专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明专利

JP2009302490A Exposure device and device manufacturing method 审中-公开
标题翻译：曝光装置和装置的制造方法
公开(公告)号：JP2009302490A
公开(公告)日：2009-12-24
申请号：JP2008158550
申请日：2008-06-17
申请人： Canon Inc , キヤノン株式会社
发明人： HATTORI TADASHI
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68
CPC分类号： G03B27/42 , G03F9/7034
摘要： PROBLEM TO BE SOLVED: To provide an exposure device that improves perpendicular measurement precision by calculating an error in a perpendicular direction accompanying horizontal driving. SOLUTION: When a substrate stage is positioned in a first area, the same place of a substrate is measured by a first measuring instrument at a plurality of measurement points both before and after the substrate stage is driven horizontally, a first displacement amount in the perpendicular direction accompanying the horizontal driving of the substrate stage in the first area is computed based upon first measurement results obtained using the first measuring instrument, and the first displacement amount is subtracted from the first measurement results to computes numerals representing a surface shape of the substrate; and the numerals representing the surface shape of the substrate are subtracted from a numeral representing perpendicular position of the substrate when the substrate stage is positioned in a second area to compute a second variation amount in the perpendicular direction accompanying the horizontal driving of the substrate stage in the second area, and the perpendicular position of the substrate stage in the second area is controlled based upon the second variation amount. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过计算伴随水平驱动的垂直方向的误差来提高垂直测量精度的曝光装置。解决方案：当衬底台被定位在第一区域中时，在衬底台被水平驱动之前和之后的多个测量点处，通过第一测量仪器测量衬底的相同位置，第一位移量基于使用第一测量仪器获得的第一测量结果计算与第一区域中的基板台的水平驱动相垂直的垂直方向，并且从第一测量结果中减去第一位移量，以计算表示第一测量结果的表面形状的数字基材; 并且当衬底台位于第二区域中时，从表示衬底垂直位置的数字中减去表示衬底的表面形状的数字，以计算伴随衬底台的水平驱动的垂直方向上的第二变化量基于第二变化量来控制基板台在第二区域中的第二区域和垂直位置。版权所有（C）2010，JPO＆INPIT

42. 发明专利

JP4379997B2 Exposure device 有权
公开(公告)号：JP4379997B2
公开(公告)日：2009-12-09
申请号：JP2000006947
申请日：2000-01-14
申请人：東洋熱工業株式会社
发明人：勝二階堂 , 徹也田所 , 智明石野
IPC分类号： G03F7/20 , H01J9/14 , G03B27/42 , H01L21/027
CPC分类号： G03B27/42
摘要： An exposure apparatus comprises mask support portions, which support photo masks each having an exposure pattern thereon for movement between an exposure position in which the masks are in contact with a to-be-exposed object and a separate position in which the masks are kept off the object. Exposure light sources are used to expose the to-be-exposed object through the photo masks that are located in the exposure position. A clean air supplier runs clean air from a first supply portion into regions between the to-be-exposed object and the photo masks to prevent penetration of foreign substances when the photo masks are moved to the separate position. When the photo masks are moved to the exposure position, the supplier feeds clean air from a second supply portion onto the respective outer surfaces of the photo masks, thereby cooling the photo masks.

43. 发明专利

JP4324207B2 Exposure device 有权
标题翻译：空值
公开(公告)号：JP4324207B2
公开(公告)日：2009-09-02
申请号：JP2007112298
申请日：2007-04-20
申请人：キヤノン株式会社
发明人：裕治児嶋 , 有賢土屋
IPC分类号： H01L21/027
CPC分类号： G03B27/42 , G03F7/70525
摘要： This invention discloses an exposure apparatus for exposing a substrate to radiant energy in accordance with a recipe including a plurality of elements, the apparatus comprising: a first storage configured to store the plurality of elements; a first processor configured to change a content of a first element stored in the first storage; and a second processor configured to change a content of a second element stored in the first storage, the second element referring to the first element, in accordance with the change performed for the first element.
摘要翻译：本发明公开了一种曝光装置，用于根据包括多个元件的食谱将基板曝光于辐射能，该装置包括：第一存储器，被配置为存储多个元件; 配置为改变存储在第一存储器中的第一元素的内容的第一处理器; 以及第二处理器，被配置为根据对第一元素执行的改变来改变存储在第一存储器中的第二元素的内容，第二元素参考第一元素。

44. 发明专利

JP2009194247A Exposure apparatus 审中-公开
标题翻译：曝光装置
公开(公告)号：JP2009194247A
公开(公告)日：2009-08-27
申请号：JP2008035155
申请日：2008-02-15
申请人： Canon Inc , キヤノン株式会社
发明人： HANAWA RIICHIRO
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03B27/42 , G03F7/70258 , G03F7/70425 , G03F7/70525 , G03F7/70725 , G03F9/7026 , G03F9/7034
摘要： PROBLEM TO BE SOLVED: To provide an exposure apparatus having high throughput. SOLUTION: The exposure apparatus includes: a substrate stage 4 for moving a substrate W in a direction vertical to an optical axis AX of a Z-direction projecting optical system 3 to switch an exposure area between shots; a driving part 3b to be used for one of shot height correction of the substrate W, inclination correction concerned with XY axes, image surface curve correction of a shot, magnification correction of a shot, and rotation correction around a Z axis in a shot; and a control part 110 for controlling the substrate stage 4 so that an exposure area is moved from a first shot to a third shot when time required for the driving part 3b to shift a correction state for the first shot to a correction state for a second shot is longer than time required for the substrate stage 4 to move the exposure area from the first shot to the second shot and time required for the driving part 3b to shift the correction state for the first shot to a correction state for the third shot even when a moving distance of the substrate stage 4 is shortest, when the substrate stage 4 moves the substrate W so as to switch the exposure area from the first shot to the second shot. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供具有高生产量的曝光装置。曝光装置包括：基板台4，用于沿垂直于Z方向投影光学系统3的光轴AX的方向移动基板W，以切换拍摄之间的曝光区域; 用于基板W的拍摄高度校正中的一个的驱动部分3b，关于XY轴的倾斜校正，镜头的图像表面曲线校正，镜头的倍率校正以及在Z轴中的旋转校正。以及控制部分110，用于当驱动部分3b将第一镜头的校正状态移动到第二镜头的校正状态所需的时间时，控制衬底台4使得曝光区域从第一镜头移动到第三镜头拍摄时间长于衬底台4将曝光区域从第一镜头移动到第二镜头所需的时间以及驱动部件3b将用于第一镜头的校正状态移动到第三镜头的校正状态所需的时间当衬底台4的移动距离最短时，当衬底台4移动衬底W以将曝光区域从第一镜头切换到第二镜头时。版权所有（C）2009，JPO＆INPIT

45. 发明专利

JP4319188B2 Substrate transfer apparatus and a substrate transfer method, an exposure apparatus and an exposure method, a device manufacturing apparatus and device manufacturing method 有权
标题翻译：空值
公开(公告)号：JP4319188B2
公开(公告)日：2009-08-26
申请号：JP2005514600
申请日：2004-10-07
申请人：株式会社ニコン , 株式会社蔵王ニコン
发明人：貴史堀内 , 篤太田
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , G03B27/42 , G03D3/00 , G03F7/2041 , G03F7/7075

46. 发明专利

JP2009117870A Alignment system and method and device manufactured thereby 审中-公开
标题翻译：对准系统及其制造方法及装置
公开(公告)号：JP2009117870A
公开(公告)日：2009-05-28
申请号：JP2009039327
申请日：2009-02-23
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： TOLSMA HOITE PIETER THEODOOR , NAVARRO Y KOREN RAMON , SIMONS HUBERTUS JOHANNES GERTR , EDART REMI DANIEL MARIE , LAM PUI LENG , HULSHOF BERNARDUS JOHANNES ANT , BOGERS ROLAND ADRIANUS EMANUEL
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G03F9/00
CPC分类号： G03B27/42 , G03F9/7046
摘要： PROBLEM TO BE SOLVED: To provide an arrangement configuration and a method for automatically selecting a substrate alignment mark on a substrate in lithography equipment and an overlay metering target in an overlay metering device. SOLUTION: A memory stores locations of one or a plurality of sets of substrate alignment marks or overlay metering targets available for selection and selection rules to select suitable substrate alignment marks or overlay metering targets from this at least one set. The selection rules are based on experimental or theoretical knowledge about which substrate alignment mark or overlay metering targets locations are optimal based on one or a plurality of selection criteria. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种在覆盖计量装置中在光刻设备和覆盖计量目标物中自动选择基板上的基板对准标记的布置配置和方法。解决方案：存储器存储可用于选择和选择规则的一组或多组衬底对准标记或覆盖测量目标的位置，以从该至少一组中选择合适的衬底对准标记或覆盖测量目标。选择规则基于关于基于一个或多个选择标准的哪些衬底对准标记或覆盖测量目标位置是最佳的实验或理论知识。版权所有（C）2009，JPO＆INPIT

47. 发明专利

JP4235468B2 Semiconductor manufacturing equipment 有权
公开(公告)号：JP4235468B2
公开(公告)日：2009-03-11
申请号：JP2003053896
申请日：2003-02-28
申请人：キヤノン株式会社
发明人：浩田中
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G03F9/00 , H01L23/544
CPC分类号： G03F9/708 , G03B27/42 , G03F9/7011 , G03F9/7084 , H01L23/544 , H01L2223/5442 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446 , H01L2223/54466 , H01L2223/54493 , H01L2924/0002 , H01L2924/00

48. 发明专利

JP4235410B2 Exposure method 有权
公开(公告)号：JP4235410B2
公开(公告)日：2009-03-11
申请号：JP2002225127
申请日：2002-08-01
申请人：キヤノン株式会社
发明人：堅一郎森
IPC分类号： H01L21/027 , G03B27/42 , G03F7/20 , G03F7/207
CPC分类号： G03F7/701 , G03B27/42 , G03F7/70433

49. 发明专利

JP2009016385A Stage apparatus, exposure apparatus, and method of manufacturing device 审中-公开
标题翻译：阶段装置，曝光装置和制造装置的方法
公开(公告)号：JP2009016385A
公开(公告)日：2009-01-22
申请号：JP2007173108
申请日：2007-06-29
申请人： Canon Inc , キヤノン株式会社
发明人： HIYAMA YOSHIHISA
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68
CPC分类号： G03B27/42 , G03F7/70758
摘要： PROBLEM TO BE SOLVED: To provide a stage apparatus capable of reducing moments generated by electromagnets due to rotation of a micromotion stage, and of reducing heat generation of a micromotion linear motor. SOLUTION: This stage apparatus includes a first stage 104 and a second stage 105 mounted on the first stage 104. A linear motor 103 positions the second stage 105 relative to the first stage 104. A plurality of electromagnets 106a-106d accelerate and decelerate the second stage 105 relative to the first stage 104. A controller controls the electromagnets 106a-106d to reduce moments generated by the electromagnets due to rotation of the second stage 105. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够减少由于微动阶段的旋转而由电磁体产生的力矩并且减少微动直线电动机的发热的平台装置。
解决方案：该级装置包括安装在第一级104上的第一级104和第二级105.线性电动机103相对于第一级104定位第二级105.多个电磁体106a-106d加速使第二级105相对于第一级104减速。控制器控制电磁体106a-106d以减少由于第二级105的旋转而由电磁体产生的力矩。（C）2009年，JPO和INPIT

50. 发明专利

JP2008288590A Assembly provided with radiation source, reflector and contaminant barrier 有权
标题翻译：装配有辐射源，反射器和污染物拦截器
公开(公告)号：JP2008288590A
公开(公告)日：2008-11-27
申请号：JP2008128618
申请日：2008-05-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SOER WOUTER ANTHON , WILHELMUS VAN HERPEN MAARTEN M
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03B27/42 , G03F7/70175 , G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide an improved assembly provided with a radiation source, a radiation reflector and a contaminant barrier, particularly, for example, an assembly which can offer improved properties for providing radiation to be employed in EUV lithography. SOLUTION: The contaminant barrier is constructed to receive a radiation from a radiation source and reflect the radiation toward a radiation reflector, and the radiation reflector is constructed to return back the radiation received from the contaminant barrier to reflect toward the contaminant barrier. COPYRIGHT: (C)2009,JPO&INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式