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1. 发明专利

JP5414921B2 Detection apparatus and method, exposure apparatus, device manufacturing method 有权
公开(公告)号：JP5414921B2
公开(公告)日：2014-02-12
申请号：JP2013035108
申请日：2013-02-25
申请人：キヤノン株式会社
发明人：浩田中 , 卓司丸田
IPC分类号： H01L21/027 , G03F9/00

2. 发明专利

JP4999781B2 Position detection apparatus and method, exposure apparatus, device manufacturing method 有权
公开(公告)号：JP4999781B2
公开(公告)日：2012-08-15
申请号：JP2008152263
申请日：2008-06-10
申请人：キヤノン株式会社
发明人：卓司丸田 , 浩田中
IPC分类号： H01L21/027

3. 发明专利

JP4759119B2 Scanning exposure apparatus and device manufacturing method 有权
公开(公告)号：JP4759119B2
公开(公告)日：2011-08-31
申请号：JP2000239425
申请日：2000-08-08
申请人：キヤノン株式会社
发明人：浩田中
IPC分类号： G01B11/00 , H01L21/027 , G03F7/20 , G03F9/00
CPC分类号： G03F9/7065 , G03F9/7088

4. 发明专利

JP4366031B2 Position detection apparatus and method, as well as an exposure apparatus, a device manufacturing method 有权
公开(公告)号：JP4366031B2
公开(公告)日：2009-11-18
申请号：JP2001282102
申请日：2001-09-17
申请人：キヤノン株式会社
发明人：和彦三島 , 浩田中
IPC分类号： G01B11/00 , H01L21/027 , G02B5/00 , G03F9/00
CPC分类号： G03F9/7088 , G03F9/7046 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446
摘要： In a position detection apparatus which detects the position of an alignment mark, the alignment mark is sensed by a low-magnification image sensing system to acquire a rough position, and a stage is aligned based on the acquired rough position. The alignment mark is sensed by a high-magnification image sensing system to acquire an accurate position. The photoelectric conversion elements of the high- and low-magnification image sensing optical systems are elements whose storage times can be set. A controller determines the signal intensity levels of the photoelectric conversion elements on the basis of electrical signals from the photoelectric conversion elements of the high- and low-magnification image sensing optical systems, and sets storage times appropriate for the photoelectric conversion elements. The position of the alignment mark is detected using signals from the photoelectric conversion elements whose storage times are properly set.

5. 发明专利

JP3605043B2 Position measuring device, exposure apparatus, device manufacturing method, and position measuring method 有权
公开(公告)号：JP3605043B2
公开(公告)日：2004-12-22
申请号：JP2001119475
申请日：2001-04-18
申请人：キヤノン株式会社
发明人：道浩広岡 , 浩田中
IPC分类号： G01B11/00 , G03B27/54 , G03F7/20 , H01L21/027
CPC分类号： G03B27/54

6. 发明专利

JP4208467B2 Camera system and its control method, device manufacturing equipment, exposure apparatus and device manufacturing method 有权
公开(公告)号：JP4208467B2
公开(公告)日：2009-01-14
申请号：JP2002001601
申请日：2002-01-08
申请人：キヤノン株式会社
发明人：浩田中
IPC分类号： G03F9/00 , G06T1/00 , H01L21/027 , H04N5/232
CPC分类号： H04N5/232

7. 发明专利

JP5036789B2 Exposure device, position detection method, and device manufacturing method 有权
公开(公告)号：JP5036789B2
公开(公告)日：2012-09-26
申请号：JP2009259298
申请日：2009-11-12
申请人：キヤノン株式会社
发明人：浩田中
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68

8. 发明专利

JP5002100B2 Focus position detection method and focus position detecting device 有权
公开(公告)号：JP5002100B2
公开(公告)日：2012-08-15
申请号：JP2001278107
申请日：2001-09-13
申请人：キヤノン株式会社
发明人：望林 , 浩田中
IPC分类号： G02B7/36 , H01L21/027 , G02B7/28 , G03F7/207 , G03F9/00
CPC分类号： G03F9/7026
摘要： Disclosed is a focal point position detecting method and a focal point position detecting system, in which an object having a mark is moved in an optical axis direction of a projection optical system, and, with respect to different movement positions of the object, the mark of the object is illuminated through the projection optical system. An image of the mark is picked up to produce imagewise information The imagewise information is corrected in accordance with an intensity of light illuminating the mark. The focal point position of the projection optical system is then detected on the basis of the imagewise information corrected with respect to each of the different movement positions of the object. With this arrangement, even if the intensity of illumination light changes, the influence upon the detection of focal point position is reduced, and the detection can be simple without complicatedness.

9. 发明专利

JP5284410B2 Position detection apparatus and method, exposure apparatus, device manufacturing method 有权
公开(公告)号：JP5284410B2
公开(公告)日：2013-09-11
申请号：JP2011098627
申请日：2011-04-26
申请人：キヤノン株式会社
发明人：浩田中 , 卓司丸田
IPC分类号： H01L21/027 , G01B11/00 , G03F9/00

10. 发明专利

JP3998223B2 Position detecting device, exposure apparatus and device manufacturing method 失效
公开(公告)号：JP3998223B2
公开(公告)日：2007-10-24
申请号：JP9997698
申请日：1998-03-30
申请人：キヤノン株式会社
发明人：修森本 , 浩田中
IPC分类号： H01L21/027 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To measure a position by an optimum measurement processing parameter, without requiring time, labor and skill on the part of an operator. SOLUTION: This position detector is provided with a pattern matching means OS (CCD photographing device), IP (image processor), IL (illumination device), LC (controller), CU (central processing unit) and MD (storage device) for pattern-matching the image information of a mark WM for position detection on a position detection object WF and a prescribed template pattern by prescribed measurement processing parameter values. The pattern matching means perform pattern matching, while changing the parameter values of the measurement processing parameter and set the parameter value of the measurement processing parameter, based on the result. When the plural kinds of measurement processing parameters for setting the parameter values are present, the pattern matching means perform pattern matching for all the combinations of the parameter values adoptable by the change, while changing the parameter values of the respective measurement processing parameters and set the parameter values based on the result.

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