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1. 发明专利

JP2011199285A Illumination system, and lithographic apparatus 有权
标题翻译：照明系统和光刻设备
公开(公告)号：JP2011199285A
公开(公告)日：2011-10-06
申请号：JP2011056066
申请日：2011-03-15
申请人： Asml Netherlands Bv , Carl Zeiss Smt Gmbh , エーエスエムエルネザーランズビー.ブイ. , カール・ツァイス・エスエムティー・ゲーエムベーハー
发明人： MULDER HEINE MELLE , HANSEN STEVEN GEORGE , HUBERTUS MULKENS JOHANNES C , DEGUENTHER MARKUS
IPC分类号： H01L21/027 , G02B19/00 , G03F7/20
CPC分类号： G03F7/70566 , G03F7/70091 , G03F7/70116
摘要： PROBLEM TO BE SOLVED: To provide an illumination system that is configured so that the system can generate a polarized illumination mode more flexibly, and to provide a lithographic apparatus.SOLUTION: The illumination system includes: a polarization member including first and second polarization modifiers, with both of which actuators configured to be movable into at least partial intersection with a radiation beam are connected so that the respective polarization modifiers apply a modified polarization to at least part of the beam; an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member; and a controller that can control the actuators so that the first and second polarization modifiers intersect with different portions of the radiation beam.
摘要翻译：要解决的问题：提供一种被配置为使得系统可以更灵活地产生偏振照明模式并提供光刻设备的照明系统。解决方案：照明系统包括：包括第一和第二偏振调节器的偏振构件，其中两个致动器被配置为可移动到与辐射束的至少部分交叉中，使得各个偏振调节器将修改的极化应用于至少部分光束; 定位成在辐射束已经通过偏振构件之后接收辐射束的单独可控反射元件的阵列; 以及控制器，其可以控制致动器，使得第一和第二偏振调节器与辐射束的不同部分相交。

2. 发明专利

JP2008283177A Lithographic apparatus and method for manufacturing device 有权
标题翻译：平面设备和制造设备的方法
公开(公告)号：JP2008283177A
公开(公告)日：2008-11-20
申请号：JP2008104803
申请日：2008-04-14
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： MICHEL FRANSOIS HUBERT KLAASSE , VAN GREEVENBROEK HENDRIKUS ROB , MULDER HEINE MELLE , GREIJDANUS ERIK MARTIJN
IPC分类号： H01L21/027 , G02B5/30 , G03F7/20
CPC分类号： G03F7/70108 , G03F7/70566
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus including a polarization changing element carrying out variable adjusting of a polarization direction of a radiation beam continuously. SOLUTION: The lithographic apparatus includes a polarization changing element including at least two wedge-shaped optically active members which rotate a polarization direction of at least one segment of the radiation beam with a predetermined angle with respect to a first direction of an optical propagation length adaptor associated with the wedge-shaped optically active members, and which adjust the predetermined angle. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种包括连续地进行辐射束的偏振方向的可变调节的偏振改变元件的光刻设备。光刻设备包括偏振改变元件，该偏振改变元件包括至少两个楔形光学有源元件，该至少两个楔形光学有源元件相对于光学器件的第一方向以预定的角度旋转辐射束的至少一个部分的偏振方向与楔形光学有源构件相关联的传播长度适配器，并且调节预定角度。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2008091907A Measurement apparatus and method 有权
标题翻译：测量装置和方法
公开(公告)号：JP2008091907A
公开(公告)日：2008-04-17
申请号：JP2007249522
申请日：2007-09-26
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KLARENBEEK EDUARD MARTINUS , MULDER HEINE MELLE , RAVENSBERGEN MARIUS , VERBEEK JOSEPH FERDINAND DIMNA
IPC分类号： H01L21/027 , G01B11/00 , G01B11/26 , G03F7/20
CPC分类号： G02B27/017 , G01J1/04 , G01J1/0414 , G01J1/4228 , G02B2027/0178 , G03F7/70116 , G03F7/7085 , G03F7/70891 , G09G5/377
摘要： PROBLEM TO BE SOLVED: To provide a measurement apparatus which determines the inclination angle of an individually controllable element of individually controllable element array of an illuminator in real time during lithography operation, without interrupting the lithography operation.
SOLUTION: The measurement apparatus has: a radiation source for illuminating the individually controllable element of the individually controllable element array modulating a radiation beam by a measurement radiation beam and redirecting the measurement radiation beam by using a radiation source supplying the measurement radiation beam; and a detector arranged to receive the redirected measurement radiation beam, determining the position at which the redirected measurement radiation beam is incident upon the detector, and being indicative of characteristics of the individually controllable element at the position at which the redirected measurement beam is incident upon the detector.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种测量装置，其在光刻操作期间实时确定照明器的独立可控元件阵列的独立可控元件的倾斜角，而不中断光刻操作。解决方案：测量装置具有：用于照亮单独可控元件阵列的可单独控制的元件的辐射源，其通过测量辐射束调制辐射束，并通过使用提供测量辐射束的辐射源来重定向测量辐射束 ; 以及检测器，被布置成接收重定向的测量辐射束，确定重定向的测量辐射束入射到检测器上的位置，并且指示在重定向的测量光束入射的位置处的单独可控元件的特性检测器。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2008166777A Lithographic device and method of manufacturing device 审中-公开
标题翻译：光刻设备及其制造方法
公开(公告)号：JP2008166777A
公开(公告)日：2008-07-17
申请号：JP2007329420
申请日：2007-12-21
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： HANSEN STEVEN GEORGE , MULDER HEINE MELLE , KAZINCZI ROBERT
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/705 , G03F7/70125
摘要： PROBLEM TO BE SOLVED: To optimize the lighting conditions of a lithographic device to a printing features having higher precision. SOLUTION: A method for constituting lighting sources of the lithographic device is provided. The method includes a step of dividing the lighting sources into pixel groups containing one or a plurality of lighting source points, respectively; a step of selecting a light form, formed by at least one pixel group for exposing a pattern; a step of repeatedly calculating lithographic metric, as a result of condition changing of the pixel group forming the modified light form in the lighting source; and a step of adjusting the light form, based on the repeated calculation. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：将光刻设备的照明条件优化为具有更高精度的打印特征。解决方案：提供一种用于构成光刻设备的光源的方法。该方法包括分别将光源划分为包含一个或多个光源点的像素组的步骤; 选择由用于曝光图案的至少一个像素组形成的光形式的步骤; 作为在光源中形成修改光形状的像素组的条件变化的结果，重复计算光刻度量的步骤; 以及基于重复计算的调整光形式的步骤。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2013098565A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2013098565A
公开(公告)日：2013-05-20
申请号：JP2012238555
申请日：2012-10-30
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： MULDER HEINE MELLE
IPC分类号： H01L21/027 , G02B26/10 , G03F7/20
CPC分类号： G03F7/2008 , G03F7/26 , G03F7/70391 , G03F7/704 , G03F7/70575
摘要： PROBLEM TO BE SOLVED: To provide a lithographic system in which one or more problems introduced by deviation of the wavelength of one or more of radiation beams from a nominal value can be mitigated or minimized, for example.SOLUTION: The lithographic apparatus has a projection system to project a plurality of radiation beams onto a substrate. The plurality of radiation beams includes a first group of one or more radiation beams formed from radiation within a first wavelength range and a second group of one or more radiation beams formed from radiation within a second wavelength range, different from the first wavelength range. The apparatus also has a dispersion element configured such that one or more radiation beams of the first group are incident on the dispersion element at a different angle from the one or more radiation beams of the second group and such that the one or more radiation beams of the first and second group output from the dispersion element are substantially parallel.
摘要翻译：要解决的问题：提供一种光刻系统，其中例如可以减轻或最小化一个或多个由一个或多个辐射束的波长偏离标称值引起的问题。解决方案：光刻设备具有将多个辐射束投影到基板上的投影系统。多个辐射束包括由第一波长范围内的辐射形成的一个或多个辐射束的第一组和由不同于第一波长范围的第二波长范围内的辐射形成的一个或多个辐射束的第二组。该装置还具有一个色散元件，其配置成使得第一组的一个或多个辐射束以与第二组的一个或多个辐射束不同的角度入射在分散元件上，并且使得一个或多个辐射束从分散元件输出的第一和第二组基本上是平行的。版权所有（C）2013，JPO＆INPIT

6. 发明专利

JP2008235941A Optical attenuator device, radiation system, and lithographic apparatus therewith and device manufacturing method 有权
标题翻译：光学衰减器装置，辐射系统及其光刻设备及其装置的制造方法
公开(公告)号：JP2008235941A
公开(公告)日：2008-10-02
申请号：JP2008172173
申请日：2008-07-01
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LUIJKX CORNELIS PETRUS ANDREAS , BANINE VADIM YEVGENYEVICH , BOTMA HAKO , VAN DUIJNHOVEN MARTINUS , MARKUS FRANCISCUS ANTONIUS EUR , KRIKKE JAN JAAP , MULDER HEINE MELLE , MUIJDERMAN JOHANNES HENDRIK EV , VAN DUIJN CORNELIS JACOBUS
IPC分类号： G02B26/02 , H01L21/027 , G03F7/20
CPC分类号： G03F7/70191 , G03F7/70066 , G03F7/70116 , G03F7/70558
摘要： PROBLEM TO BE SOLVED: To provide an optical attenuator having one optical attenuator element or a plurality of optical attenuator elements arranged symmetrically to a center line of a beam and in a central part of the beam. SOLUTION: The optical attenuator device operates to remove a part of a beam of radiation having intensity higher than average intensity by using at least one optical attenuator element. The device has applications in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有一个光衰减器元件或多个光束衰减器元件的光衰减器，所述光衰减器元件或对称地布置在梁的中心线和梁的中心部分中。解决方案：光衰减器件通过使用至少一个光衰减器元件来操作以去除强度高于平均强度的辐射束的一部分。该装置在辐射系统和/或光刻设备，特别是扫描光刻设备中具有应用，其中光学衰减器元件设置在光束的中心部分，例如垂直于扫描方向。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2008135742A Lithographic apparatus, method of manufacturing device, and computer program product 有权
标题翻译：平面设备，制造方法和计算机程序产品
公开(公告)号：JP2008135742A
公开(公告)日：2008-06-12
申请号：JP2007300017
申请日：2007-11-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： STOELDRAIJER JUDOCUS MARIE DOM , LOOPSTRA ERIK R , MULDER HEINE MELLE , SENGERS TIMOTHEUS FRANCISCUS , STOFFELS FREERK ADRIAAN , JORRITSMA LAURENTIUS CATRINUS , JUNGBLUT REINER MARIA
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70891 , G03F7/70108 , G03F7/70216
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus, capable of reducing an uneven heating effects on an element of a projection system, when using, for example, a local illumination mode, or to provide a method improved for reducing the uneven heating effects. SOLUTION: In the lithographic apparatus, a corrective irradiation step is performed by using an illumination mode arranged so as to heat a selected part on which a large amount of heat is not applied during the production exposure of the element of the projection system close to the pupil plane of the lithographic apparatus. The corrective irradiation step is performed to improve uniformity of optical component heating of the projection system and/or reduce the phase gradient. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种光刻设备，其能够减少对投影系统的元件的不均匀的加热效应，当使用例如局部照明模式时，或提供改进以减少不均匀的方法加热效果。解决方案：在光刻设备中，通过使用照射模式来执行校正照射步骤，所述照射模式被布置为在投影系统的元件的生产曝光期间加热不施加大量热量的选定部分靠近光刻设备的光瞳平面。执行校正照射步骤以改善投影系统的光学部件加热的均匀性和/或降低相位梯度。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2007335859A Miller array for lithographies 审中-公开
标题翻译：铣刀阵列
公开(公告)号：JP2007335859A
公开(公告)日：2007-12-27
申请号：JP2007144330
申请日：2007-05-31
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： RAVENSBERGEN MARIUS , MULDER HEINE MELLE
IPC分类号： H01L21/027 , G02B5/08 , G03F7/20
CPC分类号： G03F7/70875 , G03F7/70116 , G03F7/70291 , G03F7/70858
摘要： PROBLEM TO BE SOLVED: To provide a mirror array apparatus that can prevent damages caused by heat generated by radiation.
SOLUTION: This mirror array apparatus includes a carrier 110 configured to support a plurality of individually adjustable reflective elements 120. At least one actuator is associated with each reflective element 120, the actuator being configured to adjust the orientation or position of the associated reflective element 120. The apparatus further includes a liquid 200 in contact with at least a portion of the reflective elements 120.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够防止由辐射产生的热引起的损害的反射镜阵列装置。解决方案：该反射镜阵列装置包括被配置为支撑多个可单独调节的反射元件120的载体110.至少一个致动器与每个反射元件120相关联，致动器被配置成调整相关联的方向或位置反射元件120.该装置还包括与至少一部分反射元件120接触的液体200.版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2013046060A Lithographic apparatus and method 有权
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：JP2013046060A
公开(公告)日：2013-03-04
申请号：JP2012167153
申请日：2012-07-27
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： MULDER HEINE MELLE , HANSEN STEVEN GEORGE , HOLLINK TIS JOHAN HENRY
IPC分类号： H01L21/027 , G02B19/00 , G03F7/20
CPC分类号： G03F7/70091
摘要： PROBLEM TO BE SOLVED: To resolve problems such as increase in cost and complexity of a lithographic process, decrease in throughput, and increase in defects.SOLUTION: A lithographic apparatus includes: an illumination system for providing a radiation beam; a patterning device for adding a pattern in a cross-section of the radiation beam; a substrate holder for holding a substrate; and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. At least while in use, the lithographic apparatus images a pattern on to the substrate using radiation having a bright field intensity distribution in a first direction and a dark field intensity distribution in a second direction substantially perpendicular to the first direction.
摘要翻译：要解决的问题：解决光刻工艺的成本和复杂性增加等问题，吞吐量的降低和缺陷的增加。光刻设备包括：用于提供辐射束的照明系统; 用于在辐射束的横截面中添加图案的图案形成装置; 用于保持衬底的衬底保持器; 以及用于将图案化的辐射束投影到基板的目标部分上的投影系统。至少在使用时，光刻设备使用在第一方向上具有亮场强度分布的辐射和基本上垂直于第一方向的第二方向上的暗场强度分布的图案将图案成像到基板上。版权所有（C）2013，JPO＆INPIT

10. 发明专利

JP2012074695A Process tuning with polarization 有权
标题翻译：过程调整与偏振
公开(公告)号：JP2012074695A
公开(公告)日：2012-04-12
申请号：JP2011202518
申请日：2011-09-16
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： HANSEN STEVEN GEORGE , MULDER HEINE MELLE , CHIOU TSANN-BIM
IPC分类号： H01L21/027
CPC分类号： G03F7/70566 , G03F7/7005 , G03F7/70625
摘要： PROBLEM TO BE SOLVED: To improve the imaging of a mask pattern on a substrate.SOLUTION: This invention is related to a method for configuring an illumination source of a lithographic apparatus. The method includes: a step where the illumination source is divided into pixel groups; a step where each pixel group includes one or more illumination source points in a pupil plane of the illumination source; a step where a polarization state of each pixel group is changed to obtain an incremental effect on each of the plurality of critical dimensions resulting from the change of the polarization state of each pixel group; a step where a first plurality of sensitivity coefficients for each of the plurality of critical dimensions are calculated using the incremental effects; a step where an initial illumination source is selected; a step where a lithographic metric is iteratively calculated as a result of a change of the polarization state of the pixel group of the initial illumination source using the first plurality of sensitivity coefficients; a step where the change of the polarization state of the pixel group of the initial illumination source generates the changed illumination source; and a step where the initial illumination source is adjusted based on the iterative calculation results.
摘要翻译：要解决的问题：为了改善衬底上的掩模图案的成像。解决方案：本发明涉及一种用于配置光刻设备的照明源的方法。该方法包括：将照明源分割为像素组的步骤; 每个像素组包括照明源的光瞳平面中的一个或多个照明源点的步骤; 每个像素组的偏振状态被改变以获得由每个像素组的偏振状态的改变导致的多个临界尺寸中的每一个的增量效应的步骤; 使用所述增量效应计算所述多个关键尺寸中的每一个的第一多个灵敏度系数的步骤; 选择初始照明源的步骤; 作为使用第一多个灵敏度系数的初始照明源的像素组的偏振状态的变化的结果迭代地计算光刻度量的步骤; 其中初始照明源的像素组的偏振状态的变化产生改变的照明源的步骤; 以及基于迭代计算结果调整初始照明源的步骤。版权所有（C）2012，JPO＆INPIT

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