专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2013216978A Vapor deposition mask, method for manufacturing vapor deposition mask device, and method for manufacturing organic semiconductor element 有权
标题翻译：蒸气沉积掩模，制造蒸气沉积掩模装置的方法和制造有机半导体元件的方法
公开(公告)号：JP2013216978A
公开(公告)日：2013-10-24
申请号：JP2013117238
申请日：2013-06-03
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： HIROBE YOSHINORI , MATSUMOTO YUTAKA , USHIKUSA MASATO , TAKEDA TOSHIHIKO , NISHIMURA SUKEYUKI , OBATA KATSUYA , TAKEKOSHI TAKASHI
IPC分类号： C23C14/04 , H01L51/50 , H05B33/10
CPC分类号： B05B15/0437 , B05C21/005 , B32B37/182 , B32B38/0008 , B32B2310/0843 , B32B2311/00 , B32B2398/00 , C23C14/042 , H01L51/0011 , H01L51/5012 , H01L51/56
摘要： PROBLEM TO BE SOLVED: To provide: a vapor deposition mask capable of satisfying both high definition and reduced weight even when the size is increased; a method for manufacturing a vapor deposition mask device, by which the vapor deposition mask can be accurately positioned on a frame; and a method for manufacturing an organic semiconductor element, by which a high-definition organic semiconductor element can be manufactured.SOLUTION: A metal mask on which slits are disposed and a resin mask which is positioned on the surface of the metal mask and on which openings corresponding to a pattern formed by means of vapor deposition are horizontally and vertically arranged in a plurality of rows are laminated.
摘要翻译：要解决的问题：提供：即使尺寸增加，也能够同时满足高清晰度和减轻重量的气相沉积掩模; 蒸镀掩模装置的制造方法，能够将气相沉积掩模精确地定位在框架上; 以及制造有机半导体元件的方法，通过该方法制造高分辨率有机半导体元件。解决方案：设置狭缝的金属掩模和位于金属掩模表面上的树脂掩模，对应于通过气相沉积形成的图案的开口被水平和垂直排列成多行。

2. 发明专利

JP2013152645A Method for manufacturing touch panel 有权
标题翻译：制造触控面板的方法
公开(公告)号：JP2013152645A
公开(公告)日：2013-08-08
申请号：JP2012013471
申请日：2012-01-25
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： USHIKUSA MASATO , TAKAHASHI MASAYASU , ISHIGAMI TATSUHIKO , TAZAWA HIDETANE , OKUBO TOMOAKI
IPC分类号： G06F3/041 , G06F3/044
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a touch panel that can prevent cracks or wrinkles from occurring on a touch panel when the touch panel in which a COP-based base material is used as a transparent base material is manufactured in R to R process.SOLUTION: A method for manufacturing a touch panel includes a transparent conductive film formation step for forming a first transparent conductive film and a second transparent conductive film, and an etching step for forming a photoresist film on the respective transparent conductive films, and furthermore forming a first transparent electrode and a second transparent electrode by performing exposure and development processing, the method satisfying a relation 1: N≤-0.2 t+24, a relation 2: N≤6.0(N/mm) and a relation 3: N≥5.0(N/mm), where t represents the temperature of the transparent base material and N represents the tensile force.
摘要翻译：要解决的问题：提供一种用于制造触摸面板的方法，该触摸面板可以防止在将基于COP的基材用作透明基材的触摸面板在R至R中制造时在触摸面板上发生裂纹或皱纹 R工艺。方法：一种用于制造触摸面板的方法，包括用于形成第一透明导电膜和第二透明导电膜的透明导电膜形成步骤，以及在各个透明导电膜上形成光致抗蚀剂膜的蚀刻步骤，以及此外，通过进行曝光和显影处理形成第一透明电极和第二透明电极，满足关系式1：N≤-0.2t + 24，关系2：N≤6.0（N / mm）和关系3： N≥5.0（N / mm），其中t表示透明基材的温度，N表示拉伸力。

3. 发明专利

JP2013008097A Touch panel sensor 有权
标题翻译：触摸面板传感器
公开(公告)号：JP2013008097A
公开(公告)日：2013-01-10
申请号：JP2011138716
申请日：2011-06-22
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： YANO HIROSHI , SAKO KENJI , ISHIGAMI TATSUHIKO , USHIKUSA MASATO , MATSUMOTO YUTAKA , IKEGAMI KEN
IPC分类号： G06F3/041
摘要： PROBLEM TO BE SOLVED: To provide a touch panel sensor for reducing the area of a region to be occupied by a terminal string.SOLUTION: A touch panel sensor 10 includes: a substrate 11; a plurality of transparent conductive patterns 13 and 14 arranged on the substrate 11; a terminal string 17 including a plurality of terminal parts arranged on the substrate 11; and a plurality of extraction conductive patterns 15 arranged on the substrate 11. The respective terminal parts of the terminal string 17 are arranged in an x direction, and extended to a y direction orthogonal to the x direction. Also, the plurality of terminal parts of the terminal string 17 have first terminal parts 20 and second terminal parts 30 alternately arranged along the x direction. Those terminals 20 and 30 include expansion parts 22 and 32 having width which is larger than the width of the extraction conductive pattern 15. Then, the expansion parts 22 and 32 are arranged so as not to be overlapped with each other when viewed from the x direction and y direction.
摘要翻译：要解决的问题：提供一种用于减小要由端子串占据的区域的面积的触摸面板传感器。触摸板传感器10包括：基板11; 布置在基板11上的多个透明导电图案13和14; 包括布置在基板11上的多个端子部的端子串17; 以及布置在基板11上的多个提取导电图案15.端子串17的各个端子部分沿x方向布置并且延伸到与x方向正交的y方向。此外，端子串17的多个端子部分具有沿x方向交替布置的第一端子部20和第二端子部30。那些端子20和30包括宽度大于提取导电图案15的宽度的扩展部分22和32.然后，扩展部分22和32被布置成当从x观察时彼此不重叠方向和y方向。版权所有（C）2013，JPO＆INPIT

4. 发明专利

JP2012042983A Gradation mask 有权
标题翻译：分级面膜
公开(公告)号：JP2012042983A
公开(公告)日：2012-03-01
申请号：JP2011264404
申请日：2011-12-02
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SUZUKI AYA , TAKAHASHI MASAYASU , USHIKUSA MASATO
IPC分类号： G03F1/58 , G03F1/54
摘要： PROBLEM TO BE SOLVED: To provide a gradation mask which is manufactured efficiently by a wet etching method without roughness in a shape of an edge of a light-shielding film.SOLUTION: A gradation mask comprises: a transparent substrate; a light-shielding film formed pattern-like on the transparent substrate; and a semitransparent film formed pattern-like on the light-shielding film and the transparent substrate. Further, the gradation mask comprises: a transparent region in which the transparent substrate is exposed; a light-shielding region in which the light-shielding film is formed on the transparent substrate; and a semitransparent region in which only the semitransparent film is formed on the transparent substrate. The above problem is solved by providing the gradation mask where crystal structures of the light-shielding film and the semitransparent film are both columnar or granular.
摘要翻译：要解决的问题：提供一种通过湿法蚀刻方法有效制造而不具有遮光膜边缘形状的粗糙度的灰度掩模。＆lt; P＆gt;解决方案：渐变掩模包括：透明基板; 在透明基板上形成图案状的遮光膜; 以及在遮光膜和透明基板上形成图案状的半透明膜。此外，灰度掩模包括：透明基板被曝光的透明区域; 在透明基板上形成有遮光膜的遮光区域; 以及在透明基板上仅形成半透明膜的半透明区域。通过提供遮光膜和半透明膜的晶体结构都是柱状或粒状的等级掩模来解决上述问题。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP2008242293A Grayscale mask 有权
标题翻译：灰色面膜
公开(公告)号：JP2008242293A
公开(公告)日：2008-10-09
申请号：JP2007085579
申请日：2007-03-28
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SUZUKI AYA , TAKAHASHI MASAYASU , USHIKUSA MASATO
IPC分类号： C23C14/06 , G03F1/54
摘要： PROBLEM TO BE SOLVED: To provide a grayscale mask which is manufactured efficiently by a wet etching method and without roughness in the shape of the edge of a light-shielding film. SOLUTION: The present invention relates to the grayscale mask having a transparent substrate, the light-shielding film, formed pattern-like on the transparent substrate and a semitransparent film formed pattern-like on the light-shielding film and the transparent substrate, wherein the transparent substrate has an exposed transparent area, a light-shielding region formed by providing the light-shielding film on the transparent substrate and a semitransparent region, formed by providing only the semitransparent film on the transparent substrate. The crystal structure of the light-shielding film and the is attained by providing the grayscale mask where both the crystal structure of the light-shielding film and the semitransparent film are columnar or both are granular. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过湿式蚀刻方法高效制造并且不具有遮光膜边缘形状的粗糙度的灰度掩模。解决方案：本发明涉及具有透明基板，在透明基板上形成图案的遮光膜和在遮光膜和透明基板上形成图案的半透明膜的灰度掩模其中，所述透明基板具有露出的透明区域，通过在所述透明基板上设置所述遮光膜而形成的遮光区域和通过在所述透明基板上仅设置所述半透明膜而形成的半透明区域。遮光膜的晶体结构是通过提供遮光膜和半透明膜的晶体结构都是柱状的或者两者都是粒状的灰度掩模来实现的。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2007292822A Defect correction method for photomask having gradation 审中-公开
标题翻译：具有成像光斑的缺陷修正方法
公开(公告)号：JP2007292822A
公开(公告)日：2007-11-08
申请号：JP2006117323
申请日：2006-04-21
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： TARUMOTO NORIHIRO , SHINKAI MASAHIKO , KINOSHITA KAZUKI , TAKAHASHI MASAYASU , USHIKUSA MASATO
IPC分类号： G03F1/72
摘要： PROBLEM TO BE SOLVED: To provide a defect correction method for a photomask having gradation by which a minute defect can be corrected without using an expensive photomask defect correction device and the amount of a resist residual film on a transfer substrate can be controlled in a defect correction method for a semitransparent film of a photomask having gradation. SOLUTION: The defect correction method for a semitransparent region of a photomask having gradation, the photomask having a mixture of a light shielding region where at least a light shielding film is present, a semitransparent region where a semitransparent film is present, and a transparent region where neither a light-shielding film nor a semitransparent region is present on a transparent substrate, is characterized in that a defect in the semitransparent region is a white defect. The method includes the steps of: forming a positive photoresist layer on the semitransparent region including at least the white defect; locally exposing the photoresist layer in the white defect region through the transparent substrate in the backside; developing the layer to form a resist pattern exposing the white defect; and forming a semitransparent film for correction in the white defect and then peeling the resist pattern. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供具有灰度的光掩模的缺陷校正方法，通过该缺陷校正方法可以在不使用昂贵的光掩模缺陷校正装置的情况下校正微小缺陷，并且可以控制转印衬底上的抗蚀剂残留膜的量在具有灰度的光掩模的半透明膜的缺陷校正方法中。解决方案：具有灰度的光掩模的半透明区域的缺陷校正方法，光掩模具有存在至少遮光膜的遮光区域，存在半透明膜的半透明区域和在透明基板上既不存在遮光膜也不存在半透明区域的透明区域，其特征在于，半透明区域的缺陷为白色缺陷。该方法包括以下步骤：在至少包括白色缺陷的半透明区域上形成正性光致抗蚀剂层; 通过背面的透明基板将白色缺陷区域中的光致抗蚀剂层局部曝光; 显影层形成暴露白色缺陷的抗蚀剂图案; 并在白色缺陷中形成用于校正的半透明膜，然后剥离抗蚀剂图案。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2007264516A Gradation mask and its manufacturing method 有权
标题翻译：分级面膜及其制造方法
公开(公告)号：JP2007264516A
公开(公告)日：2007-10-11
申请号：JP2006092722
申请日：2006-03-30
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SUZUKI AYA , TAKAHASHI MASAYASU , USHIKUSA MASATO , MORI HIROSHI
IPC分类号： G03F1/54 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a method capable of highly precisely manufacturing a gradation mask, and to provide a high-precision gradation mask obtained by the method. SOLUTION: The gradation mask is formed by laminating a light shield film and a translucent film having a transmissivity adjusting function on a transparent substrate in this order, and has a light shield region where the light shield film is provided on the transparent substrate, a translucent region where only the translucent film is provided on the transparent substrate, and a transmission region where neither the light shield film nor the translucent film is provided on the transparent substrate and further has at least a boundary part where the light shield region and translucent region are in contact each at least on one side. The gradation mask is characterized in that at least one side of a pattern of the translucent film is arranged on a pattern of the light shield film, and the light shield film and translucent film contain mutually different kinds of metal. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够高精度地制造灰度掩模的方法，并提供通过该方法获得的高精度等级掩模。解决方案：通过在透明基板上依次层叠遮光膜和透光性调节功能的半透膜而形成灰度掩模，并且在透明基板上设置有遮光膜在透明基板上仅设置透光性膜的半透明区域和在透明基板上既不设置遮光膜也不设置透光性膜的透光区域，并且至少具有遮光区域和半透明区域至少在一侧接触。该等级掩模的特征在于，透光性膜的图案的至少一面配置在遮光膜的图案上，遮光膜和透光性膜含有相互不同种类的金属。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2013152644A Method for manufacturing touch panel 有权
标题翻译：制造触控面板的方法
公开(公告)号：JP2013152644A
公开(公告)日：2013-08-08
申请号：JP2012013470
申请日：2012-01-25
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： USHIKUSA MASATO , TAKAHASHI MASAYASU , ISHIGAMI TATSUHIKO , TAZAWA HIDETANE , OKUBO TOMOAKI
IPC分类号： G06F3/041 , G06F3/044
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a touch panel that can prevent cracks or wrinkles from occurring on a touch panel when the touch panel in which a COP-based base material is used as a transparent base material is manufactured in R to R process.SOLUTION: The temperature of the transparent base material and tensile force applied to the transparent base material in all processes of the method for manufacturing a touch panel satisfy a relation 1: N≤-0.2 t+24 and a relation 2: N≤6.0(N/mm), where t represents the temperature of the transparent base material and N represents the tensile force.
摘要翻译：要解决的问题：提供一种用于制造触摸面板的方法，该触摸面板可以防止在将基于COP的基材用作透明基材的触摸面板在R至R中制造时在触摸面板上发生裂纹或皱纹 R工艺。解决方案：触摸屏制造方法的所有方法中透明基材的温度和施加到透明基材的张力满足关系式1：N≤-0.2t + 24和关系2：N ≤6.0（N / mm），其中t表示透明基材的温度，N表示拉伸力。

9. 发明专利

JP2010122349A Gradation mask 有权
标题翻译：分级面膜
公开(公告)号：JP2010122349A
公开(公告)日：2010-06-03
申请号：JP2008294263
申请日：2008-11-18
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KINOSHITA KAZUKI , USHIKUSA MASATO , TAKAHASHI MASAYASU
IPC分类号： G03F1/00 , G03F1/38 , G03F1/44 , G03F1/54 , G03F1/80
摘要： PROBLEM TO BE SOLVED: To provide a gradation mask having a superposition accuracy measurement mark for measuring superposition displacement with high accuracy in the gradation mask where a semitransparent film, an etching stopper film, and a light shielding film are layered consecutively on a transparent substrate. SOLUTION: The gradation mask, where the semitransparent film, the etching stopper film, and a light shielding film are consecutively layered on the transparent substrate, includes the superposition accuracy measurement mark having an outer shell pattern allowing appearance of the semitransparent film, an inner shell pattern formed inside the outer shell pattern and allowing appearance of the transparent substrate, and a central pattern formed inside the inner shell pattern and allowing appearance of the etching stopper film. The inner shell pattern has two sets of a pair of outside edges parallel to each other on the outside, and has two sets of a pair of inside edges parallel to each other on the inside. The two sets of outside edges are perpendicular to each other, while the two sets of the inside edges are perpendicular to each other. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种具有叠加精度测量标记的渐变掩模，该叠加精度测量标记用于在半透明膜，蚀刻阻挡膜和遮光膜连续地层叠在层间掩模中的高精度测量叠加位移透明基板。解决方案：透明基板上连续层叠半透明膜，蚀刻阻挡膜和遮光膜的层叠掩模包括具有允许出现半透明膜的外壳图案的叠加精度测量标记，形成在外壳图案内部并且允许透明基板的外观的内壳图案，以及形成在内壳图案内部并允许蚀刻停止膜出现的中心图案。内壳图案具有两组在外侧彼此平行的一对外边缘，并且在内侧具有两组彼此平行的内边缘。两组外边缘彼此垂直，而两组内边缘彼此垂直。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2009122295A Photomask 有权
标题翻译：照片
公开(公告)号：JP2009122295A
公开(公告)日：2009-06-04
申请号：JP2007295012
申请日：2007-11-14
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： USHIKUSA MASATO , TAKAHASHI MASAYASU , KINOSHITA KAZUKI
IPC分类号： G03F1/40 , G03F1/68
摘要： PROBLEM TO BE SOLVED: To provide a photomask having a pattern part formed on one surface of a transparent substrate by a plurality of patterns, comprising a light-shielding film having a light-shielding property to exposure light in transfer, and preventing discharge damage (or electrostatic discharge damage) from occurring at two adjacent patterns which are close to each other. SOLUTION: A connecting line part which electrically connects the two adjacent patterns is disposed to prevent the discharge damage of both patterns due to discharge. The connecting line part has a first halftone film semi-transparent with respect to the exposure light in transfer, and has a line width which is not substantially resolved in transfer. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决的问题：提供一种光掩模，其具有通过多个图案形成在透明基板的一个表面上的图案部分的光掩模，其包括具有对转印中的曝光光的遮光性的遮光膜，并且防止在彼此靠近的两个相邻图案处发生放电损坏（或静电放电损坏）。
解决方案：设置电连接两个相邻图案的连接线部分，以防止由于放电而导致的两种图案的放电损坏。连接线部分具有相对于转印中的曝光光线为半透明的第一半色调膜，并且具有基本上不转印的线宽。版权所有（C）2009，JPO＆INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式