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81. 发明专利

JP2001143649A SCANNING ELECTRON MICROSCOPE 失效
公开(公告)号：JP2001143649A
公开(公告)日：2001-05-25
申请号：JP2000318232
申请日：2000-10-13
申请人： HITACHI LTD
发明人： SATO MITSUGI , OSE YOICHI , FUKUHARA SATORU , TODOKORO HIDEO , ESUMI MAKOTO
IPC分类号： H01J37/147 , H01J37/244 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide a scanning electron microscope that includes a perpendicular electromagnetic field generator reducing the axial aberration to prevent chromatic aberration during detection of reflected or highly accelerated secondary electrons. SOLUTION: A secondary electron conversion electrode is arranged in the electron trajectory deflected by the perpendicular electromagnetic field generator to deflect the converted secondary electron detected.

82. 发明专利

JP2001143648A PHOTOEXCITED ELECTRON BEAM SOURCE AND APPARATUS FOR APPLYING ELECTRON BEAM 失效
公开(公告)号：JP2001143648A
公开(公告)日：2001-05-25
申请号：JP32643599
申请日：1999-11-17
申请人： HITACHI LTD
发明人： OSHIMA TAKU , NOZOE MARI , SHINADA HIROYUKI , FUKUHARA SATORU , TODOKORO HIDEO
IPC分类号： H01J37/073 , H01J1/34 , H01J37/06 , H01S5/02
摘要： PROBLEM TO BE SOLVED: To obtain a high performance electron beam by placing objective lens in vacuum for photoexcited electron beam for reducing the size of light focused as well as preventing vibration. SOLUTION: An objective lens is arranged close to a photo cathode in vacuum to sufficiently narrow the light focused to the photo cathode, and to achieve an electron beam source of high performance not drifted by vibration.

83. 发明专利

JP2000223542A INSPECTION METHOD AND INSPECTION APPARATUS USING ELECTRON BEAM 失效
公开(公告)号：JP2000223542A
公开(公告)日：2000-08-11
申请号：JP33164899
申请日：1999-11-22
申请人： HITACHI LTD
发明人： IWABUCHI HIROKO , TODOKORO HIDEO , MORI HIROYOSHI , SATO MITSUGI , USAMI YASUTSUGU , ICHIHASHI MIKIO , FUKUHARA SATORU , SHINADA HIROYUKI , KANEKO YUTAKA , TAKATO ATSUKO , TOYAMA HIROSHI , SUGIYAMA KATSUYA
IPC分类号： G01R31/302 , G01B15/00 , G01N23/225 , G01R1/06 , G06T1/00 , G06T7/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an inspection method and an inspection apparatus using an electron beam, which enhances resolution and aims to improve the speed, reliability, and downsizing. SOLUTION: When applying voltage to a sample 13 via a sample stage 12 and focusing an electron beam on the sample 13 for scanning and shifting the sample stage 12 continuously during the scanning and detecting the charged particles generated from the sample 13, thereby detecting the defect of the sample 13, the dimension between the sample stage and a shield frame is decided, based on the limit of the discharge generated between the sample stage 12 and the shield frame, and this apparatus is provided with a coil of at least six poles to correct the shape of an electron beam. During the shifting of the sample 13, it is blanked and deflected with the crossover of the electron beam as the fulcrum for blanking, and the magnitude of the voltage applied to the sample 13 is decided by the kind of the sample 13.

84. 发明专利

JPH11111205A PARTICLE BEAM DEVICE EQUIPPED WITH ELECTRON GUN OF FIELD EMISSION TYPE AND HEAT-DEGASSING METHOD THEREOF 失效
公开(公告)号：JPH11111205A
公开(公告)日：1999-04-23
申请号：JP26468197
申请日：1997-09-29
申请人： HITACHI LTD , HITACHI SCIENCE SYSTEMS LTD
发明人： OKURA AKIMITSU , NAGASE AKIHITO , MIYAMOTO RYOICHI , HIYAMA SABURO , FUKUHARA SATORU , SONOBE NOBUYUKI , KOKUBO SHIGERU , NITTA HISAO
IPC分类号： H01J9/39 , H01J37/073 , H01J37/141 , H01J37/18
摘要： PROBLEM TO BE SOLVED: To efficiently exhaust evolved gas in an electron gun chamber of a field-emission type. SOLUTION: Temperature-detecting means, 27 to 31, are installed on the outer wall of an electron gun chamber 12, near a magnet 23 of an ion pump IP1 which evacuates the electron gun chamber 12, on the outer wall of an electromagnetic lens part 11 near the connecting part with the electron gun chamber 12, near a magnet 24 of an ion pump IP2 which evacuates the electromagnetic lens part 11, and near an air-locking part 25, respectively. A power source 14 for baking, which is connected to heaters, 15 to 19, is controlled by a control means 32, as the temperatures detected by each temperature-detecting means, 27 to 31, fall in the prescribed range respectively during a heat-degassing period.

85. 发明专利

JPH0935674A DIFFUSED REPLENISHING ELECTRON SOURCE AND MANUFACTURE THEREOF 失效
公开(公告)号：JPH0935674A
公开(公告)日：1997-02-07
申请号：JP17980295
申请日：1995-07-17
申请人： HITACHI LTD
发明人： SHINADA HIROYUKI , FUKUHARA SATORU , KURODA KATSUHIRO
IPC分类号： H01J37/06 , H01J1/15 , H01J1/304 , H01J1/30
摘要： PROBLEM TO BE SOLVED: To provide a diffused replenishing electron source with high brightness and a long life by connecting a high melting point metal single crystal wire to the tip of a high melting point metal filament, and applying slurry prepared with replenishing source powder and a nitrocellulose-containing organic solvent to the connecting part. SOLUTION: A single crystal wire made of a high melting point metal having an axial orientation of is connected to the peak of the central end binding part of a filament 2 made of high melting point metal, then a single crystal chip 1 is formed by electrolytic polishing. Slurry prepared with replenishing source powder 3 and a nitrocellulose-containing organic solvent (isoamyl acetate or the like) is applied to the connecting part of the filament 2 and the single crystal chip 1, then they are heated in vacuum to sinter the replenishing source powder 3. The filament 2 and the single crystal wire are made of a fine wire of either one of W, Mo, and Re, and the replenishing source powder is made of the powder of at least one metal selected from the group comprising Ti, Zr, Hf, Y, Th, Sc, Be, and Ba. A diffusion replenishing type electron source with high stability and high production yield can be obtained.

86. 发明专利

JP2564293B2 失效
公开(公告)号：JP2564293B2
公开(公告)日：1996-12-18
申请号：JP3551087
申请日：1987-02-20
申请人： HITACHI LTD
发明人： TAKADA KEIJI , OKUMURA MASAHIDE , FUKUHARA SATORU , MORIMURA TOSHUKI , HOSAKA SUMIO , HOSOKI SHIGEYUKI
IPC分类号： H01L41/09 , G01Q10/04 , G01Q10/06 , H01L41/08 , H02N2/00

87. 发明专利

JPH0864161A CHARGED PARTICLE DEVICE 失效
公开(公告)号：JPH0864161A
公开(公告)日：1996-03-08
申请号：JP20042494
申请日：1994-08-25
申请人： HITACHI LTD
发明人： KAMIYAMA REIKO , ESUMI MAKOTO , FUKUHARA SATORU , TODOKORO HIDEO
IPC分类号： H01J37/04
摘要： PURPOSE: To shorten the time required for control by previously measuring the variation range of electron beam amounts corresponding to the variation range of control voltage in which an optical axis is not varied and controlling the electron beam amount based on the measured value. CONSTITUTION: An electron beam drown with a drawing voltage 4 is adjusted with control voltage 3, then accelerated with accelerating voltage 6. The electron beam amount is measured with a Faraday cup 7. The electron beam amount is reversely proportional to the control voltage 3, and the range of the electron beam amount is decided with the range of the control voltage. As this method, the electron beam amount serving as the reference is set, and the drawing voltage 4 until the electron beam amount reaches the set value is adjusted for axial adjustment. The control voltage 3 is increased to the maximum value already set, and the electron beam amount at this point of time is measured with the Faraday cup 7. The voltage 3 is decreased to the minimum value already set, and the electron beam amount is measured. This electron beam amount is stored as the maximum value, and the maximum value and the minimum value are displayed as the range of the electron beam amounts.

88. 发明专利

JPH04125403A DETERMINING METHOD OF OPERATING POINT OF SCANNING TUNNELING MICROSCOPE 失效
公开(公告)号：JPH04125403A
公开(公告)日：1992-04-24
申请号：JP24400690
申请日：1990-09-17
申请人： HITACHI LTD
发明人： FUKUHARA SATORU , YAMADA OSAMU , HAZAKI EIICHI , HOSAKA SUMIO
IPC分类号： G01B7/34 , G01Q10/04 , G01Q60/10 , G05D3/00 , G11B9/14 , H01J37/28 , H02N2/00
摘要： PURPOSE:To enable execution of measurement of high precision by applying a feedback control on a Z-axis piezo for fine motion and by selecting an operating point being fitted for the indentation of the surface of a sample. CONSTITUTION:A tunnel current detecting circuit 7 detects a minute tunnel current. A servo control circuit 8 is a control circuit comprising elements of P (proportion), I (integration) and D (differentiation) and feeds back an arbitrary output signal to a control circuit 9 of Z-axis piezo for fine motion so that the tunnel current be constant. Corresponding to this output signal, extension and contraction of the Z-axis piezo for fine motion are made by the control circuit 9 of the Z-axis piezo for fine motion and thereby the tunnel current is made constant. Accordingly, the output signal of the servo control circuit 8 corresponds to the displacement of the Z-axis piezo for fine motion. This signal is digitized, transferred to an engineering work station (EWS) 12 by a CPU bus 13 and displayed in a display. Thereby information on the indentation of the surface of a sample can be observed.

89. 发明专利

JPH03101041A VOLTAGE MEASURING DEVICE BY USE OF ELECTRON BEAM 失效
公开(公告)号：JPH03101041A
公开(公告)日：1991-04-25
申请号：JP23704189
申请日：1989-09-14
申请人： HITACHI LTD
发明人： KIYOFUJI SHIGEMITSU , TODOKORO HIDEO , FUKUHARA SATORU , SHINADA HIROYUKI
IPC分类号： H01J37/28 , G01R31/305
摘要： PURPOSE:To obtain the absolute value of the voltage of a sample and display the voltage wave-form by normalizing the secondary electron signal detected by the electron beam radiation to an unknown sample voltage position, and comparing the normalized value with the known sample voltage obtained in advance. CONSTITUTION:Secondary electrons 3 generated from a sample 2 by the radiation of an electron beam 1 are detected by a detector 6 and converted into a digital signal by an A/D converter 10 after passing an amplifier 9, and it is inputted to a signal processing circuit 11. The signal processing circuit 11 performs the signal processing such as averaging and smoothing on the A/D- converted secondary electron signal and forms the data of the voltage wave-form or the like, and the output of the signal processing circuit 11 is fed to a display unit 7 or a computer 15. The absolute value of the voltage of the measured position can be displayed by using the relation between the normalized electron signal quantity characteristic and the known sample voltage obtained in advance.

90. 发明专利

JPH0349144A ROTARY CENTER DETECTING METHOD FOR CHARGED PARTICLE BEAM DEVICE 失效
公开(公告)号：JPH0349144A
公开(公告)日：1991-03-01
申请号：JP18270189
申请日：1989-07-17
申请人： HITACHI LTD
发明人： SHINADA HIROYUKI , TODOKORO HIDEO , FUKUHARA SATORU , OTOMO MOICHI , KIYOFUJI SHIGEMITSU
IPC分类号： H01J37/147 , G11B5/455 , H01J37/28
摘要： PURPOSE:To precisely determine the positional relation between the rotary center of a sample and an electron beam by calculating the rotary center of the sample based on the deflection quantity data at the rotating angle 0 deg. and the deflection quantity data at 180 deg.. CONSTITUTION:When an electron beam 2 is scanned in the X-direction in a scanning range 22 and its position is measured by the position detector 7 of the charged particle beam 2, a signal wave form reflected with the distribution of the magnetic field strength of a magnetic head 5 is obtained. When the head 5 is rotated 180 deg. around a rotary center 21 perpendicular to the incident direction of the beam 2 and the position is likewise measured, a wave-form reversed with the previously measured wave- form is obtained because only the incident direction of the beam 2 is reversed and the passing path of the beam 2 is the same as that at the rotating angle 0 deg.. When both wave-forms are displayed while the scanning position in the X-direction of the beam 2 is shown on the horizontal axis and the position change in the Y direction of the beam 2 is shown on the vertical axis, two wave-forms are made point- symmetrical, and the center coincides with the X-coordinate of the rotary center of a sample. The positional relation between the scanning range 22 of the beam 2 and the rotary center 21 of the sample is clarified.

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