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1. 发明专利

JP2009150923A Image forming method using photosensitive image recording material 有权
标题翻译：使用感光图像记录材料的图像形成方法
公开(公告)号：JP2009150923A
公开(公告)日：2009-07-09
申请号：JP2007326160
申请日：2007-12-18
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUSHIMI HIDEO , YANAI YUJIRO , SANETO RYUJI
IPC分类号： G03C5/08 , G03B27/32 , G03C1/498 , G03C1/76
摘要： PROBLEM TO BE SOLVED: To provide an image forming method using a photosensitive image recording material having small occurrence of interference fringes by having high sharpness. SOLUTION: The image forming method includes an exposure process for forming latent images by scanning and exposing the photosensitive image recording material having an image forming layer on one face of a transparent support and having a back layer on a reverse face to the image forming layer of the transparent support with laser lights L1-L3, and a developing process for visualizing the latent images by the development. The thickness d B of the back layer satisfies a specific mathematical expression including the minimum angle θ min out of incident angles θ S , θ B , θ E during scanning and exposing. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种使用具有高锐度的干涉条纹小的感光图像记录材料的图像形成方法。解决方案：图像形成方法包括通过在透明支撑体的一个面上扫描和曝光具有图像形成层的感光图像记录材料并在背面上具有背面的图像来形成潜像的曝光处理用激光L1-L3形成透明支撑层，以及通过显影使潜像可视化的显影过程。背层的厚度d B 满足在入射角θ S 外的最小角度θ min 的特定数学表达式，θ B ，θ E 。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2007078869A Heat developable photosensitive material and method for producing same 审中-公开
标题翻译：热可变光敏材料及其制造方法
公开(公告)号：JP2007078869A
公开(公告)日：2007-03-29
申请号：JP2005264373
申请日：2005-09-12
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUSHIMI HIDEO
IPC分类号： G03C1/498 , G03C1/74 , G03C1/76
摘要： PROBLEM TO BE SOLVED: To provide a high quality heat developable photosensitive material having improved coated surface condition and a method for producing the same. SOLUTION: The heat developable photosensitive material has on a support an image forming layer containing a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for silver ions and a binder and at least one non-photosensitive layer, wherein the heat developable photosensitive material contains at least one surfactant selected from a substituted phenoxypolyethyleneoxyalkyl(or aryl)sulfonate, a compound of formula II and a sulfosuccinic ester, wherein L represents a bond or -O(CH 2 CH 2 O) m3 -; and Y 1 represents H, methyl or -COOM. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有改进的涂布表面状态的高品质的可热显影的感光材料及其制造方法。解决方案：热显影感光材料在载体上具有包含感光卤化银，非感光性有机银盐，银离子还原剂和粘合剂和至少一种非感光层的图像形成层，其中所述可热显影感光材料含有至少一种选自取代的苯氧基聚乙烯氧基烷基（或芳基）磺酸酯，式II化合物和磺基琥珀酸酯的表面活性剂，其中L表示键或-O（CH 2 CH 2 O）立方米 - ; 且Y 1表示H，甲基或-COOM。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2011192743A Cleaning composition, and method of manufacturing semiconductor device 有权
标题翻译：清洁组合物及制造半导体器件的方法
公开(公告)号：JP2011192743A
公开(公告)日：2011-09-29
申请号：JP2010056286
申请日：2010-03-12
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： TAKAHASHI TOMOI , FUSHIMI HIDEO
IPC分类号： H01L21/304 , C11D7/06 , C11D7/08 , C11D7/10 , C11D7/16 , C11D7/26 , C11D7/32 , G03F7/42 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a cleaning composition for sufficiently removing plasma etching residue on a semiconductor substrate without damaging a wiring structure and interlayer insulation structure, and to provide a method of manufacturing a semiconductor device using the cleaning composition.
SOLUTION: The cleaning composition for removing plasma etching residue formed on a semiconductor substrate contains (component a) water, (component b) hydroxylamine and/or its salt, (component c) basic compound, (component d) organic acid, (component e) inorganic acid and/or its salt of ≥0.1 wt.% and
摘要翻译：要解决的问题：提供一种用于在半导体衬底上充分去除等离子体蚀刻残留物的清洁组合物，而不损坏布线结构和层间绝缘结构，并提供使用该清洁组合物制造半导体器件的方法。解决方案：用于除去形成在半导体衬底上的等离子体蚀刻残渣的清洁组合物含有（组分a）水，（组分b）羟胺和/或其盐，（组分c）碱性化合物，（组分d）有机酸，（组分e）无机酸和/或其盐≥0.1重量％和<0.5重量％。清洁组合物的pH为6-8。制造半导体器件的方法包括用清洁组合物清洗在半导体衬底上形成的等离子体蚀刻残留物的工艺。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2008101121A Latex composition and method for producing latex composition 审中-公开
标题翻译： LATEX组合物和生产LATEX组合物的方法
公开(公告)号：JP2008101121A
公开(公告)日：2008-05-01
申请号：JP2006284991
申请日：2006-10-19
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUSHIMI HIDEO , YOSHIOKA YASUHIRO , TSUKADA YOSHIHISA , YOSHIZAWA MASATAKA
IPC分类号： C08L101/00 , C08F2/24 , C08F20/00
摘要： PROBLEM TO BE SOLVED: To provide a latex composition little in formalin generation and excellent in coating property, liquid stability and liquid storage stability, and to provide a method for producing the latex composition. SOLUTION: The latex composition comprises a latex, a surfactant having a (substituted) alkylene oxide in a molecule, and an antioxidant. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供几乎不产生福尔马林的胶乳组合物，涂布性，液体稳定性和液体储存稳定性优异，并且提供了制备胶乳组合物的方法。解决方案：胶乳组合物包含胶乳，分子中具有（取代的）环氧烷的表面活性剂和抗氧化剂。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2008032934A Method for manufacturing heat developable photosensitive material and heat developable photosensitive material manufactured by the same 审中-公开
标题翻译：用于制造热可变光敏材料的方法和由其制造的热可变光敏材料
公开(公告)号：JP2008032934A
公开(公告)日：2008-02-14
申请号：JP2006205285
申请日：2006-07-27
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUSHIMI HIDEO
IPC分类号： G03C1/498
摘要： PROBLEM TO BE SOLVED: To provide an improved method for manufacturing an aqueous coating type heat developable photosensitive material by which a heat developable photosensitive material having stable photographic performance is obtained even when an aqueous dispersion of a photographically useful material or polymer fine particles used for coating is used after the lapse of time after preparation. SOLUTION: In the method for manufacturing the heat developable photosensitive material containing on a support at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for silver ions and a polymer latex, a dispersion containing a surfactant having an alkylene oxide group in a repeating unit and an antioxidant is used for the reducing agent, the polymer latex or at least one of other photographically useful compounds. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种改进的制造水性涂料型热显影感光材料的方法，通过该方法，获得具有稳定的照相性能的可热显影的感光材料，即使当照相用材料或聚合物细颗粒的水分散体用于涂料后经过一段时间后即可使用。解决方案：在至少含有感光卤化银，非感光性有机银盐，银离子还原剂和聚合物胶乳的载体上制备含热可显影感光材料的方法中，含有表面活性剂在还原剂，聚合物胶乳或其它照相用化合物中使用具有重复单元中的氧化烯基团和抗氧化剂的化合物。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2011094100A Cleaning composition, cleaning process, and process for producing semiconductor device 有权
标题翻译：清洁组合物，清洁工艺和生产半导体器件的方法
公开(公告)号：JP2011094100A
公开(公告)日：2011-05-12
申请号：JP2010116623
申请日：2010-05-20
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： TAKAHASHI TOMOI , TAKAHASHI KAZUYOSHI , MIZUTANI ATSUSHI , SEKI HIROYUKI , FUSHIMI HIDEO , KATO TOMOO
IPC分类号： C11D7/10 , C11D1/10 , C11D3/04 , C11D3/20 , C11D3/30 , C11D7/26 , C11D7/32 , H01L21/027 , H01L21/304 , H01L21/3065
CPC分类号： G03F7/425 , C09K13/00 , C09K13/06 , C11D7/08 , C11D7/265 , C11D7/3209 , C11D7/3245 , C11D7/34 , C11D7/5013 , C11D11/0047 , G03F7/422 , G03F7/423 , H01L21/02052 , H01L21/02057 , H01L21/02063 , H01L21/02068 , H01L21/02071 , H01L21/31133 , H01L21/32134 , H01L21/32136 , H01L21/32138 , H01L21/32139
摘要： PROBLEM TO BE SOLVED: To provide a cleaning composition capable of sufficiently removing a plasma etching residue and/or an ashing residue on a semiconductor substrate without damaging a wiring structure and an interlaminar insulation structure; and to provide a cleaning process and a process for producing a semiconductor device using the cleaning composition. SOLUTION: The cleaning composition for removing a plasma etching residue and/or an ashing residue formed on a semiconductor substrate includes: (component a) water; (component b) a hydroxylamine and/or salt thereof; (component c) a basic organic compound; and (component d) an organic acid. The cleaning composition has a pH of 7 to 9. There are also provided a cleaning process and a process for producing a semiconductor device emplo the cleaning composition. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供能够在不损害布线结构和层间绝缘结构的情况下在半导体基板上充分除去等离子体蚀刻残渣和/或灰化残留物的清洗组合物; 并提供清洁处理和使用该清洁组合物制造半导体器件的方法。解决方案：用于除去形成在半导体衬底上的等离子体蚀刻残渣和/或灰化残渣的清洁组合物包括：（组分a）水; （组分b）羟胺和/或其盐; （组分c）碱性有机化合物; 和（组分d）有机酸。清洁组合物的pH为7〜9。还提供了清洗方法和制造清洗组合物的半导体装置的方法。版权所有（C）2011，JPO＆INPIT

7. 发明专利

JP2008203530A Heat developing photosensitive material 审中-公开
标题翻译：热开发光敏材料
公开(公告)号：JP2008203530A
公开(公告)日：2008-09-04
申请号：JP2007039525
申请日：2007-02-20
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUSHIMI HIDEO
IPC分类号： G03C1/498
摘要： PROBLEM TO BE SOLVED: To provide an organic solvent applying type heat developing photosensitive material excellent in shelf life and image storage stability. SOLUTION: This heat developing photosensitive material has, at least on one surface of the support, an image forming layer containing at least photosensitive silver halide, non-photosensitive organic silver salt, a reducing agent for heat developing, and a binder. The reducing agent is a compound expressed in general formula (R1). The 50 mass% or larger part of the binder is a modified polyvinyl acetal resin containing 1-20 mol% of α olefin units in its main chain. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供保存期和图像保存稳定性优异的有机溶剂涂敷型显影用感光材料。解决方案：该显影感光材料至少在支撑体的一个表面上至少含有感光卤化银，非光敏有机银盐，用于显影的还原剂和粘合剂的图像形成层。还原剂是通式（R1）表示的化合物。粘合剂的50质量％以上是其主链中含有1-20摩尔％的α-烯烃单元的改性聚乙烯醇缩醛树脂。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2008090262A Heat developable photosensitive material and image forming method 审中-公开
标题翻译：热开发的感光材料和图像形成方法
公开(公告)号：JP2008090262A
公开(公告)日：2008-04-17
申请号：JP2007075625
申请日：2007-03-22
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUSHIMI HIDEO
IPC分类号： G03C1/498 , G03C1/74 , G03C5/08
CPC分类号： G03C1/49863 , G03C1/04 , G03C1/385 , G03C1/49818 , G03C1/49827 , G03C1/49881 , G03C2001/03594 , G03C2200/52 , G03C2200/60
摘要： PROBLEM TO BE SOLVED: To provide a high-quality heat developable photosensitive material where coated surface state is improved, and to provide an image forming method. SOLUTION: The heat developable photosensitive material has an image forming layer including a reducing agent for silver ions and a binder and at least one non-photosensitive layer, wherein: (1) a mean grain size of a photosensitive silver halide in the image forming layer is 10-40 nm and a number of coated grains thereof is 550-10,000 grains/μm 2 ; and (2) the heat developable photosensitive material includes a fluorine compound represented by general formula (FC-1), general formula (FC-2) or general formula (FC-3). COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种改善涂层表面状态的高质量的可显影感光材料，并提供图像形成方法。热可显影感光材料具有包含银离子还原剂和粘合剂和至少一种非感光层的图像形成层，其中：（1）感光卤化银的平均粒径在图像形成层为10〜40nm，多个涂布粒子为550〜10000粒度/μm2。和（2）可热显影感光材料包括由通式（FC-1），通式（FC-2）或通式（FC-3）表示的氟化合物。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2008077048A Photothermographic material 审中-公开
标题翻译：光电材料
公开(公告)号：JP2008077048A
公开(公告)日：2008-04-03
申请号：JP2007075626
申请日：2007-03-22
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUSHIMI HIDEO
IPC分类号： G03C1/498 , G03C1/74
CPC分类号： G03C1/49863 , G03C1/04 , G03C1/385 , G03C1/49809 , G03C1/49818 , G03C1/49827 , G03C2001/03594 , G03C2200/27
摘要： PROBLEM TO BE SOLVED: To provide a high-quality photothermographic material having improved coated surface condition. SOLUTION: The photothermographic material has, on a support, an image forming layer including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder, and at least one non-photosensitive layer, wherein a mean particle size of the non-photosensitive organic silver salt is ≤0.4 μm in terms of equivalent spherical diameter, the photothermographic material includes a fluorine compound represented by the general formula (FC-1), (FC-2) or (FC-3), and a thickness of the image forming layer is 10-14 μm. In the formulae, Rf and Rf' represent an alkyl group or alkenyl group having 3-17 fluorine atoms; L and Y represent a bond or a divalent linking group; Z represents an anionic group, a cationic group, a betaine group or a nonionic polar group; and Z' represents a divalent nonionic polar group. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供具有改进的涂布表面状态的高质量光热敏成像材料。解决方案：光热敏成像材料在载体上具有至少包含感光卤化银，非光敏有机银盐，还原剂和粘合剂的成像层和至少一个非感光层，其中所述非感光性有机银盐的平均粒径以当量的球形直径为0.4μm以下，所述光热敏成像材料包含由通式（FC-1），（FC-2）或（FC -3），图像形成层的厚度为10〜14μm。在该式中，Rf和Rf'表示具有3-17个氟原子的烷基或烯基; L和Y表示键或二价连接基团; Z表示阴离子基，阳离子基，甜菜碱基或非离子极性基; Z'表示二价非离子极性基团。版权所有（C）2008，JPO＆INPIT

10. 发明专利

JP2013215562A Method for producing tissue repair material 有权
标题翻译：生产组织修复材料的方法
公开(公告)号：JP2013215562A
公开(公告)日：2013-10-24
申请号：JP2013049341
申请日：2013-03-12
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUSHIMI HIDEO , ONO YOSHITAKA , NAKAHARA IZUMI , HIRATSUKA TAKAHIRO , OYA SHOJI , SAKAI SHUICHI , OKAMURA AI , YAMAGUCHI TAKEHIRO , NISHIMURA ICHIRO
IPC分类号： A61L27/00 , C07K14/78
CPC分类号： A61L27/222 , A61L27/52 , A61L27/54 , A61L2430/02 , A61L2430/34 , A61L2430/40
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a tissue repair material, capable of obtaining the tissue repair material having an excellent tissue regenerative capacity.SOLUTION: A method for producing a tissue repair material includes: (a) using a gelatin solution containing gelatin dissolved in an aqueous medium to obtain a gelatin-containing intermediate that contains the gelatin and has a mesh structure; (b) drying the gelatin-containing intermediate; and (c) crosslinking the gelatin before or after drying the gelatin-containing intermediate.
摘要翻译：要解决的问题：提供一种能够获得具有优异的组织再生能力的组织修复材料的组织修复材料的制造方法。解决方案：一种组织修复材料的制造方法包括：（a）使用含有明胶溶解在水性介质中以获得含明胶的含明胶的中间体，并具有网状结构; （b）干燥含明胶的中间体; 和（c）在干燥含明胶的中间体之前或之后使明胶交联。

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