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1. 发明专利

JP2009009949A Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：JP2009009949A
公开(公告)日：2009-01-15
申请号：JP2008223009
申请日：2008-09-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SAWAHATA TETSUYA , SATO MITSUGI , OSE YOICHI
IPC分类号： H01J37/244
摘要： PROBLEM TO BE SOLVED: To provide a scanning electron microscope capable of effectively detecting a reflected electron generated from a sample at a low angle while realizing a short focus distance and forming a sample image.
SOLUTION: A secondary electron conversion electrode 7 for generating a secondary electron 9a caused by collision of the reflected electron 8a is arranged further toward an electron source side than an object lens 4 and toward a sample side than a secondary electron detector 5a. Thus, the reflected electron generated from the sample at a low angle can be effectively detected on the basis of the formation.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在实现短焦距并形成样品图像的同时以低角度有效地检测由样品产生的反射电子的扫描电子显微镜。解决方案：用于产生由反射电子8a的碰撞引起的二次电子9a的二次电子转换电极7进一步朝向比透镜4的电子源侧朝向与二次电子检测器5a相对的样品侧。因此，可以基于形成来有效地检测从低角度产生的样品的反射电子。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2006019301A Electron beam adjusting method, charged particle optical system control device and scanning electron microscope 有权
标题翻译：电子束调整方法，充电粒子光学系统控制装置和扫描电子显微镜
公开(公告)号：JP2006019301A
公开(公告)日：2006-01-19
申请号：JP2005193288
申请日：2005-07-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ESUMI MAKOTO , OSE YOICHI , IKEGAMI AKIRA , TODOKORO HIDEO , ISHIJIMA TATSUAKI , SATO TAKAHIRO , FUKAYA RITSUO , ASAO KAZUNARI
IPC分类号： H01J37/21 , H01J37/20 , H01L21/027 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation method and a charged particle beam device suitable for reducing focus offset, magnification fluctuation, measurement length error in the charged particle beam device caused by charging on a sample. SOLUTION: In order to achieve the object, this invention provides a method of measuring the potential distribution on the sample by an electrostatic potentiometer for measuring the potential on the sample while the sample carried in by a carry-in mechanism of a charged particle beam passes. Further the invention provides a method of measuring local charging at a specified point on the sample and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Further the invention provides a method of correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种适用于减少对样品充电引起的带电粒子束装置中的聚焦偏移，放大波动，测量长度误差的带电粒子束照射方法和带电粒子束装置。解决方案：为了实现该目的，本发明提供了一种通过静电电位计测量样品上的电势分布的方法，用于测量样品上的电位，而样品由携带的携带机构携带粒子束通过。此外，本发明提供了一种在样品上的特定点测量局部充电的方法，并且从这些局部静电电荷分离和测量广域静电电荷量。此外，本发明提供了一种基于通过在至少两个带电粒子光学条件下测量指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2005338096A Pattern measuring method and charged particle beam device 有权
标题翻译：图案测量方法和充电颗粒光束装置
公开(公告)号：JP2005338096A
公开(公告)日：2005-12-08
申请号：JP2005193289
申请日：2005-07-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ESUMI MAKOTO , OSE YOICHI , IKEGAMI AKIRA , TODOKORO HIDEO , ISHIJIMA TATSUAKI , SATO TAKAHIRO , FUKAYA RITSUO , ASAO KAZUNARI
IPC分类号： G01B15/04 , H01J37/21 , H01J37/28 , H01L21/027 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation method suitable for reducing a focus deviation, a magnification fluctuation and a measured length value error in a charged particle beam device due to a charging on a sample and to provide the charged particle beam device. SOLUTION: To achieve the above those objects, a method is disclosed for measuring an electrical potential distribution on the sample with a static electrometer which measures the electrical potential on the sample during passing the sample loaded by a loading mechanism of the charged particle beam. Another method is disclosed for measuring a local charge at a specified point on the sample, and isolating and measuring a wide area charge quantity from this local charge quantity. Further, the charge quantity of the specified point is measured under at least two charged particle optical conditions, the fluctuation of the dimensional measured value due to the fluctuation of the charge quantity at the specified point is measured using the charged particle beam. Another method is disclosed for correcting the measured length value or the magnification based on the above fluctuation. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种适合于减少由于对样品进行充电而导致的带电粒子束装置中的聚焦偏差，放大波动和测量的长度值误差的带电粒子束照射方法，并且提供带电粒子束装置。解决方案：为了实现上述目的，公开了一种用静电静电计测量样品上的电势分布的方法，该静电静电计测量在通过由带电粒子的装载机构加载的样品时样品上的电势光束。公开了用于测量样品上指定点处的局部电荷以及从该局部电荷量分离和测量广域电荷量的另一种方法。此外，在至少两个带电粒子光学条件下测量指定点的电荷量，使用带电粒子束测量由于指定点处的电荷量的波动引起的尺寸测量值的波动。公开了用于基于上述波动来校正测量长度值或倍率的另一种方法。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JPH1186770A SCANNING ELECTRON MICROSCOPE 失效
公开(公告)号：JPH1186770A
公开(公告)日：1999-03-30
申请号：JP24814297
申请日：1997-09-12
申请人： HITACHI LTD
发明人： OSE YOICHI , YOSHINARI KIYOMI
IPC分类号： H01J37/244 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To detect secondary signal electrons without adversely affecting primary electrons and to enable observation with high resolution and high sensitivity observation by applying between an objective lens and a sample an electric field which becomes asymmetrical in distribution. SOLUTION: A primary electron beam 4, emitted from a cathode 1 by the voltage V1 applied between the cathode 1 and a first anode 2, is accelerated by a voltage Vacc applied to a second anode 3 and proceeds to a lens system of the later stage. The primary electron beam 4 is focused on a sample 7 as a fine spot by an objective lens 6 and is scanned two-dimensionally on the sample 7 by a two-staged deflection coil 8. A control electrode 10 is inserted between the sample 7 and the objective lens 6, and the asymmetrical distribution electric field is generated between the sample 7 and the control electrode 10. Secondary signal electrons 9 generated from the sample 7 are extracted to the upper section of the objective lens 6, accelerated, and deflected to the outside of the optical axis. The deflected secondary signal electrons are received by a detector 11 which is installed around the optical axis.

5. 发明专利

JPH0631774B2 失效
公开(公告)号：JPH0631774B2
公开(公告)日：1994-04-27
申请号：JP1393985
申请日：1985-01-28
申请人： HITACHI LTD
发明人： OOGA KOJI , OSE YOICHI
IPC分类号： G21D3/08 , G21C7/26

6. 发明专利

JPH04129136A CATHODE-RAY TUBE, TELEVISION EQUIPMENT THEREWITH, MONITOR APPARATUS THEREWITH AND METHOD OF COMPRESSING ELECTRON BEAM 失效
公开(公告)号：JPH04129136A
公开(公告)日：1992-04-30
申请号：JP24873490
申请日：1990-09-20
申请人： HITACHI LTD
发明人： HIGUCHI YOSHIYA , OSE YOICHI
IPC分类号： H01J29/50 , H01J29/56
摘要： PURPOSE:To obtain a cathode-ray tube and the like which are applicable to a large screen and have good focusing of electron beams by disposing in series a first quadru- pole magnetic field generating unit for compressing electron beams in one direction and a second quadru-pole magnetic field generating unit for compressing the same in the other direction. CONSTITUTION:Beams are compressed in one direction and expanded in a right-angled direction thereto by a first magnetic field generating unit 1 and then inputted to a second magnetic field generating unit 2. Thereupon, the generated quadru-pole magnetic field expands an adjacent portion to the center of the beams compressed by the first magnetic field unit 1 but the compressed portion of the beams is not expanded very much. On the other hand, since the portion expanded by the first magnetic field generating unit 1 is apart from the center of the beams, the portion is greatly compressed in the center direction by receiving a large force. Thus, the cross-section of the beams is compressed and focused by two series-disposed magnetic field generating units 1, 2 in two directions which are right-angled to each other. Accordingly, the strength of the generated quadru-pole magnetic field is easy to be adjusted and the beam focusing is easy to be performed.

7. 发明专利

JPH04679A METHOD AND DEVICE FOR SUPPORTING COORDINATE GRID PREPARATION 失效
公开(公告)号：JPH04679A
公开(公告)日：1992-01-06
申请号：JP10043790
申请日：1990-04-18
申请人： HITACHI LTD
发明人： UMEGAKI KIKUO , TAGO KAZUATSU , OSE YOICHI , HIGUCHI YOSHIYA , MIKI KAZUYOSHI
IPC分类号： G06F17/50 , G06F15/60
摘要： PURPOSE:To efficiently attain determining plural coordinate grids with different density by preparing a second coordinate grid whose interval is different from a first coordinate grid in the partial area of the first coordinate grid and preparing further new second coordinate grid with the display of corresponding relation. CONSTITUTION:Form data are inputted by using a general coordinate grid preparation supporting CAD system and the grid division of an area where analysis is executed in an analysis object. The end/not end of multiple grid preparation is judged and when it is judged to be not end, plural coordinate grid groups with different density are prepared and displayed. The second coordinate grid is prepared corresponding to the result of whether it is coarse or fine and it is stored in an external memory. Thus, the coordinate grid corresponding to the analysis object and an analysis purpose can be efficiently generated.

8. 发明专利

JPH03204779A METHOD AND DEVICE FOR SUPPORTING NUMERICAL VALUE CALCULATION 失效
公开(公告)号：JPH03204779A
公开(公告)日：1991-09-06
申请号：JP52490
申请日：1990-01-08
申请人： HITACHI LTD
发明人： KIZAWA MAKOTO , KOIZUMI MAKOTO , HIGUCHI YOSHIYA , OSE YOICHI
IPC分类号： G06F17/50
摘要： PURPOSE:To easily obtain the result of calculation with high accuracy by concentrating a coordinate lattice and an element in the part whose analytical accuracy is deteriorated due to a sudden variation, in the case a solid angle for allowing for a set area on an object boundary from a point in the vicinity of an analytical object is small if a boundary shape is projected against the point in the vicinity of the object, and in the case the solid angle is large if the shape is recessed. CONSTITUTION:An object boundary discriminating inner point is distributed uniformly in the vicinity of a boundary of the inside of an object, a foot of a perpendicular extending from this inner point to an object boundary is derived, and centering around this foot, a set area is defined onto the object boundary. On the other hand, from the inner point, the maximum solid angle OMEGAc for allowing for an area having a radius equivalent to the set area is derived. Subsequently, a boundary integration is executed analytically, and from the inner point, a solid angle OMEGA for allowing for the set area range on the object boundary is derived. This solid angle OMEGA becomes smaller than OMEGAc if the object boundary is projected against the inner point, and on the contrary, it becomes larger than OMEGAc if the object boundary is recessed against the inner point, and by magnitude of a ratio C of OMEGAc and OMEGA, a boundary subdivision is divided into (n) stages and the boundary element is roughened and densified. In such a way, in the case of a numerical analysis executed by a boundary element method, a result of analysis is obtained with sufficiently high accuracy and quickly.

9. 发明专利

JPH03178320A IONIZED ISOTOPE RECOVERY METHOD AND ITS APPARATUS 失效
公开(公告)号：JPH03178320A
公开(公告)日：1991-08-02
申请号：JP31527689
申请日：1989-12-06
申请人： HITACHI LTD
发明人： HIGUCHI YOSHIYA , OSE YOICHI , KOBAYASHI KINYA , SANO HIROKI , MISHIMA AKIRA
IPC分类号： B01D59/34 , B01D59/48
摘要： PURPOSE:To prevent generation of electric field in the reverse direction and formation of an ion sheath and recover an isotope ion efficiently by transporting the whole plasma while retaining electric neutrality as plasma without causing electric charge separation of the plasma. CONSTITUTION:An ionization isotope recovery apparatus 5 is composed of a circular coil 2, electrode plates 1, and recovery apparatus 3, 4. The electrode plates 1 and the recovery apparatus 3 are put vertically to the plane of the coil 2 in the space surrounded by the coil 2. The magnetic field B generated by the coil 2 and an electric field E formed by the electrode plates 1 are set to cross rectangularly each other and the electrode plates 1 and the recovery apparatus 3 are put rectangularly each other. A space where a steam flow 21 containing the desired ionized isotope passes is formed in the region surrounded with the electrode plates 1 and the recovery apparatus 3. The steam flow 21 containing the desired ionized isotope is led from the lower part of these apparatus and the ionized isotope which reaches the resion where the magnetic field and the electric field exist is EXB drifted and transported toward the apparatus 5 and recovered while electric neutrality of the plasma is retained.

10. 发明专利

JPH01186540A ELECTRON GUN 失效
公开(公告)号：JPH01186540A
公开(公告)日：1989-07-26
申请号：JP372788
申请日：1988-01-13
申请人： HITACHI LTD
发明人： SANO HIROKI , OSE YOICHI , TAGO KAZUATSU
IPC分类号： H01J29/48 , H01J29/50 , H01J29/51
摘要： PURPOSE:To remove the unnecessary portion of the magnetic field adversely affecting on the focusing and concentration of a beam by constituting part or all of electrodes of an electron gun with a superconducting material. CONSTITUTION:A deflecting yoke 6 to deflect an electron beam is installed around a funnel section 8 and forms the deflecting magnetic field 7. A thin film 11 made of a superconducting material is coated or deposited on the inner wall of a neck section so as to surround an electron gun, members 12 made of the superconducting material are fitted to the inner wall of a seal cup 4. These superconducting members 12 are fitted on lines passing nearly the centers between respective beam passing holes in the direction nearly perpendicular to a line connecting a center beam passing hole 15b and side beam passing holes 15a and 15c and the passing direction of the beam. Part of the deflecting magnetic field 7 formed by the deflecting yoke 6 can be prevented from infiltrating into a focusing electrode 3 or an accelerating electrode 4 by the superconducting members 12, and the Lorentz force by the deflecting magnetic field can be prevented from adversely affecting the beam shape during the focusing and acceleration of the beam.

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