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    • 60. 发明专利
    • Magnetic tunnel junction element, method of manufacturing the same and mram
    • MAGNETIC TUNNEL JUNCTION ELEMENT,METHOD OF MANTIFACTURING THE SAME AND MRAM
    • JP2012142480A
    • 2012-07-26
    • JP2011000419
    • 2011-01-05
    • Fujitsu Ltd富士通株式会社
    • RI EIMIN
    • H01L43/10G01R33/09G11B5/39H01F10/32H01L21/8246H01L27/105H01L43/08H01L43/12
    • PROBLEM TO BE SOLVED: To provide a magnetic tunnel junction element that is hardly affected by deposit generated at the side of a laminate structure.SOLUTION: A buffer layer formed of conductive material having a different etching characteristic from a lower electrode is disposed on a partial area of the lower electrode formed on a substrate. A first magnetization free layer formed of amorphous ferromagnetic material is disposed on the buffer layer. A second magnetization free layer formed of crystallized ferromagnetic material is disposed on the first magnetization free layer, and a tunnel barrier layer is disposed on the second magnetization free layer. A magnetization fixing layer whose magnetization direction is fixed is disposed on the tunnel barrier layer, and an upper electrode layer is disposed on the magnetization fixing layer.
    • 要解决的问题:提供几乎不受层压结构侧面沉积物影响的磁性隧道结元件。 解决方案:在形成在基板上的下电极的局部区域上设置由具有与下电极不同的蚀刻特性的导电材料形成的缓冲层。 由非晶铁磁材料形成的第一磁化自由层设置在缓冲层上。 由结晶的铁磁材料形成的第二磁化自由层设置在第一磁化自由层上,隧道势垒层设置在第二磁化自由层上。 其磁化方向固定的磁化固定层设置在隧道势垒层上,上电极层设置在磁化固定层上。 版权所有(C)2012,JPO&INPIT