专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

2. 发明专利

JP2011522128A Method of controlling the transformation process 审中-公开
公开(公告)号：JP2011522128A
公开(公告)日：2011-07-28
申请号：JP2011512055
申请日：2009-05-07
申请人：シーメンス・ファオアーイー・メタルズ・テクノロジーズ・ゲーエムベーハー
发明人：クルト・ヴィーダー , シュテファン・シュスター , ハインリヒ・ローフス・マリ , ハラルト・フィッシャー , フランツ・ヴィンター , ベルンハルト・ハイル・シュプイダ , ヨハネス・レオポルト・シェンク
IPC分类号： C22B4/00 , C21B5/00 , C21B11/00 , C21B13/00 , G01N21/27
CPC分类号： C21B7/24 , C21B5/006 , C21B13/00 , C22B5/02
摘要： A method for controlling a transformation process in which the conversion of charge materials to a product takes place along a transformation interface from the crystal and/or grain and/or phase and/or pore surface into the charge material, wherein one or more chemical elements in the charge materials is released and/or incorporated and/or rearranged and wherein the conversion of the charge materials takes place along advancing transformation interfaces. The charge materials are identified on the basis of at least one optical, in particular microscopic, analysis with respect to their phases and/or phase components and/or their phase morphology, structure, texture and/or their chemical composition. On the basis of these variables, reference functions for the charge materials, which describe the conversion of the charge materials in the process, are assigned and used for establishing the process parameters of the transformation process.

4. 发明专利

JP2703181B2 失效
公开(公告)号：JP2703181B2
公开(公告)日：1998-01-26
申请号：JP10576394
申请日：1994-05-19
IPC分类号： C22B9/16 , B09B3/00 , B09C1/06 , C03B5/00 , C03B5/02 , C21B13/12 , C22B4/00 , C22B7/00 , F23G5/00 , F23G5/08 , F23G5/10 , F27D11/08 , F27D99/00 , H05B7/00 , H05H1/26 , H05H1/44

5. 发明专利

JPH08225381A METHOD OF OBTAINING ARTICLE BASED ON ZIRCONIA 失效
公开(公告)号：JPH08225381A
公开(公告)日：1996-09-03
申请号：JP31834295
申请日：1995-12-06
申请人： ASULAB SA
发明人： PIEERU MAGUNAN
IPC分类号： C04B41/80 , C04B35/486 , C04B35/64 , C22B4/00 , G04B37/22

6. 发明专利

JPH05504375A 失效
公开(公告)号：JPH05504375A
公开(公告)日：1993-07-08
申请号：JP50185890
申请日：1990-12-17
IPC分类号： C22B4/00 , C22B7/02 , C22B19/04 , C22B19/18 , C22B19/30

7. 发明专利

JPH04231315A SILICA MELTING TECHNIQUE USING DIRECT FLOW FURNACE 失效
公开(公告)号：JPH04231315A
公开(公告)日：1992-08-20
申请号：JP20208191
申请日：1991-08-13
申请人： DOW CORNING
发明人： AABITSUDO NEIRU AABITSUDOSON , BISHIYUU DATSUTO DOSAAJIYU , JIEIMUSU BARATSUTO MEI
IPC分类号： C01B33/025 , C22B4/00

8. 发明专利

JPH0432142B2 失效
公开(公告)号：JPH0432142B2
公开(公告)日：1992-05-28
申请号：JP18359582
申请日：1982-10-18
IPC分类号： C22C33/04 , C21B13/12 , C22B4/00 , C22C35/00

9. 发明专利

JPH03166322A ETCHING ELECTRODE COVER 失效
公开(公告)号：JPH03166322A
公开(公告)日：1991-07-18
申请号：JP30492589
申请日：1989-11-27
申请人： NEC CORP
发明人： INOUE TAKASHI
IPC分类号： C22B4/00 , H01L21/302 , H01L21/3065
摘要： PURPOSE:To develop an electrode cover for dry etching having an excellent cooling effect by adhering an In sheet having resilience on the opposite surface of the metallic plate of the electrode cover for dry etching constituted of the metallic plate and an electrode coating material stuck on the front surface thereof. CONSTITUTION:A double-coated adhesive tape 3 is stuck onto one surface of the metallic plate 2 which is made of oxygen-free copper and is polished on both surfaces and a polypropylene plate 4 as the electrode coating material is stuck thereon. The In sheet 1 which has the extremely high resilience at ordinary temp. and is easily deformed to meet the ruggedness of the front surface of the electrode is stuck to the surface on the opposite side of the metallic plate 2. This electrode cover for dry etching comes into contact with the electrode surface via the easily deformable In sheet and, therefore, the adhesive property to the electrode is improved and the high cooling effect is obtd. simply by placing the cover on the electrode.

10. 发明专利

JPH03500304A 失效
公开(公告)号：JPH03500304A
公开(公告)日：1991-01-24
申请号：JP50449288
申请日：1988-05-26
IPC分类号： H05B7/00 , C21C5/52 , C22B4/00 , C22B9/20 , C22B9/22 , C25C3/00 , F27B3/08

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式