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1. 发明专利

JP2011199285A Illumination system, and lithographic apparatus 有权
标题翻译：照明系统和光刻设备
公开(公告)号：JP2011199285A
公开(公告)日：2011-10-06
申请号：JP2011056066
申请日：2011-03-15
申请人： Asml Netherlands Bv , Carl Zeiss Smt Gmbh , エーエスエムエルネザーランズビー.ブイ. , カール・ツァイス・エスエムティー・ゲーエムベーハー
发明人： MULDER HEINE MELLE , HANSEN STEVEN GEORGE , HUBERTUS MULKENS JOHANNES C , DEGUENTHER MARKUS
IPC分类号： H01L21/027 , G02B19/00 , G03F7/20
CPC分类号： G03F7/70566 , G03F7/70091 , G03F7/70116
摘要： PROBLEM TO BE SOLVED: To provide an illumination system that is configured so that the system can generate a polarized illumination mode more flexibly, and to provide a lithographic apparatus.SOLUTION: The illumination system includes: a polarization member including first and second polarization modifiers, with both of which actuators configured to be movable into at least partial intersection with a radiation beam are connected so that the respective polarization modifiers apply a modified polarization to at least part of the beam; an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member; and a controller that can control the actuators so that the first and second polarization modifiers intersect with different portions of the radiation beam.
摘要翻译：要解决的问题：提供一种被配置为使得系统可以更灵活地产生偏振照明模式并提供光刻设备的照明系统。解决方案：照明系统包括：包括第一和第二偏振调节器的偏振构件，其中两个致动器被配置为可移动到与辐射束的至少部分交叉中，使得各个偏振调节器将修改的极化应用于至少部分光束; 定位成在辐射束已经通过偏振构件之后接收辐射束的单独可控反射元件的阵列; 以及控制器，其可以控制致动器，使得第一和第二偏振调节器与辐射束的不同部分相交。

2. 发明专利

JP2013145880A Illumination source mask optimization to reduce stochastic effects 审中-公开
标题翻译：照明源掩蔽优化，以降低STOCHASTIC效应
公开(公告)号：JP2013145880A
公开(公告)日：2013-07-25
申请号：JP2012274198
申请日：2012-12-17
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： HANSEN STEVEN GEORGE
IPC分类号： H01L21/027
CPC分类号： G06F17/5068 , G03F1/70 , G03F7/70125 , G03F7/70433 , G03F7/70441 , G06F17/50
摘要： PROBLEM TO BE SOLVED: To provide a tool to optimize an illumination source and/or patterning device/design layout for use in a lithographic apparatus or process.SOLUTION: A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprises the step 302 of defining a multi-variable cost function being a function of stochastic effects of the lithographic process. The design variables may comprise any suitable combination selected from characteristics 300A of an illumination source (e.g., pupil fill ratio, namely, percentage of radiation of the illumination source that passes through a pupil or aperture), characteristics 300B of projection optics, and characteristics 300C of the design layout. In the step 304, the design variables are simultaneously adjusted so that the cost function is moved towards convergence. In the step 306, it is determined whether a predefined termination condition is satisfied.
摘要翻译：要解决的问题：提供用于优化用于光刻设备或过程的照明源和/或图案化设备/设计布局的工具。解决方案：用于改进用于对设计的一部分进行成像的光刻处理的计算机实现的方法使用光刻投影装置布置在基板上的步骤包括定义作为光刻工艺的随机效应的函数的多变量成本函数的步骤302。设计变量可以包括从照明源的特征300A（例如，光瞳填充率，即通过瞳孔或孔径的照明源的辐射百分比），投影光学器件的特性300B和特性300C 的设计布局。在步骤304中，同时调整设计变量，使得成本函数向收敛移动。在步骤306中，确定是否满足预定的终止条件。

3. 发明专利

JP2008166777A Lithographic device and method of manufacturing device 审中-公开
标题翻译：光刻设备及其制造方法
公开(公告)号：JP2008166777A
公开(公告)日：2008-07-17
申请号：JP2007329420
申请日：2007-12-21
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： HANSEN STEVEN GEORGE , MULDER HEINE MELLE , KAZINCZI ROBERT
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/705 , G03F7/70125
摘要： PROBLEM TO BE SOLVED: To optimize the lighting conditions of a lithographic device to a printing features having higher precision. SOLUTION: A method for constituting lighting sources of the lithographic device is provided. The method includes a step of dividing the lighting sources into pixel groups containing one or a plurality of lighting source points, respectively; a step of selecting a light form, formed by at least one pixel group for exposing a pattern; a step of repeatedly calculating lithographic metric, as a result of condition changing of the pixel group forming the modified light form in the lighting source; and a step of adjusting the light form, based on the repeated calculation. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：将光刻设备的照明条件优化为具有更高精度的打印特征。解决方案：提供一种用于构成光刻设备的光源的方法。该方法包括分别将光源划分为包含一个或多个光源点的像素组的步骤; 选择由用于曝光图案的至少一个像素组形成的光形式的步骤; 作为在光源中形成修改光形状的像素组的条件变化的结果，重复计算光刻度量的步骤; 以及基于重复计算的调整光形式的步骤。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2013046060A Lithographic apparatus and method 有权
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：JP2013046060A
公开(公告)日：2013-03-04
申请号：JP2012167153
申请日：2012-07-27
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： MULDER HEINE MELLE , HANSEN STEVEN GEORGE , HOLLINK TIS JOHAN HENRY
IPC分类号： H01L21/027 , G02B19/00 , G03F7/20
CPC分类号： G03F7/70091
摘要： PROBLEM TO BE SOLVED: To resolve problems such as increase in cost and complexity of a lithographic process, decrease in throughput, and increase in defects.SOLUTION: A lithographic apparatus includes: an illumination system for providing a radiation beam; a patterning device for adding a pattern in a cross-section of the radiation beam; a substrate holder for holding a substrate; and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. At least while in use, the lithographic apparatus images a pattern on to the substrate using radiation having a bright field intensity distribution in a first direction and a dark field intensity distribution in a second direction substantially perpendicular to the first direction.
摘要翻译：要解决的问题：解决光刻工艺的成本和复杂性增加等问题，吞吐量的降低和缺陷的增加。光刻设备包括：用于提供辐射束的照明系统; 用于在辐射束的横截面中添加图案的图案形成装置; 用于保持衬底的衬底保持器; 以及用于将图案化的辐射束投影到基板的目标部分上的投影系统。至少在使用时，光刻设备使用在第一方向上具有亮场强度分布的辐射和基本上垂直于第一方向的第二方向上的暗场强度分布的图案将图案成像到基板上。版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2012074695A Process tuning with polarization 有权
标题翻译：过程调整与偏振
公开(公告)号：JP2012074695A
公开(公告)日：2012-04-12
申请号：JP2011202518
申请日：2011-09-16
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： HANSEN STEVEN GEORGE , MULDER HEINE MELLE , CHIOU TSANN-BIM
IPC分类号： H01L21/027
CPC分类号： G03F7/70566 , G03F7/7005 , G03F7/70625
摘要： PROBLEM TO BE SOLVED: To improve the imaging of a mask pattern on a substrate.SOLUTION: This invention is related to a method for configuring an illumination source of a lithographic apparatus. The method includes: a step where the illumination source is divided into pixel groups; a step where each pixel group includes one or more illumination source points in a pupil plane of the illumination source; a step where a polarization state of each pixel group is changed to obtain an incremental effect on each of the plurality of critical dimensions resulting from the change of the polarization state of each pixel group; a step where a first plurality of sensitivity coefficients for each of the plurality of critical dimensions are calculated using the incremental effects; a step where an initial illumination source is selected; a step where a lithographic metric is iteratively calculated as a result of a change of the polarization state of the pixel group of the initial illumination source using the first plurality of sensitivity coefficients; a step where the change of the polarization state of the pixel group of the initial illumination source generates the changed illumination source; and a step where the initial illumination source is adjusted based on the iterative calculation results.
摘要翻译：要解决的问题：为了改善衬底上的掩模图案的成像。解决方案：本发明涉及一种用于配置光刻设备的照明源的方法。该方法包括：将照明源分割为像素组的步骤; 每个像素组包括照明源的光瞳平面中的一个或多个照明源点的步骤; 每个像素组的偏振状态被改变以获得由每个像素组的偏振状态的改变导致的多个临界尺寸中的每一个的增量效应的步骤; 使用所述增量效应计算所述多个关键尺寸中的每一个的第一多个灵敏度系数的步骤; 选择初始照明源的步骤; 作为使用第一多个灵敏度系数的初始照明源的像素组的偏振状态的变化的结果迭代地计算光刻度量的步骤; 其中初始照明源的像素组的偏振状态的变化产生改变的照明源的步骤; 以及基于迭代计算结果调整初始照明源的步骤。版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2007158328A Lithographic apparatus and device manufacturing method 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2007158328A
公开(公告)日：2007-06-21
申请号：JP2006317735
申请日：2006-11-24
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： CHEN ALEK CHI-HENG , HANSEN STEVEN GEORGE
IPC分类号： H01L21/027 , G03F1/08 , G03F7/20
CPC分类号： G03F7/70283 , G03F1/32 , G03F1/34 , G03F7/70308 , G03F7/70433 , G03F7/705
摘要： PROBLEM TO BE SOLVED: To provide an exposure method having sufficient process latitude (that is, a combination of usable depth of focus and allowable variance of exposure dose for a given tolerance in the minimum dimension) for imaging of small contact holes. SOLUTION: A method of transferring an image of a pattern onto a substrate with a lithographic apparatus using an attenuated phase shift mask or a binary mask comprises: a step of selecting multiple parameters including a pupil filter parameter; a step of calculating an image of a pattern for the selected parameters; a step of calculating a metric that represents a variation of an attribute of the calculated image over a process range; and a step of adjusting the multiple parameters on the basis of a result of the metric. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供用于小接触孔成像的具有足够的工艺自由度（即，可用的深度焦点的浓度和允许的曝光剂量的变化对于给定的最小尺寸的公差）的曝光方法。解决方案：使用衰减相移掩模或二进制掩模的光刻设备将图案的图像转印到基板上的方法包括：选择包括瞳孔滤光器参数的多个参数的步骤; 计算所选参数的图案的图像的步骤; 计算表示所计算的图像在处理范围上的属性的变化的度量的步骤; 以及基于度量的结果来调整多个参数的步骤。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2004343079A Device manufacturing method 有权
公开(公告)号：JP2004343079A
公开(公告)日：2004-12-02
申请号：JP2004104522
申请日：2004-03-31
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： HANSEN STEVEN GEORGE , FLAGELLO DONIS GEORGE , KLAAASSEN MICHEL FRANCOIS HUBE , DE WINTER LAURENTIUS CORNELIUS , KNOLS EDWIN WILHELMUS MARIE
IPC分类号： G02B5/18 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70066 , G03F7/70091 , G03F7/701 , G03F7/70566 , G03F7/70891
摘要： PROBLEM TO BE SOLVED: To provide an improved method and device for printing, e.g., a fine isolated gate, and particularly a method and device for achieving a higher processing latitude and/or a more even heating of a lens.
SOLUTION: A rectangular or stick-like on-axis illumination mask is provided which polarizes a radiation in parallel with the length of a stick. The mask improves a depth of focus (DOF) and an exposure latitude as compared with a circular monopole having the same σ value, and heats a relatively small lens.
COPYRIGHT: (C)2005,JPO&NCIPI

8. 发明专利

JP2004320037A Tone reversal printing of lighting device control 有权
标题翻译： TIGHT逆向打印照明设备控制
公开(公告)号：JP2004320037A
公开(公告)日：2004-11-11
申请号：JP2004121075
申请日：2004-04-16
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： HANSEN STEVEN GEORGE , VAN DEN BROEKE DOUGLAS J
IPC分类号： G03F7/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/701 , G03F7/0035 , G03F7/2022 , G03F7/70108 , G03F7/70433 , G03F7/70466
摘要： PROBLEM TO BE SOLVED: To provide a method for reversing the tone of an image to be printed on a layer of a radiation sensitive material formed on a substrate.
SOLUTION: A method includes the steps of defining a lithography matter, designing a patterning device, deciding a first lighting structure and a radiation-sensitive material process which can print the positive tone of the lithographic features, and deciding a second lighting structure which can print the negative tone of the lithographic features by a radiation-sensitive material process.
COPYRIGHT: (C)2005,JPO&NCIPI

9. 发明专利

JP2004247737A Lithography apparatus and illumination source optimization method using optical lithography simulation 有权
公开(公告)号：JP2004247737A
公开(公告)日：2004-09-02
申请号：JP2004035045
申请日：2004-02-12
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： HANSEN STEVEN GEORGE
IPC分类号： G03F1/36 , G03F7/20 , H01L21/027
CPC分类号： G03F7/705 , G03F1/36 , G03F7/701 , G03F7/70108 , G03F7/70125
摘要： PROBLEM TO BE SOLVED: To optimize illumination conditions for a lithography projection apparatus by using a computer simulation. SOLUTION: In a method that optimizes illumination conditions for the lithography projection apparatus by using a computer simulation, the lithography projection apparatus includes an illumination device and a projection optical system. The illumination conditions optimization method includes the steps of forming a lithography pattern to be transferred onto a substrate, selecting a simulation model, selecting a lattice of a light source point in the illumination device's pupil plane, calculating, for each projection source point, an discrete response that is a single or a series of simulation results obtained by each one using the simulation model, and adjusting the illumination arrangement based on the accumulated results of discrete calculations. COPYRIGHT: (C)2004,JPO&NCIPI

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