. A dielectric film for electrostatic chucking is formed on the electrode member. In this case, titanium and alumina ceramics have no affinity for donding, so that a nickel alloy (Ni. Al) is desirably interposed between these members.

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