会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明专利
    • Method and apparatus for forming thin film
    • 形成薄膜的方法和装置
    • JP2008289967A
    • 2008-12-04
    • JP2007136146
    • 2007-05-23
    • Cambridge Enterprise LtdSamco Incケンブリッジ エンタープライズ リミテッドサムコ株式会社
    • MIYAKE MASAHITOMORRISON FINLAY DOOGANTATSUTA TOSHIAKISCOTT JAMES FLOYDTSUJI OSAMU
    • B05D1/02B05B17/06C23C16/40H01L21/28H01L21/288
    • PROBLEM TO BE SOLVED: To provide a method for forming a thin film by using a raw material for MOCVD in the mist deposition method, by solving the problem that the mist deposition method uses a raw material used for the MOD method but cannot use a raw material for MOCVD.
      SOLUTION: The mist deposition method for forming a thin film comprises applying mist comprised of a raw material of a thin film and a solvent onto a heated substrate, whereby only solvent mist evaporates before it sticks to the substrate and a thin film is formed on the surface of the substrate. The thin film thus formed may be annealed to enhance its crystallinity. By enabling a mist deposition method according to the present invention to form a thin film from a raw material for MOCVD, a thin film electrode of iridium oxide or ruthenium oxide can be formed on a substrate, and hence a device such as RuO
      2 /PZT/RuO
      2 can be prepared at a low cost using a single thin-film forming apparatus for a mist deposition method according to the present invention.
      COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:为了提供一种通过在雾化沉积法中使用用于MOCVD的原料形成薄膜的方法,通过解决雾沉积方法使用用于MOD方法的原料但不能 使用原料进行MOCVD。 解决方案:用于形成薄膜的雾化沉积方法包括将由薄膜原料和溶剂构成的雾施加到加热的基板上,由此仅在溶剂雾附着到基板之前蒸发溶剂雾,并且薄膜为 形成在基板的表面上。 这样形成的薄膜可以退火以提高其结晶度。 通过使根据本发明的雾化沉积方法能够从用于MOCVD的原料形成薄膜,可以在衬底上形成氧化铱或氧化钌的薄膜电极,因此诸如RuO < 可以使用根据本发明的用于雾化沉积方法的单个薄膜形成装置以低成本制备2 / PZT / RuO 2 。 版权所有(C)2009,JPO&INPIT