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    • 6. 发明专利
    • MASTER PLATE EXPOSURE DEVICE AND ITS METHOD
    • JP2001014740A
    • 2001-01-19
    • JP18477899
    • 1999-06-30
    • HITACHI LTD
    • YAMANE TOMOYUKIKIMURA NOBUOYANAGI MASASHISUMIYA MASANORI
    • G11B7/26
    • PROBLEM TO BE SOLVED: To raise the cleanliness of a required part to a desired level by setting the inside of the container, which encloses a master plate and a prescribed transporting path or the exposure device itself, at the external pressure or below. SOLUTION: With the purpose of setting the pressure lower than the external pressure in the area enclosed with a wall 10, an evacuation valve 13 is opened, operating a rotary pump 15 for evacuation, running a turbo-molecular pump 16, and adjusting the pressure with a pressure regulating valve 14. After the reduction in the pressure to an arbitrary level, master plate exposure is performed; with the completion of the exposure, the evacuation valve 13 and the pressure regulating valve 14 are closed; and then, a gas purging valve 18 in a gas source 19 is opened, purging the gas into a vacuum container. After the pressure is equalized to the external pressure level, the master plate is taken out. As a result, the area enclosed with the wall 10 in the periphery including the master plate 6 is evacuated and put under the low pressure; hence, the generation and entry of foreign matters as dust are suppressed, bringing an area with little foreign matters and enhancing the cleanliness.
    • 7. 发明专利
    • MASTER PLATE EXPOSURE DEVICE
    • JP2001014739A
    • 2001-01-19
    • JP18477699
    • 1999-06-30
    • HITACHI LTD
    • YANAGI MASASHIKIMURA NOBUOSUMIYA MASANORIYAMANE TOMOYUKI
    • G11B7/26
    • PROBLEM TO BE SOLVED: To prevent sticking of dust due to manual operation by locally cleaning only the part that deals with a master plate inside the device and using a hermetically sealing type cassette case for the master plate when it is moved inside a clean room. SOLUTION: A master plate 11 is transported from a master plate cassette 12 to a turntable 7 by means of a master plate transporting robot 9. In this case, the opening/closing part of the device enclosure 5 is open, but the container of the master plate cassette case 13 is hermetically sealed, leaving no openings as a whole, with cleanliness maintained by the down flow of air of No.2 cleanliness level. The master plate 11 after exposure is transported from the turntable 7 to the cassette 12 by the robot 9 and, after the completion of the transportation, is returned to the cassette case 13 by a cassette case opening/closing mechanism 8; the cassette case 13 is closed linked with its opening/closing part 14 and the opening/closing part 15 of the device enclosure 5, and is again put to the hermetically sealed state.
    • 8. 发明专利
    • DEVICE AND METHOD FOR EXPOSING MASTER DISK
    • JP2002092975A
    • 2002-03-29
    • JP2000276671
    • 2000-09-12
    • HITACHI LTD
    • YAMANE TOMOYUKIKIMURA NOBUOYANAGI MASASHINAKAMOTO HIDEKAZUIMUDA YOSHIO
    • G11B7/26
    • PROBLEM TO BE SOLVED: To solve such a problem that the temperature in conventional device for exposing master disk is influenced by the temperature of a room in which the device for exposing master disk is disposed because the conventional device has no temperature controlling mechanism, therefore, characteristics of a laser for exposure, respective optical holders, respective optical elements and respective controlling instruments, etc., are varied by the temperature change and the proper exposure processing is made unable. SOLUTION: This device and method for exposing original plate has a mechanism which controls the temperature of the laser for exposure, the respective optical holders, the respective optical elements and the respective controlling instruments, etc., or the whole of device for exposing master disk. The temperature controlling is performed by purging the temperature-controlled gas, by the temperature controlling means, and, therein, single gas such as N2 and argon or mixed gas containing one or more of the single gases is used as the purged gas. Otherwise, the temperature controlling means is preferably such a type one that the temperature controlling is performed by flowing the temperature-controlled liquid to respective places to be temperature- controlled. In such a manner, failure due to temperature variation is removed and making the effect possible the proper exposure processing is obtained.