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1. 发明专利

JP2006135330A Radially polarized light in lithographic apparatus 审中-公开
标题翻译：光学装置中的放射性偏振光
公开(公告)号：JP2006135330A
公开(公告)日：2006-05-25
申请号：JP2005320265
申请日：2005-11-04
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： DE WINTER LAURENTIUS CORNELIUS , HUBERT KLAASSEN MICHEL FRANSOI
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70566
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which a radiation beam which illuminates a patterning means polarizes to the substantially radial direction, and a diaphragm intercepts the diffraction polarized to the radial direction of patterned radiation. SOLUTION: The lithographic apparatus and a method of using the apparatus in the manufacture of a device such as an integrated circuit (IC) are disclosed. In particular, the lithographic apparatus is designed to be used with radiation having a wavelength in the Deep Ultra-Violet (DUV), and radially polarized light is used to enhance the image contrast. In particular, partial clipping of the first order diffraction radiation is disclosed. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种光刻设备，其中照射图案化装置的辐射束偏振到基本上径向，并且光阑拦截对图案化辐射的径向方向偏振的衍射。解决方案：公开了光刻设备和在制造诸如集成电路（IC）的设备中使用该设备的方法。特别地，光刻设备被设计成与深紫外（DUV）中具有波长的辐射一起使用，并且使用径向偏振光来增强图像对比度。具体地，公开了一阶衍射辐射的部分削波。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2004343079A Device manufacturing method 有权
公开(公告)号：JP2004343079A
公开(公告)日：2004-12-02
申请号：JP2004104522
申请日：2004-03-31
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： HANSEN STEVEN GEORGE , FLAGELLO DONIS GEORGE , KLAAASSEN MICHEL FRANCOIS HUBE , DE WINTER LAURENTIUS CORNELIUS , KNOLS EDWIN WILHELMUS MARIE
IPC分类号： G02B5/18 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70066 , G03F7/70091 , G03F7/701 , G03F7/70566 , G03F7/70891
摘要： PROBLEM TO BE SOLVED: To provide an improved method and device for printing, e.g., a fine isolated gate, and particularly a method and device for achieving a higher processing latitude and/or a more even heating of a lens.
SOLUTION: A rectangular or stick-like on-axis illumination mask is provided which polarizes a radiation in parallel with the length of a stick. The mask improves a depth of focus (DOF) and an exposure latitude as compared with a circular monopole having the same σ value, and heats a relatively small lens.
COPYRIGHT: (C)2005,JPO&NCIPI

3. 发明专利

JP2010123948A Method for lithographic apparatus 有权
标题翻译：地图设备的方法
公开(公告)号：JP2010123948A
公开(公告)日：2010-06-03
申请号：JP2009256616
申请日：2009-11-10
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DE WINTER LAURENTIUS CORNELIUS , FINDERS JOZEF MARIA
IPC分类号： H01L21/027 , G03F7/207
CPC分类号： G03F7/70641 , G03F7/70125 , G03F7/70308 , G03F7/70591 , G03F7/70891
摘要： PROBLEM TO BE SOLVED: To provide a method of acquiring information at least indicative of a focal property of a lithographic apparatus. SOLUTION: The method includes steps of: illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern having a first pattern feature that substantially diffracts radiation, and a second pattern feature that does not substantially diffract radiation; introducing an asymmetry relative to an optical axis, in the substantially diffracted radiation element, through illuminating the phase modulation element with radiation emanating from the patterning device pattern; forming a receiving element pattern on the receiving element by illuminating a radiation beam receiving element with radiation emanating from the phase modulation element, the receiving element pattern having first and second features related to the first and second patterns respectively; acquiring positional information regarding relative positions of the first and second features; and determining information at least indicative of the focal property of the lithographic apparatus from the acquired positional information. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供获取至少指示光刻设备的焦点特性的信息的方法。解决方案：该方法包括以下步骤：利用具有对称照明模式的辐射束照射图案形成装置图案，图案形成装置图案具有基本上衍射辐射的第一图案特征和基本上不衍射的第二图案特征辐射; 通过利用从图案形成装置图案发出的辐射照射相位调制元件，在基本衍射的辐射元件中引入相对于光轴的不对称性; 通过用从所述相位调制元件发出的辐射照射辐射束接收元件在所述接收元件上形成接收元件图案，所述接收元件图案分别具有与所述第一和第二图案相关的第一和第二特征; 获取关于所述第一和第二特征的相对位置的位置信息; 以及从获取的位置信息确定至少指示光刻设备的焦点特性的信息。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2013123048A Lithography method and device 有权
标题翻译： LITHOGRAPHY方法和设备
公开(公告)号：JP2013123048A
公开(公告)日：2013-06-20
申请号：JP2012257658
申请日：2012-11-26
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： PETER DAVID ENGBLOM , KOEHLER CARSTEN ANDREAS , STAALS FRANK , DE WINTER LAURENTIUS CORNELIUS
IPC分类号： H01L21/027 , G02B19/00 , G03F7/20
CPC分类号： G03F7/70425 , G03F1/144 , G03F1/36 , G03F7/70433 , G03F7/70441
摘要： PROBLEM TO BE SOLVED: To provide a method and a device that can be used to reduce a range in which an assist feature is exposed to light in a resist on a substrate.SOLUTION: A method for projecting a pattern from a patterning device on a substrate by using a projection system includes applying phase correction to radiation diffracted from an assist feature of a pattern by using a light phase adjustment device in the projection system. The phase correction acts to reduce the size of an assist feature image exposed to light in a resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, as well as to maintain contribution to strengthening of an image of a function feature of a pattern by the assist feature image.
摘要翻译：要解决的问题：提供可用于减少辅助特征暴露于基板上的抗蚀剂中的光的范围的方法和装置。解决方案：通过使用投影系统从图案形成装置将图案投影在基板上的方法包括通过在投影系统中使用光相位调节装置对从图案的辅助特征衍射的辐射进行相位校正。相位校正用于减小在基板上的抗蚀剂中暴露于光的辅助特征图像的尺寸，或者防止辅助特征图像在基板上的抗蚀剂中的印刷，并且保持对图像的加强的贡献辅助特征图像的图案功能特征。版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2010130010A Method for lithographic apparatus 有权
标题翻译：地图设备的方法
公开(公告)号：JP2010130010A
公开(公告)日：2010-06-10
申请号：JP2009263436
申请日：2009-11-19
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DE WINTER LAURENTIUS CORNELIUS , FINDERS JOZEF MARIA
IPC分类号： H01L21/027 , G03F7/207
CPC分类号： G03B27/42 , G03F7/70308
摘要： PROBLEM TO BE SOLVED: To provide a method for increasing a depth of focus of a lithographic apparatus. SOLUTION: The method includes: a step of forming a diffracted beam of radiation by radiating a patterning device pattern with a radiation beam; illuminating a phase modulation element with the diffracted beams of radiation; and a step of transforming a phase-wavefront of a portion of the diffracted beams of radiation into a first phase-wavefront having a first focal plane for the lithographic apparatus, and a second phase-wavefront having a second focal plane for the lithographic apparatus, wherein the transforming step includes: a step of subjecting a phase of a first portion of a first diffracted beam of radiation and a phase of a corresponding first portion of a second diffracted beam of radiation to a phase change which results in an at least partial formation of the first phase-wavefront; and subjecting a phase of a second portion of the first diffracted beam of radiation and a phase of a corresponding second portion of the second diffracted beam of radiation to a phase change which results in an at least partial formation of the second phase-wavefront. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于增加光刻设备的焦深的方法。解决方案：该方法包括：通过用辐射束辐射图案形成装置图案来形成衍射光束的步骤; 用衍射光束照射相位调制元件; 以及将衍射的辐射束的一部分的相位波前变换为具有用于光刻设备的第一焦平面的第一相位波段和具有用于光刻设备的第二焦平面的第二相位波前的步骤，其中所述变换步骤包括：使第一衍射光束的第一部分的相位和第二衍射光束的对应的第一部分的相位相位相变的步骤，所述相位变化导致至少部分形成的第一相波前; 并且使所述第一衍射光束的第二部分的相位和所述第二衍射光束的对应第二部分的相位相位变化，所述相位变化导致所述第二相位波前的至少部分形成。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2010251761A Device manufacturing method, and lithographic apparatus 有权
标题翻译：设备制造方法和平面设备
公开(公告)号：JP2010251761A
公开(公告)日：2010-11-04
申请号：JP2010093709
申请日：2010-04-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DE WINTER LAURENTIUS CORNELIUS , FINDERS JOZEF MARIA
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70308 , G03F7/70258 , G03F7/70266 , G03F7/70283
摘要： PROBLEM TO BE SOLVED: To prevent an image error such as an intensity imbalance between adjacent bright lines in a projected pattern, which may occur due to mask pattern surface topography although a mask is used to print the pattern. SOLUTION: A projection system PS may include an optical phase adjuster 310 so as to help alleviate or eliminate the problem of intensity imbalance. The optical phase adjuster 310 is constructed and arranged to adjust a phase of an electric field of optical radiation beam DB traversing the adjuster 310. A reduction of intensity imbalance is achieved by suitably adjusting the phases of diffraction radiations DB of the 0th order, plus first-order and minus first-order radiated from the mask pattern. By adjusting the phase differently for different portions of the illumination, the method can be applied such that no decrease of depth of focus due to, for example, the 0th order occurs. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了防止由于掩模图案表面形貌而可能发生的投影图案中的相邻亮线之间的强度不平衡的图像误差，尽管使用掩模来打印图案。解决方案：投影系统PS可以包括光学相位调节器310，以帮助减轻或消除强度不平衡的问题。光学相位调整器310被构造和布置成调节穿过调节器310的光辐射束DB的电场的相位。通过适当地调整第0级的衍射辐射DB的相位加上第一级来实现强度不平衡的减小 - 从阴影图案辐射的顺序和负一阶。通过对照明的不同部分不同地调整相位，可以应用该方法，使得不会发生由于例如第0次引起的焦点深度的降低。版权所有（C）2011，JPO＆INPIT

7. 发明专利

JP2010141327A Method for lithographic apparatus 有权
标题翻译：地图设备的方法
公开(公告)号：JP2010141327A
公开(公告)日：2010-06-24
申请号：JP2009278115
申请日：2009-12-08
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： COLINA SANTAMARIA LUIS ALBERTO , FINDERS JOZEF MARIA , DE WINTER LAURENTIUS CORNELIUS
IPC分类号： H01L21/027
CPC分类号： G03F7/70266 , G03B27/54 , G03F7/70308 , G03F7/70525 , G03F7/70833 , G03F7/70891
摘要： PROBLEM TO BE SOLVED: To provide a method of compensating at least partially for shift in characteristics of a pattern feature to be applied to a substrate using a lithographic apparatus.
SOLUTION: In an embodiment, the method includes a step of acquiring information about the shift in the characteristics and a step of determining a desired change in phase to compensate at least partially for the shift in the characteristics to be applied to at least part of a radiation beam used to apply a pattern feature to a substrate. The step of determining a desired change in phase includes a step of determining a desired configuration of a phase modulation element. The method further includes a step of making a desired phase change for the part of the radiation beam when applying the pattern feature to the substrate and illuminating the phase modulation element using the part of the radiation beam when the phase modulation element is configured into a desired configuration by making the desired phase change.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种至少部分地补偿使用光刻设备施加到基板的图案特征的特性偏移的方法。解决方案：在一个实施例中，该方法包括获取关于特性偏移的信息的步骤，以及确定期望的相位变化的步骤，以至少部分地补偿要应用至少的特性的偏移用于将图案特征施加到基底的辐射束的一部分。确定期望的相位变化的步骤包括确定相位调制元件的期望配置的步骤。所述方法还包括当将所述图案特征应用于所述衬底时对所述辐射束的所述一部分进行期望的相位变化的步骤，以及当所述相位调制元件被配置为期望的时，使用所述辐射束的所述部分照射所述相位调制元件通过使期望的相位变化来进行配置。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2011166143A Lithographic apparatus and method 有权
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：JP2011166143A
公开(公告)日：2011-08-25
申请号：JP2011023571
申请日：2011-02-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KOEHLER CARSTEN ANDREAS , LAAN HANS VAN DER , DE WINTER LAURENTIUS CORNELIUS , GODFRIED HERMAN PHILIP , STAALS FRANK
IPC分类号： H01L21/027
CPC分类号： G03F7/70333 , G03F7/70575
摘要： PROBLEM TO BE SOLVED: To control a laser radiation spectrum emitted by a laser radiation source, thereby allowing a lithographic apparatus to more accurately project patterns on a substrate.
SOLUTION: A lithographic method includes: a step of calculating laser metric based on a spectrum of a laser radiation emitted to the lithographic apparatus from a laser and representation of an aerial image of the pattern projected on the substrate by the lithographic apparatus; a step of either changing operation of the laser or adjusting the lithographic apparatus by using the laser metric; and a step of projecting the pattern on the substrate.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了控制由激光辐射源发射的激光辐射光谱，从而允许光刻设备更准确地在基板上投影图案。光刻方法包括：基于从激光发射到光刻设备的激光辐射的光谱和由光刻设备投射在基板上的图案的空间图像的表示来计算激光度量的步骤; 通过使用激光度量来改变激光器的操作或调整光刻设备的步骤; 以及将图案投影在基板上的步骤。版权所有（C）2011，JPO＆INPIT

9. 发明专利

JP2008283178A Lithographic apparatus and method 审中-公开
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：JP2008283178A
公开(公告)日：2008-11-20
申请号：JP2008114085
申请日：2008-04-24
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KAZINCZI ROBERT , TEL WIM TJIBBO , DE WINTER LAURENTIUS CORNELIUS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70891
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a method, improving fidelity or quality of, for example, a printed pattern. SOLUTION: The lithographic method includes using an illumination system to provide a radiation beam having an illumination mode, using a patterning device to impart the radiation beam with a pattern in its cross-section, and projecting the patterned radiation beam onto a plurality of substrates. The illumination mode is adjusted after the radiation beam has been projected onto one or more substrates. The adjustment is arranged to reduce the effect of aberrations due to lens heating on the projected pattern during projection of the pattern onto one or more subsequent substrates. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种提高例如印刷图案的保真度或质量的光刻设备和方法。解决方案：光刻方法包括使用照明系统提供具有照明模式的辐射束，使用图案形成装置将辐射束赋予其横截面中的图案，并将图案化的辐射束投影到多个的底物。在辐射束已经投影到一个或多个基板上之后调整照明模式。该调整被布置为在将图案投影到一个或多个后续基底上时，减少由于透镜加热引起的像差对投射图案的影响。版权所有（C）2009，JPO＆INPIT

10. 发明专利

JP2008199014A Device manufacturing method, computer program and lithographic apparatus 有权
标题翻译：设备制造方法，计算机程序和平面设备
公开(公告)号：JP2008199014A
公开(公告)日：2008-08-28
申请号：JP2008022379
申请日：2008-02-01
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LAAN HANS VAN DER , DE WINTER LAURENTIUS CORNELIUS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70891 , G03F7/70125
摘要： PROBLEM TO BE SOLVED: To provide an improved apparatus to compensate an aberration caused by heating a projection system, when using a localized lighting mode. SOLUTION: In a lithographic projection apparatus, adjustment of the projection system, e.g. to compensate for lens heating effects, is performed by: determining a region of interest for a given pattern and illumination arrangement, the region of interest being a non-circular region of a pupil plane of the projection system through which substantially all of the radiation of the modulated beam that contributes to formation of the image passes; obtaining a set of basis functions that are orthogonal over the region of interest; expressing the wavefront of the modulated radiation beam in the pupil plane in terms of the basis functions that are orthogonal over the region of interest and a set of coefficients; and determining at least one value of a control setting to minimize the values of the coefficients. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：当使用局部照明模式时，提供一种改进的装置来补偿由投影系统加热引起的像差。解决方案：在光刻投影设备中，投影系统的调整，例如。以补偿透镜加热效应，通过以下方式进行：通过确定给定图案和照明布置的感兴趣区域，感兴趣区域是投影系统的瞳孔平面的非圆形区域，基本上所有的辐射有助于形成图像的调制束通过; 获得在感兴趣区域上正交的一组基函数; 根据在感兴趣区域和一组系数上正交的基函数，在瞳平面中表达调制辐射束的波前; 以及确定控制设置的至少一个值以最小化所述系数的值。版权所有（C）2008，JPO＆INPIT

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